DE68921237D1 - Maskenstruktur für Lithographie und Einpassvorrichtung dafür. - Google Patents

Maskenstruktur für Lithographie und Einpassvorrichtung dafür.

Info

Publication number
DE68921237D1
DE68921237D1 DE68921237T DE68921237T DE68921237D1 DE 68921237 D1 DE68921237 D1 DE 68921237D1 DE 68921237 T DE68921237 T DE 68921237T DE 68921237 T DE68921237 T DE 68921237T DE 68921237 D1 DE68921237 D1 DE 68921237D1
Authority
DE
Germany
Prior art keywords
lithography
fitting device
mask structure
device therefor
therefor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE68921237T
Other languages
English (en)
Other versions
DE68921237T2 (de
Inventor
Hirofumi Shibata
Yasuaki Fukuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of DE68921237D1 publication Critical patent/DE68921237D1/de
Application granted granted Critical
Publication of DE68921237T2 publication Critical patent/DE68921237T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7007—Alignment other than original with workpiece
    • G03F9/7011—Pre-exposure scan; original with original holder alignment; Prealignment, i.e. workpiece with workpiece holder
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE68921237T 1988-04-28 1989-04-26 Maskenstruktur für Lithographie und Einpassvorrichtung dafür. Expired - Fee Related DE68921237T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63107061A JPH01278019A (ja) 1988-04-28 1988-04-28 リソグラフィ用マスクの構造体

Publications (2)

Publication Number Publication Date
DE68921237D1 true DE68921237D1 (de) 1995-03-30
DE68921237T2 DE68921237T2 (de) 1995-07-20

Family

ID=14449504

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68921237T Expired - Fee Related DE68921237T2 (de) 1988-04-28 1989-04-26 Maskenstruktur für Lithographie und Einpassvorrichtung dafür.

Country Status (4)

Country Link
US (1) US5042945A (de)
EP (1) EP0339953B1 (de)
JP (1) JPH01278019A (de)
DE (1) DE68921237T2 (de)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04332115A (ja) * 1991-05-02 1992-11-19 Shin Etsu Chem Co Ltd Ｘ線リソグラフィ−マスク用ｘ線透過膜
JP3012069B2 (ja) * 1991-12-04 2000-02-21 キヤノン株式会社 Ｘ線露光用マスク構造体及びこれを用いたｘ線露光装置
JP2746511B2 (ja) * 1993-03-04 1998-05-06 信越半導体株式会社 単結晶インゴットのオリエンテーションフラット幅測定方法
US5436721A (en) * 1993-06-04 1995-07-25 Advanced Micro Devices, Inc. Wafer tilt gauge
US5383016A (en) * 1993-07-15 1995-01-17 At&T Corp. Method for aligning two reflective surfaces
JPH098103A (ja) * 1995-06-19 1997-01-10 Nikon Corp 投影露光装置及び投影露光方法
US5982481A (en) * 1996-10-01 1999-11-09 Mcdonnell Douglas Corporation Alignment system and method for dish concentrators
US5874770A (en) * 1996-10-10 1999-02-23 General Electric Company Flexible interconnect film including resistor and capacitor layers
US5760483A (en) * 1996-12-23 1998-06-02 International, Business Machines Corporation Method for improving visibility of alignment targets in semiconductor processing
US6162564A (en) * 1997-11-25 2000-12-19 Kabushiki Kaisha Toshiba Mask blank and method of producing mask
US6083806A (en) * 1998-07-06 2000-07-04 Motorola, Inc. Method of forming an alignment mark
US6630746B1 (en) 2000-05-09 2003-10-07 Motorola, Inc. Semiconductor device and method of making the same
JP4635610B2 (ja) * 2005-01-07 2011-02-23 凸版印刷株式会社 反射型フォトマスクブランク、反射型フォトマスク、及び反射型フォトマスクの製造方法
JP4855060B2 (ja) * 2005-12-14 2012-01-18 独立行政法人科学技術振興機構 光学素子製造方法
JP5801796B2 (ja) * 2010-03-31 2015-10-28 Hoya株式会社 レンズ形状測定装置
TR201811449T4 (tr) * 2012-11-07 2018-09-21 Artec Europe S A R L Üç boyutlu nesnelerin doğrusal boyutlarını gözetlemek için yöntem.
CN105452802B (zh) * 2013-07-19 2019-02-01 株式会社尼康 形状测定装置、构造物制造系统、形状测定方法、构造物制造方法、形状测定程序、以及记录介质
US20170052024A1 (en) * 2015-08-21 2017-02-23 Adcole Corporation Optical profiler and methods of use thereof
JP6516665B2 (ja) * 2015-10-29 2019-05-22 信越化学工業株式会社 Ｅｕｖリソグラフィー用ペリクルに適した接着剤とこれを用いたペリクル

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3449961A (en) * 1964-12-28 1969-06-17 Gen Electric Optical readout systems
US3583815A (en) * 1969-05-01 1971-06-08 Nasa Angular displacement indicating gas bearing support system
US3657792A (en) * 1970-11-13 1972-04-25 Identicon Corp Scanning mirror alignment techniques
US3695767A (en) * 1970-11-18 1972-10-03 Burroughs Corp Apparatus for measuring magnetic head angle of a magnetic disc file
US3954339A (en) * 1974-08-22 1976-05-04 The Perkin-Elmer Corporation Angular sensor
US4573791A (en) * 1979-04-03 1986-03-04 Optimetrix Corporation Step-and-repeat projection alignment and exposure system
JPS5610928A (en) * 1979-07-07 1981-02-03 Shinetsu Sekiei Kk Preparation of electronic device
US4298281A (en) * 1979-07-16 1981-11-03 Libbey-Owens-Ford Company Laser system for aligning conveyor rolls
US4801208A (en) * 1984-11-19 1989-01-31 Nikon Corporation Projection type exposing apparatus

Also Published As

Publication number Publication date
EP0339953A2 (de) 1989-11-02
JPH01278019A (ja) 1989-11-08
US5042945A (en) 1991-08-27
EP0339953A3 (en) 1990-10-24
DE68921237T2 (de) 1995-07-20
EP0339953B1 (de) 1995-02-22

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee