JP2004507513A - カチオン性重合を行いうる多官能エポキシモノマーを含むホログラフィー蓄積媒体 - Google Patents

カチオン性重合を行いうる多官能エポキシモノマーを含むホログラフィー蓄積媒体 Download PDF

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Publication number
JP2004507513A
JP2004507513A JP2002523098A JP2002523098A JP2004507513A JP 2004507513 A JP2004507513 A JP 2004507513A JP 2002523098 A JP2002523098 A JP 2002523098A JP 2002523098 A JP2002523098 A JP 2002523098A JP 2004507513 A JP2004507513 A JP 2004507513A
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JP2004507513A5 (cg-RX-API-DMAC7.html
Inventor
チェティン，アーデン，エイ．
ミンス，リチャード，エイ．
ウォルドマン，デービッド，エイ．
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アプリリス，インコーポレイテッド
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/32—Epoxy compounds containing three or more epoxy groups
    • C08G59/3254—Epoxy compounds containing three or more epoxy groups containing atoms other than carbon, hydrogen, oxygen or nitrogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/48—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
    • C08G77/50—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms by carbon linkages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/001—Phase modulating patterns, e.g. refractive index patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0755—Non-macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/2403—Layers; Shape, structure or physical properties thereof
    • G11B7/24035—Recording layers
    • G11B7/24044—Recording layers for storing optical interference patterns, e.g. holograms; for storing data in three dimensions, e.g. volume storage
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/242—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
    • G11B7/244—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only
    • G11B7/245—Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing a polymeric component
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H2001/026—Recording materials or recording processes
    • G03H2001/0264—Organic recording material
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H2260/00—Recording materials or recording processes
    • G03H2260/12—Photopolymer

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Holo Graphy (AREA)
  • Epoxy Resins (AREA)
JP2002523098A 2000-08-28 2001-08-28 カチオン性重合を行いうる多官能エポキシモノマーを含むホログラフィー蓄積媒体 Pending JP2004507513A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US22812100P 2000-08-28 2000-08-28
PCT/US2001/026828 WO2002019040A2 (en) 2000-08-28 2001-08-28 Holographic storage medium comprising polyfunctional epoxy monomers capable of undergoing cationic polymerization

Publications (2)

Publication Number Publication Date
JP2004507513A true JP2004507513A (ja) 2004-03-11
JP2004507513A5 JP2004507513A5 (cg-RX-API-DMAC7.html) 2008-10-16

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JP2002523098A Pending JP2004507513A (ja) 2000-08-28 2001-08-28 カチオン性重合を行いうる多官能エポキシモノマーを含むホログラフィー蓄積媒体

Country Status (10)

Country Link
US (4) US6784300B2 (cg-RX-API-DMAC7.html)
EP (1) EP1317498B1 (cg-RX-API-DMAC7.html)
JP (1) JP2004507513A (cg-RX-API-DMAC7.html)
KR (1) KR100749304B1 (cg-RX-API-DMAC7.html)
AT (1) ATE328939T1 (cg-RX-API-DMAC7.html)
AU (1) AU2001286860A1 (cg-RX-API-DMAC7.html)
CA (1) CA2424366A1 (cg-RX-API-DMAC7.html)
DE (1) DE60120432T2 (cg-RX-API-DMAC7.html)
TW (1) TWI251000B (cg-RX-API-DMAC7.html)
WO (1) WO2002019040A2 (cg-RX-API-DMAC7.html)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009511638A (ja) * 2005-10-18 2009-03-19 ディーシーイー アプリリス，インコーポレイテッド ホログラフィックストレージのための、カチオン重合をサポートするシロキサン化合物を含む光重合可能な媒体
US7977015B2 (en) 2007-02-08 2011-07-12 Fujifilm Corporation Polymerizable compound, optical recording composition, holographic recording medium and method of recording information
WO2015182143A1 (ja) * 2014-05-30 2015-12-03 東レ・ダウコーニング株式会社 有機ケイ素化合物、硬化性シリコーン組成物、および半導体装置

