DE60120432T2 - Holographisches speichermedium, das polyfunktionelle epoxidmonomere enthält, welche zur kationischen polymerisation fähig sind - Google Patents

Holographisches speichermedium, das polyfunktionelle epoxidmonomere enthält, welche zur kationischen polymerisation fähig sind Download PDF

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Publication number
DE60120432T2
DE60120432T2 DE60120432T DE60120432T DE60120432T2 DE 60120432 T2 DE60120432 T2 DE 60120432T2 DE 60120432 T DE60120432 T DE 60120432T DE 60120432 T DE60120432 T DE 60120432T DE 60120432 T2 DE60120432 T2 DE 60120432T2
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Prior art keywords
group
substituted
unsubstituted
aryl
independently
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
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DE60120432T
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German (de)
English (en)
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DE60120432D1 (de
Inventor
Erdem A. Ashland CETIN
A. Richard Arlington MINNS
A. David Concord WALDMAN
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Forcetec Co Ltd Changwon Gyeongsangnam Kr
Original Assignee
Aprilis, Inc., Maynard
Aprilis Inc
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Publication of DE60120432D1 publication Critical patent/DE60120432D1/de
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Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/32—Epoxy compounds containing three or more epoxy groups
    • C08G59/3254—Epoxy compounds containing three or more epoxy groups containing atoms other than carbon, hydrogen, oxygen or nitrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/48—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
    • C08G77/50—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms by carbon linkages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/2403—Layers; Shape, structure or physical properties thereof
    • G11B7/24035—Recording layers
    • G11B7/24044—Recording layers for storing optical interference patterns, e.g. holograms; for storing data in three dimensions, e.g. volume storage
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
    • G11B7/244—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only
    • G11B7/245—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing a polymeric component
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H2001/026—Recording materials or recording processes
    • G03H2001/0264—Organic recording material
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2260/00—Recording materials or recording processes
    • G03H2260/12—Photopolymer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Holo Graphy (AREA)
  • Epoxy Resins (AREA)
DE60120432T 2000-08-28 2001-08-28 Holographisches speichermedium, das polyfunktionelle epoxidmonomere enthält, welche zur kationischen polymerisation fähig sind Expired - Lifetime DE60120432T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US22812100P 2000-08-28 2000-08-28
US228121P 2000-08-28
PCT/US2001/026828 WO2002019040A2 (en) 2000-08-28 2001-08-28 Holographic storage medium comprising polyfunctional epoxy monomers capable of undergoing cationic polymerization

Publications (2)

Publication Number Publication Date
DE60120432D1 DE60120432D1 (de) 2006-07-20
DE60120432T2 true DE60120432T2 (de) 2007-01-04

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DE60120432T Expired - Lifetime DE60120432T2 (de) 2000-08-28 2001-08-28 Holographisches speichermedium, das polyfunktionelle epoxidmonomere enthält, welche zur kationischen polymerisation fähig sind

Country Status (10)

Country Link
US (4) US6784300B2 (cg-RX-API-DMAC7.html)
EP (1) EP1317498B1 (cg-RX-API-DMAC7.html)
JP (1) JP2004507513A (cg-RX-API-DMAC7.html)
KR (1) KR100749304B1 (cg-RX-API-DMAC7.html)
AT (1) ATE328939T1 (cg-RX-API-DMAC7.html)
AU (1) AU2001286860A1 (cg-RX-API-DMAC7.html)
CA (1) CA2424366A1 (cg-RX-API-DMAC7.html)
DE (1) DE60120432T2 (cg-RX-API-DMAC7.html)
TW (1) TWI251000B (cg-RX-API-DMAC7.html)
WO (1) WO2002019040A2 (cg-RX-API-DMAC7.html)

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DE60112292T2 (de) * 2000-05-23 2006-06-01 Aprilis, Inc., Cambridge Datenspeichermedium das ein kolloidales metall enthält und verfahren zur herstellung
CA2424366A1 (en) 2000-08-28 2002-03-07 Aprilis, Inc. Holographic storage medium comprising polyfunctional epoxy monomers capable of undergoing cationic polymerization
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EP1578870A2 (en) * 2002-12-23 2005-09-28 Aprilis, Inc. Sensitizer dyes for photoacid generating systems
US20050187308A1 (en) * 2004-02-20 2005-08-25 Korea Advanced Institute Of Science And Technology Method of preparing photopolymer with enhanced optical quality using nanoporous membrane and photopolymer prepared by the same
US20070260089A1 (en) * 2004-03-26 2007-11-08 Albemarle Corporation Method for the Synthesis of Quaternary Ammonium Compounds and Compositions Thereof
JP4629367B2 (ja) * 2004-05-31 2011-02-09 東レ・ダウコーニング株式会社 活性エネルギー線硬化型オルガノポリシロキサン樹脂組成物、光伝送部材およびその製造方法
US7122290B2 (en) * 2004-06-15 2006-10-17 General Electric Company Holographic storage medium
US7111806B2 (en) 2004-08-05 2006-09-26 Esselte Spool for supply of image receiving medium
US7897296B2 (en) 2004-09-30 2011-03-01 General Electric Company Method for holographic storage
US20060078802A1 (en) * 2004-10-13 2006-04-13 Chan Kwok P Holographic storage medium
US20060199081A1 (en) * 2005-03-04 2006-09-07 General Electric Company Holographic storage medium, article and method
US8034514B2 (en) * 2005-03-08 2011-10-11 Nippon Steel Chemical Co., Ltd. Photosensitive resin composition for volume phase hologram recording and optical information recording medium using the same
WO2007047840A2 (en) * 2005-10-18 2007-04-26 Dce Aprilis, Inc. Photopolymerizable medium comprising siloxane compounds that support cationic polymerization for holographic storage
US20070167407A1 (en) * 2005-12-20 2007-07-19 Albemarle Corporation Quaternary ammonium borate compositions and substrate preservative solutions containing them
EP1966224A4 (en) * 2005-12-29 2012-03-21 Univ Akron LIGHT-RESISTANT POLYMERS FOR OPHTHALMIC APPLICATIONS
JP4976373B2 (ja) * 2006-03-09 2012-07-18 新日鐵化学株式会社 体積位相型ホログラム記録用感光性樹脂組成物及びそれを用いた光情報記録媒体
WO2007120628A2 (en) * 2006-04-11 2007-10-25 Dow Corning Corporation A composition including a siloxane and a method of forming the same
WO2007124459A2 (en) * 2006-04-20 2007-11-01 Inphase Technologies, Inc. Index-contrasting-photoactive polymerizable materials, and articles and methods using same
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US8323854B2 (en) * 2009-04-23 2012-12-04 Akonia Holographics, Llc Photopolymer media with enhanced dynamic range
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RU2518095C2 (ru) 2009-11-26 2014-06-10 Дайнитисейка Колор & Кемикалс Мфг. Ко., Лтд. Полигидрокси-полиуретановая смола, модифицированная полисилоксаном, способ ее получения, содержащий эту смолу термочувствительный материал для записи, искусственная кожа, кожеподобный материал из термопластичной полиолефиновой смолы, материал для уплотнителя и уплотнитель
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Also Published As

Publication number Publication date
JP2004507513A (ja) 2004-03-11
US20100280260A1 (en) 2010-11-04
ATE328939T1 (de) 2006-06-15
KR100749304B1 (ko) 2007-08-14
US20020068223A1 (en) 2002-06-06
AU2001286860A1 (en) 2002-03-13
KR20030045790A (ko) 2003-06-11
CA2424366A1 (en) 2002-03-07
US7070886B2 (en) 2006-07-04
DE60120432D1 (de) 2006-07-20
US20070293637A1 (en) 2007-12-20
EP1317498B1 (en) 2006-06-07
WO2002019040A3 (en) 2002-05-30
US20040249181A1 (en) 2004-12-09
US7332249B2 (en) 2008-02-19
TWI251000B (en) 2006-03-11
US6784300B2 (en) 2004-08-31
EP1317498A2 (en) 2003-06-11
WO2002019040A9 (en) 2002-07-25
WO2002019040A2 (en) 2002-03-07

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Owner name: FORCETEC CO., LTD., CHANGWON, GYEONGSANGNAM, KR

8328 Change in the person/name/address of the agent

Representative=s name: KROHER, STROBEL RECHTS- UND PATENTANWAELTE, 80336