JP3123563B2 - Photosensitive resin developer - Google Patents

Photosensitive resin developer

Info

Publication number
JP3123563B2
JP3123563B2 JP27668791A JP27668791A JP3123563B2 JP 3123563 B2 JP3123563 B2 JP 3123563B2 JP 27668791 A JP27668791 A JP 27668791A JP 27668791 A JP27668791 A JP 27668791A JP 3123563 B2 JP3123563 B2 JP 3123563B2
Authority
JP
Japan
Prior art keywords
developer
photosensitive resin
aqueous solution
mol
developing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP27668791A
Other languages
Japanese (ja)
Other versions
JPH0588377A (en
Inventor
弘幸 佐藤
隆徳 福村
鉄哉 永家
加津彦 小林
洋 川端
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JNC Corp
Original Assignee
Chisso Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chisso Corp filed Critical Chisso Corp
Priority to JP27668791A priority Critical patent/JP3123563B2/en
Publication of JPH0588377A publication Critical patent/JPH0588377A/en
Application granted granted Critical
Publication of JP3123563B2 publication Critical patent/JP3123563B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、感光性樹脂用現像液に
関する。更に詳しくは、感光性樹脂組成物を使用してレ
リーフ画像を形成する際の現像に使用するアルカリ性現
像液に関する。本発明に係るアルカリ性現像液は、エレ
クトロニクス分野の部品加工や印刷産業における製版材
料などに用いられるフォトレジストの現像液として使用
することができる。
The present invention relates to a developer for a photosensitive resin. More specifically, the present invention relates to an alkaline developer used for development when forming a relief image using a photosensitive resin composition. The alkaline developing solution according to the present invention can be used as a developing solution for a photoresist used for component processing in the field of electronics and plate making materials in the printing industry.

【0002】[0002]

【従来の技術とその問題点】レリーフ画像形成の際の現
像液としては、水またはアルカリ水溶液や有機溶剤が使
われてきた。しかし、職場環境の改善という観点から有
機溶剤は好ましくない。また、一方で高性能の光硬化性
樹脂組成物には水に不溶のものが多く、アルカリ性現像
液の占める比重は大きくなっている。従来のアルカリ性
現像液としては、炭酸ナトリウム水溶液、テトラメチル
アンモニウムヒドロキシド水溶液、モノエタノールアミ
ン水溶液等多数知られている。
2. Description of the Related Art Water, an aqueous alkaline solution or an organic solvent has been used as a developer for forming a relief image. However, organic solvents are not preferred from the viewpoint of improving the working environment. On the other hand, many high-performance photocurable resin compositions are insoluble in water, and the specific gravity of the alkaline developer is large. Many conventional alkaline developers are known, such as an aqueous solution of sodium carbonate, an aqueous solution of tetramethylammonium hydroxide, and an aqueous solution of monoethanolamine.

【0003】[0003]

【発明が解決しようとする課題】しかしながら、これら
の現像液は、現像を繰り返すにつれて、溶解する樹脂組
成物のために現像性能が低下する。更に弱アルカリ性現
像液の場合は空気中の炭酸ガスを吸収することによって
経時的に現像性能が低下していく。したがって、従来の
現像液を使用する際は常に新しい現像液を供給する必要
があり、現像に必要な性能を十分に満足しているとはい
えなかった。
However, the development performance of these developing solutions decreases as the development is repeated due to the dissolving resin composition. Further, in the case of a weakly alkaline developer, the developing performance decreases over time by absorbing carbon dioxide in the air. Therefore, it is necessary to always supply a new developer when using the conventional developer, and it cannot be said that the performance required for development is sufficiently satisfied.

【0004】このような欠点を解消するために鋭意研究
を行った結果、本発明者等はアルカリ水溶液と酸水溶液
または塩水溶液との混合液が極めて優れた現像性能を持
つことを見出し、本発明に至った。以上の記述から明ら
かなように、本発明は、繰り返し現像に使用しても現像
性能の低下の少ない水溶液性の感光性樹脂用現像液を提
供することをその目的とする。
[0004] As a result of intensive studies to solve such disadvantages, the present inventors have found that a mixture of an aqueous alkali solution and an aqueous acid or salt solution has extremely excellent developing performance. Reached. As is apparent from the above description, an object of the present invention is to provide an aqueous photosensitive resin developer having a small decrease in developing performance even when used in repeated development.

【0005】[0005]

【課題を解決するための手段】すなわち、本発明は、下
記(1)および(2)の構成を有する。 (1) 濃度が0.001〜2.0モル/リットルの炭
酸ナトリウム水溶液および濃度が0.001〜2.0モ
ル/リットルの炭酸水素ナトリウム水溶液をを混合して
なる感光性樹脂用現像液。 (2) 炭酸ナトリウム水溶液と炭酸水素ナトリウム水
溶液が1:0.01〜0.01:1の重量比率である請
求項2に記載の感光性樹脂用現像液。
That is, the present invention has the following configurations (1) and (2). (1) Charcoal with a concentration of 0.001 to 2.0 mol / L
Sodium acid aqueous solution and concentration of 0.001 to 2.0
And an aqueous solution of sodium bicarbonate
Developer for photosensitive resin. (2) The developer according to claim 2, wherein the weight ratio of the aqueous solution of sodium carbonate and the aqueous solution of sodium hydrogen carbonate is 1: 0.01 to 0.01: 1.

【0006】本発明に使用する炭酸ナトリウム水溶液お
よび炭酸水素ナトリウム水溶液における無機塩の濃度
は、通常0.001モル/リットル〜2.0モル/リッ
トル、好ましくは0.002モル/リットル〜1.0モ
ル/リットルの範囲であり、感光性樹脂組成物の構成に
適したpH値になるように調製して使用する。
The aqueous solution of sodium carbonate used in the present invention
Of inorganic salts in aqueous solution of sodium and hydrogencarbonate
Is usually in the range of 0.001 mol / L to 2.0 mol / L, preferably 0.002 mol / L to 1.0 mol / L, and has a pH value suitable for the composition of the photosensitive resin composition. Prepare and use it.

【0007】本発明の現像液の使用方法に特に制限はな
く、浸漬、シャワー等の通常の現像方法が使用できる。
本発明の現像液の使用温度に特に制限はないが、通常1
0〜90℃の範囲で使用される。もちろんこれ以外の温
度で使用することも可能である。本発明の現像液の性能
をさらに向上させるために、ドデシルベンゼンスルホン
酸ナトリウム、ポリオキシエチレンラウリルエーテル等
の界面活性剤を添加するのもよい。また、少量の消泡剤
を添加してもよい。
The method of using the developing solution of the present invention is not particularly limited, and ordinary developing methods such as dipping and showering can be used.
The temperature at which the developer of the present invention is used is not particularly limited.
It is used in the range of 0 to 90 ° C. Of course, it is possible to use at other temperatures. In order to further improve the performance of the developer of the present invention, a surfactant such as sodium dodecylbenzenesulfonate and polyoxyethylene lauryl ether may be added. Further, a small amount of an antifoaming agent may be added.

【0008】本発明のアルカリ性現像液は繰り返し使用
してもpHの低下が小さく現像性能が保持され、現像時
間の変動も小さい。このため現像液の交換のサイクルが
長くなり、コストの低下にも役立つ。このように本発明
のアルカリ性現像液は極めて有用なものである。
The alkaline developer of the present invention has a small decrease in pH even when it is used repeatedly, maintains developing performance, and has a small fluctuation in developing time. For this reason, the exchange cycle of the developing solution is lengthened and the cost is reduced. Thus, the alkaline developer of the present invention is extremely useful.

【0009】以下実施例により本発明を詳述するが、本
発明はこれらの実施例に限られるものではない。実施
例、比較例における現像性能の評価は6cm×6cmの
ガラス基板の片面に厚さ2.0μmのメタクリル酸メチ
ル−メタクリル酸共重合体(重量比70:30,ポリス
チレン換算重量平均分子量70,000)の膜を形成さ
せたものをアルカリ性現像液200ミリリットルを用い
て溶解除去するのに要した時間と、該溶解除去後のアル
カリ性現像液のpHを測定することによって行った。現
像方法としては、ガラス基板を現像液に浸漬して振とう
する方法を用いた。アルカリ性現像液の温度は30℃一
定とした。
Hereinafter, the present invention will be described in detail with reference to examples, but the present invention is not limited to these examples. The evaluation of the developing performance in Examples and Comparative Examples was carried out on a 6 cm × 6 cm glass substrate on one side by a 2.0 μm thick methyl methacrylate-methacrylic acid copolymer (weight ratio 70:30, polystyrene equivalent weight average molecular weight 70,000). The film was formed by measuring the time required for dissolving and removing the film having the film formed thereon using 200 ml of an alkaline developer and the pH of the alkaline developer after the dissolution and removal. As a developing method, a method of immersing a glass substrate in a developing solution and shaking was used. The temperature of the alkaline developer was kept constant at 30 ° C.

【0010】実施例1 0.02モル/リットルの炭酸ナトリウム水溶液100
ミリリットルと0.02モル/リットルの炭酸水素ナト
リウム水溶液100ミリリットルを混合してアルカリ性
現像液とした。これを用いて現像性能を評価した。結果
を表1に示す。
EXAMPLE 1 A 0.02 mol / liter aqueous solution of sodium carbonate 100
Milliliter and 100 ml of a 0.02 mol / liter aqueous sodium hydrogen carbonate solution were mixed to prepare an alkaline developer. The developing performance was evaluated using this. Table 1 shows the results.

【0011】実施例2 0.02モル/リットルの炭酸ナトリウム水溶液160
ミリリットルと0.02モル/リットルの炭酸水素ナト
リウム水溶液40ミリリットルを混合してアルカリ性現
像液とした。これを用いて現像性能を評価した。結果を
表1に示す。
Example 2 A 0.02 mol / liter aqueous solution of sodium carbonate 160
Milliliter and 40 ml of a 0.02 mol / liter aqueous sodium hydrogen carbonate solution were mixed to prepare an alkaline developer. The developing performance was evaluated using this. Table 1 shows the results.

【0012】[0012]

【0013】[0013]

【0014】[0014]

【表1】 [Table 1]

【0015】比較例1 0.02モル/リットルの炭酸ナトリウム水溶液200
ミリリットルをアルカリ性現像液として現像性能を評価
した。結果を表2に示す。
COMPARATIVE EXAMPLE 1 A 0.02 mol / liter aqueous solution of sodium carbonate 200
The developing performance was evaluated using milliliters as an alkaline developer. Table 2 shows the results.

【0016】比較例2 0.002モル/リットルの炭酸ナトリウム水溶液20
0ミリリットルをアルイカリ性現像液として現像性能を
評価した。結果を表2に示す。
Comparative Example 2 A 0.002 mol / liter sodium carbonate aqueous solution 20
The developing performance was evaluated using 0 ml as an alkali developer. Table 2 shows the results.

【0017】[0017]

【表2】 [Table 2]

【0018】[0018]

【発明の効果】本発明のアルカリ性現像液を用いると、
繰り返し現像を行ってもpH値の変動が小さく、一定現
像条件で繰返しの現像が出来、現像液の交換、補充の回
数が少なくて済む等の生産上の利点が大きい。また、前
述のように本発明は有機溶剤を含まない水溶液性現像液
を提供したのが大きな特徴である。
When the alkaline developer of the present invention is used,
Even if the development is repeated, the fluctuation of the pH value is small, the development can be repeated under a constant development condition, and the advantages of production such as the necessity of replacing and replenishing the developing solution are small. Also before
As described above, the present invention is an aqueous developer containing no organic solvent.
Is a major feature.

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平2−2571(JP,A) 特開 平2−2572(JP,A) 特開 平5−119483(JP,A) 化学便覧基礎編改訂2版、第1496頁、 丸善株式会社、昭和50年6月20日発行 (58)調査した分野(Int.Cl.7,DB名) G03F 7/32 H01L 21/027 ────────────────────────────────────────────────── ─── Continuation of the front page (56) References JP-A-2-2571 (JP, A) JP-A-2-2572 (JP, A) JP-A-5-119483 (JP, A) Revised Basics of Chemical Handbook 2nd ed., P. 1496, Maruzen Co., Ltd., issued on June 20, 1975 (58) Fields investigated (Int. Cl. 7 , DB name) G03F 7/32 H01L 21/027

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】濃度が0.001〜2.0モル/リットル
の炭酸ナトリウム水溶液および濃度が0.001〜2.
0モル/リットルの炭酸水素ナトリウム水溶液を混合し
てなる感光性樹脂用現像液。
(1) a concentration of 0.001 to 2.0 mol / l;
Sodium carbonate aqueous solution and a concentration of 0.001-2.
A developer for photosensitive resin obtained by mixing 0 mol / L aqueous sodium hydrogen carbonate solution.
【請求項2】炭酸ナトリウム水溶液と炭酸水素ナトリウ
ム水溶液が1:0.01〜0.01:1の重量比率であ
る請求項1に記載の感光性樹脂用現像液。
2. An aqueous solution of sodium carbonate and sodium bicarbonate.
The aqueous solution has a weight ratio of 1: 0.01 to 0.01: 1.
The developer for a photosensitive resin according to claim 1.
JP27668791A 1991-09-27 1991-09-27 Photosensitive resin developer Expired - Fee Related JP3123563B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27668791A JP3123563B2 (en) 1991-09-27 1991-09-27 Photosensitive resin developer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27668791A JP3123563B2 (en) 1991-09-27 1991-09-27 Photosensitive resin developer

Publications (2)

Publication Number Publication Date
JPH0588377A JPH0588377A (en) 1993-04-09
JP3123563B2 true JP3123563B2 (en) 2001-01-15

Family

ID=17572925

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27668791A Expired - Fee Related JP3123563B2 (en) 1991-09-27 1991-09-27 Photosensitive resin developer

Country Status (1)

Country Link
JP (1) JP3123563B2 (en)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69430960T2 (en) * 1993-04-28 2003-02-20 Toray Industries, Inc. Developer for positive working electron beam resist
WO1999053381A1 (en) * 1998-04-15 1999-10-21 Etec Systems, Inc. Photoresist developer and method of development
EP1502941B1 (en) 2003-07-30 2015-12-23 FUJIFILM Corporation Image-forming method and developer
JP2005049542A (en) 2003-07-31 2005-02-24 Fuji Photo Film Co Ltd Picture forming method and developer
US7115352B2 (en) 2003-10-30 2006-10-03 Fuji Photo Film Co., Ltd. Method for forming images
US7157213B2 (en) 2004-03-01 2007-01-02 Think Laboratory Co., Ltd. Developer agent for positive type photosensitive compound
EP1574907A1 (en) * 2004-03-08 2005-09-14 Think Laboratory Co., Ltd. Developing agent for positive-type photosensitive composition
CN1811602B (en) 2005-01-27 2010-10-06 明德国际仓储贸易(上海)有限公司 Developer solution composition
JP5264427B2 (en) * 2008-03-25 2013-08-14 富士フイルム株式会社 Preparation method of lithographic printing plate
JP5020871B2 (en) * 2008-03-25 2012-09-05 富士フイルム株式会社 Planographic printing plate manufacturing method
CN103184523B (en) * 2011-12-27 2016-01-27 中建材浚鑫科技股份有限公司 The preparation method of a kind of silicon single crystal Wool-making agent and textured mono-crystalline silicon
CN110727180A (en) * 2018-07-17 2020-01-24 南昌欧菲显示科技有限公司 Self-purification type developing solution composition, preparation method thereof and developing method using self-purification type developing solution composition
CN112305876A (en) * 2019-07-31 2021-02-02 无锡迪思微电子有限公司 Preparation method of developing solution

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
化学便覧基礎編改訂2版、第1496頁、丸善株式会社、昭和50年6月20日発行

Also Published As

Publication number Publication date
JPH0588377A (en) 1993-04-09

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