DE60000948T2 - Dünnschichtiges piezoelektrisches bilaminares Element, diese benutzender mechanischer Detektor und Tintenstrahldruckkopf und Herstellungsverfahren dafür - Google Patents
Dünnschichtiges piezoelektrisches bilaminares Element, diese benutzender mechanischer Detektor und Tintenstrahldruckkopf und Herstellungsverfahren dafürInfo
- Publication number
- DE60000948T2 DE60000948T2 DE60000948T DE60000948T DE60000948T2 DE 60000948 T2 DE60000948 T2 DE 60000948T2 DE 60000948 T DE60000948 T DE 60000948T DE 60000948 T DE60000948 T DE 60000948T DE 60000948 T2 DE60000948 T2 DE 60000948T2
- Authority
- DE
- Germany
- Prior art keywords
- bilaminar
- manufacturing
- thin film
- ink jet
- print head
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000010409 thin film Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
- G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
- G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
- G01P15/0802—Details
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14201—Structure of print heads with piezoelectric elements
- B41J2/14233—Structure of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01P—MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
- G01P15/00—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
- G01P15/02—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
- G01P15/08—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
- G01P15/09—Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values by piezoelectric pick-up
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/01—Manufacture or treatment
- H10N30/07—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base
- H10N30/074—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing
- H10N30/076—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing by vapour phase deposition
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/20—Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators
- H10N30/204—Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators using bending displacement, e.g. unimorph, bimorph or multimorph cantilever or membrane benders
- H10N30/2041—Beam type
- H10N30/2042—Cantilevers, i.e. having one fixed end
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/20—Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators
- H10N30/204—Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators using bending displacement, e.g. unimorph, bimorph or multimorph cantilever or membrane benders
- H10N30/2047—Membrane type
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/30—Piezoelectric or electrostrictive devices with mechanical input and electrical output, e.g. functioning as generators or sensors
- H10N30/302—Sensors
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14201—Structure of print heads with piezoelectric elements
- B41J2/14233—Structure of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
- B41J2002/14258—Multi layer thin film type piezoelectric element
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/42—Piezoelectric device making
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49004—Electrical device making including measuring or testing of device or component part
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49005—Acoustic transducer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49126—Assembling bases
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49128—Assembling formed circuit to base
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49147—Assembling terminal to base
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11142058A JP2000332313A (ja) | 1999-05-21 | 1999-05-21 | 薄膜圧電型バイモルフ素子及びその応用 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE60000948D1 DE60000948D1 (de) | 2003-01-23 |
DE60000948T2 true DE60000948T2 (de) | 2003-07-17 |
Family
ID=15306448
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60000948T Expired - Lifetime DE60000948T2 (de) | 1999-05-21 | 2000-05-19 | Dünnschichtiges piezoelektrisches bilaminares Element, diese benutzender mechanischer Detektor und Tintenstrahldruckkopf und Herstellungsverfahren dafür |
Country Status (5)
Country | Link |
---|---|
US (1) | US7024738B2 (de) |
EP (1) | EP1054459B1 (de) |
JP (1) | JP2000332313A (de) |
KR (1) | KR100683325B1 (de) |
DE (1) | DE60000948T2 (de) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10020443B2 (en) | 2015-07-02 | 2018-07-10 | Fujifilm Corporation | Method of producing laminated thin film structure, laminated thin film structure, and piezoelectric element including same |
DE102020107028A1 (de) | 2020-03-13 | 2021-09-16 | Technische Universität Chemnitz | Piezoelektrische Vorrichtung und Verfahren zu deren Herstellung |
Families Citing this family (48)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4934924B2 (ja) * | 2001-08-09 | 2012-05-23 | パナソニック株式会社 | 強誘電体アクチュエータ素子およびその製造方法 |
TW546477B (en) * | 2001-08-09 | 2003-08-11 | Matsushita Electric Ind Co Ltd | Drop impact determination system and acceleration sensing element used in the drop impact determination system |
WO2003049209A1 (en) * | 2001-11-21 | 2003-06-12 | Apogent Robotics Limited | Actuator structure |
JP3931823B2 (ja) | 2002-03-18 | 2007-06-20 | セイコーエプソン株式会社 | 圧電アクチュエータ及びその製造方法、並びに、液体噴射ヘッド及びその製造方法 |
JP4305016B2 (ja) | 2002-03-18 | 2009-07-29 | セイコーエプソン株式会社 | 圧電アクチュエータユニット、及び、それを用いた液体噴射ヘッド |
JP3903936B2 (ja) | 2002-03-18 | 2007-04-11 | セイコーエプソン株式会社 | 圧電素子、圧電アクチュエータ、及び、液体噴射ヘッド |
JP3879685B2 (ja) | 2002-03-18 | 2007-02-14 | セイコーエプソン株式会社 | 圧電素子、圧電アクチュエータ、及び、液体噴射ヘッド |
JP3991894B2 (ja) | 2002-03-18 | 2007-10-17 | セイコーエプソン株式会社 | 圧電アクチュエータの製造方法、液体噴射ヘッドの製造方法、及び、アクチュエータ母部材 |
JP4100202B2 (ja) | 2002-03-18 | 2008-06-11 | セイコーエプソン株式会社 | 圧電アクチュエータ、及び、液体噴射ヘッド |
KR100478228B1 (ko) * | 2002-06-12 | 2005-03-23 | 재단법인서울대학교산학협력재단 | 분극 방향이 서로 반대인 압전-압전 세라믹 액츄에이터 |
WO2004023572A1 (en) * | 2002-08-30 | 2004-03-18 | Usc Corporation | Piezoelectric generator |
EP1566728B1 (de) * | 2002-10-30 | 2018-05-23 | Thomson Licensing | Eingabeeinrichtung und prozess zur herstellung dieser, tragbare elektronische vorrichtung mit der eingabeeinrichtung |
JP3867664B2 (ja) * | 2002-12-12 | 2007-01-10 | ソニー株式会社 | 入力装置、携帯型情報処理装置、リモートコントロール装置、および入力装置における圧電アクチュエータ駆動制御方法 |
US7089635B2 (en) | 2003-02-25 | 2006-08-15 | Palo Alto Research Center, Incorporated | Methods to make piezoelectric ceramic thick film arrays and elements |
US6964201B2 (en) * | 2003-02-25 | 2005-11-15 | Palo Alto Research Center Incorporated | Large dimension, flexible piezoelectric ceramic tapes |
US6895645B2 (en) * | 2003-02-25 | 2005-05-24 | Palo Alto Research Center Incorporated | Methods to make bimorph MEMS devices |
JP4593905B2 (ja) * | 2003-06-30 | 2010-12-08 | 京セラ株式会社 | 圧電アクチュエータおよびその製造方法、並びに液体吐出装置 |
JP4058018B2 (ja) * | 2003-12-16 | 2008-03-05 | 松下電器産業株式会社 | 圧電素子及びその製造方法、並びにその圧電素子を備えたインクジェットヘッド、インクジェット式記録装置及び角速度センサ |
US7701119B2 (en) | 2003-12-26 | 2010-04-20 | Nec Corporation | Piezoelectric actuator |
JP4737375B2 (ja) * | 2004-03-11 | 2011-07-27 | セイコーエプソン株式会社 | アクチュエータ装置の製造方法及び液体噴射ヘッドの製造方法並びに液体噴射装置の製造方法 |
CN100402293C (zh) * | 2004-07-13 | 2008-07-16 | 兄弟工业株式会社 | 压电致动器和喷墨头以及其制造方法 |
EP1616700A1 (de) * | 2004-07-13 | 2006-01-18 | Brother Kogyo Kabushiki Kaisha | Piezoelektrischer Aktor, Tintenstrahlkopf und dazugehöriges Herstellungsverfahren |
US7419252B2 (en) * | 2004-07-13 | 2008-09-02 | Brother Kogyo Kabushiki Kaisha | Ink jet head, piezo-electric actuator, and method of manufacturing them |
US7239064B1 (en) | 2004-10-15 | 2007-07-03 | Morgan Research Corporation | Resettable latching MEMS temperature sensor apparatus and method |
WO2006097522A1 (en) * | 2005-03-18 | 2006-09-21 | Bae Systems Plc | An actuator |
US20070041273A1 (en) * | 2005-06-21 | 2007-02-22 | Shertukde Hemchandra M | Acoustic sensor |
JP4696754B2 (ja) * | 2005-07-26 | 2011-06-08 | Tdk株式会社 | 圧電薄膜振動子およびその製造方法、並びにそれを用いた駆動装置および圧電モータ |
JP5063892B2 (ja) * | 2005-12-20 | 2012-10-31 | 富士フイルム株式会社 | 液体吐出ヘッドの製造方法 |
EP1835553B1 (de) * | 2006-03-17 | 2009-05-27 | Delphi Technologies, Inc. | Piezoelektrischer Aktor |
ATE450894T1 (de) * | 2007-01-30 | 2009-12-15 | Delphi Tech Inc | Herstellungsverfahren für einen piezoelektrischen aktor |
WO2009051166A1 (ja) * | 2007-10-16 | 2009-04-23 | Murata Manufacturing Co., Ltd. | 振動装置および圧電ポンプ |
JP5636730B2 (ja) * | 2010-04-28 | 2014-12-10 | パナソニック株式会社 | 角速度センサ素子およびその製造方法 |
KR101187465B1 (ko) | 2011-01-31 | 2012-10-02 | 한국산업기술대학교산학협력단 | 다층 졸겔층을 갖는 압전 세라믹 소자 |
RU2472253C1 (ru) * | 2011-08-17 | 2013-01-10 | Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Тверской государственный университет" | Пьезоэлектрический прибор и способ его изготовления |
JP5979369B2 (ja) * | 2011-10-03 | 2016-08-24 | セイコーエプソン株式会社 | 発電装置、電子機器、移動手段、電池、及び、発電装置の制御方法 |
DE102013200243A1 (de) * | 2013-01-10 | 2014-07-10 | Robert Bosch Gmbh | Piezoelektrisches Bauteil und Verfahren zur Herstellung eines piezoelektrischen Bauteils |
DE102013200242A1 (de) | 2013-01-10 | 2014-07-10 | Robert Bosch Gmbh | Piezoelektrisches Bauteil und Verfahren zur Herstellung eines piezoelektrischen Bauteils |
KR101531114B1 (ko) * | 2013-12-26 | 2015-06-23 | 삼성전기주식회사 | 압전 액추에이터 모듈, 압전 액추에이터 모듈의 제조방법 및 압전 액추에이터 모듈을 포함하는 mems 센서 |
JP6413461B2 (ja) * | 2014-08-13 | 2018-10-31 | セイコーエプソン株式会社 | 圧電駆動装置及びその駆動方法、ロボット及びその駆動方法 |
KR101616784B1 (ko) * | 2014-08-21 | 2016-04-29 | 한양대학교 산학협력단 | 전력모듈 제어시스템 |
KR101705078B1 (ko) * | 2015-02-09 | 2017-02-10 | 도레이첨단소재 주식회사 | 양면 금속적층 필름의 제조방법 및 그로부터 제조되는 양면 금속적층 필름 |
DE102016206566A1 (de) * | 2016-04-19 | 2017-10-19 | Robert Bosch Gmbh | Mikromechanisches Bauteil und Herstellungsverfahren für ein mikromechanisches Bauteil |
US10622543B2 (en) | 2017-01-11 | 2020-04-14 | The Boeing Company | Piezoelectric bimorph disk outer boundary design and method for performance optimization |
US10777730B2 (en) * | 2017-12-26 | 2020-09-15 | Santosh Kumar BEHERA | Scalable piezoelectric linear actuator |
US20190198748A1 (en) * | 2017-12-26 | 2019-06-27 | Santosh Kumar BEHERA | Self-sensing bending actuator |
US11701619B2 (en) * | 2018-10-12 | 2023-07-18 | MIS IP Holdings, LLC | Diagnostic methods and apparatus for electrodialysis |
DE102020002351A1 (de) * | 2020-04-19 | 2021-10-21 | Exel Industries Sa | Druckkopf mit mikropneumatischer Steuereinheit |
CN116418251A (zh) * | 2021-12-31 | 2023-07-11 | 华为技术有限公司 | 致动器、驱动装置、摄像模组以及电子设备 |
Family Cites Families (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3457463A (en) | 1965-07-07 | 1969-07-22 | Lewis Balamuth | Method and apparatus for generating electric currents of small magnitude |
JPS58151077A (ja) | 1982-03-03 | 1983-09-08 | Seiko Epson Corp | 圧電効果装置 |
JPS5919383A (ja) | 1982-07-23 | 1984-01-31 | Omron Tateisi Electronics Co | 圧電バイモルフ |
JPS59175777A (ja) | 1983-03-25 | 1984-10-04 | Sumitomo Special Metals Co Ltd | バイモルフ振動子の駆動方法 |
JPS60178677A (ja) | 1984-02-24 | 1985-09-12 | Nippon Telegr & Teleph Corp <Ntt> | 屈曲形圧電アクチユエ−タ |
DE3751183T2 (de) * | 1986-09-29 | 1995-11-16 | Mitsubishi Chem Corp | Piezoelektrischer Antrieb. |
US4985926A (en) * | 1988-02-29 | 1991-01-15 | Motorola, Inc. | High impedance piezoelectric transducer |
US5404067A (en) * | 1990-08-10 | 1995-04-04 | Siemens Aktiengesellschaft | Bonded piezoelectric bending transducer and process for producing the same |
JP2741629B2 (ja) * | 1990-10-09 | 1998-04-22 | キヤノン株式会社 | カンチレバー型プローブ、それを用いた走査型トンネル顕微鏡及び情報処理装置 |
JP3185226B2 (ja) * | 1991-01-30 | 2001-07-09 | 株式会社村田製作所 | 圧電バイモルフ素子の駆動方法及び圧電バイモルフ素子 |
JP2836269B2 (ja) * | 1991-03-07 | 1998-12-14 | 三菱マテリアル株式会社 | 光学スイッチ |
JP3093849B2 (ja) * | 1991-08-09 | 2000-10-03 | 呉羽化学工業株式会社 | 可撓性積層圧電素子 |
JPH05286132A (ja) * | 1992-04-16 | 1993-11-02 | Rohm Co Ltd | インクジェットプリントヘッドの製造方法及びインクジェットプリントヘッド |
JPH06218917A (ja) | 1993-01-22 | 1994-08-09 | Sharp Corp | インクジェットヘッド |
JPH07142781A (ja) * | 1993-06-21 | 1995-06-02 | Sumitomo Metal Ind Ltd | 圧電バイモルフ素子 |
US5666141A (en) * | 1993-07-13 | 1997-09-09 | Sharp Kabushiki Kaisha | Ink jet head and a method of manufacturing thereof |
JP3490483B2 (ja) * | 1993-10-08 | 2004-01-26 | アネルバ株式会社 | Pzt薄膜の作製方法 |
JP3114538B2 (ja) | 1994-12-12 | 2000-12-04 | 株式会社村田製作所 | 圧電体素子及びその製造方法 |
US5914556A (en) | 1994-09-09 | 1999-06-22 | Murata Manufacturing Co., Ltd. | Piezoelectric element and method of manufacturing the same |
JP3405618B2 (ja) | 1995-04-11 | 2003-05-12 | 松下電器産業株式会社 | バイモルフ圧電アクチュエータ |
JP3428773B2 (ja) * | 1995-04-21 | 2003-07-22 | 松下電器産業株式会社 | バイモルフ圧電素子とその製造方法 |
JPH08293631A (ja) | 1995-04-24 | 1996-11-05 | Tokin Corp | 圧電バイモルフ |
JP3890634B2 (ja) * | 1995-09-19 | 2007-03-07 | セイコーエプソン株式会社 | 圧電体薄膜素子及びインクジェット式記録ヘッド |
JPH111387A (ja) * | 1997-06-12 | 1999-01-06 | Toshio Fukuda | Pzt薄膜バイモルフ構造体、pzt薄膜バイモルフ形の平行平板構造体、及びその製造方法 |
US6169355B1 (en) | 1998-07-22 | 2001-01-02 | Eastman Kodak Company | Piezoelectric actuating element for an ink jet head and the like |
-
1999
- 1999-05-21 JP JP11142058A patent/JP2000332313A/ja active Pending
-
2000
- 2000-05-19 DE DE60000948T patent/DE60000948T2/de not_active Expired - Lifetime
- 2000-05-19 KR KR1020000026866A patent/KR100683325B1/ko not_active IP Right Cessation
- 2000-05-19 EP EP00110740A patent/EP1054459B1/de not_active Expired - Lifetime
-
2002
- 2002-04-04 US US10/116,096 patent/US7024738B2/en not_active Expired - Lifetime
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10020443B2 (en) | 2015-07-02 | 2018-07-10 | Fujifilm Corporation | Method of producing laminated thin film structure, laminated thin film structure, and piezoelectric element including same |
DE112016002558B4 (de) | 2015-07-02 | 2018-09-20 | Fujifilm Corporation | Verfahren zum Produzieren einer laminierten dünnen Filmstruktur, eine laminierte dünne Filmstruktur und ein piezoelektrisches Element, das dieselbe aufweist |
DE102020107028A1 (de) | 2020-03-13 | 2021-09-16 | Technische Universität Chemnitz | Piezoelektrische Vorrichtung und Verfahren zu deren Herstellung |
DE102020107028B4 (de) | 2020-03-13 | 2022-12-29 | Technische Universität Chemnitz | Piezoelektrische Vorrichtung und Verfahren zu deren Herstellung |
Also Published As
Publication number | Publication date |
---|---|
EP1054459B1 (de) | 2002-12-11 |
KR100683325B1 (ko) | 2007-02-15 |
EP1054459A1 (de) | 2000-11-22 |
US7024738B2 (en) | 2006-04-11 |
KR20010007085A (ko) | 2001-01-26 |
DE60000948D1 (de) | 2003-01-23 |
JP2000332313A (ja) | 2000-11-30 |
US20020149296A1 (en) | 2002-10-17 |
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Owner name: PANASONIC CORP., KADOMA, OSAKA, JP |