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CA2424366A1 (en) 2000-08-28 2002-03-07 Aprilis, Inc. Holographic storage medium comprising polyfunctional epoxy monomers capable of undergoing cationic polymerization
EP1550677B1 (en) * 2002-07-30 2007-02-28 Toagosei Co., Ltd. Composition for holography, method of curing the same, and cured article
JP2006511843A (ja) 2002-10-22 2006-04-06 ゼブラ・イメージング・インコーポレイテッド アクティブ・デジタル・ホログラム・ディスプレイ
EP1578870A2 (en) * 2002-12-23 2005-09-28 Aprilis, Inc. Sensitizer dyes for photoacid generating systems
US20050187308A1 (en) * 2004-02-20 2005-08-25 Korea Advanced Institute Of Science And Technology Method of preparing photopolymer with enhanced optical quality using nanoporous membrane and photopolymer prepared by the same
US20070260089A1 (en) * 2004-03-26 2007-11-08 Albemarle Corporation Method for the Synthesis of Quaternary Ammonium Compounds and Compositions Thereof
JP4629367B2 (ja) * 2004-05-31 2011-02-09 東レ・ダウコーニング株式会社 活性エネルギー線硬化型オルガノポリシロキサン樹脂組成物、光伝送部材およびその製造方法
US7122290B2 (en) * 2004-06-15 2006-10-17 General Electric Company Holographic storage medium
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US7897296B2 (en) 2004-09-30 2011-03-01 General Electric Company Method for holographic storage
US20060078802A1 (en) * 2004-10-13 2006-04-13 Chan Kwok P Holographic storage medium
US20060199081A1 (en) * 2005-03-04 2006-09-07 General Electric Company Holographic storage medium, article and method
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WO2007120628A2 (en) * 2006-04-11 2007-10-25 Dow Corning Corporation A composition including a siloxane and a method of forming the same
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RU2009141372A (ru) 2007-04-11 2011-05-20 Байер МатириальСайенс АГ (DE) Предпочтительные запоминающие среды для голографических применений
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US8323854B2 (en) * 2009-04-23 2012-12-04 Akonia Holographics, Llc Photopolymer media with enhanced dynamic range
JP2011132208A (ja) * 2009-11-25 2011-07-07 Dainichiseika Color & Chem Mfg Co Ltd ５員環環状カーボネートポリシロキサン化合物およびその製造方法
CN102666655B (zh) 2009-11-25 2014-07-09 大日精化工业株式会社 聚硅氧烷改性聚羟基聚氨酯树脂及其制造方法、以及其应用
RU2518095C2 (ru) 2009-11-26 2014-06-10 Дайнитисейка Колор & Кемикалс Мфг. Ко., Лтд. Полигидрокси-полиуретановая смола, модифицированная полисилоксаном, способ ее получения, содержащий эту смолу термочувствительный материал для записи, искусственная кожа, кожеподобный материал из термопластичной полиолефиновой смолы, материал для уплотнителя и уплотнитель
GB2476275A (en) 2009-12-17 2011-06-22 Dublin Inst Of Technology Photosensitive holographic recording medium comprising glycerol
KR101476559B1 (ko) 2010-06-24 2014-12-24 다이니치 세이카 고교 가부시키가이샤 자기 가교형 폴리히드록시 폴리우레탄 수지, 그 수지를 포함하는 수지 재료, 그 수지의 제조방법, 그 수지를 이용하여 이루어진 인조 가죽, 표피재 및 웨더 스트립용 재료
EP2610276B1 (en) 2010-08-26 2017-11-01 Dainichiseika Color & Chemicals Mfg. Co., Ltd. Self-crosslinking polysiloxane-modified polyhydroxy polyurethane resin, resin material containing same, method for producing same, artificial leather comprising same, and thermoplastic polyolefin skin material comprising same
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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009511638A (ja) * 2005-10-18 2009-03-19 ディーシーイー アプリリス，インコーポレイテッド ホログラフィックストレージのための、カチオン重合をサポートするシロキサン化合物を含む光重合可能な媒体
US7977015B2 (en) 2007-02-08 2011-07-12 Fujifilm Corporation Polymerizable compound, optical recording composition, holographic recording medium and method of recording information
WO2015182143A1 (ja) * 2014-05-30 2015-12-03 東レ・ダウコーニング株式会社 有機ケイ素化合物、硬化性シリコーン組成物、および半導体装置
JPWO2015182143A1 (ja) * 2014-05-30 2017-04-27 東レ・ダウコーニング株式会社 有機ケイ素化合物、硬化性シリコーン組成物、および半導体装置
US10125242B2 (en) 2014-05-30 2018-11-13 Dow Corning Toray Co., Ltd. Organosilicon compound, curable silicone composition, and semiconductor device

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US20100280260A1 (en) 2010-11-04
ATE328939T1 (de) 2006-06-15
KR100749304B1 (ko) 2007-08-14
US20020068223A1 (en) 2002-06-06
AU2001286860A1 (en) 2002-03-13
KR20030045790A (ko) 2003-06-11
CA2424366A1 (en) 2002-03-07
US7070886B2 (en) 2006-07-04
DE60120432D1 (de) 2006-07-20
US20070293637A1 (en) 2007-12-20
EP1317498B1 (en) 2006-06-07
WO2002019040A3 (en) 2002-05-30
DE60120432T2 (de) 2007-01-04
US20040249181A1 (en) 2004-12-09
US7332249B2 (en) 2008-02-19
TWI251000B (en) 2006-03-11
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