DE3680716D1 - Spektroskopievorrichtung fuer oberflaechenanalyse. - Google Patents

Spektroskopievorrichtung fuer oberflaechenanalyse.

Info

Publication number
DE3680716D1
DE3680716D1 DE8686303888T DE3680716T DE3680716D1 DE 3680716 D1 DE3680716 D1 DE 3680716D1 DE 8686303888 T DE8686303888 T DE 8686303888T DE 3680716 T DE3680716 T DE 3680716T DE 3680716 D1 DE3680716 D1 DE 3680716D1
Authority
DE
Germany
Prior art keywords
specimen
microscopy
surface analysis
devices
analysis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8686303888T
Other languages
English (en)
Inventor
Edmund M Cashell
Liam Mcdonnell
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TEKSCAN Ltd
Original Assignee
TEKSCAN Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TEKSCAN Ltd filed Critical TEKSCAN Ltd
Application granted granted Critical
Publication of DE3680716D1 publication Critical patent/DE3680716D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/2206—Combination of two or more measurements, at least one measurement being that of secondary emission, e.g. combination of secondary electron [SE] measurement and back-scattered electron [BSE] measurement
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N25/00—Investigating or analyzing materials by the use of thermal means
    • G01N25/72—Investigating presence of flaws
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/252—Tubes for spot-analysing by electron or ion beams; Microanalysers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/02—Details
    • H01J49/06—Electron- or ion-optical arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/44—Energy spectrometers, e.g. alpha-, beta-spectrometers
    • H01J49/46—Static spectrometers
    • H01J49/48—Static spectrometers using electrostatic analysers, e.g. cylindrical sector, Wien filter
    • H01J49/482—Static spectrometers using electrostatic analysers, e.g. cylindrical sector, Wien filter with cylindrical mirrors
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/1702—Systems in which incident light is modified in accordance with the properties of the material investigated with opto-acoustic detection, e.g. for gases or analysing solids

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
DE8686303888T 1985-05-21 1986-05-22 Spektroskopievorrichtung fuer oberflaechenanalyse. Expired - Fee Related DE3680716D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IE127885A IE58049B1 (en) 1985-05-21 1985-05-21 Surface analysis microscopy apparatus

Publications (1)

Publication Number Publication Date
DE3680716D1 true DE3680716D1 (de) 1991-09-12

Family

ID=11024790

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8686303888T Expired - Fee Related DE3680716D1 (de) 1985-05-21 1986-05-22 Spektroskopievorrichtung fuer oberflaechenanalyse.

Country Status (6)

Country Link
US (1) US4860224A (de)
EP (1) EP0202937B1 (de)
JP (1) JPS61271736A (de)
AT (1) ATE66069T1 (de)
DE (1) DE3680716D1 (de)
IE (1) IE58049B1 (de)

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DE3803424C2 (de) * 1988-02-05 1995-05-18 Gsf Forschungszentrum Umwelt Verfahren zur quantitativen, tiefendifferentiellen Analyse fester Proben
JP2759680B2 (ja) * 1989-07-19 1998-05-28 株式会社日立製作所 分析システム
US5036708A (en) * 1990-03-09 1991-08-06 North Dakota State University Rheo-photoacoustic ft-ir spectroscopic method and apparatus
JPH04357440A (ja) * 1990-08-20 1992-12-10 Shiseido Co Ltd 光音響セルおよび光音響測定装置
KR940007963A (ko) * 1992-09-03 1994-04-28 오오가 노리오 판그물 및 투과형 전자현미경용 시료의 연마방법
US5412211A (en) * 1993-07-30 1995-05-02 Electroscan Corporation Environmental scanning electron microscope
US5362964A (en) * 1993-07-30 1994-11-08 Electroscan Corporation Environmental scanning electron microscope
US5734164A (en) * 1996-11-26 1998-03-31 Amray, Inc. Charged particle apparatus having a canted column
FR2760528B1 (fr) * 1997-03-05 1999-05-21 Framatome Sa Procede et dispositif d'examen photothermique d'un materiau
FR2760529B1 (fr) * 1997-03-05 1999-05-28 Framatome Sa Procede d'examen photothermique d'une piece
US6236455B1 (en) * 1998-06-26 2001-05-22 Battelle Memorial Institute Photoacoustic spectroscopy sample cells and methods of photoacoustic spectroscopy
US6184523B1 (en) 1998-07-14 2001-02-06 Board Of Regents Of The University Of Nebraska High resolution charged particle-energy detecting, multiple sequential stage, compact, small diameter, retractable cylindrical mirror analyzer system, and method of use
JP2000268756A (ja) * 1999-03-12 2000-09-29 Toshiba Corp 荷電ビーム装置および荷電ビームの制御方法
JP4178741B2 (ja) * 2000-11-02 2008-11-12 株式会社日立製作所 荷電粒子線装置および試料作製装置
US6696692B1 (en) 2000-11-06 2004-02-24 Hrl Laboratories, Llc Process control methods for use with e-beam fabrication technology
AUPR749801A0 (en) * 2001-09-05 2001-09-27 Generation Technology Research Pty Ltd Apparatus for presenting a sample of material for analysis
US6995847B2 (en) 2002-05-24 2006-02-07 Honeywell International Inc. Methods and systems for substrate surface evaluation
US20090056475A1 (en) * 2002-11-27 2009-03-05 Takata Seat Belts, Inc. Seat belt comfort measuring system
US20060026807A1 (en) * 2003-08-07 2006-02-09 Carnevali Jeffrey D Quick release mounting apparatus
US7401527B2 (en) * 2006-10-11 2008-07-22 Toyota Motor Engineering & Manufacturing North America, Inc. Windshield wiper pressure sensor
US10505234B2 (en) 2011-03-14 2019-12-10 Battelle Memorial Institute Battery cell and n situ battery electrode analysis method
US8555710B2 (en) * 2011-03-14 2013-10-15 Battelle Memorial Institute Systems and methods for analyzing liquids under vacuum
US9274059B2 (en) 2011-03-14 2016-03-01 Battelle Memorial Institute Microfluidic electrochemical device and process for chemical imaging and electrochemical analysis at the electrode-liquid interface in-situ
US10598609B2 (en) 2011-03-14 2020-03-24 Battelle Memorial Institute Universal liquid sample device and process for high resolution transmission electron microscope imaging and multimodal analyses of liquid sample materials
CN103852479A (zh) * 2014-02-12 2014-06-11 中国科学院物理研究所 一种用于探索高效率光阴极材料的光发射阴极测试系统
CN104062312B (zh) * 2014-06-09 2017-04-12 清华大学 研究等离子体与材料表面相互作用的xps分析方法及系统
CN108760867B (zh) * 2018-03-13 2020-10-09 上海科技大学 Uhv设备互联的原位反应池与内置质谱电四极杆的联用结构
CN109444192B (zh) * 2018-11-27 2024-05-28 金华职业技术学院 一种脉冲激光加热的高压样品测试装置
US11101102B2 (en) * 2019-08-28 2021-08-24 The Board Of Trustees Of The Leland Stanford Junior University Photoabsorption microscopy using electron analysis
CN113008917B (zh) * 2021-03-19 2022-12-06 中国工程物理研究院机械制造工艺研究所 一种硬脆光学晶体表面损伤宏微观综合检测方法

