ATE221141T1 - Vakuum-beschichtungsanlage - Google Patents

Vakuum-beschichtungsanlage

Info

Publication number
ATE221141T1
ATE221141T1 AT98921302T AT98921302T ATE221141T1 AT E221141 T1 ATE221141 T1 AT E221141T1 AT 98921302 T AT98921302 T AT 98921302T AT 98921302 T AT98921302 T AT 98921302T AT E221141 T1 ATE221141 T1 AT E221141T1
Authority
AT
Austria
Prior art keywords
mandrel
coating system
base plate
vacuum coating
ring
Prior art date
Application number
AT98921302T
Other languages
English (en)
Inventor
Reinhart Weber
Michael Ryan Alberty
George Paul Tyroler
Ian Keith Passmore
Original Assignee
Inco Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Inco Ltd filed Critical Inco Ltd
Application granted granted Critical
Publication of ATE221141T1 publication Critical patent/ATE221141T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/16—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metal carbonyl compounds
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582—Rigid and flat substrates, e.g. plates or discs
    • C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
    • C23C16/4586—Elements in the interior of the support, e.g. electrodes, heating or cooling devices

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Road Signs Or Road Markings (AREA)
AT98921302T 1997-09-02 1998-05-11 Vakuum-beschichtungsanlage ATE221141T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/922,036 US6007634A (en) 1997-09-02 1997-09-02 Vapor deposition apparatus
PCT/CA1998/000476 WO1999011838A1 (en) 1997-09-02 1998-05-11 Vapor deposition apparatus

Publications (1)

Publication Number Publication Date
ATE221141T1 true ATE221141T1 (de) 2002-08-15

Family

ID=25446395

Family Applications (1)

Application Number Title Priority Date Filing Date
AT98921302T ATE221141T1 (de) 1997-09-02 1998-05-11 Vakuum-beschichtungsanlage

Country Status (12)

Country Link
US (1) US6007634A (de)
EP (1) EP1015658B1 (de)
JP (1) JP3325587B2 (de)
KR (1) KR20000070623A (de)
AT (1) ATE221141T1 (de)
AU (1) AU731555B2 (de)
CA (1) CA2276000C (de)
DE (1) DE69806776T2 (de)
ES (1) ES2179491T3 (de)
RU (1) RU2188252C2 (de)
TW (1) TW475001B (de)
WO (1) WO1999011838A1 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6185370B1 (en) * 1998-09-09 2001-02-06 Tokyo Electron Limited Heating apparatus for heating an object to be processed
US6461434B1 (en) * 1999-09-27 2002-10-08 Advanced Micro Devices, Inc. Quick-change flange
US6616870B1 (en) * 2000-08-07 2003-09-09 Shipley Company, L.L.C. Method of producing high aspect ratio domes by vapor deposition
US6571821B2 (en) * 2001-07-13 2003-06-03 Varian, Inc. Energy conserving gate valve
CA2430546A1 (en) * 2003-05-30 2004-11-30 Sig Ryka Inc. Hollow nickel mold members for use in blow molding
CA2437343A1 (en) * 2003-08-08 2005-02-08 Reinhart Weber Hollow nickel shapes by vapour deposition
US20080232424A1 (en) * 2007-03-23 2008-09-25 Honeywell International Inc. Hearth plate including side walls defining a processing volume
KR20090057729A (ko) * 2007-12-03 2009-06-08 에이피시스템 주식회사 급속열처리장치의 히터블록
JP5699425B2 (ja) * 2008-08-05 2015-04-08 東京エレクトロン株式会社 載置台構造及び成膜装置
US10454114B2 (en) 2016-12-22 2019-10-22 The Research Foundation For The State University Of New York Method of producing stable, active and mass-producible Pt3Ni catalysts through preferential co etching

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2496054A (en) * 1945-07-27 1950-01-31 Rca Corp Bell-jar vacuum evaporator
US4496609A (en) * 1969-10-15 1985-01-29 Applied Materials, Inc. Chemical vapor deposition coating process employing radiant heat and a susceptor
GB9014430D0 (en) * 1990-06-28 1990-08-22 Weber Reinhart Method of producing nickel shell molds
CA2076578A1 (en) * 1992-08-21 1994-02-22 Miroslav Milinkovic Mandrel for use in nickel vapour deposition processes and nickel molds made therefrom
GB9309249D0 (en) * 1993-05-05 1993-06-16 Weber Manufacturing Limited Method of producing nickel shell moulds
GB9402471D0 (en) * 1994-02-09 1994-03-30 Weber Manufacturing Limited Nickel shell molds

Also Published As

Publication number Publication date
DE69806776T2 (de) 2003-02-27
EP1015658B1 (de) 2002-07-24
US6007634A (en) 1999-12-28
AU7421498A (en) 1999-03-22
WO1999011838A1 (en) 1999-03-11
TW475001B (en) 2002-02-01
JP3325587B2 (ja) 2002-09-17
KR20000070623A (ko) 2000-11-25
ES2179491T3 (es) 2003-01-16
RU2188252C2 (ru) 2002-08-27
JP2000510534A (ja) 2000-08-15
AU731555B2 (en) 2001-04-05
CA2276000C (en) 2005-12-27
DE69806776D1 (de) 2002-08-29
CA2276000A1 (en) 1999-03-11
EP1015658A1 (de) 2000-07-05

Similar Documents

Publication Publication Date Title
AU9118291A (en) A catalyst structure having integral heat exchange (ii)
ATE221141T1 (de) Vakuum-beschichtungsanlage
ATE139580T1 (de) Gasversorgungsvorrichtung und ihre verwendung für eine filmabscheidungsanlage
EP1146012A3 (de) Chemischer Sauerstoffgenerator
DE69934231D1 (de) Verfahren und vorrichtung zur gewinnung erhöhter produktionsraten in thermochemischen reaktionen
GB2381523A (en) Portable hydrogen source
BR0116252A (pt) Preparação de catalisadores de polimerização
DK159479C (da) Apparat til gennemfoerelse af exotherme, katalytiske gasreaktioner til ammoniak- eller methanolsyntese
CA2045843A1 (en) Process for the preparation of dialkyl carbonates
MXPA04001280A (es) Procesadores de combustible que utilizan enfriamiento con tubos isotermicos.
AU2001283757A1 (en) Hot stamping cylinder
IE812962L (en) Heat transfer process
DE59004035D1 (de) Wärmetauscher zum Kühlen von heissem Reaktionsgas.
EP0374740A3 (de) Halbleiterplättchenträger
MX9606723A (es) Preparacion de triarilborano.
DK0580848T3 (de)
MX9603783A (es) Unidad de mezclado para flujos gasesos a diferentes temperaturas, en particular para reactores de sintesis heterogenea exotermica.
DE3064625D1 (en) Process for the preparation of alkyl benzenes
JPS5614401A (en) Alcohol reforming apparatus
EP1227702A3 (de) Optisches Bauelement-Modul versehen mit einem Wärmeträger durch Phasenübergang
JPS5340120A (en) Air supply unit for thermal reactor
IT8023464A0 (it) Dispositivo per il rilevamento centralizzato dell'energia termica prelevata da parecchi utilizzatori di calore.
KR920005257A (ko) 플라즈마 화학 증착장치
JPS5213021A (en) Exhaust gas manifold reactor
JPS572527A (en) Reduced-pressure vapor phase growing apparatus

Legal Events

Date Code Title Description
UEP Publication of translation of european patent specification