DE60217673T2 - Belichtungsvorrichtung mit einem optischen Element aus isometrischem Kristall - Google Patents

Belichtungsvorrichtung mit einem optischen Element aus isometrischem Kristall Download PDF

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Publication number
DE60217673T2
DE60217673T2 DE60217673T DE60217673T DE60217673T2 DE 60217673 T2 DE60217673 T2 DE 60217673T2 DE 60217673 T DE60217673 T DE 60217673T DE 60217673 T DE60217673 T DE 60217673T DE 60217673 T2 DE60217673 T2 DE 60217673T2
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DE
Germany
Prior art keywords
optical
axis
optical element
intrinsic birefringence
crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60217673T
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German (de)
English (en)
Other versions
DE60217673D1 (de
Inventor
Seiji c/o Canon Kabushiki Kaisha Ohta-Ku TAKEUCHI
Yasuyuki c/o Canon Kabushiki Kaisha Ohta - Ku UNNO
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=26619804&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE60217673(T2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Canon Inc filed Critical Canon Inc
Application granted granted Critical
Publication of DE60217673D1 publication Critical patent/DE60217673D1/de
Publication of DE60217673T2 publication Critical patent/DE60217673T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10—Inorganic compounds or compositions
    • C30B29/12—Halides
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10S117/918—Single-crystal waveguide

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Polarising Elements (AREA)
  • Liquid Crystal (AREA)
  • Pressure Sensors (AREA)
DE60217673T 2001-06-27 2002-06-13 Belichtungsvorrichtung mit einem optischen Element aus isometrischem Kristall Expired - Lifetime DE60217673T2 (de)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2001234254 2001-06-27
JP2001234254 2001-06-27
JP2001244970A JP3639807B2 (ja) 2001-06-27 2001-07-06 光学素子及び製造方法
JP2001244970 2001-07-06
PCT/JP2002/005952 WO2003003072A2 (en) 2001-06-27 2002-06-13 Optical element and manufacturing method therefor

Publications (2)

Publication Number Publication Date
DE60217673D1 DE60217673D1 (de) 2007-03-08
DE60217673T2 true DE60217673T2 (de) 2007-10-18

Family

ID=26619804

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60217673T Expired - Lifetime DE60217673T2 (de) 2001-06-27 2002-06-13 Belichtungsvorrichtung mit einem optischen Element aus isometrischem Kristall

Country Status (8)

Country Link
US (2) US7102828B2 (enExample)
EP (1) EP1399766B1 (enExample)
JP (1) JP3639807B2 (enExample)
KR (1) KR100544394B1 (enExample)
AT (1) ATE352048T1 (enExample)
DE (1) DE60217673T2 (enExample)
TW (1) TWI244679B (enExample)
WO (1) WO2003003072A2 (enExample)

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EP1399766A2 (en) 2004-03-24
KR20040015179A (ko) 2004-02-18
WO2003003072A3 (en) 2003-10-30
DE60217673D1 (de) 2007-03-08
US7102828B2 (en) 2006-09-05
KR100544394B1 (ko) 2006-01-23
US20030000453A1 (en) 2003-01-02
US20040136084A1 (en) 2004-07-15
JP3639807B2 (ja) 2005-04-20
US7262920B2 (en) 2007-08-28
WO2003003072A2 (en) 2003-01-09
JP2003131002A (ja) 2003-05-08
EP1399766B1 (en) 2007-01-17
ATE352048T1 (de) 2007-02-15
TWI244679B (en) 2005-12-01

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