Family Cites Families (20)

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JPS49118493A (de) * 1973-03-12 1974-11-12
DE2340372A1 (de) * 1973-08-09 1975-02-20 Max Planck Gesellschaft Doppelfokussierendes massenspektrometer hoher eingangsapertur
DE2347946A1 (de) * 1973-09-24 1975-04-10 Max Planck Gesellschaft Quadrupolfeld-massenanalysator hoher eingangsapertur
US3878392A (en) * 1973-12-17 1975-04-15 Etec Corp Specimen analysis with ion and electrom beams
US4050084A (en) * 1976-07-14 1977-09-20 Cbs Inc. Comb filter for television signals having adaptive features
FR2410271A1 (fr) * 1977-11-29 1979-06-22 Anvar Perfectionnements aux procedes de micro-analyse faisant intervenir un rayonnement x
GB1601890A (en) * 1978-05-31 1981-11-04 Sira Institute Apparatus and method for indicating stress in an object
US4334844A (en) * 1979-12-05 1982-06-15 Tokyo Metropolitan Government Replica film of specimen for electron microscopy apparatus
US4296323A (en) * 1980-03-10 1981-10-20 The Perkin-Elmer Corporation Secondary emission mass spectrometer mechanism to be used with other instrumentation
EP0057290A1 (de) * 1981-02-02 1982-08-11 Hoogovens Groep B.V. Temperaturabtaster
JPS59177846A (ja) * 1983-03-28 1984-10-08 Fujitsu Ltd 電子ビ−ム装置
JPS6037644A (ja) * 1983-08-10 1985-02-27 Anelva Corp 表面分析装置
GB8322017D0 (en) * 1983-08-16 1983-09-21 Vg Instr Ltd Charged particle energy spectrometer
US4578584A (en) * 1984-01-23 1986-03-25 International Business Machines Corporation Thermal wave microscopy using areal infrared detection
US4564758A (en) * 1984-02-01 1986-01-14 Cameca Process and device for the ionic analysis of an insulating sample
US4628468A (en) * 1984-04-13 1986-12-09 Exxon Production Research Co. Method and means for determining physical properties from measurements of microstructure in porous media
US4567767A (en) * 1984-05-14 1986-02-04 The Board Of Trustees Of The Leland Stanford Junior University Method and apparatus for very low temperature acoustic microscopy
JPS60243958A (ja) * 1984-05-18 1985-12-03 Hitachi Ltd イオンビ−ム装置
FR2575597B1 (fr) * 1984-12-28 1987-03-20 Onera (Off Nat Aerospatiale) Appareil pour la micro-analyse ionique a tres haute resolution d'un echantillon solide
US4680467A (en) * 1986-04-08 1987-07-14 Kevex Corporation Electron spectroscopy system for chemical analysis of electrically isolated specimens

Also Published As

Publication number Publication date
EP0202937B1 (de) 1991-08-07
EP0202937A2 (de) 1986-11-26
JPS61271736A (ja) 1986-12-02
EP0202937A3 (en) 1988-01-07
IE58049B1 (en) 1993-06-16
US4860224A (en) 1989-08-22
ATE66069T1 (de) 1991-08-15
IE851278L (en) 1986-11-22

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee