DE60217673D1 - Belichtungsvorrichtung mit einem optischen Element aus isometrischem Kristall - Google Patents
Belichtungsvorrichtung mit einem optischen Element aus isometrischem KristallInfo
- Publication number
- DE60217673D1 DE60217673D1 DE60217673T DE60217673T DE60217673D1 DE 60217673 D1 DE60217673 D1 DE 60217673D1 DE 60217673 T DE60217673 T DE 60217673T DE 60217673 T DE60217673 T DE 60217673T DE 60217673 D1 DE60217673 D1 DE 60217673D1
- Authority
- DE
- Germany
- Prior art keywords
- optical element
- exposure device
- crystal optical
- isometric crystal
- isometric
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
- G03F7/70966—Birefringence
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/12—Halides
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10S117/918—Single-crystal waveguide
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Optics & Photonics (AREA)
- Public Health (AREA)
- Epidemiology (AREA)
- Environmental & Geological Engineering (AREA)
- Health & Medical Sciences (AREA)
- Inorganic Chemistry (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Lenses (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Polarising Elements (AREA)
- Liquid Crystal (AREA)
- Pressure Sensors (AREA)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001234254 | 2001-06-27 | ||
JP2001234254 | 2001-06-27 | ||
JP2001244970A JP3639807B2 (ja) | 2001-06-27 | 2001-07-06 | 光学素子及び製造方法 |
JP2001244970 | 2001-07-06 | ||
PCT/JP2002/005952 WO2003003072A2 (en) | 2001-06-27 | 2002-06-13 | Optical element and manufacturing method therefor |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60217673D1 true DE60217673D1 (de) | 2007-03-08 |
DE60217673T2 DE60217673T2 (de) | 2007-10-18 |
Family
ID=26619804
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60217673T Expired - Lifetime DE60217673T2 (de) | 2001-06-27 | 2002-06-13 | Belichtungsvorrichtung mit einem optischen Element aus isometrischem Kristall |
Country Status (8)
Country | Link |
---|---|
US (2) | US7102828B2 (de) |
EP (1) | EP1399766B1 (de) |
JP (1) | JP3639807B2 (de) |
KR (1) | KR100544394B1 (de) |
AT (1) | ATE352048T1 (de) |
DE (1) | DE60217673T2 (de) |
TW (1) | TWI244679B (de) |
WO (1) | WO2003003072A2 (de) |
Families Citing this family (121)
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DE10028434B4 (de) * | 2000-06-14 | 2005-09-29 | Ludwig Felser | Stahlbausystem |
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US7239447B2 (en) * | 2001-05-15 | 2007-07-03 | Carl Zeiss Smt Ag | Objective with crystal lenses |
DE10210782A1 (de) * | 2002-03-12 | 2003-10-09 | Zeiss Carl Smt Ag | Objektiv mit Kristall-Linsen |
JP2004526331A (ja) * | 2001-05-15 | 2004-08-26 | カール・ツアイス・エスエムテイ・アーゲー | フッ化物結晶レンズを含む対物レンズ |
DE10123725A1 (de) | 2001-05-15 | 2002-11-21 | Zeiss Carl | Projektionsbelichtungsanlage der Mikrolithographie, Optisches System und Herstellverfahren |
US6683710B2 (en) * | 2001-06-01 | 2004-01-27 | Optical Research Associates | Correction of birefringence in cubic crystalline optical systems |
US20030011893A1 (en) * | 2001-06-20 | 2003-01-16 | Nikon Corporation | Optical system and exposure apparatus equipped with the optical system |
US6831731B2 (en) * | 2001-06-28 | 2004-12-14 | Nikon Corporation | Projection optical system and an exposure apparatus with the projection optical system |
US6775063B2 (en) | 2001-07-10 | 2004-08-10 | Nikon Corporation | Optical system and exposure apparatus having the optical system |
US6788389B2 (en) * | 2001-07-10 | 2004-09-07 | Nikon Corporation | Production method of projection optical system |
US6844915B2 (en) * | 2001-08-01 | 2005-01-18 | Nikon Corporation | Optical system and exposure apparatus provided with the optical system |
JPWO2003023480A1 (ja) * | 2001-09-07 | 2004-12-24 | 株式会社ニコン | 光学系および該光学系を備えた露光装置、並びにデバイスの製造方法 |
US20030070606A1 (en) * | 2001-10-05 | 2003-04-17 | Leblond Nicolas | Preparation of feedstock of alkaline earth and alkali metal fluorides |
US6970232B2 (en) * | 2001-10-30 | 2005-11-29 | Asml Netherlands B.V. | Structures and methods for reducing aberration in integrated circuit fabrication systems |
US7453641B2 (en) * | 2001-10-30 | 2008-11-18 | Asml Netherlands B.V. | Structures and methods for reducing aberration in optical systems |
US6995908B2 (en) * | 2001-10-30 | 2006-02-07 | Asml Netherlands B.V. | Methods for reducing aberration in optical systems |
DE10162796B4 (de) * | 2001-12-20 | 2007-10-31 | Carl Zeiss Smt Ag | Verfahren zur Optimierung der Abbildungseigenschaften von mindestens zwei optischen Elementen sowie photolithographisches Fertigungsverfahren |
US7075721B2 (en) * | 2002-03-06 | 2006-07-11 | Corning Incorporated | Compensator for radially symmetric birefringence |
JP2003309059A (ja) * | 2002-04-17 | 2003-10-31 | Nikon Corp | 投影光学系、その製造方法、露光装置および露光方法 |
JP4333078B2 (ja) * | 2002-04-26 | 2009-09-16 | 株式会社ニコン | 投影光学系、該投影光学系を備えた露光装置および該投影光学系を用いた露光方法並びにデバイス製造方法 |
US7292388B2 (en) * | 2002-05-08 | 2007-11-06 | Carl Zeiss Smt Ag | Lens made of a crystalline material |
JP2004045692A (ja) * | 2002-07-11 | 2004-02-12 | Canon Inc | 投影光学系、露光装置及びデバイス製造方法 |
US7072102B2 (en) * | 2002-08-22 | 2006-07-04 | Asml Netherlands B.V. | Methods for reducing polarization aberration in optical systems |
DE10345895B4 (de) * | 2002-10-01 | 2015-11-05 | Nikon Corp. | Verfahren zur Herstellung eines durch einen Fluoridkristall gebildeten optischen Elements |
EP1662553A1 (de) * | 2003-07-24 | 2006-05-31 | Nikon Corporation | Optisches beleuchtungssystem, belichtungssystem und belichtungsverfahren |
US7463422B2 (en) * | 2004-01-14 | 2008-12-09 | Carl Zeiss Smt Ag | Projection exposure apparatus |
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JP4776891B2 (ja) * | 2004-04-23 | 2011-09-21 | キヤノン株式会社 | 照明光学系、露光装置、及びデバイス製造方法 |
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-
2001
- 2001-07-06 JP JP2001244970A patent/JP3639807B2/ja not_active Expired - Fee Related
- 2001-08-22 US US09/934,947 patent/US7102828B2/en not_active Expired - Fee Related
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2002
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- 2002-06-13 WO PCT/JP2002/005952 patent/WO2003003072A2/en active IP Right Grant
- 2002-06-13 AT AT02736104T patent/ATE352048T1/de not_active IP Right Cessation
- 2002-06-13 KR KR1020037014060A patent/KR100544394B1/ko not_active IP Right Cessation
- 2002-06-13 EP EP02736104A patent/EP1399766B1/de not_active Revoked
- 2002-06-13 DE DE60217673T patent/DE60217673T2/de not_active Expired - Lifetime
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Also Published As
Publication number | Publication date |
---|---|
JP3639807B2 (ja) | 2005-04-20 |
DE60217673T2 (de) | 2007-10-18 |
WO2003003072A3 (en) | 2003-10-30 |
EP1399766B1 (de) | 2007-01-17 |
US20030000453A1 (en) | 2003-01-02 |
KR20040015179A (ko) | 2004-02-18 |
KR100544394B1 (ko) | 2006-01-23 |
JP2003131002A (ja) | 2003-05-08 |
EP1399766A2 (de) | 2004-03-24 |
US7102828B2 (en) | 2006-09-05 |
US20040136084A1 (en) | 2004-07-15 |
ATE352048T1 (de) | 2007-02-15 |
US7262920B2 (en) | 2007-08-28 |
WO2003003072A2 (en) | 2003-01-09 |
TWI244679B (en) | 2005-12-01 |
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