DE69219183T2 - Herstellungsmethode für abgeschrägte Oberfläche mit vorbestimmter Neigung - Google Patents

Herstellungsmethode für abgeschrägte Oberfläche mit vorbestimmter Neigung

Info

Publication number
DE69219183T2
DE69219183T2 DE1992619183 DE69219183T DE69219183T2 DE 69219183 T2 DE69219183 T2 DE 69219183T2 DE 1992619183 DE1992619183 DE 1992619183 DE 69219183 T DE69219183 T DE 69219183T DE 69219183 T2 DE69219183 T2 DE 69219183T2
Authority
DE
Germany
Prior art keywords
manufacturing
beveled surface
predetermined slope
slope
predetermined
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE1992619183
Other languages
English (en)
Other versions
DE69219183D1 (de
Inventor
Greg E Blonder
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
AT&T Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by AT&T Corp filed Critical AT&T Corp
Publication of DE69219183D1 publication Critical patent/DE69219183D1/de
Application granted granted Critical
Publication of DE69219183T2 publication Critical patent/DE69219183T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/201—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
DE1992619183 1991-02-20 1992-02-11 Herstellungsmethode für abgeschrägte Oberfläche mit vorbestimmter Neigung Expired - Fee Related DE69219183T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US65814591A 1991-02-20 1991-02-20

Publications (2)

Publication Number Publication Date
DE69219183D1 DE69219183D1 (de) 1997-05-28
DE69219183T2 true DE69219183T2 (de) 1998-01-08

Family

ID=24640086

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1992619183 Expired - Fee Related DE69219183T2 (de) 1991-02-20 1992-02-11 Herstellungsmethode für abgeschrägte Oberfläche mit vorbestimmter Neigung

Country Status (3)

Country Link
EP (1) EP0499944B1 (de)
JP (1) JPH0588335A (de)
DE (1) DE69219183T2 (de)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10351034A1 (de) * 2003-10-31 2005-06-09 Infineon Technologies Ag Verfahren zum Ausbilden eines keilförmigen Werkstücks
DE202004010922U1 (de) * 2004-07-12 2005-11-24 Leica Geosystems Ag Neigungssensor

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4333620A1 (de) * 1993-10-15 1995-04-20 Jenoptik Technologie Gmbh Anordnung und Verfahren zur Erzeugung von Dosisprofilen für die Herstellung von Oberflächenprofilen
US6534425B1 (en) 1999-12-02 2003-03-18 Seagate Technology Llc Mask design and method for controlled profile fabrication
DE10038928A1 (de) * 2000-08-09 2002-02-28 Infineon Technologies Ag Photolithographische Maske
KR20060029412A (ko) * 2004-10-01 2006-04-06 삼성전자주식회사 마스크 및 이를 이용한 액정 표시 장치용 표시판의 제조방법
KR100873275B1 (ko) * 2007-03-19 2008-12-11 매그나칩 반도체 유한회사 이미지센서의 제조 방법

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07104590B2 (ja) * 1986-12-06 1995-11-13 株式会社クラレ 透過率変調型フォトマスク、その製法及びそれを用いる回折格子の製法
US4936665A (en) * 1987-10-25 1990-06-26 Whitney Theodore R High resolution imagery systems and methods
US4908656A (en) * 1988-01-21 1990-03-13 Nikon Corporation Method of dimension measurement for a pattern formed by exposure apparatus, and method for setting exposure conditions and for inspecting exposure precision
JPH02151862A (ja) * 1988-12-05 1990-06-11 Omron Tateisi Electron Co フォトリソグラフィ用マスクおよびその作製方法
US4912022A (en) * 1988-12-27 1990-03-27 Motorola, Inc. Method for sloping the profile of an opening in resist

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10351034A1 (de) * 2003-10-31 2005-06-09 Infineon Technologies Ag Verfahren zum Ausbilden eines keilförmigen Werkstücks
DE202004010922U1 (de) * 2004-07-12 2005-11-24 Leica Geosystems Ag Neigungssensor
US7299557B2 (en) 2004-07-12 2007-11-27 Leica Geosystems Ag Tilt sensor

Also Published As

Publication number Publication date
DE69219183D1 (de) 1997-05-28
EP0499944A1 (de) 1992-08-26
JPH0588335A (ja) 1993-04-09
EP0499944B1 (de) 1997-04-23

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Legal Events

Date Code Title Description
8332 No legal effect for de
8370 Indication of lapse of patent is to be deleted
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee