DE59108989D1 - Strahlungsempfindliche Zusammensetzung auf Basis von Wasser als Lösungs- bzw. Dispersionsmittel - Google Patents

Strahlungsempfindliche Zusammensetzung auf Basis von Wasser als Lösungs- bzw. Dispersionsmittel

Info

Publication number
DE59108989D1
DE59108989D1 DE59108989T DE59108989T DE59108989D1 DE 59108989 D1 DE59108989 D1 DE 59108989D1 DE 59108989 T DE59108989 T DE 59108989T DE 59108989 T DE59108989 T DE 59108989T DE 59108989 D1 DE59108989 D1 DE 59108989D1
Authority
DE
Germany
Prior art keywords
radiation
solvent
water
dispersion medium
composition based
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE59108989T
Other languages
German (de)
English (en)
Inventor
Roger Pierre-Elie Dr Salvin
Adrian Dr Schulthess
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Huntsman Advanced Materials Switzerland GmbH
Original Assignee
Ciba Geigy AG
Ciba Spezialitaetenchemie Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=4268122&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE59108989(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Ciba Geigy AG, Ciba Spezialitaetenchemie Holding AG filed Critical Ciba Geigy AG
Application granted granted Critical
Publication of DE59108989D1 publication Critical patent/DE59108989D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/04—Chromates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/111—Polymer of unsaturated acid or ester
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/148—Light sensitive titanium compound containing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Paints Or Removers (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Materials For Photolithography (AREA)
DE59108989T 1990-12-18 1991-12-09 Strahlungsempfindliche Zusammensetzung auf Basis von Wasser als Lösungs- bzw. Dispersionsmittel Expired - Fee Related DE59108989D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH401090 1990-12-18

Publications (1)

Publication Number Publication Date
DE59108989D1 true DE59108989D1 (de) 1998-06-25

Family

ID=4268122

Family Applications (1)

Application Number Title Priority Date Filing Date
DE59108989T Expired - Fee Related DE59108989D1 (de) 1990-12-18 1991-12-09 Strahlungsempfindliche Zusammensetzung auf Basis von Wasser als Lösungs- bzw. Dispersionsmittel

Country Status (7)

Country Link
US (2) US5501942A (enExample)
EP (1) EP0493317B2 (enExample)
JP (1) JP2688583B2 (enExample)
KR (1) KR100203822B1 (enExample)
CA (1) CA2057725C (enExample)
DE (1) DE59108989D1 (enExample)
TW (1) TW208071B (enExample)

Families Citing this family (45)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6422953B1 (en) 1992-04-24 2002-07-23 Spalding Sports Worldwide, Inc. Golf ball
US6315684B1 (en) 1992-04-24 2001-11-13 Spalding Sports Worldwide, Inc. Golf ball with soft core
US6413172B1 (en) 1992-04-24 2002-07-02 Spalding Sports Worldwide, Inc. Golf ball with soft core
US6325730B1 (en) 1992-04-24 2001-12-04 Spalding Sports Worldwide, Inc. Golf ball with soft core
TW268031B (enExample) * 1993-07-02 1996-01-11 Ciba Geigy
EP0666504B1 (en) * 1994-01-10 1998-06-03 E.I. Du Pont De Nemours And Company Aqueous photoimageable liquid emulsion, photoimageable film and process of manufacture
US5741621A (en) * 1994-01-10 1998-04-21 E. I. Du Pont De Nemours And Company Process for using photoimageable films prepared for aqueous photoimageable liquid emulsions
DE19510766A1 (de) * 1995-03-24 1996-09-26 Bayer Ag Epoxy(meth)acrylate, ein Verfahren zu ihrer Herstellung und ihre Verwendung
JP3877802B2 (ja) * 1995-05-02 2007-02-07 株式会社リコー エマルジョンインク及びこれを用いた印刷方法
US5512607A (en) * 1995-06-06 1996-04-30 W. R. Grace & Co.-Conn. Unsaturated epoxy ester with quaternary ammonium and phosphate groups
WO1996041240A1 (en) * 1995-06-07 1996-12-19 W.R. Grace & Co.-Conn. Water photoresist emulsions and methods of preparation thereof
US5925499A (en) * 1995-08-01 1999-07-20 Morton International, Inc. Epoxy-containing waterborne photoimageable composition
US5912106A (en) * 1996-09-10 1999-06-15 Ciba Specialty Chemicals Corporation Method for improving photoimage quality
AU721046B2 (en) * 1996-12-19 2000-06-22 Rohm And Haas Company Coating substrates
DE19718948A1 (de) * 1997-05-05 1998-11-12 Basf Ag Wässrige, strahlungshärtbare Beschichtungsmassen
JP4523679B2 (ja) * 1998-06-22 2010-08-11 太陽インキ製造株式会社 ハロゲンフリーの着色顔料を用いたプリント配線板用緑色レジストインキ組成物
WO2000002091A1 (en) 1998-07-07 2000-01-13 Kansai Paint Co., Ltd. Water-based solder resist composition
US6187374B1 (en) 1998-09-02 2001-02-13 Xim Products, Inc. Coatings with increased adhesion
US6048587A (en) * 1998-10-01 2000-04-11 Ricon Resins, Inc. Water-dispersible, radiation and thermally-curable polymeric compositions
CA2357001C (en) 1998-12-22 2009-01-20 Vantico Ag Production of photoresist coatings
US6433038B1 (en) * 1999-03-16 2002-08-13 Seiko Epson Corporation Photocurable ink composition for ink jet recording and ink jet recording method using the same
JP2001222103A (ja) * 1999-08-05 2001-08-17 Nippon Paint Co Ltd 水性フォトソルダーレジスト組成物
US6342541B1 (en) * 1999-12-08 2002-01-29 Advanced Ceramics Research, Inc. Machinable positive image model material for shape deposition manufacturing
US6803112B1 (en) * 2000-03-29 2004-10-12 Sun Chemical Corporation Radiation curable aqueous compositions for low extractable film packaging
US7037953B2 (en) * 2000-03-29 2006-05-02 Sun Chemical Corporation Radiation curable aqueous compositions
DE10026955A1 (de) * 2000-05-30 2001-12-13 Daimler Chrysler Ag Materialsystem zur Verwendung beim 3D-Drucken
ES2254652T3 (es) * 2001-03-05 2006-06-16 Georg Gros Mezcla de revestimiento a base de agua, procedimiento para aplicar una capa de proteccion frente a la corrosion con esta mezcla, base revestida de este modo y su uso.
KR100589067B1 (ko) 2001-10-30 2006-06-14 가부시키가이샤 가네카 감광성 수지 조성물, 이것을 이용한 감광성 필름 및 적층체
CN1582416A (zh) * 2001-12-03 2005-02-16 昭和电工株式会社 光敏膜和印刷线路板用光敏组合物及其生产方法
MXPA04010219A (es) * 2002-04-20 2005-03-07 Chemetall Gmbh Mezcla para aplicar un recubrimiento polimerico, a prueba de corrosion, electricamente soldable, y metodo para producir este recubrimiento.
JP2004020643A (ja) * 2002-06-12 2004-01-22 Fuji Photo Film Co Ltd ドライフィルムレジスト及びプリント基板の製造方法
KR100629887B1 (ko) * 2003-05-14 2006-09-28 이규한 금속 칩스케일 반도체패키지 및 그 제조방법
JP4531475B2 (ja) * 2003-08-15 2010-08-25 株式会社半導体エネルギー研究所 半導体装置の作製方法
US20050056954A1 (en) * 2003-09-12 2005-03-17 Devlin Brian Gerrard Method for making contact lenses
TW200630447A (en) * 2004-11-19 2006-09-01 Showa Denko Kk Resin cured film for flexible printed wiring board and production process thereof
US7863485B2 (en) * 2004-12-10 2011-01-04 Omnitech Environmental, Llc Additive and vehicle for inks, paints, coatings and adhesives
US7199192B2 (en) * 2004-12-21 2007-04-03 Callaway Golf Company Golf ball
US9777162B2 (en) 2005-09-30 2017-10-03 Nippon Shokubai Co., Ltd. Waterborne curable resin composition
JP2012003225A (ja) 2010-01-27 2012-01-05 Fujifilm Corp ソルダーレジスト用重合性組成物及びソルダーレジストパターンの形成方法
JP5417364B2 (ja) 2011-03-08 2014-02-12 富士フイルム株式会社 固体撮像素子用硬化性組成物、並びに、これを用いた感光層、永久パターン、ウエハレベルレンズ、固体撮像素子、及び、パターン形成方法
KR101313441B1 (ko) * 2011-10-25 2013-10-01 주식회사 포스코 용접성, 내스크래치성 및 내식성이 우수한 표면처리 강판
KR102122284B1 (ko) * 2013-05-13 2020-06-12 제이에스알 가부시끼가이샤 중합체 조성물, 가교 중합체 및 타이어
KR102609535B1 (ko) * 2015-07-08 2023-12-04 주식회사 동진쎄미켐 포토레지스트 패턴 코팅용 조성물 및 이를 이용한 미세 패턴 형성 방법
TWI707004B (zh) * 2018-08-02 2020-10-11 臻鼎科技股份有限公司 感光樹脂組合物及其製備方法
CN114539843B (zh) * 2021-12-21 2023-03-28 深圳市容大感光科技股份有限公司 一种喷墨打印阻焊油墨组合物及其线路板

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5243090B2 (enExample) * 1974-05-10 1977-10-28
US4025348A (en) * 1974-05-10 1977-05-24 Hitachi Chemical Company, Ltd. Photosensitive resin compositions
US4621043A (en) * 1983-01-31 1986-11-04 E. I. Du Pont De Nemours And Company Storage stable photopolymerizable composition
JPS59179608A (ja) * 1983-03-31 1984-10-12 Nitto Electric Ind Co Ltd 光硬化性ヒドロゾル組成物の製造法
JPS60247637A (ja) * 1984-05-23 1985-12-07 Agency Of Ind Science & Technol 感光性樹脂組成物
US4564580A (en) * 1983-06-30 1986-01-14 Kogyo Gijutsuin Photosensitive resin composition
DE3427519A1 (de) * 1984-07-26 1986-02-06 Hoechst Ag, 6230 Frankfurt Durch strahlung polymerisierbares gemisch, darin enthaltenes mischpolymerisat und verfahren zur herstellung des mischpolymerisats
US4592816A (en) * 1984-09-26 1986-06-03 Rohm And Haas Company Electrophoretic deposition process
DE3510219A1 (de) * 1985-03-21 1986-09-25 Hoechst Ag, 6230 Frankfurt Verfahren zur herstellung eines photopolymerisierbaren aufzeichnungsmaterials
GB8700594D0 (en) * 1986-01-29 1987-02-18 Ici Plc Curable coating compositions
GB8602195D0 (en) * 1986-01-29 1986-03-05 Ici Plc Curable coating compositions
GB8714863D0 (en) * 1987-06-25 1987-07-29 Ciba Geigy Ag Photopolymerizable composition i
GB8716378D0 (en) * 1987-07-11 1987-08-19 Autotype Int Ltd Photopolymerisable compositions
EP0345340B1 (en) * 1987-12-07 1995-03-08 Morton International, Inc. Photoimageable compositions
JPH01275636A (ja) * 1988-04-28 1989-11-06 Toagosei Chem Ind Co Ltd 貯蔵安定性の優れた架橋型エマルションの製造法
US5045435A (en) * 1988-11-25 1991-09-03 Armstrong World Industries, Inc. Water-borne, alkali-developable, photoresist coating compositions and their preparation
DE59009431D1 (de) * 1989-06-16 1995-08-31 Ciba Geigy Ag Photoresist.
JPH0473763A (ja) * 1990-07-16 1992-03-09 Kansai Paint Co Ltd 光硬化性電着塗料組成物
CA2084369A1 (en) * 1991-12-11 1993-06-12 Brent T. Speelman Water-borne photoimageable compositions

Also Published As

Publication number Publication date
EP0493317B1 (de) 1998-05-20
CA2057725C (en) 2000-09-19
CA2057725A1 (en) 1992-06-19
EP0493317B2 (de) 2001-01-10
KR100203822B1 (ko) 1999-06-15
US5691006A (en) 1997-11-25
JP2688583B2 (ja) 1997-12-10
US5501942A (en) 1996-03-26
JPH059407A (ja) 1993-01-19
KR920013026A (ko) 1992-07-28
EP0493317A1 (de) 1992-07-01
TW208071B (enExample) 1993-06-21

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Legal Events

Date Code Title Description
8363 Opposition against the patent
8366 Restricted maintained after opposition proceedings
8327 Change in the person/name/address of the patent owner

Owner name: VANTICO AG, BASEL, CH

8339 Ceased/non-payment of the annual fee