KR100544394B1 - 광학소자 및 그 제조방법 - Google Patents

광학소자 및 그 제조방법 Download PDF

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Publication number
KR100544394B1
KR100544394B1 KR1020037014060A KR20037014060A KR100544394B1 KR 100544394 B1 KR100544394 B1 KR 100544394B1 KR 1020037014060 A KR1020037014060 A KR 1020037014060A KR 20037014060 A KR20037014060 A KR 20037014060A KR 100544394 B1 KR100544394 B1 KR 100544394B1
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optical
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optical system
optical element
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Korean (ko)
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KR20040015179A (ko
Inventor
세이지 타케우치
야수유키 우노
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캐논 가부시끼가이샤
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10—Inorganic compounds or compositions
    • C30B29/12—Halides
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10S117/918—Single-crystal waveguide

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Polarising Elements (AREA)
  • Liquid Crystal (AREA)
  • Pressure Sensors (AREA)
KR1020037014060A 2001-06-27 2002-06-13 광학소자 및 그 제조방법 Expired - Fee Related KR100544394B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JPJP-P-2001-00234254 2001-06-27
JP2001234254 2001-06-27
JPJP-P-2001-00244970 2001-07-06
JP2001244970A JP3639807B2 (ja) 2001-06-27 2001-07-06 光学素子及び製造方法
PCT/JP2002/005952 WO2003003072A2 (en) 2001-06-27 2002-06-13 Optical element and manufacturing method therefor

Publications (2)

Publication Number Publication Date
KR20040015179A KR20040015179A (ko) 2004-02-18
KR100544394B1 true KR100544394B1 (ko) 2006-01-23

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ID=26619804

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020037014060A Expired - Fee Related KR100544394B1 (ko) 2001-06-27 2002-06-13 광학소자 및 그 제조방법

Country Status (8)

Country Link
US (2) US7102828B2 (enExample)
EP (1) EP1399766B1 (enExample)
JP (1) JP3639807B2 (enExample)
KR (1) KR100544394B1 (enExample)
AT (1) ATE352048T1 (enExample)
DE (1) DE60217673T2 (enExample)
TW (1) TWI244679B (enExample)
WO (1) WO2003003072A2 (enExample)

Families Citing this family (124)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10028434B4 (de) * 2000-06-14 2005-09-29 Ludwig Felser Stahlbausystem
US6870668B2 (en) * 2000-10-10 2005-03-22 Nikon Corporation Method for evaluating image formation performance
DE10123725A1 (de) 2001-05-15 2002-11-21 Zeiss Carl Projektionsbelichtungsanlage der Mikrolithographie, Optisches System und Herstellverfahren
WO2002093209A2 (de) * 2001-05-15 2002-11-21 Carl Zeiss Objektiv mit fluorid-kristall-linsen
US7239447B2 (en) * 2001-05-15 2007-07-03 Carl Zeiss Smt Ag Objective with crystal lenses
DE10210782A1 (de) * 2002-03-12 2003-10-09 Zeiss Carl Smt Ag Objektiv mit Kristall-Linsen
US6683710B2 (en) * 2001-06-01 2004-01-27 Optical Research Associates Correction of birefringence in cubic crystalline optical systems
US20030011893A1 (en) * 2001-06-20 2003-01-16 Nikon Corporation Optical system and exposure apparatus equipped with the optical system
US6831731B2 (en) * 2001-06-28 2004-12-14 Nikon Corporation Projection optical system and an exposure apparatus with the projection optical system
US6788389B2 (en) * 2001-07-10 2004-09-07 Nikon Corporation Production method of projection optical system
US6775063B2 (en) 2001-07-10 2004-08-10 Nikon Corporation Optical system and exposure apparatus having the optical system
US6844915B2 (en) * 2001-08-01 2005-01-18 Nikon Corporation Optical system and exposure apparatus provided with the optical system
JPWO2003023480A1 (ja) * 2001-09-07 2004-12-24 株式会社ニコン 光学系および該光学系を備えた露光装置、並びにデバイスの製造方法
US20030070606A1 (en) * 2001-10-05 2003-04-17 Leblond Nicolas Preparation of feedstock of alkaline earth and alkali metal fluorides
US7453641B2 (en) * 2001-10-30 2008-11-18 Asml Netherlands B.V. Structures and methods for reducing aberration in optical systems
US6970232B2 (en) * 2001-10-30 2005-11-29 Asml Netherlands B.V. Structures and methods for reducing aberration in integrated circuit fabrication systems
US6995908B2 (en) * 2001-10-30 2006-02-07 Asml Netherlands B.V. Methods for reducing aberration in optical systems
DE10162796B4 (de) * 2001-12-20 2007-10-31 Carl Zeiss Smt Ag Verfahren zur Optimierung der Abbildungseigenschaften von mindestens zwei optischen Elementen sowie photolithographisches Fertigungsverfahren
US7075721B2 (en) * 2002-03-06 2006-07-11 Corning Incorporated Compensator for radially symmetric birefringence
JP2003309059A (ja) * 2002-04-17 2003-10-31 Nikon Corp 投影光学系、その製造方法、露光装置および露光方法
JP4333078B2 (ja) * 2002-04-26 2009-09-16 株式会社ニコン 投影光学系、該投影光学系を備えた露光装置および該投影光学系を用いた露光方法並びにデバイス製造方法
US7292388B2 (en) * 2002-05-08 2007-11-06 Carl Zeiss Smt Ag Lens made of a crystalline material
JP2004045692A (ja) * 2002-07-11 2004-02-12 Canon Inc 投影光学系、露光装置及びデバイス製造方法
US6958864B2 (en) * 2002-08-22 2005-10-25 Asml Netherlands B.V. Structures and methods for reducing polarization aberration in integrated circuit fabrication systems
US20040237880A1 (en) * 2002-10-01 2004-12-02 Nikon Corporation Method for manufacturing an optical member formed of a fluoride crystal
KR20060039925A (ko) * 2003-07-24 2006-05-09 가부시키가이샤 니콘 조명 광학 장치, 노광 장치 및 노광 방법
US7463422B2 (en) * 2004-01-14 2008-12-09 Carl Zeiss Smt Ag Projection exposure apparatus
US7239450B2 (en) 2004-11-22 2007-07-03 Carl Zeiss Smt Ag Method of determining lens materials for a projection exposure apparatus
JP4776891B2 (ja) * 2004-04-23 2011-09-21 キヤノン株式会社 照明光学系、露光装置、及びデバイス製造方法
KR20070105976A (ko) * 2005-02-25 2007-10-31 칼 짜이스 에스엠티 아게 광학시스템, 특히 마이크로리소그래픽 투사노출장치용대물렌즈 또는 조명장치
US20110180781A1 (en) * 2008-06-05 2011-07-28 Soraa, Inc Highly Polarized White Light Source By Combining Blue LED on Semipolar or Nonpolar GaN with Yellow LED on Semipolar or Nonpolar GaN
US8847249B2 (en) * 2008-06-16 2014-09-30 Soraa, Inc. Solid-state optical device having enhanced indium content in active regions
US8805134B1 (en) 2012-02-17 2014-08-12 Soraa Laser Diode, Inc. Methods and apparatus for photonic integration in non-polar and semi-polar oriented wave-guided optical devices
US8259769B1 (en) 2008-07-14 2012-09-04 Soraa, Inc. Integrated total internal reflectors for high-gain laser diodes with high quality cleaved facets on nonpolar/semipolar GaN substrates
US8143148B1 (en) 2008-07-14 2012-03-27 Soraa, Inc. Self-aligned multi-dielectric-layer lift off process for laser diode stripes
US8284810B1 (en) 2008-08-04 2012-10-09 Soraa, Inc. Solid state laser device using a selected crystal orientation in non-polar or semi-polar GaN containing materials and methods
