DE69129925D1 - Kompaktes Ausrichtsystem für Maske und Halbleiterscheibe - Google Patents

Kompaktes Ausrichtsystem für Maske und Halbleiterscheibe

Info

Publication number
DE69129925D1
DE69129925D1 DE69129925T DE69129925T DE69129925D1 DE 69129925 D1 DE69129925 D1 DE 69129925D1 DE 69129925 T DE69129925 T DE 69129925T DE 69129925 T DE69129925 T DE 69129925T DE 69129925 D1 DE69129925 D1 DE 69129925D1
Authority
DE
Germany
Prior art keywords
mask
semiconductor wafer
alignment system
compact alignment
compact
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69129925T
Other languages
English (en)
Other versions
DE69129925T2 (de
Inventor
Shinichiro Aoki
Takeo Sato
Masaki Yamamoto
Hiroyuki Takeuchi
Nobuhiro Araki
Yoshiyuki Sugiyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Publication of DE69129925D1 publication Critical patent/DE69129925D1/de
Application granted granted Critical
Publication of DE69129925T2 publication Critical patent/DE69129925T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7065—Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
DE69129925T 1990-05-25 1991-05-24 Kompaktes Ausrichtsystem für Maske und Halbleiterscheibe Expired - Fee Related DE69129925T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2135919A JPH0430414A (ja) 1990-05-25 1990-05-25 位置決め装置

Publications (2)

Publication Number Publication Date
DE69129925D1 true DE69129925D1 (de) 1998-09-10
DE69129925T2 DE69129925T2 (de) 1999-03-18

Family

ID=15162918

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69129925T Expired - Fee Related DE69129925T2 (de) 1990-05-25 1991-05-24 Kompaktes Ausrichtsystem für Maske und Halbleiterscheibe

Country Status (4)

Country Link
US (1) US5194744A (de)
EP (1) EP0458354B1 (de)
JP (1) JPH0430414A (de)
DE (1) DE69129925T2 (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5424839A (en) * 1993-03-01 1995-06-13 Hughes Training, Inc. Method and apparatus for aligning visual images with visual display devices
US5654553A (en) * 1993-06-10 1997-08-05 Nikon Corporation Projection exposure apparatus having an alignment sensor for aligning a mask image with a substrate
US5477057A (en) * 1994-08-17 1995-12-19 Svg Lithography Systems, Inc. Off axis alignment system for scanning photolithography
US5477058A (en) * 1994-11-09 1995-12-19 Kabushiki Kaisha Toshiba Attenuated phase-shifting mask with opaque reticle alignment marks
KR0186068B1 (ko) * 1995-12-27 1999-04-01 문정환 리소그라피 장치의 위치 정렬 시스템
US6088089A (en) * 1996-06-28 2000-07-11 G. Rodenstock Instruments Gmbh Process and device for measuring the optical properties of spectacle lenses by means of an optical detector of engravings in the spectacle lenses
US6099596A (en) 1997-07-23 2000-08-08 Applied Materials, Inc. Wafer out-of-pocket detection tool
US6197117B1 (en) * 1997-07-23 2001-03-06 Applied Materials, Inc. Wafer out-of-pocket detector and susceptor leveling tool
US6950188B2 (en) * 2003-04-23 2005-09-27 International Business Machines Corporation Wafer alignment system using parallel imaging detection
JP4927557B2 (ja) * 2003-11-24 2012-05-09 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ ディスプレイ内蔵ミラー
US7466411B2 (en) * 2005-05-26 2008-12-16 Inphase Technologies, Inc. Replacement and alignment of laser
NL2003497A (en) * 2008-09-23 2010-03-24 Asml Netherlands Bv Lithographic system, lithographic method and device manufacturing method.
US20140240705A1 (en) * 2013-02-27 2014-08-28 Kabushiki Kaisha Toshiba Semiconductor device, reticle method for checking position misalignment and method for manufacturing position misalignment checking mark
WO2021078474A1 (en) * 2019-10-21 2021-04-29 Asml Holding N.V. Apparatus for and method of sensing alignment marks

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53135653A (en) * 1977-05-01 1978-11-27 Canon Inc Photoelectric detecting optical device
JPH0619280B2 (ja) * 1983-09-24 1994-03-16 名古屋大学長 光学式自動位置決め装置
US4631416A (en) * 1983-12-19 1986-12-23 Hewlett-Packard Company Wafer/mask alignment system using diffraction gratings
JPS60144937A (ja) * 1984-01-05 1985-07-31 Nippon Kogaku Kk <Nikon> アライメントマ−クの検出装置
DE3573864D1 (en) * 1984-11-13 1989-11-23 Hitachi Ltd Alignment method for reduction projection type aligner
JPH0715368B2 (ja) * 1985-09-05 1995-02-22 株式会社ニコン 位置ずれ検出装置
JPH0666241B2 (ja) * 1985-10-14 1994-08-24 株式会社日立製作所 位置検出方法
US4697087A (en) * 1986-07-31 1987-09-29 The Perkin-Elmer Corporation Reverse dark field alignment system for scanning lithographic aligner
JPH01242904A (ja) * 1988-03-25 1989-09-27 Hitachi Ltd アライメント装置
JP2642392B2 (ja) * 1988-04-05 1997-08-20 株式会社東芝 Ｔｔｌアライメント装置
JP2773147B2 (ja) * 1988-08-19 1998-07-09 株式会社ニコン 露光装置の位置合わせ装置及び方法

Also Published As

Publication number Publication date
JPH0430414A (ja) 1992-02-03
EP0458354B1 (de) 1998-08-05
EP0458354A3 (en) 1992-08-05
EP0458354A2 (de) 1991-11-27
US5194744A (en) 1993-03-16
DE69129925T2 (de) 1999-03-18

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee