JP3639807B2 - 光学素子及び製造方法 - Google Patents

光学素子及び製造方法 Download PDF

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Publication number
JP3639807B2
JP3639807B2 JP2001244970A JP2001244970A JP3639807B2 JP 3639807 B2 JP3639807 B2 JP 3639807B2 JP 2001244970 A JP2001244970 A JP 2001244970A JP 2001244970 A JP2001244970 A JP 2001244970A JP 3639807 B2 JP3639807 B2 JP 3639807B2
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JP
Japan
Prior art keywords
axis
optical
optical system
optical element
intrinsic birefringence
Prior art date
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Expired - Fee Related
Application number
JP2001244970A
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English (en)
Japanese (ja)
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JP2003131002A5 (enExample
JP2003131002A (ja
Inventor
誠二 竹内
靖行 吽野
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Canon Inc
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Canon Inc
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First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=26619804&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=JP3639807(B2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2001244970A priority Critical patent/JP3639807B2/ja
Priority to US09/934,947 priority patent/US7102828B2/en
Priority to TW091108576A priority patent/TWI244679B/zh
Priority to PCT/JP2002/005952 priority patent/WO2003003072A2/en
Priority to KR1020037014060A priority patent/KR100544394B1/ko
Priority to EP02736104A priority patent/EP1399766B1/en
Priority to DE60217673T priority patent/DE60217673T2/de
Priority to AT02736104T priority patent/ATE352048T1/de
Publication of JP2003131002A publication Critical patent/JP2003131002A/ja
Priority to US10/684,294 priority patent/US7262920B2/en
Publication of JP3639807B2 publication Critical patent/JP3639807B2/ja
Application granted granted Critical
Publication of JP2003131002A5 publication Critical patent/JP2003131002A5/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10—Inorganic compounds or compositions
    • C30B29/12—Halides
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10S117/918—Single-crystal waveguide

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Polarising Elements (AREA)
  • Liquid Crystal (AREA)
  • Pressure Sensors (AREA)
JP2001244970A 2001-06-27 2001-07-06 光学素子及び製造方法 Expired - Fee Related JP3639807B2 (ja)

Priority Applications (9)

Application Number Priority Date Filing Date Title
JP2001244970A JP3639807B2 (ja) 2001-06-27 2001-07-06 光学素子及び製造方法
US09/934,947 US7102828B2 (en) 2001-06-27 2001-08-22 Optical element and manufacturing method thereof
TW091108576A TWI244679B (en) 2001-06-27 2002-04-25 Optical element and manufacturing method therefor
DE60217673T DE60217673T2 (de) 2001-06-27 2002-06-13 Belichtungsvorrichtung mit einem optischen Element aus isometrischem Kristall
KR1020037014060A KR100544394B1 (ko) 2001-06-27 2002-06-13 광학소자 및 그 제조방법
EP02736104A EP1399766B1 (en) 2001-06-27 2002-06-13 Exposure apparatus comprising an optical element made of an isometric crystal
PCT/JP2002/005952 WO2003003072A2 (en) 2001-06-27 2002-06-13 Optical element and manufacturing method therefor
AT02736104T ATE352048T1 (de) 2001-06-27 2002-06-13 Belichtungsvorrichtung mit einem optischen element aus isometrischem kristall
US10/684,294 US7262920B2 (en) 2001-06-27 2003-10-10 Optical element and manufacturing method therefor

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2001234254 2001-06-27
JP2001-234254 2001-06-27
JP2001244970A JP3639807B2 (ja) 2001-06-27 2001-07-06 光学素子及び製造方法

Publications (3)

Publication Number Publication Date
JP2003131002A JP2003131002A (ja) 2003-05-08
JP3639807B2 true JP3639807B2 (ja) 2005-04-20
JP2003131002A5 JP2003131002A5 (enExample) 2005-07-28

Family

ID=26619804

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001244970A Expired - Fee Related JP3639807B2 (ja) 2001-06-27 2001-07-06 光学素子及び製造方法

Country Status (8)

Country Link
US (2) US7102828B2 (enExample)
EP (1) EP1399766B1 (enExample)
JP (1) JP3639807B2 (enExample)
KR (1) KR100544394B1 (enExample)
AT (1) ATE352048T1 (enExample)
DE (1) DE60217673T2 (enExample)
TW (1) TWI244679B (enExample)
WO (1) WO2003003072A2 (enExample)

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US20030000453A1 (en) 2003-01-02
US20040136084A1 (en) 2004-07-15
US7262920B2 (en) 2007-08-28
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