DE4120941C2 - - Google Patents

Info

Publication number
DE4120941C2
DE4120941C2 DE4120941A DE4120941A DE4120941C2 DE 4120941 C2 DE4120941 C2 DE 4120941C2 DE 4120941 A DE4120941 A DE 4120941A DE 4120941 A DE4120941 A DE 4120941A DE 4120941 C2 DE4120941 C2 DE 4120941C2
Authority
DE
Germany
Prior art keywords
crucible
cathode
deposition material
anode
acceleration
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE4120941A
Other languages
German (de)
English (en)
Other versions
DE4120941A1 (de
Inventor
Hiroki Amagasaki Hyogo Jp Ito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Publication of DE4120941A1 publication Critical patent/DE4120941A1/de
Application granted granted Critical
Publication of DE4120941C2 publication Critical patent/DE4120941C2/de
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/221—Ion beam deposition
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/08—Ion sources; Ion guns using arc discharge
    • H01J27/14—Other arc discharge ion sources using an applied magnetic field

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Combustion & Propulsion (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Physical Vapour Deposition (AREA)
DE4120941A 1990-06-25 1991-06-25 Vorrichtung zum aufbringen von duennschichten Granted DE4120941A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2164184A JPH089774B2 (ja) 1990-06-25 1990-06-25 薄膜形成装置

Publications (2)

Publication Number Publication Date
DE4120941A1 DE4120941A1 (de) 1992-01-09
DE4120941C2 true DE4120941C2 (US06633600-20031014-M00021.png) 1993-09-09

Family

ID=15788300

Family Applications (1)

Application Number Title Priority Date Filing Date
DE4120941A Granted DE4120941A1 (de) 1990-06-25 1991-06-25 Vorrichtung zum aufbringen von duennschichten

Country Status (4)

Country Link
US (1) US5180477A (US06633600-20031014-M00021.png)
JP (1) JPH089774B2 (US06633600-20031014-M00021.png)
DE (1) DE4120941A1 (US06633600-20031014-M00021.png)
GB (1) GB2248340B (US06633600-20031014-M00021.png)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2278952B (en) * 1993-06-12 1997-03-26 James Harry Freeman Improvements in or relating to surface ionisation ion sources
DE10019720A1 (de) * 2000-04-20 2001-10-31 Atotech Deutschland Gmbh Verfahren und Vorrichtung zum elektrischen Kontaktieren von plattenförmigem Behandlungsgut bei elektrolytischen Prozessen
JP4728882B2 (ja) * 2006-06-09 2011-07-20 長州産業株式会社 薄膜堆積用分子線源用坩堝の製造方法
CN101908458B (zh) * 2009-06-05 2012-03-07 马利民 一种矩形刻蚀离子枪
KR101432514B1 (ko) * 2013-01-29 2014-08-21 한국기초과학지원연구원 플라즈마 보조 물리 기상 증착원
DE102016114480B4 (de) * 2016-08-04 2023-02-02 VON ARDENNE Asset GmbH & Co. KG Ionenstrahlquelle und Verfahren zur Ionenstrahlbehandlung
KR102461901B1 (ko) * 2017-12-12 2022-11-01 어플라이드 머티어리얼스, 인코포레이티드 이온 소스 및 간접적으로 가열된 캐소드 이온 소스
US11404254B2 (en) 2018-09-19 2022-08-02 Varian Semiconductor Equipment Associates, Inc. Insertable target holder for solid dopant materials
US11170973B2 (en) 2019-10-09 2021-11-09 Applied Materials, Inc. Temperature control for insertable target holder for solid dopant materials
US10957509B1 (en) 2019-11-07 2021-03-23 Applied Materials, Inc. Insertable target holder for improved stability and performance for solid dopant materials
US11854760B2 (en) 2021-06-21 2023-12-26 Applied Materials, Inc. Crucible design for liquid metal in an ion source

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB685269A (en) * 1951-02-02 1952-12-31 Nat Res Corp Apparatus and process for coating a substrate with a metal
BE762681A (nl) * 1971-02-09 1971-07-16 Bekaert Sa Nv Inrichting voor het opdampen van een metalen deklaag op een langwerpig substraat met behulp van tenminste een elektronenkanon.
US3908183A (en) * 1973-03-14 1975-09-23 California Linear Circuits Inc Combined ion implantation and kinetic transport deposition process
JPS5181791A (ja) * 1975-01-13 1976-07-17 Osaka Koon Denki Kk Ionkapureeteinguhoho
US4424104A (en) * 1983-05-12 1984-01-03 International Business Machines Corporation Single axis combined ion and vapor source
JPS6115965A (ja) * 1984-07-03 1986-01-24 Hitachi Ltd クラスタイオンビ−ム発生方法およびその装置
JPS61174370A (ja) * 1985-01-29 1986-08-06 Mitsubishi Electric Corp 蒸着装置
JPS6214416A (ja) * 1985-07-12 1987-01-23 Victor Co Of Japan Ltd 薄膜形成装置
JPS63176460A (ja) * 1987-01-13 1988-07-20 Matsushita Electric Ind Co Ltd 薄膜製造装置
GB8701414D0 (en) * 1987-01-22 1987-02-25 Matthews A Heating enhancement in physical vapour deposition
JPS63297559A (ja) * 1987-08-22 1988-12-05 Tokuda Seisakusho Ltd 高周波電源を用いたグロ−放電装置のア−クしゃ断方法および装置
JP2619068B2 (ja) * 1989-09-08 1997-06-11 三菱電機株式会社 薄膜形成装置

Also Published As

Publication number Publication date
GB2248340A (en) 1992-04-01
US5180477A (en) 1993-01-19
GB9113636D0 (en) 1991-08-14
JPH089774B2 (ja) 1996-01-31
JPH0456761A (ja) 1992-02-24
GB2248340B (en) 1994-09-28
DE4120941A1 (de) 1992-01-09

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Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
D2 Grant after examination
8364 No opposition during term of opposition
8320 Willingness to grant licences declared (paragraph 23)
8339 Ceased/non-payment of the annual fee