JPS57124349A - Image formation method - Google Patents

Image formation method

Info

Publication number
JPS57124349A
JPS57124349A JP936381A JP936381A JPS57124349A JP S57124349 A JPS57124349 A JP S57124349A JP 936381 A JP936381 A JP 936381A JP 936381 A JP936381 A JP 936381A JP S57124349 A JPS57124349 A JP S57124349A
Authority
JP
Japan
Prior art keywords
aqueous solution
alcohol
etching
layer
etching solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP936381A
Other languages
Japanese (ja)
Other versions
JPS6355694B2 (en
Inventor
Takeo Moriya
Toshio Yamagata
Kentaro Osawa
Takashi Okubo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kimoto Co Ltd
Original Assignee
Kimoto Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kimoto Co Ltd filed Critical Kimoto Co Ltd
Priority to JP936381A priority Critical patent/JPS57124349A/en
Publication of JPS57124349A publication Critical patent/JPS57124349A/en
Publication of JPS6355694B2 publication Critical patent/JPS6355694B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/094—Multilayer resist systems, e.g. planarising layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PURPOSE:To enable low concentration etching, by using an aqueous solution of an alkali metal compound of halogenated phenol or benzoic acid as an etching solution of an alcohol-soluble polyacid. CONSTITUTION:An alcohol-soluble polyamide layer is provided on a transparent substrate unattackable by an etching solution, on this layer a photosensitive resist layer is formed, this resist layer is exposed, and developed. This is processed with an etching solution containing one or more compounds represented by the formula in which X is OM or COOM; M is Na or K; Y is Cl or Br; and n is 1-5. This compound is embodied by sodium o-, m-, and p-chlorophenolate, potassium p-chorobenzoate, etc., and they are preferably used as a 4-30wt% aqueous solution. An aqueous solution of a lower alcohol can be used as a solvent.
JP936381A 1981-01-24 1981-01-24 Image formation method Granted JPS57124349A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP936381A JPS57124349A (en) 1981-01-24 1981-01-24 Image formation method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP936381A JPS57124349A (en) 1981-01-24 1981-01-24 Image formation method

Publications (2)

Publication Number Publication Date
JPS57124349A true JPS57124349A (en) 1982-08-03
JPS6355694B2 JPS6355694B2 (en) 1988-11-04

Family

ID=11718388

Family Applications (1)

Application Number Title Priority Date Filing Date
JP936381A Granted JPS57124349A (en) 1981-01-24 1981-01-24 Image formation method

Country Status (1)

Country Link
JP (1) JPS57124349A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2687232A1 (en) * 1992-02-10 1993-08-13 Du Pont PROCESS FOR THE SIMULTANEOUS DEVELOPMENT AND ATTACK OF LAMINATE LAYERS BASED ON PHOTOSENSITIVE RESIN AND POLYIMIDE.

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2687232A1 (en) * 1992-02-10 1993-08-13 Du Pont PROCESS FOR THE SIMULTANEOUS DEVELOPMENT AND ATTACK OF LAMINATE LAYERS BASED ON PHOTOSENSITIVE RESIN AND POLYIMIDE.

Also Published As

Publication number Publication date
JPS6355694B2 (en) 1988-11-04

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