DE60020781D1 - Sprudelvorrichtung mit zwei Fritten - Google Patents

Sprudelvorrichtung mit zwei Fritten

Info

Publication number
DE60020781D1
DE60020781D1 DE60020781T DE60020781T DE60020781D1 DE 60020781 D1 DE60020781 D1 DE 60020781D1 DE 60020781 T DE60020781 T DE 60020781T DE 60020781 T DE60020781 T DE 60020781T DE 60020781 D1 DE60020781 D1 DE 60020781D1
Authority
DE
Germany
Prior art keywords
bubbler
carrier gas
source material
saturated
inlet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60020781T
Other languages
English (en)
Other versions
DE60020781T2 (de
Inventor
Sri Prakash Rangarajan
John O'grady
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rohm and Haas Chemicals LLC
Original Assignee
Morton International LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/472,403 external-priority patent/US6444038B1/en
Application filed by Morton International LLC filed Critical Morton International LLC
Publication of DE60020781D1 publication Critical patent/DE60020781D1/de
Application granted granted Critical
Publication of DE60020781T2 publication Critical patent/DE60020781T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Mechanical Control Devices (AREA)
  • Medicines Containing Antibodies Or Antigens For Use As Internal Diagnostic Agents (AREA)
  • Materials For Medical Uses (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
DE60020781T 1999-08-20 2000-08-18 Sprudelvorrichtung mit zwei Fritten Expired - Fee Related DE60020781T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US37827499A 1999-08-20 1999-08-20
US378274 1999-08-20
US09/472,403 US6444038B1 (en) 1999-12-27 1999-12-27 Dual fritted bubbler
US472403 1999-12-27

Publications (2)

Publication Number Publication Date
DE60020781D1 true DE60020781D1 (de) 2005-07-21
DE60020781T2 DE60020781T2 (de) 2006-05-11

Family

ID=27008140

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60020781T Expired - Fee Related DE60020781T2 (de) 1999-08-20 2000-08-18 Sprudelvorrichtung mit zwei Fritten

Country Status (6)

Country Link
EP (1) EP1079001B1 (de)
JP (1) JP2001115263A (de)
KR (1) KR20010050136A (de)
CN (1) CN1160482C (de)
AT (1) ATE298013T1 (de)
DE (1) DE60020781T2 (de)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FI118805B (fi) * 2000-05-15 2008-03-31 Asm Int Menetelmä ja kokoonpano kaasufaasireaktantin syöttämiseksi reaktiokammioon
US7186385B2 (en) 2002-07-17 2007-03-06 Applied Materials, Inc. Apparatus for providing gas to a processing chamber
JP4352783B2 (ja) 2002-08-23 2009-10-28 東京エレクトロン株式会社 ガス供給系及び処理システム
JP4571787B2 (ja) * 2003-07-08 2010-10-27 東ソー・ファインケム株式会社 固体有機金属化合物用充填容器およびその充填方法
JP4585182B2 (ja) * 2003-07-11 2010-11-24 東ソー・ファインケム株式会社 トリメチルインジウムの充填方法および充填容器
US20060037540A1 (en) * 2004-08-20 2006-02-23 Rohm And Haas Electronic Materials Llc Delivery system
US7722720B2 (en) * 2004-12-08 2010-05-25 Rohm And Haas Electronic Materials Llc Delivery device
US7967911B2 (en) * 2006-04-11 2011-06-28 Applied Materials, Inc. Apparatus and methods for chemical vapor deposition
US9109287B2 (en) 2006-10-19 2015-08-18 Air Products And Chemicals, Inc. Solid source container with inlet plenum
US7775508B2 (en) 2006-10-31 2010-08-17 Applied Materials, Inc. Ampoule for liquid draw and vapor draw with a continuous level sensor
GB2444143B (en) * 2006-11-27 2009-10-28 Sumitomo Chemical Co Apparatus of supplying organometallic compound
JP5257197B2 (ja) * 2008-03-31 2013-08-07 住友化学株式会社 有機金属化合物供給装置
US8146896B2 (en) 2008-10-31 2012-04-03 Applied Materials, Inc. Chemical precursor ampoule for vapor deposition processes
TW201040306A (en) 2009-03-11 2010-11-16 Air Liquide Bubbling supply system for stable precursor supply
KR20140052956A (ko) * 2011-02-04 2014-05-07 엔테그리스, 아이엔씨. 소결 금속 분말과 금속 섬유의 다공성 금속체
JP5728772B2 (ja) 2011-05-31 2015-06-03 株式会社ブイ・テクノロジー 原料ガス発生装置
KR101389011B1 (ko) * 2012-03-28 2014-04-24 주식회사 유니텍스 소스 컨테이너 및 기상 증착용 반응로
KR101885808B1 (ko) 2018-02-01 2018-08-06 김동섭 로링기용 금형세팅 장치 및 이를 포함하는 로링기
CN110885970A (zh) * 2018-09-11 2020-03-17 北京北方华创微电子装备有限公司 固体前驱体蒸汽的稳压和纯化装置以及ald沉积设备

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4506815A (en) * 1982-12-09 1985-03-26 Thiokol Corporation Bubbler cylinder and dip tube device
FR2569207B1 (fr) * 1984-08-14 1986-11-14 Mellet Robert Procede et dispositif d'obtention d'un courant gazeux contenant un compose a l'etat de vapeur, utilisable notamment pour introduire ce compose dans un reacteur d'epitaxie
GB2223509B (en) * 1988-10-04 1992-08-05 Stc Plc Vapour phase processing
KR960010901A (ko) * 1994-09-30 1996-04-20 김광호 고체 유기화합물 전용 버블러 장치
FR2727322B1 (fr) * 1994-11-30 1996-12-27 Kodak Pathe Procede pour la sublimation d'un materiau solide et dispositif pour la mise en oeuvre du procede

Also Published As

Publication number Publication date
ATE298013T1 (de) 2005-07-15
CN1160482C (zh) 2004-08-04
KR20010050136A (ko) 2001-06-15
CN1300876A (zh) 2001-06-27
EP1079001B1 (de) 2005-06-15
EP1079001A1 (de) 2001-02-28
DE60020781T2 (de) 2006-05-11
JP2001115263A (ja) 2001-04-24

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Legal Events

Date Code Title Description
8327 Change in the person/name/address of the patent owner

Owner name: ROHM AND HAAS CHEMICALS LLC, PHILADELPHIA, PA., US

8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee