DE3535375C2 - - Google Patents
Info
- Publication number
- DE3535375C2 DE3535375C2 DE3535375A DE3535375A DE3535375C2 DE 3535375 C2 DE3535375 C2 DE 3535375C2 DE 3535375 A DE3535375 A DE 3535375A DE 3535375 A DE3535375 A DE 3535375A DE 3535375 C2 DE3535375 C2 DE 3535375C2
- Authority
- DE
- Germany
- Prior art keywords
- gel
- container
- dry
- sol
- gels
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 227
- 235000012239 silicon dioxide Nutrition 0.000 claims description 88
- 239000000243 solution Substances 0.000 claims description 72
- 239000000377 silicon dioxide Substances 0.000 claims description 40
- 238000000034 method Methods 0.000 claims description 26
- 238000004519 manufacturing process Methods 0.000 claims description 25
- 239000002245 particle Substances 0.000 claims description 18
- 150000004703 alkoxides Chemical class 0.000 claims description 14
- 229910052751 metal Inorganic materials 0.000 claims description 13
- 239000002184 metal Substances 0.000 claims description 13
- 230000001133 acceleration Effects 0.000 claims description 6
- 230000003301 hydrolyzing effect Effects 0.000 claims description 3
- 239000012267 brine Substances 0.000 claims description 2
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 claims description 2
- 239000000499 gel Substances 0.000 description 221
- 239000011521 glass Substances 0.000 description 70
- 238000010438 heat treatment Methods 0.000 description 65
- 239000010453 quartz Substances 0.000 description 57
- 230000015572 biosynthetic process Effects 0.000 description 36
- 238000005245 sintering Methods 0.000 description 34
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 33
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 29
- 238000001035 drying Methods 0.000 description 27
- 239000000463 material Substances 0.000 description 27
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 25
- -1 alkyl silicates Chemical class 0.000 description 25
- 238000005336 cracking Methods 0.000 description 22
- 230000007062 hydrolysis Effects 0.000 description 22
- 238000006460 hydrolysis reaction Methods 0.000 description 22
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 19
- 229910052799 carbon Inorganic materials 0.000 description 18
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 15
- 239000004743 Polypropylene Substances 0.000 description 15
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 15
- 229920001155 polypropylene Polymers 0.000 description 15
- 229920000915 polyvinyl chloride Polymers 0.000 description 15
- 239000004800 polyvinyl chloride Substances 0.000 description 15
- 238000003756 stirring Methods 0.000 description 15
- 239000013068 control sample Substances 0.000 description 14
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 13
- 235000011114 ammonium hydroxide Nutrition 0.000 description 13
- 238000005187 foaming Methods 0.000 description 13
- 238000004031 devitrification Methods 0.000 description 12
- 235000019270 ammonium chloride Nutrition 0.000 description 11
- 238000000926 separation method Methods 0.000 description 11
- 238000003980 solgel method Methods 0.000 description 11
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 10
- 229910002020 Aerosil® OX 50 Inorganic materials 0.000 description 9
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 9
- 239000006260 foam Substances 0.000 description 9
- 239000000203 mixture Substances 0.000 description 7
- 230000003287 optical effect Effects 0.000 description 7
- 239000002585 base Substances 0.000 description 6
- 238000012546 transfer Methods 0.000 description 6
- 239000013307 optical fiber Substances 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- 230000008602 contraction Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000011148 porous material Substances 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 229910002012 Aerosil® Inorganic materials 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 238000011835 investigation Methods 0.000 description 3
- 239000007791 liquid phase Substances 0.000 description 3
- 238000009210 therapy by ultrasound Methods 0.000 description 3
- 229910003902 SiCl 4 Inorganic materials 0.000 description 2
- 239000004115 Sodium Silicate Substances 0.000 description 2
- 239000003377 acid catalyst Substances 0.000 description 2
- 229910001413 alkali metal ion Inorganic materials 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 150000001722 carbon compounds Chemical class 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001879 gelation Methods 0.000 description 2
- 230000002209 hydrophobic effect Effects 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000005304 optical glass Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 2
- 229910052911 sodium silicate Inorganic materials 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- XVMSFILGAMDHEY-UHFFFAOYSA-N 6-(4-aminophenyl)sulfonylpyridin-3-amine Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=N1 XVMSFILGAMDHEY-UHFFFAOYSA-N 0.000 description 1
- 241000566113 Branta sandvicensis Species 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000006004 Quartz sand Substances 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229940075614 colloidal silicon dioxide Drugs 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 239000012611 container material Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000003670 easy-to-clean Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 229910021485 fumed silica Inorganic materials 0.000 description 1
- ZZUFCTLCJUWOSV-UHFFFAOYSA-N furosemide Chemical compound C1=C(Cl)C(S(=O)(=O)N)=CC(C(O)=O)=C1NCC1=CC=CO1 ZZUFCTLCJUWOSV-UHFFFAOYSA-N 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- CRNJBCMSTRNIOX-UHFFFAOYSA-N methanolate silicon(4+) Chemical compound [Si+4].[O-]C.[O-]C.[O-]C.[O-]C CRNJBCMSTRNIOX-UHFFFAOYSA-N 0.000 description 1
- 150000007530 organic bases Chemical class 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 230000001698 pyrogenic effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 230000008719 thickening Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000012549 training Methods 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 238000002604 ultrasonography Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/016—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by a liquid phase reaction process, e.g. through a gel phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/12—Other methods of shaping glass by liquid-phase reaction processes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
- C03C1/006—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S65/00—Glass manufacturing
- Y10S65/901—Liquid phase reaction process
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Manufacturing & Machinery (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Dispersion Chemistry (AREA)
- Glass Melting And Manufacturing (AREA)
- Silicon Compounds (AREA)
- Glass Compositions (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20891784A JPS6191023A (ja) | 1984-10-04 | 1984-10-04 | 管状石英ガラスの製造方法 |
| JP2600285A JPS61186232A (ja) | 1985-02-13 | 1985-02-13 | 管状石英ガラスの製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE3535375A1 DE3535375A1 (de) | 1986-04-10 |
| DE3535375C2 true DE3535375C2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1993-03-18 |
Family
ID=26363726
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19853535375 Granted DE3535375A1 (de) | 1984-10-04 | 1985-10-03 | Verfahren zur herstellung von roehrenfoermigem quarzglas |
Country Status (5)
Families Citing this family (42)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2165534B (en) * | 1984-10-05 | 1988-10-19 | Suwa Seikosha Kk | Method of preparing parent material for optical fibres |
| AU619301B2 (en) * | 1984-10-05 | 1992-01-23 | Seiko Epson Kabushiki Kaisha | A method of preparing doped silica glass |
| GB2165234B (en) * | 1984-10-05 | 1988-09-01 | Suwa Seikosha Kk | Methods of preparing doped silica glass |
| JPH07121813B2 (ja) * | 1985-07-16 | 1995-12-25 | セイコーエプソン株式会社 | 平板状石英ガラスの製造方法 |
| US5236483A (en) * | 1985-07-16 | 1993-08-17 | Seiko Epson Corporation | Method of preparing silica glass |
| DE3702025A1 (de) * | 1987-01-24 | 1988-08-04 | Philips Patentverwaltung | Verfahren und vorrichtung zur herstellung von rotationssymmetrischen poroesen festkoerpern |
| US4775401A (en) * | 1987-06-18 | 1988-10-04 | American Telephone And Telegraph Company, At&T Bell Laboratories | Method of producing an optical fiber |
| JP2624291B2 (ja) * | 1988-04-08 | 1997-06-25 | 松下電器産業株式会社 | 遠赤外線ヒータ |
| JPH0684254B2 (ja) * | 1988-06-29 | 1994-10-26 | 三菱電線工業株式会社 | 耐放射線性マルチプルファイバ |
| DE68900870D1 (de) * | 1988-09-21 | 1992-04-02 | American Telephone & Telegraph | Verfahren zur herstellung eines glaskoerpers. |
| JPH02124739A (ja) * | 1988-10-31 | 1990-05-14 | Shin Etsu Chem Co Ltd | 合成石英ガラスおよびその製造方法 |
| JPH0662311B2 (ja) * | 1988-12-07 | 1994-08-17 | シツプ‐ソシエタ・イタリアーナ・ペル・レセルチツイオ・デル・テレコミニカイオーニ・ピー・アー | シリカを基材としたファイバープリフォームのコアをドープする方法 |
| BE1004293A3 (fr) * | 1989-07-20 | 1992-10-27 | Solvay | Procede de fabrication d'un composite d'oxydes metalliques, poudres composites d'oxydes metalliques et materiaux ceramiques. |
| US5284500A (en) * | 1989-10-31 | 1994-02-08 | Fujitsu Limited | Process for fabricating an optical fiber preform |
| EP0611731B1 (en) * | 1989-10-31 | 1997-05-14 | Fujitsu Limited | Process for fabricating an optical fiber preform |
| JPH0823645B2 (ja) * | 1989-11-24 | 1996-03-06 | 松下電器産業株式会社 | 非線形光学薄膜及びその製造方法 |
| US5023208A (en) * | 1989-12-19 | 1991-06-11 | Orion Laboratories, Inc. | Sol-gel process for glass and ceramic articles |
| US5240488A (en) * | 1992-08-14 | 1993-08-31 | At&T Bell Laboratories | Manufacture of vitreous silica product via a sol-gel process using a polymer additive |
| US6528441B1 (en) * | 1992-10-28 | 2003-03-04 | Westinghouse Savannah River Company, L.L.C. | Hydrogen storage composition and method |
| US5364427A (en) * | 1993-07-16 | 1994-11-15 | At&T Bell Laboratories | Manufacture of optical fiber using sol-gel |
| US5567622A (en) * | 1995-07-05 | 1996-10-22 | The Aerospace Corporation | Sensor for detection of nitrogen dioxide and nitrogen tetroxide |
| DE19810132C2 (de) * | 1997-03-10 | 2002-02-07 | Samsung Electronics Co Ltd | Vorrichtung und Verfahren zur Herstellung eines rohrförmigen Glasmonolithen unter Anwendung eines Sol-Gel-Prozesses |
| KR100229900B1 (ko) * | 1997-03-10 | 1999-11-15 | 윤종용 | 솔-젤법을 이용한 실리카 유리 단일체의 제조방법 |
| KR100229884B1 (ko) * | 1997-03-10 | 1999-11-15 | 윤종용 | 솔-젤법을 이용한 고순도 실리카 유리의 제조방법 |
| CA2300147C (en) * | 1997-08-13 | 2008-10-14 | Trustees Of Princeton University (The) | Sol-gel coated polarization vessels |
| US6334338B1 (en) | 1998-07-02 | 2002-01-01 | Lucent Technologies Inc. | Sol gel process of making a fiber preform with removal of oxide particles |
| KR100322132B1 (ko) | 1999-01-29 | 2002-01-29 | 윤종용 | 졸-겔 공정용 실리카 글래스 조성물 |
| ITNO990004A1 (it) * | 1999-03-08 | 2000-09-08 | Gel Design And Engineering S R | Processo sol-gel per la produzione di manufatti contenenti e aderentiad un inserto cilindrico incomprimibile e manufatti cosi' ottenuti. |
| KR100549422B1 (ko) * | 1999-03-16 | 2006-02-06 | 삼성전자주식회사 | 졸-겔 공정용 실리카 글래스 조성물 및 이를 이용한 실리카 글래스의 제조방법 |
| US6648130B1 (en) * | 1999-08-11 | 2003-11-18 | Medi-Physics, Inc. | Hyperpolarized gas transport and storage devices and associated transport and storage methods using permanent magnets |
| KR100323821B1 (ko) * | 1999-08-26 | 2002-02-19 | 윤종용 | 튜브형 실리카 글래스 제조 방법 |
| DE10196206T1 (de) * | 2000-05-16 | 2003-07-17 | Lee Yoon Woo | Verfahren zur Herstellung von Schaumglas für feuerfestes thermisches Isolierungsmaterial |
| DE60123878T2 (de) * | 2000-06-28 | 2007-05-24 | Japan Super Quartz Corp. | Synthetisches Quarzpulver, Verfahren zur Herstellung und synthetischer Quarztiegel |
| IT1318617B1 (it) * | 2000-07-10 | 2003-08-27 | Novara Technology Srl | Processo sol-gel per la produzione di geli secchi di grandidimensioni e vetri derivati. |
| DE10141103B4 (de) * | 2001-08-22 | 2007-01-18 | Schott Ag | Verfahren zur Herstellung optischer Gläser und Farbgläser bei niederen Temperaturen |
| US7001568B2 (en) * | 2002-02-01 | 2006-02-21 | Simax Technologies, Inc. | Method of removing liquid from pores of a sol-gel monolith |
| US20030147606A1 (en) * | 2002-02-01 | 2003-08-07 | Shiho Wang | Sol-gel-based optical preforms and methods of manufacture |
| US7000885B2 (en) * | 2002-02-01 | 2006-02-21 | Simax Technologies, Inc. | Apparatus and method for forming a sol-gel monolith utilizing multiple casting |
| US20040194511A1 (en) * | 2002-02-01 | 2004-10-07 | Chih-Hsing Cheng | Sol-gel-derived halogen-doped glass |
| ES2360018T3 (es) * | 2008-08-08 | 2011-05-31 | Orion Tech Anstalt | Procesos de sol-gel para producir artículos monolíticos de sílice vítrea. |
| PL409679A1 (pl) * | 2014-10-06 | 2016-04-11 | Wrocławskie Centrum Badań Eit + Spółka Z Ograniczoną Odpowiedzialnością | Sposób wytwarzania pianosilikatów z domieszkami o właściwościach magnetycznych oraz pianosilikat wytworzony tym sposobem |
| EP3034476A1 (de) * | 2014-12-16 | 2016-06-22 | Heraeus Quarzglas GmbH & Co. KG | Verfahren zur herstellung von synthetischem quarzglas unter verwendung einer reinigungsvorrichtung |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3853521A (en) * | 1973-03-29 | 1974-12-10 | Int Standard Electric Corp | Method for making glass optical fibre preform |
| US4173459A (en) * | 1976-08-30 | 1979-11-06 | Siemens Aktiengesellschaft | Method for producing a light conducting fiber |
| FR2429040A1 (fr) * | 1978-06-23 | 1980-01-18 | Editions Filmees | Procede de fabrication de preforme pour fibres optiques |
| JPS55100231A (en) * | 1979-01-19 | 1980-07-31 | Hitachi Ltd | Production of optical fiber base material |
| EP0029590B1 (en) * | 1979-11-21 | 1984-03-21 | Hitachi, Ltd. | Method for producing optical glass |
| JPS5858292B2 (ja) * | 1980-01-21 | 1983-12-24 | 株式会社日立製作所 | シリカガラスの製造方法 |
| GB2075003B (en) * | 1980-04-28 | 1984-01-04 | Hitachi Ltd | Method for producing optical glass |
| FR2490211B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1980-09-17 | 1990-09-21 | Passaret Michel | |
| JPS57191221A (en) * | 1981-05-22 | 1982-11-25 | Hitachi Ltd | Production of porous substance |
| US4419115A (en) * | 1981-07-31 | 1983-12-06 | Bell Telephone Laboratories, Incorporated | Fabrication of sintered high-silica glasses |
| US4426216A (en) * | 1982-01-06 | 1984-01-17 | Hitachi, Ltd. | Process for producing optical glass |
| ATE25960T1 (de) * | 1982-01-15 | 1987-04-15 | Corning Glass Works | Verfahren zur herstellung von glas oder keramik. |
| EP0107943B1 (en) * | 1982-10-29 | 1986-12-17 | Dow Corning Corporation | Carbon-containing monolithic glasses prepared by a sol-gel process |
| EP0131057B1 (en) * | 1982-12-23 | 1987-11-04 | Suwa Seikosha Co. Ltd | Process for producing quartz glass |
| US4574063A (en) * | 1983-05-09 | 1986-03-04 | Corning Glass Works | Method of forming glass or ceramic article |
| JP2587605B2 (ja) * | 1983-06-27 | 1997-03-05 | コ−ニング・グラス・ワ−クス | ガラスまたはセラミック製品の製造方法 |
| WO1985002837A1 (en) * | 1983-12-22 | 1985-07-04 | American Telephone & Telegraph Company | Fabrication of high-silica glass article |
| GB2165534B (en) * | 1984-10-05 | 1988-10-19 | Suwa Seikosha Kk | Method of preparing parent material for optical fibres |
-
1985
- 1985-09-20 GB GB08523302A patent/GB2165233B/en not_active Expired
- 1985-10-01 US US06/782,333 patent/US4680045A/en not_active Expired - Lifetime
- 1985-10-03 FR FR8514655A patent/FR2571357A1/fr not_active Withdrawn
- 1985-10-03 DE DE19853535375 patent/DE3535375A1/de active Granted
- 1985-10-04 AU AU48311/85A patent/AU581687B2/en not_active Ceased
-
1987
- 1987-07-13 US US07/072,503 patent/US4786302A/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| GB2165233B (en) | 1988-03-09 |
| US4786302A (en) | 1988-11-22 |
| AU581687B2 (en) | 1989-03-02 |
| DE3535375A1 (de) | 1986-04-10 |
| FR2571357A1 (fr) | 1986-04-11 |
| GB2165233A (en) | 1986-04-09 |
| GB8523302D0 (en) | 1985-10-23 |
| US4680045A (en) | 1987-07-14 |
| AU4831185A (en) | 1986-04-10 |
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Legal Events
| Date | Code | Title | Description |
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| 8110 | Request for examination paragraph 44 | ||
| D2 | Grant after examination | ||
| 8364 | No opposition during term of opposition | ||
| 8328 | Change in the person/name/address of the agent |
Free format text: HOFFMANN, E., DIPL.-ING., PAT.-ANW., 82166 GRAEFELFING |
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| 8327 | Change in the person/name/address of the patent owner |
Owner name: SEIKO EPSON CORP., TOKIO/TOKYO, JP |