DE60219229D1 - Herstellungsverfahren für Verbindungshalbleiterlaser - Google Patents
Herstellungsverfahren für VerbindungshalbleiterlaserInfo
- Publication number
- DE60219229D1 DE60219229D1 DE60219229T DE60219229T DE60219229D1 DE 60219229 D1 DE60219229 D1 DE 60219229D1 DE 60219229 T DE60219229 T DE 60219229T DE 60219229 T DE60219229 T DE 60219229T DE 60219229 D1 DE60219229 D1 DE 60219229D1
- Authority
- DE
- Germany
- Prior art keywords
- manufacturing
- semiconductor laser
- compound semiconductor
- compound
- laser
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 150000001875 compounds Chemical class 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
- H01L21/225—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a solid phase, e.g. a doped oxide layer
- H01L21/2258—Diffusion into or out of AIIIBV compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/16—Window-type lasers, i.e. with a region of non-absorbing material between the active region and the reflecting surface
- H01S5/162—Window-type lasers, i.e. with a region of non-absorbing material between the active region and the reflecting surface with window regions made by diffusion or disordening of the active layer
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Optics & Photonics (AREA)
- Electromagnetism (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Semiconductor Lasers (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Recrystallisation Techniques (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001011885A JP3719705B2 (ja) | 2001-01-19 | 2001-01-19 | 化合物半導体装置の製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE60219229D1 true DE60219229D1 (de) | 2007-05-16 |
Family
ID=18878969
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60219229T Expired - Lifetime DE60219229D1 (de) | 2001-01-19 | 2002-01-16 | Herstellungsverfahren für Verbindungshalbleiterlaser |
Country Status (4)
Country | Link |
---|---|
US (1) | US6686217B2 (de) |
EP (1) | EP1233492B1 (de) |
JP (1) | JP3719705B2 (de) |
DE (1) | DE60219229D1 (de) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4309636B2 (ja) * | 2002-10-17 | 2009-08-05 | 三菱電機株式会社 | 半導体レーザおよび光通信用素子 |
JP2010199520A (ja) * | 2009-02-27 | 2010-09-09 | Renesas Electronics Corp | 半導体レーザ及び半導体レーザの製造方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2752423B2 (ja) * | 1989-03-31 | 1998-05-18 | 三菱電機株式会社 | 化合物半導体へのZn拡散方法 |
JPH03126283A (ja) * | 1989-10-11 | 1991-05-29 | Toshiba Corp | 窓構造半導体レーザ素子の製造方法 |
JPH0582463A (ja) * | 1991-03-25 | 1993-04-02 | Mitsubishi Electric Corp | P形不純物の拡散方法及び半導体レーザ |
JPH0629621A (ja) * | 1992-07-09 | 1994-02-04 | Mitsubishi Electric Corp | 半導体レーザ装置 |
JP2956869B2 (ja) * | 1993-08-30 | 1999-10-04 | 富士通株式会社 | 半導体レーザおよびその製造方法 |
JP3718952B2 (ja) * | 1997-04-15 | 2005-11-24 | 三菱電機株式会社 | 半導体レーザ |
US6503421B1 (en) | 2000-11-01 | 2003-01-07 | Corning Incorporated | All polymer process compatible optical polymer material |
US6801703B2 (en) | 2001-08-08 | 2004-10-05 | Photon-X, Llc | Freestanding athermal polymer optical waveguide |
-
2001
- 2001-01-19 JP JP2001011885A patent/JP3719705B2/ja not_active Expired - Fee Related
-
2002
- 2002-01-16 EP EP02250291A patent/EP1233492B1/de not_active Expired - Lifetime
- 2002-01-16 DE DE60219229T patent/DE60219229D1/de not_active Expired - Lifetime
- 2002-01-16 US US10/046,217 patent/US6686217B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP2002217490A (ja) | 2002-08-02 |
EP1233492B1 (de) | 2007-04-04 |
EP1233492A3 (de) | 2005-02-16 |
JP3719705B2 (ja) | 2005-11-24 |
US6686217B2 (en) | 2004-02-03 |
US20020098666A1 (en) | 2002-07-25 |
EP1233492A2 (de) | 2002-08-21 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8332 | No legal effect for de |