DE3788500D1 - Bipolarer Halbleitertransistor. - Google Patents
Bipolarer Halbleitertransistor.Info
- Publication number
- DE3788500D1 DE3788500D1 DE87309580T DE3788500T DE3788500D1 DE 3788500 D1 DE3788500 D1 DE 3788500D1 DE 87309580 T DE87309580 T DE 87309580T DE 3788500 T DE3788500 T DE 3788500T DE 3788500 D1 DE3788500 D1 DE 3788500D1
- Authority
- DE
- Germany
- Prior art keywords
- semiconductor transistor
- bipolar semiconductor
- bipolar
- transistor
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/0684—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape, relative sizes or dispositions of the semiconductor regions or junctions between the regions
- H01L29/0692—Surface layout
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/41—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions
- H01L29/417—Electrodes ; Multistep manufacturing processes therefor characterised by their shape, relative sizes or dispositions carrying the current to be rectified, amplified or switched
- H01L29/41708—Emitter or collector electrodes for bipolar transistors
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Bipolar Transistors (AREA)
- Bipolar Integrated Circuits (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61260994A JPS63114259A (ja) | 1986-10-31 | 1986-10-31 | バイポ−ラ型トランジスタ |
JP61289424A JPS63142674A (ja) | 1986-12-04 | 1986-12-04 | バイポ−ラ型トランジスタ |
Publications (2)
Publication Number | Publication Date |
---|---|
DE3788500D1 true DE3788500D1 (de) | 1994-01-27 |
DE3788500T2 DE3788500T2 (de) | 1994-04-28 |
Family
ID=26544855
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE87309580T Expired - Fee Related DE3788500T2 (de) | 1986-10-31 | 1987-10-29 | Bipolarer Halbleitertransistor. |
Country Status (4)
Country | Link |
---|---|
US (1) | US4994880A (de) |
EP (1) | EP0266205B1 (de) |
KR (1) | KR900008150B1 (de) |
DE (1) | DE3788500T2 (de) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0784647B2 (ja) * | 1988-09-15 | 1995-09-13 | 日本電装株式会社 | ニッケル膜およびそれを形成するスパッタリング方法 |
US5229313A (en) * | 1989-09-29 | 1993-07-20 | Mitsubishi Denki Kabushiki Kaisha | Method of making a semiconductor device having multilayer structure |
US5111267A (en) * | 1989-09-29 | 1992-05-05 | Mitsubishi Denki Kabushiki Kaisha | Semiconductor device having a multilayer electrode structure and method for fabricating the same |
JPH07101736B2 (ja) * | 1990-06-28 | 1995-11-01 | 日本電装株式会社 | 半導体装置およびその製造方法 |
DE69223868T2 (de) * | 1991-07-17 | 1998-09-03 | Denso Corp | Verfahren zur Herstellung von Elektroden eines Halbleiterbauelements |
US5352924A (en) * | 1993-04-14 | 1994-10-04 | Texas Instruments Incorporated | Bipolar layout for improved performance |
JPH0786430A (ja) * | 1993-09-14 | 1995-03-31 | Mitsubishi Electric Corp | 半導体装置およびその製造方法 |
US5488252A (en) * | 1994-08-16 | 1996-01-30 | Telefonaktiebolaget L M Erricsson | Layout for radio frequency power transistors |
JP3253468B2 (ja) * | 1994-12-05 | 2002-02-04 | シャープ株式会社 | 半導体装置 |
NL1001062C2 (nl) | 1995-08-25 | 1997-02-27 | Tno | Membraan en werkwijze voor het scheiden van aromatische koolwaterstoffen uit een mengsel van diverse aromatische koolwaterstoffen of uit een mengsel van dergelijke aromatische koolwaterstoffen en niet-aromatische koolwaterstoffen. |
KR100471520B1 (ko) * | 1996-07-03 | 2005-04-14 | 코닌클리케 필립스 일렉트로닉스 엔.브이. | 반도체디바이스 |
JP2002203957A (ja) * | 2000-12-28 | 2002-07-19 | Rohm Co Ltd | トランジスタ |
IT1319755B1 (it) * | 2000-12-28 | 2003-11-03 | St Microelectronics Srl | Dispositivo integrato in configurazione emitter-switching e relativoprocesso di fabbricazione |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1514880B2 (de) * | 1965-10-12 | 1972-02-17 | Telefunken Patentverwertungsgesellschaft Mbh, 7900 Ulm | Transistor zur verstaerkungsregelung insbesondere planar oder mesa transistor |
DE1764455C3 (de) * | 1968-06-08 | 1980-02-07 | Robert Bosch Gmbh, 7000 Stuttgart | Monolithisch integrierte Darlington-Transistorschaltung |
US3609460A (en) * | 1968-06-28 | 1971-09-28 | Rca Corp | Power transistor having ballasted emitter fingers interdigitated with base fingers |
NL165888C (nl) * | 1970-10-10 | 1981-05-15 | Philips Nv | Halfgeleiderinrichting met een halfgeleiderlichaam bevattende een collectorzone, een basiszone en een emitterzone waarbij de emitterzone ten minste twee strookvormige onderling evenwijdige emittergebieden bevat, die uit afwisselend smallere en bredere delen bestaan. |
US3836996A (en) * | 1973-09-26 | 1974-09-17 | Rca Corp | Semiconductor darlington circuit |
JPS6020905B2 (ja) * | 1977-04-07 | 1985-05-24 | ソニー株式会社 | 半導体装置 |
US4167748A (en) * | 1978-07-03 | 1979-09-11 | Bell Telephone Laboratories, Incorporated | High voltage monolithic transistor circuit |
JPS5559767A (en) * | 1978-10-30 | 1980-05-06 | Hitachi Ltd | Semiconductor device, method of fabricating the same and application thereof |
JPS5650562A (en) * | 1979-10-02 | 1981-05-07 | Mitsubishi Electric Corp | Transistor |
JPS57162462A (en) * | 1981-03-31 | 1982-10-06 | Toshiba Corp | Semiconductor device |
JPS58145152A (ja) * | 1982-02-23 | 1983-08-29 | Mitsubishi Electric Corp | ダ−リントン接続構造のトランジスタ |
US4435174A (en) * | 1982-04-12 | 1984-03-06 | American Hospital Supply Corporation | Catheter guide |
FR2529389A1 (fr) * | 1982-06-25 | 1983-12-30 | Thomson Csf | Transistor de commutation de puissance a structure digitee |
JPS6022366A (ja) * | 1983-07-18 | 1985-02-04 | Mitsubishi Electric Corp | ダ−リントン接続形トランジスタ |
JPS60154552A (ja) * | 1984-01-23 | 1985-08-14 | Mitsubishi Electric Corp | 電力用半導体装置 |
JPS61159762A (ja) * | 1984-12-31 | 1986-07-19 | Sanken Electric Co Ltd | 半導体装置 |
-
1987
- 1987-10-29 DE DE87309580T patent/DE3788500T2/de not_active Expired - Fee Related
- 1987-10-29 EP EP87309580A patent/EP0266205B1/de not_active Expired - Lifetime
- 1987-10-30 KR KR1019870012062A patent/KR900008150B1/ko not_active IP Right Cessation
-
1989
- 1989-09-25 US US07/412,552 patent/US4994880A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
KR900008150B1 (ko) | 1990-11-03 |
US4994880A (en) | 1991-02-19 |
KR880008455A (ko) | 1988-08-31 |
EP0266205A3 (en) | 1990-02-07 |
DE3788500T2 (de) | 1994-04-28 |
EP0266205B1 (de) | 1993-12-15 |
EP0266205A2 (de) | 1988-05-04 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8320 | Willingness to grant licences declared (paragraph 23) | ||
8339 | Ceased/non-payment of the annual fee |