DE602005007405D1 - Speicherbauelemente basierend auf elektrisch programmierbaren Filmen - Google Patents

Speicherbauelemente basierend auf elektrisch programmierbaren Filmen

Info

Publication number
DE602005007405D1
DE602005007405D1 DE602005007405T DE602005007405T DE602005007405D1 DE 602005007405 D1 DE602005007405 D1 DE 602005007405D1 DE 602005007405 T DE602005007405 T DE 602005007405T DE 602005007405 T DE602005007405 T DE 602005007405T DE 602005007405 D1 DE602005007405 D1 DE 602005007405D1
Authority
DE
Germany
Prior art keywords
memory devices
devices based
electrically programmable
programmable films
films
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE602005007405T
Other languages
English (en)
Inventor
Lujia Bu
Charlotte Cutler
Charles R Szmanda
Emine Cagin
Dana A Gronbeck
Edward C Greer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rohm and Haas Co
Original Assignee
Rohm and Haas Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm and Haas Co filed Critical Rohm and Haas Co
Publication of DE602005007405D1 publication Critical patent/DE602005007405D1/de
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/56—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency
    • G11C11/5664—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency using organic memory material storage elements
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
    • G11C13/0009—RRAM elements whose operation depends upon chemical change
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
    • G11C13/0009—RRAM elements whose operation depends upon chemical change
    • G11C13/0014—RRAM elements whose operation depends upon chemical change comprising cells based on organic memory material
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
    • G11C13/0009—RRAM elements whose operation depends upon chemical change
    • G11C13/0014—RRAM elements whose operation depends upon chemical change comprising cells based on organic memory material
    • G11C13/0016—RRAM elements whose operation depends upon chemical change comprising cells based on organic memory material comprising polymers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H10K10/701—Organic molecular electronic devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C2213/00—Indexing scheme relating to G11C13/00 for features not covered by this group
    • G11C2213/70—Resistive array aspects
    • G11C2213/71—Three dimensional array
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C2213/00—Indexing scheme relating to G11C13/00 for features not covered by this group
    • G11C2213/70—Resistive array aspects
    • G11C2213/72—Array wherein the access device being a diode
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C2213/00—Indexing scheme relating to G11C13/00 for features not covered by this group
    • G11C2213/70—Resistive array aspects
    • G11C2213/77—Array wherein the memory element being directly connected to the bit lines and word lines without any access device being used
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K19/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic element specially adapted for rectifying, amplifying, oscillating or switching, covered by group H10K10/00
    • H10K19/202—Integrated devices comprising a common active layer

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Semiconductor Memories (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
  • Laminated Bodies (AREA)
DE602005007405T 2004-03-24 2005-03-19 Speicherbauelemente basierend auf elektrisch programmierbaren Filmen Expired - Fee Related DE602005007405D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US55624604P 2004-03-24 2004-03-24

Publications (1)

Publication Number Publication Date
DE602005007405D1 true DE602005007405D1 (de) 2008-07-24

Family

ID=34860543

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602005007405T Expired - Fee Related DE602005007405D1 (de) 2004-03-24 2005-03-19 Speicherbauelemente basierend auf elektrisch programmierbaren Filmen

Country Status (9)

Country Link
US (1) US20050211978A1 (de)
EP (1) EP1580825B1 (de)
JP (1) JP2005307191A (de)
KR (1) KR100687187B1 (de)
CN (2) CN1770461A (de)
CA (1) CA2500938A1 (de)
DE (1) DE602005007405D1 (de)
SG (1) SG115841A1 (de)
TW (1) TWI270982B (de)

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US20050212022A1 (en) * 2004-03-24 2005-09-29 Greer Edward C Memory cell having an electric field programmable storage element, and method of operating same
DE102004037150B4 (de) * 2004-07-30 2006-08-24 Infineon Technologies Ag Resistiv arbeitende Speicherzelle für Low-Voltage-Anwendungen und Verfahren zu deren Herstellung
US7344913B1 (en) * 2005-04-06 2008-03-18 Spansion Llc Spin on memory cell active layer doped with metal ions
US20070007585A1 (en) * 2005-07-05 2007-01-11 Spansion Llc Memory device with improved data retention
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US7935957B2 (en) * 2005-08-12 2011-05-03 Semiconductor Energy Laboratory Co., Ltd. Memory device and a semiconductor device
JP2007073969A (ja) * 2005-09-07 2007-03-22 Samsung Electronics Co Ltd 電荷トラップ型メモリ素子及びその製造方法
KR100654361B1 (ko) * 2005-09-15 2006-12-08 한양대학교 산학협력단 고분자 박막 내에 형성된 나노 결정체를 사용한 비휘발성고분자 쌍안정성 기억 소자 및 그 제조 방법
US7642043B2 (en) * 2005-11-16 2010-01-05 Shin-Etsu Chemical Co., Ltd. Rework process for photoresist film
KR101167737B1 (ko) * 2006-02-22 2012-07-23 삼성전자주식회사 저항변화형 유기 메모리 소자 및 그의 제조방법
US8454810B2 (en) 2006-07-14 2013-06-04 4D-S Pty Ltd. Dual hexagonal shaped plasma source
US20080032049A1 (en) * 2006-07-29 2008-02-07 Lex Kosowsky Voltage switchable dielectric material having high aspect ratio particles
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JP2008077817A (ja) * 2006-09-12 2008-04-03 Rohm & Haas Co 情報の書き込みおよび読み取り方法ならびにそれに基づく装置
EP1919071B1 (de) * 2006-11-03 2011-04-27 Danfoss A/S Dielektrischer Verbundwerkstoff und Verfahren zur Herstellung eines dielektrischen Verbundwerkstoffs
JP4577695B2 (ja) * 2006-11-07 2010-11-10 エルピーダメモリ株式会社 半導体記憶装置及び半導体記憶装置の製造方法
WO2008059940A1 (en) 2006-11-17 2008-05-22 Semiconductor Energy Laboratory Co., Ltd. Memory element and method for manufacturing the same, and semiconductor device
KR100842730B1 (ko) * 2007-01-16 2008-07-01 삼성전자주식회사 멀티 비트 전기 기계적 메모리 소자 및 그의 제조방법
KR100818239B1 (ko) * 2007-04-09 2008-04-02 한국과학기술원 기계적인 스위치를 이용한 비휘발성 메모리 셀 및 그동작방법
US8084765B2 (en) * 2007-05-07 2011-12-27 Xerox Corporation Electronic device having a dielectric layer
TWI339895B (en) * 2007-05-09 2011-04-01 Ind Tech Res Inst Organic non-volatile memory material and memory device utilizing the same
CN101330128B (zh) * 2007-06-18 2010-08-25 财团法人工业技术研究院 有机非易失性存储材料及存储器件
US7884342B2 (en) * 2007-07-31 2011-02-08 Macronix International Co., Ltd. Phase change memory bridge cell
GB0721527D0 (en) * 2007-11-02 2007-12-12 P2I Ltd Filtration Membranes
KR101067051B1 (ko) * 2007-11-29 2011-09-22 파나소닉 주식회사 비휘발성 기억 장치 및 그 제조 방법
US7692959B2 (en) 2008-04-22 2010-04-06 International Business Machines Corporation Multilayer storage class memory using externally heated phase change material
IT1392754B1 (it) * 2008-12-18 2012-03-16 St Microelectronics Srl Nanoarray ad incrocio con strato organico attivo anisotropico
US8064247B2 (en) * 2009-01-14 2011-11-22 Macronix International Co., Ltd. Rewritable memory device based on segregation/re-absorption
US8213224B2 (en) 2009-11-23 2012-07-03 International Business Machines Corporation High density low power nanowire phase change material memory device
CN102074648B (zh) * 2009-11-24 2015-04-15 清华大学 压电元件及其制备方法
KR101361658B1 (ko) 2009-12-04 2014-02-21 한국전자통신연구원 저항형 메모리 장치 및 그 제조 방법
TWI407607B (zh) * 2010-01-22 2013-09-01 Hon Hai Prec Ind Co Ltd 壓電元件及其製備方法
WO2013177539A1 (en) 2012-05-24 2013-11-28 University Of Utah Research Foundation Compounds, sensors, methods, and systems for detecting gamma radiation
JP2014027185A (ja) * 2012-07-27 2014-02-06 Toshiba Corp 不揮発性記憶装置
US9991076B2 (en) * 2013-01-28 2018-06-05 Massachusetts Institute Of Technology Electromechanical device
JP2016530343A (ja) * 2013-06-06 2016-09-29 キング アブドゥラー ユニバーシティ オブ サイエンス アンド テクノロジー トリプチセン系酸二無水物、ポリイミド、それぞれを製造する方法、及び使用方法
GB2517755A (en) 2013-08-30 2015-03-04 Ibm State-changeable device
JP2015111054A (ja) * 2013-12-06 2015-06-18 セイコーエプソン株式会社 光学素子及びその製造方法
KR101482723B1 (ko) * 2014-03-07 2015-01-15 한양대학교 산학협력단 비휘발성 메모리 소자 및 그 제조 방법
US9858111B2 (en) * 2014-06-18 2018-01-02 Empire Technologies Development Llc Heterogeneous magnetic memory architecture
EP3165511B1 (de) * 2015-11-03 2018-08-08 The State Scientific Institution "Institute of Chemistry of New Materials of National Academy of Sciences of Belarus" Verfahren zur herstellung eines polymerfilms mit einer hohen konzentration von silbernanopartikeln
GB2545264B (en) * 2015-12-11 2020-01-15 Advanced Risc Mach Ltd A storage array
JP2019514195A (ja) * 2016-03-23 2019-05-30 フォルシュングスツェントルム・ユーリッヒ・ゲゼルシャフト・ミット・ベシュレンクテル・ハフツング メモリーの作製方法、メモリー、及びメモリーの使用
JP2019520455A (ja) * 2016-06-28 2019-07-18 ダウ グローバル テクノロジーズ エルエルシー 有機電荷輸送フィルムを作製するためのプロセス
DE112017003257T5 (de) * 2016-06-30 2019-04-18 Osram Opto Semiconductors Gmbh Wellenlängenkonverter mit einem polysiloxanmaterial, herstellungsverfahren und ihn enthaltende festkörperbeleuchtungsvorrichtung
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US7274035B2 (en) * 2003-09-03 2007-09-25 The Regents Of The University Of California Memory devices based on electric field programmable films

Also Published As

Publication number Publication date
TW200614500A (en) 2006-05-01
SG115841A1 (en) 2005-10-28
CN1674293A (zh) 2005-09-28
US20050211978A1 (en) 2005-09-29
EP1580825A1 (de) 2005-09-28
CA2500938A1 (en) 2005-09-24
KR100687187B1 (ko) 2007-02-27
EP1580825B1 (de) 2008-06-11
TWI270982B (en) 2007-01-11
KR20060044673A (ko) 2006-05-16
JP2005307191A (ja) 2005-11-04
CN1770461A (zh) 2006-05-10

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee