ATE298013T1 - Sprudelvorrichtung mit zwei fritten - Google Patents

Sprudelvorrichtung mit zwei fritten

Info

Publication number
ATE298013T1
ATE298013T1 AT00307081T AT00307081T ATE298013T1 AT E298013 T1 ATE298013 T1 AT E298013T1 AT 00307081 T AT00307081 T AT 00307081T AT 00307081 T AT00307081 T AT 00307081T AT E298013 T1 ATE298013 T1 AT E298013T1
Authority
AT
Austria
Prior art keywords
bubbler
carrier gas
source material
saturated
inlet
Prior art date
Application number
AT00307081T
Other languages
English (en)
Inventor
Sri Prakash Rangarajan
John O'grady
Original Assignee
Morton Int Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/472,403 external-priority patent/US6444038B1/en
Application filed by Morton Int Inc filed Critical Morton Int Inc
Application granted granted Critical
Publication of ATE298013T1 publication Critical patent/ATE298013T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Mechanical Control Devices (AREA)
  • Medicines Containing Antibodies Or Antigens For Use As Internal Diagnostic Agents (AREA)
  • Materials For Medical Uses (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
AT00307081T 1999-08-20 2000-08-18 Sprudelvorrichtung mit zwei fritten ATE298013T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US37827499A 1999-08-20 1999-08-20
US09/472,403 US6444038B1 (en) 1999-12-27 1999-12-27 Dual fritted bubbler

Publications (1)

Publication Number Publication Date
ATE298013T1 true ATE298013T1 (de) 2005-07-15

Family

ID=27008140

Family Applications (1)

Application Number Title Priority Date Filing Date
AT00307081T ATE298013T1 (de) 1999-08-20 2000-08-18 Sprudelvorrichtung mit zwei fritten

Country Status (6)

Country Link
EP (1) EP1079001B1 (de)
JP (1) JP2001115263A (de)
KR (1) KR20010050136A (de)
CN (1) CN1160482C (de)
AT (1) ATE298013T1 (de)
DE (1) DE60020781T2 (de)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FI118805B (fi) * 2000-05-15 2008-03-31 Asm Int Menetelmä ja kokoonpano kaasufaasireaktantin syöttämiseksi reaktiokammioon
US7186385B2 (en) 2002-07-17 2007-03-06 Applied Materials, Inc. Apparatus for providing gas to a processing chamber
JP4352783B2 (ja) 2002-08-23 2009-10-28 東京エレクトロン株式会社 ガス供給系及び処理システム
JP4571787B2 (ja) * 2003-07-08 2010-10-27 東ソー・ファインケム株式会社 固体有機金属化合物用充填容器およびその充填方法
JP4585182B2 (ja) * 2003-07-11 2010-11-24 東ソー・ファインケム株式会社 トリメチルインジウムの充填方法および充填容器
US20060037540A1 (en) * 2004-08-20 2006-02-23 Rohm And Haas Electronic Materials Llc Delivery system
US7722720B2 (en) * 2004-12-08 2010-05-25 Rohm And Haas Electronic Materials Llc Delivery device
US7967911B2 (en) * 2006-04-11 2011-06-28 Applied Materials, Inc. Apparatus and methods for chemical vapor deposition
US9109287B2 (en) 2006-10-19 2015-08-18 Air Products And Chemicals, Inc. Solid source container with inlet plenum
US7775508B2 (en) 2006-10-31 2010-08-17 Applied Materials, Inc. Ampoule for liquid draw and vapor draw with a continuous level sensor
GB2444143B (en) * 2006-11-27 2009-10-28 Sumitomo Chemical Co Apparatus of supplying organometallic compound
JP5257197B2 (ja) * 2008-03-31 2013-08-07 住友化学株式会社 有機金属化合物供給装置
US8146896B2 (en) 2008-10-31 2012-04-03 Applied Materials, Inc. Chemical precursor ampoule for vapor deposition processes
TW201040306A (en) 2009-03-11 2010-11-16 Air Liquide Bubbling supply system for stable precursor supply
WO2012106149A2 (en) * 2011-02-04 2012-08-09 Entegris, Inc. Porous metal membrane of sintered powders and metal fibers
JP5728772B2 (ja) 2011-05-31 2015-06-03 株式会社ブイ・テクノロジー 原料ガス発生装置
KR101389011B1 (ko) * 2012-03-28 2014-04-24 주식회사 유니텍스 소스 컨테이너 및 기상 증착용 반응로
KR101885808B1 (ko) 2018-02-01 2018-08-06 김동섭 로링기용 금형세팅 장치 및 이를 포함하는 로링기

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4506815A (en) * 1982-12-09 1985-03-26 Thiokol Corporation Bubbler cylinder and dip tube device
FR2569207B1 (fr) * 1984-08-14 1986-11-14 Mellet Robert Procede et dispositif d'obtention d'un courant gazeux contenant un compose a l'etat de vapeur, utilisable notamment pour introduire ce compose dans un reacteur d'epitaxie
GB2223509B (en) * 1988-10-04 1992-08-05 Stc Plc Vapour phase processing
KR960010901A (ko) * 1994-09-30 1996-04-20 김광호 고체 유기화합물 전용 버블러 장치
FR2727322B1 (fr) * 1994-11-30 1996-12-27 Kodak Pathe Procede pour la sublimation d'un materiau solide et dispositif pour la mise en oeuvre du procede

Also Published As

Publication number Publication date
DE60020781T2 (de) 2006-05-11
KR20010050136A (ko) 2001-06-15
EP1079001A1 (de) 2001-02-28
CN1160482C (zh) 2004-08-04
JP2001115263A (ja) 2001-04-24
EP1079001B1 (de) 2005-06-15
DE60020781D1 (de) 2005-07-21
CN1300876A (zh) 2001-06-27

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Legal Events

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