DE60141047D1 - Zirkonverstärkte keramische komponenten und beschichtungen bei halbleiterherstellungsgeräten und verfahren zu ihrer herstellung - Google Patents

Zirkonverstärkte keramische komponenten und beschichtungen bei halbleiterherstellungsgeräten und verfahren zu ihrer herstellung

Info

Publication number
DE60141047D1
DE60141047D1 DE60141047T DE60141047T DE60141047D1 DE 60141047 D1 DE60141047 D1 DE 60141047D1 DE 60141047 T DE60141047 T DE 60141047T DE 60141047 T DE60141047 T DE 60141047T DE 60141047 D1 DE60141047 D1 DE 60141047D1
Authority
DE
Germany
Prior art keywords
zirconia
ceramic
component
toughened
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60141047T
Other languages
English (en)
Inventor
Robert J O'donnell
Christopher C Chang
John E Daugherty
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lam Research Corp
Original Assignee
Lam Research Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lam Research Corp filed Critical Lam Research Corp
Application granted granted Critical
Publication of DE60141047D1 publication Critical patent/DE60141047D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32477—Vessel characterised by the means for protecting vessels or internal parts, e.g. coatings
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/083—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/405—Oxides of refractory metals or yttrium
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
    • Y10T428/264—Up to 3 mils
    • Y10T428/265—1 mil or less

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Drying Of Semiconductors (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Ceramic Capacitors (AREA)
  • Chemical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Compositions Of Oxide Ceramics (AREA)
DE60141047T 2000-12-29 2001-11-21 Zirkonverstärkte keramische komponenten und beschichtungen bei halbleiterherstellungsgeräten und verfahren zu ihrer herstellung Expired - Lifetime DE60141047D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/750,056 US6620520B2 (en) 2000-12-29 2000-12-29 Zirconia toughened ceramic components and coatings in semiconductor processing equipment and method of manufacture thereof
PCT/US2001/043149 WO2002054453A1 (en) 2000-12-29 2001-11-21 Zirconia toughened ceramic components and coatings in semiconductor processing equipment and method of manufacture thereof

Publications (1)

Publication Number Publication Date
DE60141047D1 true DE60141047D1 (de) 2010-02-25

Family

ID=25016312

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60141047T Expired - Lifetime DE60141047D1 (de) 2000-12-29 2001-11-21 Zirkonverstärkte keramische komponenten und beschichtungen bei halbleiterherstellungsgeräten und verfahren zu ihrer herstellung

Country Status (10)

Country Link
US (2) US6620520B2 (de)
EP (1) EP1356501B1 (de)
JP (1) JP4331479B2 (de)
KR (1) KR100898531B1 (de)
CN (1) CN1260770C (de)
AT (1) ATE454710T1 (de)
DE (1) DE60141047D1 (de)
IL (1) IL156698A0 (de)
TW (1) TW548737B (de)
WO (1) WO2002054453A1 (de)

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KR20030068569A (ko) 2003-08-21
WO2002054453A1 (en) 2002-07-11
US20020086153A1 (en) 2002-07-04
IL156698A0 (en) 2004-01-04
JP4331479B2 (ja) 2009-09-16
CN1260770C (zh) 2006-06-21
EP1356501A2 (de) 2003-10-29
JP2004526053A (ja) 2004-08-26
WO2002054453A9 (en) 2003-08-21
TW548737B (en) 2003-08-21
EP1356501B1 (de) 2010-01-06
US7255898B2 (en) 2007-08-14
CN1489779A (zh) 2004-04-14
US6620520B2 (en) 2003-09-16
ATE454710T1 (de) 2010-01-15
US20040023047A1 (en) 2004-02-05
KR100898531B1 (ko) 2009-05-20

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