IT1319755B1 - Dispositivo integrato in configurazione emitter-switching e relativoprocesso di fabbricazione - Google Patents

Dispositivo integrato in configurazione emitter-switching e relativoprocesso di fabbricazione

Info

Publication number
IT1319755B1
IT1319755B1 IT2000MI002836A ITMI20002836A IT1319755B1 IT 1319755 B1 IT1319755 B1 IT 1319755B1 IT 2000MI002836 A IT2000MI002836 A IT 2000MI002836A IT MI20002836 A ITMI20002836 A IT MI20002836A IT 1319755 B1 IT1319755 B1 IT 1319755B1
Authority
IT
Italy
Prior art keywords
emitter
manufacturing process
integrated device
switching configuration
related manufacturing
Prior art date
Application number
IT2000MI002836A
Other languages
English (en)
Inventor
Sergio Tommaso Spampinato
Original Assignee
St Microelectronics Srl
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by St Microelectronics Srl filed Critical St Microelectronics Srl
Priority to IT2000MI002836A priority Critical patent/IT1319755B1/it
Priority to US10/032,289 priority patent/US6979883B2/en
Publication of ITMI20002836A1 publication Critical patent/ITMI20002836A1/it
Application granted granted Critical
Publication of IT1319755B1 publication Critical patent/IT1319755B1/it

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/06Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
    • H01L27/07Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common
    • H01L27/0744Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common without components of the field effect type
    • H01L27/075Bipolar transistors in combination with diodes, or capacitors, or resistors, e.g. lateral bipolar transistor, and vertical bipolar transistor and resistor
    • H01L27/0755Vertical bipolar transistor in combination with diodes, or capacitors, or resistors
    • H01L27/0761Vertical bipolar transistor in combination with diodes only

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Bipolar Transistors (AREA)
  • Bipolar Integrated Circuits (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)
IT2000MI002836A 2000-12-28 2000-12-28 Dispositivo integrato in configurazione emitter-switching e relativoprocesso di fabbricazione IT1319755B1 (it)

Priority Applications (2)

Application Number Priority Date Filing Date Title
IT2000MI002836A IT1319755B1 (it) 2000-12-28 2000-12-28 Dispositivo integrato in configurazione emitter-switching e relativoprocesso di fabbricazione
US10/032,289 US6979883B2 (en) 2000-12-28 2001-12-21 Integrated device in emitter-switching configuration and related manufacturing process

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT2000MI002836A IT1319755B1 (it) 2000-12-28 2000-12-28 Dispositivo integrato in configurazione emitter-switching e relativoprocesso di fabbricazione

Publications (2)

Publication Number Publication Date
ITMI20002836A1 ITMI20002836A1 (it) 2002-06-28
IT1319755B1 true IT1319755B1 (it) 2003-11-03

Family

ID=11446333

Family Applications (1)

Application Number Title Priority Date Filing Date
IT2000MI002836A IT1319755B1 (it) 2000-12-28 2000-12-28 Dispositivo integrato in configurazione emitter-switching e relativoprocesso di fabbricazione

Country Status (2)

Country Link
US (1) US6979883B2 (it)
IT (1) IT1319755B1 (it)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5048242B2 (ja) * 2005-11-30 2012-10-17 オンセミコンダクター・トレーディング・リミテッド 半導体装置及びその製造方法
US10290566B2 (en) * 2014-09-23 2019-05-14 Infineon Technologies Austria Ag Electronic component

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3788500T2 (de) * 1986-10-31 1994-04-28 Nippon Denso Co Bipolarer Halbleitertransistor.
EP0646965B1 (en) * 1993-09-17 1999-01-07 Co.Ri.M.Me. Consorzio Per La Ricerca Sulla Microelettronica Nel Mezzogiorno An integrated device with a bipolar transistor and a MOSFET transistor in an emitter switching configuration
US6127723A (en) * 1998-01-30 2000-10-03 Sgs-Thomson Microelectronics, S.R.L. Integrated device in an emitter-switching configuration
JP3707942B2 (ja) * 1998-12-17 2005-10-19 三菱電機株式会社 半導体装置とそれを用いた半導体回路
US6614633B1 (en) * 1999-03-19 2003-09-02 Denso Corporation Semiconductor device including a surge protecting circuit
KR100317622B1 (ko) * 1999-03-24 2001-12-22 구본준, 론 위라하디락사 박막트랜지스터 및 그의 제조방법

Also Published As

Publication number Publication date
ITMI20002836A1 (it) 2002-06-28
US20020109151A1 (en) 2002-08-15
US6979883B2 (en) 2005-12-27

Similar Documents

Publication Publication Date Title
DE60019913D1 (de) Halbleiterbauelement und Herstellungsverfahren
ATE342323T1 (de) Integriertes hydroisomerizierungs- und alkylierungsverfahren
SG94792A1 (en) Semiconductor display device and manufacturing method thereof
DE60128768D1 (de) Polierverfahren und vorrichtung
SG118068A1 (en) Semiconductor device and manufacturing method thereof
SG112805A1 (en) Semiconductor device and manufacturing method thereof
IL156619A0 (en) Semiconductor device and its manufacturing method
IT1316871B1 (it) Dispositivo elettronico integrato monoliticamente e relativo processodi fabbricazione
DE60202136D1 (de) Cache-eintrag-auswahlverfahren und -vorrichtung
DE60119418D1 (de) Gesichtsbildaufnehmendes Erkennungsgerät und Passprüfungsgerät
HK1041558A1 (zh) 半導體裝置及其製造方法
DE60030931D1 (de) Halbleiteranordnung und Herstellungsverfahren dafür
DE50112013D1 (de) Deodorantien und antiperspirantien
DE60023103D1 (de) Lüfter und dessen Herstellungverfahren
DE50112910D1 (de) Navigationsverfahren und -vorrichtung
DE60142600D1 (de) Entwicklungsverfahren und -vorrichtung
DE60101217D1 (de) Quantumcascade-laser und sein herstellungsverfahren
DE50112616D1 (de) Faltverfahren und -vorrichtung
DE60132528D1 (de) Microlötverfahren und -vorrichtung
DE60232497D1 (de) Poliervorrichtung und -verfahren
DE60134189D1 (de) Halbleiteranordnung und Herstellungsverfahren
DE60143113D1 (de) Toner und herstellungsverfahren
DE60132129D1 (de) Halbleiterbauelement mit LDD-Struktur und dessen Herstellungsverfahren
EP1164640A4 (en) SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
DE60223197D1 (de) Flüssigkeitsausstossgerät und dazugehöriges Herstellungsverfahren