DE4203781C1 - - Google Patents

Info

Publication number
DE4203781C1
DE4203781C1 DE19924203781 DE4203781A DE4203781C1 DE 4203781 C1 DE4203781 C1 DE 4203781C1 DE 19924203781 DE19924203781 DE 19924203781 DE 4203781 A DE4203781 A DE 4203781A DE 4203781 C1 DE4203781 C1 DE 4203781C1
Authority
DE
Germany
Prior art keywords
polyimide
layer
light
developed
photoresist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE19924203781
Other languages
German (de)
English (en)
Inventor
Marion 6074 Roedermark De Weigand
Neville Hillesden Buckinghamshire Gb Eilbeck
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DuPont de Nemours Deutschland GmbH
Original Assignee
DuPont de Nemours Deutschland GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by DuPont de Nemours Deutschland GmbH filed Critical DuPont de Nemours Deutschland GmbH
Priority to DE19924203781 priority Critical patent/DE4203781C1/de
Priority to DE9203458U priority patent/DE9203458U1/de
Priority to GB9302508A priority patent/GB2263981A/en
Priority to FR9301397A priority patent/FR2687232B1/fr
Application granted granted Critical
Publication of DE4203781C1 publication Critical patent/DE4203781C1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Laminated Bodies (AREA)
DE19924203781 1992-02-10 1992-02-10 Expired - Fee Related DE4203781C1 (fr)

Priority Applications (4)

Application Number Priority Date Filing Date Title
DE19924203781 DE4203781C1 (fr) 1992-02-10 1992-02-10
DE9203458U DE9203458U1 (de) 1992-02-10 1992-03-14 Behandlungsflüssigkeit für das gleichzeitige Entwickeln und Ätzen von Verbundschichten aus Photoresisten und Polyimiden
GB9302508A GB2263981A (en) 1992-02-10 1993-02-09 Process for developing and etching compound layers of photoresist and polyimidesimultaneously
FR9301397A FR2687232B1 (fr) 1992-02-10 1993-02-09 Procede de developpement et attaque simultanes de couches stratifiees a base de resine photosensible et de polyimide.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19924203781 DE4203781C1 (fr) 1992-02-10 1992-02-10

Publications (1)

Publication Number Publication Date
DE4203781C1 true DE4203781C1 (fr) 1993-09-09

Family

ID=6451305

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19924203781 Expired - Fee Related DE4203781C1 (fr) 1992-02-10 1992-02-10

Country Status (3)

Country Link
DE (1) DE4203781C1 (fr)
FR (1) FR2687232B1 (fr)
GB (1) GB2263981A (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2265021B (en) * 1992-03-10 1996-02-14 Nippon Steel Chemical Co Photosensitive materials and their use in forming protective layers for printed circuit and process for preparation of printed circuit
JPH09306901A (ja) * 1996-05-17 1997-11-28 Nec Corp 半導体装置の製造方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01281730A (ja) * 1988-05-07 1989-11-13 Seiko Epson Corp パターン形成方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55120032A (en) * 1979-03-09 1980-09-16 Daicel Chem Ind Ltd Treating solution for photosensitive laminate having alcohol-soluble polyamide layer
JPS57124349A (en) * 1981-01-24 1982-08-03 Kimoto & Co Ltd Image formation method
US4426253A (en) * 1981-12-03 1984-01-17 E. I. Du Pont De Nemours & Co. High speed etching of polyimide film
EP0177905B1 (fr) * 1984-10-09 1990-12-05 Hoechst Japan Kabushiki Kaisha Procédé pour le developpement et l enlèvement des couches photoréserves avec des composés ammonium quaternaires
DE3705896A1 (de) * 1986-02-24 1987-08-27 Tokyo Ohka Kogyo Co Ltd Verfahren zur herstellung eines fotoresistmusters auf einer substratflaeche und ein dafuer geeignetes schaumentfernungsmittel
JPS6362322A (ja) * 1986-09-03 1988-03-18 Matsushita Electronics Corp 半導体素子の製造方法
US4782009A (en) * 1987-04-03 1988-11-01 General Electric Company Method of coating and imaging photopatternable silicone polyamic acid
GB8917191D0 (en) * 1989-07-27 1989-09-13 Gec Avery Technology Strain gauge encapsulation process
DE3941394A1 (de) * 1989-12-15 1991-06-20 Basf Ag Waessrige entwicklerloesung und verfahren zum entwickeln von photoresisten

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01281730A (ja) * 1988-05-07 1989-11-13 Seiko Epson Corp パターン形成方法

Also Published As

Publication number Publication date
GB9302508D0 (en) 1993-03-24
FR2687232A1 (fr) 1993-08-13
GB2263981A (en) 1993-08-11
FR2687232B1 (fr) 1994-09-16

Similar Documents

Publication Publication Date Title
DE19758561B4 (de) Verfahren zur Herstellung eines feinen Musters und einer Halbleitervorrichtung
EP0000702B1 (fr) Procédé de préparation d'un masque de photorésist résistant à l'écoulement en matériau sensible à une radiation
DE2460988C2 (de) Verfahren zum Niederschlagen eines Musters aus einem dünnen Film auf einem anorganischen Substrat
EP0001429B1 (fr) Procédé pour former des structures en couche mince à l'aide de la technique lift-off
EP0082463B1 (fr) Procédé pour la production d'images en relief
EP0002795B1 (fr) Procédé pour la fabrication de masques pour les procédés lithographiques utilisant un photorésist
DE2655455C2 (de) Verfahren zum Herstellen einer Maske und Lackstruktur zur Verwendung bei dem Verfahren
DE2624832C3 (de) Verfahren zum Herstellen von Lackmustern
DE2424338A1 (de) Verfahren zum aufbringen von mustern duenner filme auf einem substrat
DE2448535A1 (de) Verfahren zum niederschlagen eines duennen filmes unter verwendung einer abloesbaren maske
DE19525745A1 (de) Verfahren zur Bildung eines Abdeckungsmusters
EP0057738A2 (fr) Procédé pour la réalisation et le remplissage de trous dans une couche appliquée sur un substrat
DE10014083A1 (de) Verfahren zum Herstellen einer Halbleitervorrichtung
DE2447225A1 (de) Verfahren zum loesen von positivem photolack
DE2728886A1 (de) Aetzzusammensetzungen und verfahren zu deren verwendung
DE3241980A1 (de) Verfahren zur erzeugung eines metallischen bildes sowie verbundmaterial und behandlungsloesung dafuer
DE2830622A1 (de) Verfahren zur bilderzeugung und dafuer verwendbares lichtempfindliches element
EP0002669A1 (fr) Procédé pour enlever du matériau d'un substrat par gravure à sec sélective et emploi de ce procédé dans la production de patrons conducteurs
DE3541451A1 (de) Verfahren zum herstellen eines negativbildes
DE1772680A1 (de) Verfahren zur photographischen Herstellung von Masken
DE2620961A1 (de) Metallbild-erzeugendes material
DE19825039A1 (de) Verfahren zum Strukturieren eines chemisch verstärkten Photoresists
DE2539691A1 (de) Verfahren zum entwickeln von elektronenstrahlempfindlichen resistfilmen
DE4341302A1 (de) Verfahren zum Herstellen einer Halbleitervorrichtung und einer darin verwendeten Resistverbindung
DE4203781C1 (fr)

Legal Events

Date Code Title Description
8100 Publication of the examined application without publication of unexamined application
D1 Grant (no unexamined application published) patent law 81
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee