DE68924048T2 - Belichtungsmaske für ein Halbleiterplättchen und Belichtungsverfahren. - Google Patents

Belichtungsmaske für ein Halbleiterplättchen und Belichtungsverfahren.

Info

Publication number
DE68924048T2
DE68924048T2 DE68924048T DE68924048T DE68924048T2 DE 68924048 T2 DE68924048 T2 DE 68924048T2 DE 68924048 T DE68924048 T DE 68924048T DE 68924048 T DE68924048 T DE 68924048T DE 68924048 T2 DE68924048 T2 DE 68924048T2
Authority
DE
Germany
Prior art keywords
exposure
semiconductor wafer
mask
exposure method
exposure mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE68924048T
Other languages
English (en)
Other versions
DE68924048D1 (de
Inventor
Takeshi Kimura
Shinji Kuniyoshi
Akihiko Kishimoto
Takashi Soga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Application granted granted Critical
Publication of DE68924048D1 publication Critical patent/DE68924048D1/de
Publication of DE68924048T2 publication Critical patent/DE68924048T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70475—Stitching, i.e. connecting image fields to produce a device field, the field occupied by a device such as a memory chip, processor chip, CCD, flat panel display

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE68924048T 1988-12-23 1989-12-12 Belichtungsmaske für ein Halbleiterplättchen und Belichtungsverfahren. Expired - Fee Related DE68924048T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63323293A JPH02170410A (ja) 1988-12-23 1988-12-23 放射線露光用マスクおよびこれを用いた放射線露光方法

Publications (2)

Publication Number Publication Date
DE68924048D1 DE68924048D1 (de) 1995-10-05
DE68924048T2 true DE68924048T2 (de) 1996-04-18

Family

ID=18153170

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68924048T Expired - Fee Related DE68924048T2 (de) 1988-12-23 1989-12-12 Belichtungsmaske für ein Halbleiterplättchen und Belichtungsverfahren.

Country Status (4)

Country Link
US (1) US5115456A (de)
EP (1) EP0374701B1 (de)
JP (1) JPH02170410A (de)
DE (1) DE68924048T2 (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5235626A (en) * 1991-10-22 1993-08-10 International Business Machines Corporation Segmented mask and exposure system for x-ray lithography
SG43954A1 (en) * 1991-11-15 1997-11-14 Canon Kk X-ray mask structure and x-ray exposing method and semiconductor device manufactured by use of x-ray mask structure and method for manufacturing x-ray mask structure
US5263073A (en) * 1991-12-20 1993-11-16 Board Of Supervisors Of Louisiana State University And Agricultural And Mechanical College Scanning systems for high resolution E-beam and X-ray lithography
JPH07159974A (ja) * 1993-12-09 1995-06-23 Ryoden Semiconductor Syst Eng Kk パターン転写マスクおよびその製造方法
US5491643A (en) * 1994-02-04 1996-02-13 Stratasys, Inc. Method for optimizing parameters characteristic of an object developed in a rapid prototyping system
JP3287725B2 (ja) * 1994-06-07 2002-06-04 キヤノン株式会社 露光方法とこれを用いたデバイス製造方法
US5548625A (en) * 1995-03-02 1996-08-20 Motorola, Inc. Method for parallel multiple field processing in X-ray lithography
JPH10106943A (ja) * 1996-06-04 1998-04-24 Nikon Corp マスク用基板の製造方法
US5781607A (en) * 1996-10-16 1998-07-14 Ibm Corporation Membrane mask structure, fabrication and use
JPH10135103A (ja) * 1996-10-25 1998-05-22 Nikon Corp 荷電粒子線転写用マスクまたはｘ線転写用マスクの製造方法
US6180289B1 (en) 1997-07-23 2001-01-30 Nikon Corporation Projection-microlithography mask with separate mask substrates
US6009143A (en) * 1997-08-08 1999-12-28 International Business Machines Corporation Mirror for providing selective exposure in X-ray lithography
JPH11142121A (ja) 1997-11-11 1999-05-28 Nikon Corp レチクルの歪み計測方法および歪み計測装置
US6713842B1 (en) * 1999-08-18 2004-03-30 Advanced Micro Devices, Inc. Mask for and method of forming a character on a substrate
JP2002110537A (ja) 2000-07-19 2002-04-12 Nikon Corp マスク描画用電子線露光装置
US6949638B2 (en) * 2001-01-29 2005-09-27 Affymetrix, Inc. Photolithographic method and system for efficient mask usage in manufacturing DNA arrays
JP3674573B2 (ja) * 2001-06-08 2005-07-20 ソニー株式会社 マスクおよびその製造方法と半導体装置の製造方法
US7045904B2 (en) * 2003-12-10 2006-05-16 Texas Instruments Incorporated Patterned plasma treatment to improve distribution of underfill material
JP5090780B2 (ja) * 2007-04-26 2012-12-05 株式会社オーク製作所 露光描画装置
JP2010271589A (ja) * 2009-05-22 2010-12-02 Renesas Electronics Corp パターン分割方法、パターン分割処理装置及びコンピュータプログラム

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3742230A (en) * 1972-06-29 1973-06-26 Massachusetts Inst Technology Soft x-ray mask support substrate
US3873824A (en) * 1973-10-01 1975-03-25 Texas Instruments Inc X-ray lithography mask
US3974382A (en) * 1975-01-06 1976-08-10 Massachusetts Institute Of Technology Lithographic mask attraction system
US4301237A (en) * 1979-07-12 1981-11-17 Western Electric Co., Inc. Method for exposing substrates to X-rays
US4260670A (en) * 1979-07-12 1981-04-07 Western Electric Company, Inc. X-ray mask
JPS57211732A (en) * 1981-06-24 1982-12-25 Toshiba Corp X ray exposing mask and manufacture thereof
JPS6318353A (ja) * 1986-07-10 1988-01-26 Toppan Printing Co Ltd 電子写真感光体
JPS6318351A (ja) * 1986-07-11 1988-01-26 Hitachi Micro Comput Eng Ltd パタ−ン形成用マスク
JPS6318352A (ja) * 1986-07-11 1988-01-26 Agency Of Ind Science & Technol 分割露光用マスク
JPH0746681B2 (ja) * 1986-10-28 1995-05-17 富士通株式会社 Ｘ線ステッパー用マスクの製造方法
DE68924122T2 (de) * 1988-10-20 1996-05-09 Fujitsu Ltd Herstellungsverfahren für Halbleitervorrichtungen und durchsichtige Maske für den geladenen Teilchenstrahl.

Also Published As

Publication number Publication date
US5115456A (en) 1992-05-19
JPH02170410A (ja) 1990-07-02
DE68924048D1 (de) 1995-10-05
EP0374701A2 (de) 1990-06-27
EP0374701A3 (de) 1991-05-08
EP0374701B1 (de) 1995-08-30

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee