DE602004026395D1 - Heteroübergang-Bipolartransistor - Google Patents

Heteroübergang-Bipolartransistor

Info

Publication number
DE602004026395D1
DE602004026395D1 DE602004026395T DE602004026395T DE602004026395D1 DE 602004026395 D1 DE602004026395 D1 DE 602004026395D1 DE 602004026395 T DE602004026395 T DE 602004026395T DE 602004026395 T DE602004026395 T DE 602004026395T DE 602004026395 D1 DE602004026395 D1 DE 602004026395D1
Authority
DE
Germany
Prior art keywords
bipolar transistor
heterojunction bipolar
heterojunction
transistor
bipolar
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602004026395T
Other languages
English (en)
Inventor
Takaki Kawasaki Niwa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Renesas Electronics Corp
Original Assignee
NEC Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Electronics Corp filed Critical NEC Electronics Corp
Publication of DE602004026395D1 publication Critical patent/DE602004026395D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/08Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
    • H01L29/0821Collector regions of bipolar transistors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • H01L29/10Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode not carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
    • H01L29/1004Base region of bipolar transistors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/70Bipolar devices
    • H01L29/72Transistor-type devices, i.e. able to continuously respond to applied control signals
    • H01L29/73Bipolar junction transistors
    • H01L29/737Hetero-junction transistors
    • H01L29/7371Vertical transistors

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Bipolar Transistors (AREA)
DE602004026395T 2003-11-18 2004-11-03 Heteroübergang-Bipolartransistor Active DE602004026395D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003388187A JP2005150531A (ja) 2003-11-18 2003-11-18 半導体装置

Publications (1)

Publication Number Publication Date
DE602004026395D1 true DE602004026395D1 (de) 2010-05-20

Family

ID=34431548

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602004026395T Active DE602004026395D1 (de) 2003-11-18 2004-11-03 Heteroübergang-Bipolartransistor

Country Status (5)

Country Link
US (1) US7304333B2 (de)
EP (1) EP1533849B1 (de)
JP (1) JP2005150531A (de)
CN (1) CN100454573C (de)
DE (1) DE602004026395D1 (de)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7425726B2 (en) * 2004-05-19 2008-09-16 Avago Technologies Fiber Ip Pte Ltd. Electroabsorption modulators and methods of making the same
JP2006351752A (ja) * 2005-06-15 2006-12-28 Mitsubishi Electric Corp 半導体装置
US8866194B2 (en) 2006-09-28 2014-10-21 Semiconductor Components Industries, Llc Semiconductor device
JP5341327B2 (ja) * 2006-09-28 2013-11-13 セミコンダクター・コンポーネンツ・インダストリーズ・リミテッド・ライアビリティ・カンパニー 半導体装置
JP2012099651A (ja) * 2010-11-02 2012-05-24 Toshiba Corp 発光素子
TWI456755B (zh) * 2011-05-11 2014-10-11 Univ Nat Kaohsiung Normal 變晶性積體化雙極場效電晶體
CN103177939B (zh) * 2013-03-05 2016-04-20 中国科学院半导体研究所 一种硅基半绝缘iii-v族材料的制备方法
WO2015005037A1 (ja) 2013-07-10 2015-01-15 株式会社村田製作所 半導体装置
US9231088B2 (en) * 2014-01-16 2016-01-05 Triquint Semiconductor, Inc. Emitter contact epitaxial structure and ohmic contact formation for heterojunction bipolar transistor
US10263125B2 (en) * 2014-05-16 2019-04-16 Qorvo Us, Inc. Varactor diode with heterostructure
JP6636459B2 (ja) 2014-05-27 2020-01-29 シランナ・ユー・ブイ・テクノロジーズ・プライベート・リミテッドSilanna Uv Technologies Pte Ltd 半導体構造と超格子とを用いた高度電子デバイス
WO2015181648A1 (en) 2014-05-27 2015-12-03 The Silanna Group Pty Limited An optoelectronic device
WO2015181656A1 (en) 2014-05-27 2015-12-03 The Silanna Group Pty Limited Electronic devices comprising n-type and p-type superlattices
US11322643B2 (en) 2014-05-27 2022-05-03 Silanna UV Technologies Pte Ltd Optoelectronic device
JP2018101652A (ja) * 2016-12-19 2018-06-28 株式会社村田製作所 バイポーラトランジスタ及びその製造方法
JP2019075424A (ja) * 2017-10-13 2019-05-16 株式会社村田製作所 ヘテロ接合バイポーラトランジスタ
TWI643337B (zh) * 2017-10-17 2018-12-01 全新光電科技股份有限公司 具有能隙漸變的電洞阻隔層之異質接面雙極性電晶體結構
TWI691085B (zh) * 2018-11-20 2020-04-11 全新光電科技股份有限公司 具堅固性的異質接面雙極性電晶體結構
CN113130638A (zh) * 2020-01-14 2021-07-16 全新光电科技股份有限公司 高坚固性的异质结双极型晶体管

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH022629A (ja) 1988-06-17 1990-01-08 Nec Corp バイポーラトランジスタ及びその製造方法
US5132764A (en) 1991-03-21 1992-07-21 Texas Instruments Incorporated Multilayer base heterojunction bipolar transistor
JPH07326629A (ja) 1994-06-02 1995-12-12 Nippon Telegr & Teleph Corp <Ntt> ヘテロ接合型バイポーラトランジスタ
JPH08288300A (ja) * 1995-04-12 1996-11-01 Nippon Telegr & Teleph Corp <Ntt> ヘテロ接合バイポーラトランジスタ
JPH10321640A (ja) 1997-05-16 1998-12-04 Toshiba Corp 半導体装置及びその製造方法
US6563145B1 (en) * 1999-04-19 2003-05-13 Chang Charles E Methods and apparatus for a composite collector double heterojunction bipolar transistor
US6674103B2 (en) 2000-07-31 2004-01-06 The Regents Of The University Of California HBT with nitrogen-containing current blocking base collector interface and method for current blocking
US6847060B2 (en) 2000-11-27 2005-01-25 Kopin Corporation Bipolar transistor with graded base layer
JP4056226B2 (ja) 2001-02-23 2008-03-05 株式会社ルネサステクノロジ 半導体装置
JP2002343802A (ja) 2001-05-16 2002-11-29 Hitachi Ltd 半導体装置およびそれを搭載した電子装置
JP2002359249A (ja) 2001-05-31 2002-12-13 Matsushita Electric Ind Co Ltd 化合物半導体装置及びその製造方法
JP3507828B2 (ja) 2001-09-11 2004-03-15 シャープ株式会社 ヘテロ接合バイポーラトランジスタ及びその製造方法
JP2003086602A (ja) 2001-09-14 2003-03-20 Nippon Telegr & Teleph Corp <Ntt> ヘテロ接合バイポーラトランジスタ
JP3573737B2 (ja) 2002-01-18 2004-10-06 Nec化合物デバイス株式会社 ヘテロ接合バイポーラ・トランジスタおよび半導体集積回路
JP2003219213A (ja) 2002-01-21 2003-07-31 Futaba Corp 携帯型文字図形拡大表示器
JP2003297849A (ja) 2002-04-05 2003-10-17 Toshiba Corp ヘテロ接合バイポーラトランジスタ及びその製造方法
JP3629247B2 (ja) 2002-04-18 2005-03-16 Nec化合物デバイス株式会社 ダブルヘテロ接合バイポーラ・トランジスタ
JP2004022818A (ja) 2002-06-17 2004-01-22 Toshiba Corp ダブルへテロ接合バイポーラトランジスタ

Also Published As

Publication number Publication date
EP1533849A3 (de) 2005-06-08
EP1533849A2 (de) 2005-05-25
EP1533849B1 (de) 2010-04-07
CN1619830A (zh) 2005-05-25
US7304333B2 (en) 2007-12-04
CN100454573C (zh) 2009-01-21
JP2005150531A (ja) 2005-06-09
US20050104088A1 (en) 2005-05-19

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Legal Events

Date Code Title Description
8327 Change in the person/name/address of the patent owner

Owner name: RENESAS ELECTRONICS CORP., KAWASAKI-SHI, KANAG, JP

8364 No opposition during term of opposition