JP2011530194A (ja) 2008-08-04 2011-12-15 ソラア インコーポレーテッド 物質および蛍光体を含んだ非分極性あるいは半極性のガリウムを用いた白色灯デバイス
US20100295088A1 (en) * 2008-10-02 2010-11-25 Soraa, Inc. Textured-surface light emitting diode and method of manufacture
US8247886B1 (en) 2009-03-09 2012-08-21 Soraa, Inc. Polarization direction of optical devices using selected spatial configurations
US8422525B1 (en) 2009-03-28 2013-04-16 Soraa, Inc. Optical device structure using miscut GaN substrates for laser applications
US8294179B1 (en) 2009-04-17 2012-10-23 Soraa, Inc. Optical device structure using GaN substrates and growth structures for laser applications
US8254425B1 (en) 2009-04-17 2012-08-28 Soraa, Inc. Optical device structure using GaN substrates and growth structures for laser applications
US8242522B1 (en) 2009-05-12 2012-08-14 Soraa, Inc. Optical device structure using non-polar GaN substrates and growth structures for laser applications in 481 nm
US8837545B2 (en) 2009-04-13 2014-09-16 Soraa Laser Diode, Inc. Optical device structure using GaN substrates and growth structures for laser applications
US9531164B2 (en) 2009-04-13 2016-12-27 Soraa Laser Diode, Inc. Optical device structure using GaN substrates for laser applications
US8634442B1 (en) 2009-04-13 2014-01-21 Soraa Laser Diode, Inc. Optical device structure using GaN substrates for laser applications
US8416825B1 (en) 2009-04-17 2013-04-09 Soraa, Inc. Optical device structure using GaN substrates and growth structure for laser applications
US8791499B1 (en) 2009-05-27 2014-07-29 Soraa, Inc. GaN containing optical devices and method with ESD stability
US10108079B2 (en) 2009-05-29 2018-10-23 Soraa Laser Diode, Inc. Laser light source for a vehicle
US8247887B1 (en) * 2009-05-29 2012-08-21 Soraa, Inc. Method and surface morphology of non-polar gallium nitride containing substrates
US8509275B1 (en) 2009-05-29 2013-08-13 Soraa, Inc. Gallium nitride based laser dazzling device and method
US9800017B1 (en) 2009-05-29 2017-10-24 Soraa Laser Diode, Inc. Laser device and method for a vehicle
US9829780B2 (en) 2009-05-29 2017-11-28 Soraa Laser Diode, Inc. Laser light source for a vehicle
US9250044B1 (en) 2009-05-29 2016-02-02 Soraa Laser Diode, Inc. Gallium and nitrogen containing laser diode dazzling devices and methods of use
US8427590B2 (en) 2009-05-29 2013-04-23 Soraa, Inc. Laser based display method and system
US20110056429A1 (en) * 2009-08-21 2011-03-10 Soraa, Inc. Rapid Growth Method and Structures for Gallium and Nitrogen Containing Ultra-Thin Epitaxial Structures for Devices
US9000466B1 (en) 2010-08-23 2015-04-07 Soraa, Inc. Methods and devices for light extraction from a group III-nitride volumetric LED using surface and sidewall roughening
US8314429B1 (en) 2009-09-14 2012-11-20 Soraa, Inc. Multi color active regions for white light emitting diode
US8355418B2 (en) * 2009-09-17 2013-01-15 Soraa, Inc. Growth structures and method for forming laser diodes on {20-21} or off cut gallium and nitrogen containing substrates
US8750342B1 (en) 2011-09-09 2014-06-10 Soraa Laser Diode, Inc. Laser diodes with scribe structures
CN107256915A (zh) 2009-09-18 2017-10-17 天空公司 发光二极管器件
US9293644B2 (en) 2009-09-18 2016-03-22 Soraa, Inc. Power light emitting diode and method with uniform current density operation
US9583678B2 (en) 2009-09-18 2017-02-28 Soraa, Inc. High-performance LED fabrication
US8933644B2 (en) 2009-09-18 2015-01-13 Soraa, Inc. LED lamps with improved quality of light
US20110182056A1 (en) * 2010-06-23 2011-07-28 Soraa, Inc. Quantum Dot Wavelength Conversion for Optical Devices Using Nonpolar or Semipolar Gallium Containing Materials
US20110186874A1 (en) * 2010-02-03 2011-08-04 Soraa, Inc. White Light Apparatus and Method
US8905588B2 (en) 2010-02-03 2014-12-09 Sorra, Inc. System and method for providing color light sources in proximity to predetermined wavelength conversion structures
US10147850B1 (en) 2010-02-03 2018-12-04 Soraa, Inc. System and method for providing color light sources in proximity to predetermined wavelength conversion structures
US9927611B2 (en) 2010-03-29 2018-03-27 Soraa Laser Diode, Inc. Wearable laser based display method and system
US8451876B1 (en) 2010-05-17 2013-05-28 Soraa, Inc. Method and system for providing bidirectional light sources with broad spectrum
US9450143B2 (en) 2010-06-18 2016-09-20 Soraa, Inc. Gallium and nitrogen containing triangular or diamond-shaped configuration for optical devices
US8816319B1 (en) 2010-11-05 2014-08-26 Soraa Laser Diode, Inc. Method of strain engineering and related optical device using a gallium and nitrogen containing active region
US8975615B2 (en) 2010-11-09 2015-03-10 Soraa Laser Diode, Inc. Method of fabricating optical devices using laser treatment of contact regions of gallium and nitrogen containing material
US9048170B2 (en) 2010-11-09 2015-06-02 Soraa Laser Diode, Inc. Method of fabricating optical devices using laser treatment
US9025635B2 (en) 2011-01-24 2015-05-05 Soraa Laser Diode, Inc. Laser package having multiple emitters configured on a support member
US8786053B2 (en) 2011-01-24 2014-07-22 Soraa, Inc. Gallium-nitride-on-handle substrate materials and devices and method of manufacture
US9318875B1 (en) 2011-01-24 2016-04-19 Soraa Laser Diode, Inc. Color converting element for laser diode
US9595813B2 (en) 2011-01-24 2017-03-14 Soraa Laser Diode, Inc. Laser package having multiple emitters configured on a substrate member
US9093820B1 (en) 2011-01-25 2015-07-28 Soraa Laser Diode, Inc. Method and structure for laser devices using optical blocking regions
US9287684B2 (en) 2011-04-04 2016-03-15 Soraa Laser Diode, Inc. Laser package having multiple emitters with color wheel
US8686431B2 (en) 2011-08-22 2014-04-01 Soraa, Inc. Gallium and nitrogen containing trilateral configuration for optical devices
US8971370B1 (en) 2011-10-13 2015-03-03 Soraa Laser Diode, Inc. Laser devices using a semipolar plane
US8912025B2 (en) 2011-11-23 2014-12-16 Soraa, Inc. Method for manufacture of bright GaN LEDs using a selective removal process
WO2013134432A1 (en) 2012-03-06 2013-09-12 Soraa, Inc. Light emitting diodes with low refractive index material layers to reduce light guiding effects
US9020003B1 (en) 2012-03-14 2015-04-28 Soraa Laser Diode, Inc. Group III-nitride laser diode grown on a semi-polar orientation of gallium and nitrogen containing substrates
US9343871B1 (en) 2012-04-05 2016-05-17 Soraa Laser Diode, Inc. Facet on a gallium and nitrogen containing laser diode
US10559939B1 (en) 2012-04-05 2020-02-11 Soraa Laser Diode, Inc. Facet on a gallium and nitrogen containing laser diode
US9800016B1 (en) 2012-04-05 2017-10-24 Soraa Laser Diode, Inc. Facet on a gallium and nitrogen containing laser diode
US9088135B1 (en) 2012-06-29 2015-07-21 Soraa Laser Diode, Inc. Narrow sized laser diode
US9184563B1 (en) 2012-08-30 2015-11-10 Soraa Laser Diode, Inc. Laser diodes with an etched facet and surface treatment
US9978904B2 (en) 2012-10-16 2018-05-22 Soraa, Inc. Indium gallium nitride light emitting devices
US8802471B1 (en) 2012-12-21 2014-08-12 Soraa, Inc. Contacts for an n-type gallium and nitrogen substrate for optical devices
US9166372B1 (en) 2013-06-28 2015-10-20 Soraa Laser Diode, Inc. Gallium nitride containing laser device configured on a patterned substrate
US8994033B2 (en) 2013-07-09 2015-03-31 Soraa, Inc. Contacts for an n-type gallium and nitrogen substrate for optical devices
US9379525B2 (en) 2014-02-10 2016-06-28 Soraa Laser Diode, Inc. Manufacturable laser diode
US9520695B2 (en) 2013-10-18 2016-12-13 Soraa Laser Diode, Inc. Gallium and nitrogen containing laser device having confinement region
US9368939B2 (en) 2013-10-18 2016-06-14 Soraa Laser Diode, Inc. Manufacturable laser diode formed on C-plane gallium and nitrogen material
US9362715B2 (en) 2014-02-10 2016-06-07 Soraa Laser Diode, Inc Method for manufacturing gallium and nitrogen bearing laser devices with improved usage of substrate material
US9419189B1 (en) 2013-11-04 2016-08-16 Soraa, Inc. Small LED source with high brightness and high efficiency
US9209596B1 (en) 2014-02-07 2015-12-08 Soraa Laser Diode, Inc. Manufacturing a laser diode device from a plurality of gallium and nitrogen containing substrates
US9871350B2 (en) 2014-02-10 2018-01-16 Soraa Laser Diode, Inc. Manufacturable RGB laser diode source
US9520697B2 (en) 2014-02-10 2016-12-13 Soraa Laser Diode, Inc. Manufacturable multi-emitter laser diode
US10175165B2 (en) 2014-02-28 2019-01-08 Halliburton Energy Services, Inc. Multi-characteristic integrated computational element using light incidence angle manipulation
US9564736B1 (en) 2014-06-26 2017-02-07 Soraa Laser Diode, Inc. Epitaxial growth of p-type cladding regions using nitrogen gas for a gallium and nitrogen containing laser diode
US9246311B1 (en) 2014-11-06 2016-01-26 Soraa Laser Diode, Inc. Method of manufacture for an ultraviolet laser diode
US12126143B2 (en) 2014-11-06 2024-10-22 Kyocera Sld Laser, Inc. Method of manufacture for an ultraviolet emitting optoelectronic device
US9666677B1 (en) 2014-12-23 2017-05-30 Soraa Laser Diode, Inc. Manufacturable thin film gallium and nitrogen containing devices
US9653642B1 (en) 2014-12-23 2017-05-16 Soraa Laser Diode, Inc. Manufacturable RGB display based on thin film gallium and nitrogen containing light emitting diodes
US11437774B2 (en) 2015-08-19 2022-09-06 Kyocera Sld Laser, Inc. High-luminous flux laser-based white light source
US10938182B2 (en) 2015-08-19 2021-03-02 Soraa Laser Diode, Inc. Specialized integrated light source using a laser diode
US10879673B2 (en) 2015-08-19 2020-12-29 Soraa Laser Diode, Inc. Integrated white light source using a laser diode and a phosphor in a surface mount device package
US11437775B2 (en) 2015-08-19 2022-09-06 Kyocera Sld Laser, Inc. Integrated light source using a laser diode
US9787963B2 (en) 2015-10-08 2017-10-10 Soraa Laser Diode, Inc. Laser lighting having selective resolution
US10771155B2 (en) 2017-09-28 2020-09-08 Soraa Laser Diode, Inc. Intelligent visible light with a gallium and nitrogen containing laser source
US10222474B1 (en) 2017-12-13 2019-03-05 Soraa Laser Diode, Inc. Lidar systems including a gallium and nitrogen containing laser light source
US10551728B1 (en) 2018-04-10 2020-02-04 Soraa Laser Diode, Inc. Structured phosphors for dynamic lighting
US11239637B2 (en) 2018-12-21 2022-02-01 Kyocera Sld Laser, Inc. Fiber delivered laser induced white light system
US11421843B2 (en) 2018-12-21 2022-08-23 Kyocera Sld Laser, Inc. Fiber-delivered laser-induced dynamic light system
US12152742B2 (en) 2019-01-18 2024-11-26 Kyocera Sld Laser, Inc. Laser-based light guide-coupled wide-spectrum light system
US11884202B2 (en) 2019-01-18 2024-01-30 Kyocera Sld Laser, Inc. Laser-based fiber-coupled white light system
US12000552B2 (en) 2019-01-18 2024-06-04 Kyocera Sld Laser, Inc. Laser-based fiber-coupled white light system for a vehicle
US11228158B2 (en) 2019-05-14 2022-01-18 Kyocera Sld Laser, Inc. Manufacturable laser diodes on a large area gallium and nitrogen containing substrate
US10903623B2 (en) 2019-05-14 2021-01-26 Soraa Laser Diode, Inc. Method and structure for manufacturable large area gallium and nitrogen containing substrate
US12191626B1 (en) 2020-07-31 2025-01-07 Kyocera Sld Laser, Inc. Vertically emitting laser devices and chip-scale-package laser devices and laser-based, white light emitting devices

Family Cites Families (43)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2934993A (en) * 1955-11-18 1960-05-03 Benjamin J Chromy Device for optical examination of gem materials
US3904267A (en) * 1973-07-02 1975-09-09 American Optical Corp Compensating plate to provide uniformity in interference microscopes
JPS5418160U (enExample) * 1977-04-14 1979-02-06
US5042922A (en) * 1986-05-20 1991-08-27 Hughes Aircraft Company Method for improvidng the spatial resolution in an integrated adaptive optics apparatus
NL8900991A (nl) * 1989-04-20 1990-11-16 Asm Lithography Bv Apparaat voor het afbeelden van een maskerpatroon op een substraat.
US5194344A (en) * 1991-03-26 1993-03-16 Micron Technology, Inc. Method of fabricating phase shift reticles including chemically mechanically planarizing
US5194346A (en) * 1991-04-15 1993-03-16 Micron Technology, Inc. Method of fabricating phase shifting reticles with an accurate phase shift layer
JPH0527200A (ja) 1991-07-18 1993-02-05 Fujitsu Ltd 偏波カプラ
US5308211A (en) * 1992-06-22 1994-05-03 Bayne Machine Works, Inc. Residential refuse collection cart lifter with universal features
US5538158A (en) * 1994-05-05 1996-07-23 Toter, Inc. Rotationally-molded refuse container with integrally-molded handle sealed from communication with refuse-carrying compartment
US5795047A (en) * 1994-12-09 1998-08-18 Matsushita Electric Industrial Co., Ltd. Projection lens and projection display apparatus
US6518210B1 (en) * 1995-01-06 2003-02-11 Nikon Corporation Exposure apparatus including silica glass and method for producing silica glass
JP3534363B2 (ja) * 1995-07-31 2004-06-07 パイオニア株式会社 結晶レンズ及びこれを用いた光ピックアップ光学系
US6680803B2 (en) * 1996-12-21 2004-01-20 Carl-Zeiss Smt Ag Partial objective in an illuminating systems
JP3413067B2 (ja) 1997-07-29 2003-06-03 キヤノン株式会社 投影光学系及びそれを用いた投影露光装置
JP2000128696A (ja) 1998-10-16 2000-05-09 Nikon Corp フッ化物単結晶からなる光学素子作製用素材とその製造方法
JP3856265B2 (ja) 1998-03-12 2006-12-13 株式会社ニコン 光学素子の製造方法、光学素子の複屈折算出方法及び複屈折判定方法
US6201634B1 (en) * 1998-03-12 2001-03-13 Nikon Corporation Optical element made from fluoride single crystal, method for manufacturing optical element, method for calculating birefringence of optical element and method for determining direction of minimum birefringence of optical element
JP2000089450A (ja) 1998-09-09 2000-03-31 Canon Inc レチクル及び投影露光装置
JP2000086394A (ja) 1998-09-17 2000-03-28 Natl Space Development Agency Of Japan 氷の結晶成長方向制御方法および氷の結晶成長実験装置
WO2000033138A1 (de) * 1998-11-30 2000-06-08 Carl Zeiss Hochaperturiges projektionsobjektiv mit minimalem blendenfehler
DE19942281A1 (de) * 1999-05-14 2000-11-16 Zeiss Carl Fa Projektionsobjektiv
JP4345232B2 (ja) * 1998-12-25 2009-10-14 株式会社ニコン 反射屈折結像光学系および該光学系を備えた投影露光装置
JP2000331927A (ja) 1999-03-12 2000-11-30 Canon Inc 投影光学系及びそれを用いた投影露光装置
EP1200796A1 (en) 1999-07-02 2002-05-02 Cambridge Research & Instrumentation, Inc. Birefringement interferometer
EP1102100A3 (de) * 1999-11-12 2003-12-10 Carl Zeiss Katadioptrisches Objektiv mit physikalischem Strahlteiler
US6330256B1 (en) * 2000-02-01 2001-12-11 Raytheon Company Method and apparatus for non-dispersive face-cooling of multi-crystal nonlinear optical devices
JP2001332696A (ja) 2000-05-24 2001-11-30 Nec Corp 基板電位検知回路及び基板電位発生回路
US7405884B2 (en) * 2000-12-21 2008-07-29 Olympus Corporation Optical apparatus
JP2004531764A (ja) * 2001-05-16 2004-10-14 コーニング インコーポレイテッド 好ましい結晶方位をもつ立方晶系結晶材料光学素子
US6683710B2 (en) 2001-06-01 2004-01-27 Optical Research Associates Correction of birefringence in cubic crystalline optical systems
US20030011893A1 (en) * 2001-06-20 2003-01-16 Nikon Corporation Optical system and exposure apparatus equipped with the optical system
US6788389B2 (en) * 2001-07-10 2004-09-07 Nikon Corporation Production method of projection optical system
US6775063B2 (en) * 2001-07-10 2004-08-10 Nikon Corporation Optical system and exposure apparatus having the optical system
JP4238727B2 (ja) * 2001-07-17 2009-03-18 株式会社ニコン 光学部材の製造方法
US20030023498A1 (en) * 2001-07-25 2003-01-30 Day Money, Inc. Method of buying and selling goods and services
US6995908B2 (en) * 2001-10-30 2006-02-07 Asml Netherlands B.V. Methods for reducing aberration in optical systems
US6970232B2 (en) * 2001-10-30 2005-11-29 Asml Netherlands B.V. Structures and methods for reducing aberration in integrated circuit fabrication systems
US7453641B2 (en) * 2001-10-30 2008-11-18 Asml Netherlands B.V. Structures and methods for reducing aberration in optical systems
EP1451619A4 (en) 2001-10-30 2007-10-03 Asml Netherlands Bv STRUCTURES AND METHOD FOR REDUCING BERRATION IN OPTICAL SYSTEMS
US6844972B2 (en) * 2001-10-30 2005-01-18 Mcguire, Jr. James P. Reducing aberration in optical systems comprising cubic crystalline optical elements
SG121818A1 (en) * 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US7154582B2 (en) * 2003-02-14 2006-12-26 Canon Kabushiki Kaisha Exposure apparatus and method

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US20030000453A1 (en) 2003-01-02
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