DE3852744D1 - Hoch auflösendes abbildendes System. - Google Patents

Hoch auflösendes abbildendes System.

Info

Publication number
DE3852744D1
DE3852744D1 DE3852744T DE3852744T DE3852744D1 DE 3852744 D1 DE3852744 D1 DE 3852744D1 DE 3852744 T DE3852744 T DE 3852744T DE 3852744 T DE3852744 T DE 3852744T DE 3852744 D1 DE3852744 D1 DE 3852744D1
Authority
DE
Germany
Prior art keywords
imaging system
resolution imaging
resolution
imaging
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE3852744T
Other languages
English (en)
Other versions
DE3852744T2 (de
Inventor
Theodore Robert Whitney
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of DE3852744D1 publication Critical patent/DE3852744D1/de
Application granted granted Critical
Publication of DE3852744T2 publication Critical patent/DE3852744T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0037—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0075—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means for altering, e.g. increasing, the depth of field or depth of focus
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/4205—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive optical element [DOE] contributing to image formation, e.g. whereby modulation transfer function MTF or optical aberrations are relevant
    • G02B27/4211—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive optical element [DOE] contributing to image formation, e.g. whereby modulation transfer function MTF or optical aberrations are relevant correcting chromatic aberrations
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
    • G02B27/4205—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive optical element [DOE] contributing to image formation, e.g. whereby modulation transfer function MTF or optical aberrations are relevant
    • G02B27/4222—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive optical element [DOE] contributing to image formation, e.g. whereby modulation transfer function MTF or optical aberrations are relevant in projection exposure systems, e.g. photolithographic systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1876—Diffractive Fresnel lenses; Zone plates; Kinoforms
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1876—Diffractive Fresnel lenses; Zone plates; Kinoforms
    • G02B5/188—Plurality of such optical elements formed in or on a supporting substrate
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70583—Speckle reduction, e.g. coherence control or amplitude/wavefront splitting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Lasers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Microscoopes, Condenser (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lenses (AREA)
DE3852744T 1987-10-25 1988-10-12 Hoch auflösendes abbildendes System. Expired - Lifetime DE3852744T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/108,435 US4936665A (en) 1987-10-25 1987-10-25 High resolution imagery systems and methods

Publications (2)

Publication Number Publication Date
DE3852744D1 true DE3852744D1 (de) 1995-02-23
DE3852744T2 DE3852744T2 (de) 1995-05-24

Family

ID=22322178

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3852744T Expired - Lifetime DE3852744T2 (de) 1987-10-25 1988-10-12 Hoch auflösendes abbildendes System.

Country Status (5)

Country Link
US (1) US4936665A (de)
EP (1) EP0312341B1 (de)
JP (4) JP2867375B2 (de)
DE (1) DE3852744T2 (de)
HK (1) HK1006749A1 (de)

Families Citing this family (120)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5161059A (en) * 1987-09-21 1992-11-03 Massachusetts Institute Of Technology High-efficiency, multilevel, diffractive optical elements
US4936665A (en) * 1987-10-25 1990-06-26 Whitney Theodore R High resolution imagery systems and methods
US5134507A (en) * 1988-07-12 1992-07-28 Sharp Kabushiki Kaisha Liquid crystal display apparatus having a particular optical compensating member
US5291315A (en) * 1988-07-26 1994-03-01 Konica Corporation Method of obtaining hologram and an exposure apparatus
US5161057A (en) * 1988-09-12 1992-11-03 Johnson Kenneth C Dispersion-compensated fresnel lens
US5121160A (en) * 1989-03-09 1992-06-09 Canon Kabushiki Kaisha Exposure method and apparatus
US5404366A (en) * 1989-07-14 1995-04-04 Kabushiki Kaisha Komatsu Seisakusho Narrow band excimer laser and wavelength detecting apparatus
US5227915A (en) * 1990-02-13 1993-07-13 Holo-Or Ltd. Diffractive optical element
WO1991012551A1 (en) * 1990-02-14 1991-08-22 Massachusetts Institute Of Technology Lens/zone plate combination for chromatic dispersion correction
US5638211A (en) 1990-08-21 1997-06-10 Nikon Corporation Method and apparatus for increasing the resolution power of projection lithography exposure system
US7656504B1 (en) 1990-08-21 2010-02-02 Nikon Corporation Projection exposure apparatus with luminous flux distribution
US5362940A (en) * 1990-11-09 1994-11-08 Litel Instruments Use of Fresnel zone plates for material processing
US6252647B1 (en) 1990-11-15 2001-06-26 Nikon Corporation Projection exposure apparatus
US5719704A (en) * 1991-09-11 1998-02-17 Nikon Corporation Projection exposure apparatus
US6897942B2 (en) * 1990-11-15 2005-05-24 Nikon Corporation Projection exposure apparatus and method
US6885433B2 (en) * 1990-11-15 2005-04-26 Nikon Corporation Projection exposure apparatus and method
US6967710B2 (en) * 1990-11-15 2005-11-22 Nikon Corporation Projection exposure apparatus and method
JP3353902B2 (ja) * 1990-12-12 2002-12-09 オリンパス光学工業株式会社 投影レンズ系
DE69219183T2 (de) * 1991-02-20 1998-01-08 At & T Corp Herstellungsmethode für abgeschrägte Oberfläche mit vorbestimmter Neigung
US6411377B1 (en) 1991-04-02 2002-06-25 Hitachi, Ltd. Optical apparatus for defect and particle size inspection
US5153772A (en) * 1991-04-09 1992-10-06 Toledyne Industries, Inc. Binary optic-corrected multistage imaging system
GB2256500A (en) * 1991-05-03 1992-12-09 Minnesota Mining & Mfg Diffractive mirror having diffractive zones seperated by optical steps
JPH04361201A (ja) * 1991-06-10 1992-12-14 Olympus Optical Co Ltd フレネルゾーンプレートを用いた光学系
US5153778A (en) * 1991-06-19 1992-10-06 At&T Bell Laboratories Powerless field-corrective lens
US5272501A (en) * 1991-08-28 1993-12-21 Nikon Corporation Projection exposure apparatus
US5257133A (en) * 1991-09-11 1993-10-26 Hughes Aircraft Company Re-imaging optical system employing refractive and diffractive optical elements
US5629799A (en) * 1992-07-16 1997-05-13 Asahi Kogaku Kogyo Kabushiki Kaisha Chromatic aberration correcting element and its application
JPH0694939A (ja) * 1992-09-09 1994-04-08 Fuji Photo Film Co Ltd 光導波路素子
US5319496A (en) * 1992-11-18 1994-06-07 Photonics Research Incorporated Optical beam delivery system
US5305150A (en) * 1992-11-20 1994-04-19 Lockheed Missiles & Space Company, Inc. Laser beam expander: 10×
US5329404A (en) * 1992-11-20 1994-07-12 Lockheed Missiles & Space Company, Inc. Laser beam expander: 5X
US5405659A (en) * 1993-03-05 1995-04-11 University Of Puerto Rico Method and apparatus for removing material from a target by use of a ring-shaped elliptical laser beam and depositing the material onto a substrate
JPH07168809A (ja) * 1993-03-30 1995-07-04 Klics Ltd ウェーブレット変換方法及びウェーブレット変換回路
US5546477A (en) * 1993-03-30 1996-08-13 Klics, Inc. Data compression and decompression
JP3268929B2 (ja) * 1993-04-19 2002-03-25 オリンパス光学工業株式会社 光学素子の製造方法
JPH06331941A (ja) * 1993-05-19 1994-12-02 Olympus Optical Co Ltd 投影レンズ系
US5631779A (en) * 1993-05-24 1997-05-20 Olympus Optical Co., Ltd. Objective lens system
JP3463335B2 (ja) * 1994-02-17 2003-11-05 株式会社ニコン 投影露光装置
US6304317B1 (en) 1993-07-15 2001-10-16 Nikon Corporation Projection apparatus and method
US5561558A (en) * 1993-10-18 1996-10-01 Matsushita Electric Industrial Co., Ltd. Diffractive optical device
US5538674A (en) * 1993-11-19 1996-07-23 Donnelly Corporation Method for reproducing holograms, kinoforms, diffractive optical elements and microstructures
US6285443B1 (en) 1993-12-13 2001-09-04 Carl-Zeiss-Stiftung Illuminating arrangement for a projection microlithographic apparatus
DE19520563A1 (de) * 1995-06-06 1996-12-12 Zeiss Carl Fa Beleuchtungseinrichtung für ein Projektions-Mikrolithographie-Gerät
US6480334B1 (en) * 1994-01-18 2002-11-12 Massachusetts Institute Of Technology Agile beam steering using phased-array-like elements
US5695274A (en) * 1994-03-23 1997-12-09 Olympus Optical Co., Ltd. Illuminating optical system for use in projecting exposure device
US5589982A (en) * 1994-06-03 1996-12-31 Rochester Photonics Corporation Polychromatic diffractive lens
US5623473A (en) * 1994-06-30 1997-04-22 Nikon Corporation Method and apparatus for manufacturing a diffraction grating zone plate
US5748786A (en) 1994-09-21 1998-05-05 Ricoh Company, Ltd. Apparatus for compression using reversible embedded wavelets
JP3302229B2 (ja) 1994-09-20 2002-07-15 株式会社リコー 符号化方法、符号化／復号方法及び復号方法
US5966465A (en) * 1994-09-21 1999-10-12 Ricoh Corporation Compression/decompression using reversible embedded wavelets
US6229927B1 (en) 1994-09-21 2001-05-08 Ricoh Company, Ltd. Reversible embedded wavelet system implementation
US6873734B1 (en) 1994-09-21 2005-03-29 Ricoh Company Ltd Method and apparatus for compression using reversible wavelet transforms and an embedded codestream
US6549666B1 (en) * 1994-09-21 2003-04-15 Ricoh Company, Ltd Reversible embedded wavelet system implementation
US5881176A (en) * 1994-09-21 1999-03-09 Ricoh Corporation Compression and decompression with wavelet style and binary style including quantization by device-dependent parser
US6195465B1 (en) 1994-09-21 2001-02-27 Ricoh Company, Ltd. Method and apparatus for compression using reversible wavelet transforms and an embedded codestream
JPH08286113A (ja) * 1995-04-17 1996-11-01 Olympus Optical Co Ltd 対物レンズ
FR2737581B1 (fr) * 1995-07-28 1997-10-24 Fujitsu Ltd Lentille de fresnel et dispositif d'affichage a cristaux liquides
US6380994B1 (en) 1995-07-28 2002-04-30 Fujitsu Limited Fresnel lens and liquid crystal display device
US5751387A (en) * 1995-07-28 1998-05-12 Fujitsu Limited Fresnel lens and liquid crystal display device
US5995285A (en) * 1996-07-09 1999-11-30 Canon Kabushiki Kaisha Multilevel optical diffraction device with antireflection film and exposure apparatus
US5715271A (en) * 1996-08-01 1998-02-03 Northern Telecom Limited Polarization independent grating resonator filter
US5929892A (en) * 1996-08-26 1999-07-27 Hewlett-Packard Company Beam deflecting for enhanced laser printer scanning
US6381356B1 (en) * 1996-10-23 2002-04-30 Nec Corporation Method and apparatus for inspecting high-precision patterns
JPH10133150A (ja) 1996-10-29 1998-05-22 Canon Inc 回折光学装置及びこれを用いた露光装置
CA2197706A1 (en) * 1997-02-14 1998-08-14 Peter Ehbets Method of fabricating apodized phase mask
JP3784136B2 (ja) * 1997-06-02 2006-06-07 株式会社ルネサステクノロジ 投影露光装置および投影露光方法
JPH10339804A (ja) 1997-06-06 1998-12-22 Canon Inc 回折光学素子及び該素子の光軸調整装置
US6475704B1 (en) 1997-09-12 2002-11-05 Canon Kabushiki Kaisha Method for forming fine structure
US6044172A (en) * 1997-12-22 2000-03-28 Ricoh Company Ltd. Method and apparatus for reversible color conversion
US6560019B2 (en) 1998-02-05 2003-05-06 Canon Kabushiki Kaisha Diffractive optical element and optical system having the same
JP3827860B2 (ja) * 1998-03-31 2006-09-27 パイオニア株式会社 対物レンズ及び光ピックアップ装置
DE69931690T2 (de) 1998-04-08 2007-06-14 Asml Netherlands B.V. Lithographischer Apparat
US20020027301A1 (en) 1998-06-11 2002-03-07 Hideo Kato Method for manufacture of optical element
JP2000098116A (ja) 1998-09-18 2000-04-07 Canon Inc 素子又は素子作製用モールド型の作製方法
US6856392B1 (en) † 1998-11-09 2005-02-15 Canon Kabushiki Kaisha Optical element with alignment mark, and optical system having such optical element
US6335831B2 (en) * 1998-12-18 2002-01-01 Eastman Kodak Company Multilevel mechanical grating device
JP3437517B2 (ja) 1999-02-16 2003-08-18 キヤノン株式会社 二次元位相型光学素子の作製方法
US7169293B2 (en) * 1999-08-20 2007-01-30 Uop Llc Controllable space velocity reactor and process
US6314452B1 (en) 1999-08-31 2001-11-06 Rtimage, Ltd. System and method for transmitting a digital image over a communication network
TW587199B (en) 1999-09-29 2004-05-11 Asml Netherlands Bv Lithographic method and apparatus
US20010047516A1 (en) * 2000-02-01 2001-11-29 Compaq Computer Corporation System for time shifting live streamed video-audio distributed via the internet
US7024046B2 (en) * 2000-04-18 2006-04-04 Real Time Image Ltd. System and method for the lossless progressive streaming of images over a communication network
AU2002229090A1 (en) * 2000-12-14 2002-06-24 Rtimage Inc. Three-dimensional image streaming system and method for medical images
US6898323B2 (en) * 2001-02-15 2005-05-24 Ricoh Company, Ltd. Memory usage scheme for performing wavelet processing
US7062101B2 (en) 2001-03-30 2006-06-13 Ricoh Co., Ltd. Method and apparatus for storing bitplanes of coefficients in a reduced size memory
US6950558B2 (en) 2001-03-30 2005-09-27 Ricoh Co., Ltd. Method and apparatus for block sequential processing
US6895120B2 (en) * 2001-03-30 2005-05-17 Ricoh Co., Ltd. 5,3 wavelet filter having three high pair and low pair filter elements with two pairs of cascaded delays
US7006697B1 (en) 2001-03-30 2006-02-28 Ricoh Co., Ltd. Parallel block MQ arithmetic image compression of wavelet transform coefficients
US6859563B2 (en) 2001-03-30 2005-02-22 Ricoh Co., Ltd. Method and apparatus for decoding information using late contexts
DE10123230A1 (de) * 2001-05-12 2002-11-28 Zeiss Carl Diffraktives optisches Element sowie optische Anordnung mit einem diffraktiven optischen Element
US7581027B2 (en) * 2001-06-27 2009-08-25 Ricoh Co., Ltd. JPEG 2000 for efficent imaging in a client/server environment
US7280252B1 (en) 2001-12-19 2007-10-09 Ricoh Co., Ltd. Error diffusion of multiresolutional representations
US7095907B1 (en) 2002-01-10 2006-08-22 Ricoh Co., Ltd. Content and display device dependent creation of smaller representation of images
US7120305B2 (en) * 2002-04-16 2006-10-10 Ricoh, Co., Ltd. Adaptive nonlinear image enlargement using wavelet transform coefficients
US7042334B2 (en) * 2003-01-31 2006-05-09 General Electric Company Methods for managing access to physical assets
US7245407B2 (en) * 2002-06-10 2007-07-17 Matsushita Electric Industrial Co., Ltd. Complex objective lens compatible with information media of different thicknesses
US6951391B2 (en) * 2003-06-16 2005-10-04 Apollo Optical Systems Llc Bifocal multiorder diffractive lenses for vision correction
KR101144458B1 (ko) * 2003-07-30 2012-05-14 칼 짜이스 에스엠티 게엠베하 마이크로 인쇄술용 조명 시스템
JP2005070124A (ja) * 2003-08-27 2005-03-17 Canon Inc 光走査装置及びそれを用いた画像形成装置
CN1902639A (zh) * 2003-11-10 2007-01-24 科技创新有限责任公司 数字成像组合件及其方法
JP4465200B2 (ja) * 2004-01-20 2010-05-19 Ｈｏｙａ株式会社 光ピックアップ装置および光ピックアップ用対物レンズ
US7156516B2 (en) * 2004-08-20 2007-01-02 Apollo Optical Systems Llc Diffractive lenses for vision correction
US7025456B2 (en) * 2004-08-20 2006-04-11 Apollo Optical Systems, Llc Diffractive lenses for vision correction
US7630085B2 (en) * 2005-04-19 2009-12-08 Texas Instruments Incorporated Interferometers of high resolutions
US20070109520A1 (en) * 2005-11-17 2007-05-17 Whitney Theodore R Modular illuminator for a scanning printer
DE102006035022A1 (de) 2006-07-28 2008-01-31 Carl Zeiss Smt Ag Verfahren zum Herstellen einer optischen Komponente, Interferometeranordnung und Beugungsgitter
WO2009006919A1 (en) 2007-07-09 2009-01-15 Carl Zeiss Smt Ag Method of measuring a deviation an optical surface from a target shape
DE102008041288A1 (de) 2007-09-28 2009-04-02 Carl Zeiss Smt Ag Beleuchtungssystem für eine Projektionsbelichtungsanlage mit Stabintegrator und Graufilter
EP2399098B1 (de) * 2009-02-23 2018-11-21 Dental Imaging Technologies Corporation Vorrichtung zur schnellen phasenumtastung für interferrometrische messsysteme
DE102009029132A1 (de) 2009-09-02 2010-11-04 Carl Zeiss Smt Ag Beleuchtungssystem für eine Projektionsbelichtungsanlage für die Mikrolithographie mit Stabintegrator
CN102349685B (zh) * 2011-07-26 2012-09-19 许盛英 球形茶叶防潮脱氧保鲜剂
KR20130073429A (ko) * 2011-12-23 2013-07-03 삼성전자주식회사 존 플레이트 및 이를 포함하는 마스크 패턴 측정 장치
CN102540475B (zh) * 2012-02-28 2014-10-22 中国科学院上海微系统与信息技术研究所 用于中红外分布反馈光栅制备的全息曝光光路调整方法
DE102013204443A1 (de) * 2013-03-14 2014-10-02 Carl Zeiss Smt Gmbh Optische Baugruppe zur Lichtleitwerterhöhung
US10444467B2 (en) 2015-11-25 2019-10-15 Himax Technologies Limited Collimation lens module and light source module using the same
EP3185060B1 (de) * 2015-12-23 2018-12-12 Himax Technologies Limited Kollimationslinsenmodul und lichtquellenmodul damit
CN110622059B (zh) * 2017-05-22 2021-12-10 三菱电机株式会社 光图案生成装置
US11487058B2 (en) * 2020-08-13 2022-11-01 Applied Materials, Inc. Method for manufacturing optical device structures
CN112255787B (zh) * 2020-10-23 2022-06-07 中国人民解放军陆军装甲兵学院 一种集成成像显示系统的景深扩展方法及系统
CN113345619B (zh) * 2021-06-16 2022-07-12 中国工程物理研究院激光聚变研究中心 一维x射线折射闪耀波带片

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3754814A (en) * 1971-01-19 1973-08-28 Battelle Development Corp Coherent imaging with reduced speckle
US3677616A (en) * 1971-05-03 1972-07-18 Battelle Development Corp Reduced noise high resolution holographic imaging using spatially incoherent reconstructing radiation
NL174591C (nl) * 1973-02-09 1984-07-02 Philips Nv Schijfvormig registratiedragerlichaam.
DE2307158A1 (de) * 1973-02-14 1974-08-22 Agfa Gevaert Ag Verfahren und vorrichtung zur herstellung rotationssymmetrischer asphaerischer beugungsoptischer elemente
US4057326A (en) * 1976-05-27 1977-11-08 Rca Corporation Simplified and improved diffractive subtractive color filtering technique
DE2645075C2 (de) * 1976-10-06 1985-06-20 Philips Patentverwaltung Gmbh, 2000 Hamburg Optische Anordnung zur Erzeugung von spektral zerlegten Abbildungen
DE3213839A1 (de) * 1982-04-15 1983-10-27 Philips Patentverwaltung Gmbh, 2000 Hamburg Optische wellenlaengen-multiplex- bzw. -demultiplexanordnung
US4435041A (en) * 1982-05-28 1984-03-06 Sperry Corporation Chromatic aberration correction in a multiwavelength light beam deflection system
GB2129157B (en) * 1982-10-27 1986-02-05 Pilkington Perkin Elmer Ltd Bifocal contact lenses having defractive power
JPS59137908A (ja) * 1983-01-28 1984-08-08 Toshiba Corp 複合グレ−テイングレンズ
JPS60150239A (ja) * 1984-01-18 1985-08-07 Hitachi Ltd 情報記録装置
JPS60214334A (ja) * 1984-04-11 1985-10-26 Canon Inc 投影露光装置及び投影露光方法
JPS60181701A (ja) * 1984-02-29 1985-09-17 Toshiba Corp 光フアイバ結合用グレ−テイングレンズ
JPS60247611A (ja) * 1984-05-24 1985-12-07 Toshiba Corp 光学ヘツド
JPS6022738A (ja) * 1984-06-01 1985-02-05 Hitachi Ltd 情報処理装置
JPS6190029U (de) * 1984-11-19 1986-06-11
US4721362A (en) * 1985-05-31 1988-01-26 The United States Of America As Represented By The Secretary Of The Army Phase gradient contrast microscope
JPS62186585A (ja) * 1986-02-12 1987-08-14 Fuji Photo Film Co Ltd 半導体レ−ザ
US4704033A (en) * 1986-03-06 1987-11-03 Micronix Corporation Multiple wavelength linear zone plate alignment apparatus and method
JPS62229203A (ja) * 1986-03-31 1987-10-08 Toshiba Corp グレ−テイングレンズ
JPS62238502A (ja) * 1986-04-09 1987-10-19 Toshiba Corp グレ−テイングレンズ
US4895790A (en) * 1987-09-21 1990-01-23 Massachusetts Institute Of Technology High-efficiency, multilevel, diffractive optical elements
US4936665A (en) * 1987-10-25 1990-06-26 Whitney Theodore R High resolution imagery systems and methods

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JP2554601B2 (ja) 1996-11-13
JP2554600B2 (ja) 1996-11-13
JPH021109A (ja) 1990-01-05
JP2521235B2 (ja) 1996-08-07
JPH0772320A (ja) 1995-03-17
JPH0772319A (ja) 1995-03-17
EP0312341A2 (de) 1989-04-19
JPH0772429A (ja) 1995-03-17
EP0312341A3 (en) 1989-10-11
JP2867375B2 (ja) 1999-03-08
US4936665A (en) 1990-06-26
EP0312341B1 (de) 1995-01-11
DE3852744T2 (de) 1995-05-24
HK1006749A1 (en) 1999-03-12

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