DE3462141D1 - Photopolymerization initiator and method of photopolymerization by use of said initiator - Google Patents

Photopolymerization initiator and method of photopolymerization by use of said initiator

Info

Publication number
DE3462141D1
DE3462141D1 DE8484302473T DE3462141T DE3462141D1 DE 3462141 D1 DE3462141 D1 DE 3462141D1 DE 8484302473 T DE8484302473 T DE 8484302473T DE 3462141 T DE3462141 T DE 3462141T DE 3462141 D1 DE3462141 D1 DE 3462141D1
Authority
DE
Germany
Prior art keywords
photopolymerization
initiator
photopolymerization initiator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8484302473T
Other languages
German (de)
English (en)
Inventor
Komai Takeshi
Shimizu Mamoru
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NOF Corp
Original Assignee
Nippon Oil and Fats Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Oil and Fats Co Ltd filed Critical Nippon Oil and Fats Co Ltd
Application granted granted Critical
Publication of DE3462141D1 publication Critical patent/DE3462141D1/de
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C409/00Peroxy compounds
    • C07C409/38Peroxy compounds the —O—O— group being bound between a >C=O group and a carbon atom, not further substituted by oxygen atoms, i.e. esters of peroxy acids
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
DE8484302473T 1983-04-26 1984-04-11 Photopolymerization initiator and method of photopolymerization by use of said initiator Expired DE3462141D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58072277A JPS59197401A (ja) 1983-04-26 1983-04-26 光重合開始剤

Publications (1)

Publication Number Publication Date
DE3462141D1 true DE3462141D1 (en) 1987-02-26

Family

ID=13484625

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8484302473T Expired DE3462141D1 (en) 1983-04-26 1984-04-11 Photopolymerization initiator and method of photopolymerization by use of said initiator

Country Status (4)

Country Link
US (2) US4970244A (cg-RX-API-DMAC7.html)
EP (1) EP0126541B1 (cg-RX-API-DMAC7.html)
JP (1) JPS59197401A (cg-RX-API-DMAC7.html)
DE (1) DE3462141D1 (cg-RX-API-DMAC7.html)

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US20120208914A1 (en) 2011-02-14 2012-08-16 Deepak Shukla Photoinitiator compositions and uses
JP5659189B2 (ja) * 2011-05-13 2015-01-28 富士フイルム株式会社 非共鳴2光子吸収材料、非共鳴2光子吸収記録材料、記録媒体、記録再生方法及び非共鳴2光子吸収化合物
WO2013083505A1 (en) 2011-12-07 2013-06-13 Basf Se Oxime ester photoinitiators
CN107652222B (zh) 2012-05-09 2021-09-10 巴斯夫欧洲公司 肟酯光敏引发剂
KR101804646B1 (ko) 2012-10-19 2017-12-04 바스프 에스이 하이브리드 광개시제
US10040810B2 (en) 2012-12-19 2018-08-07 Basf Se Derivatives of bisacylphosphinic acid, their preparation and use as photoinitiators
CN105358527B (zh) 2013-07-08 2018-09-25 巴斯夫欧洲公司 肟酯光引发剂
CN105339375A (zh) 2013-07-08 2016-02-17 巴斯夫欧洲公司 液态双酰基氧化膦光引发剂
CN105531260B (zh) 2013-09-10 2019-05-31 巴斯夫欧洲公司 肟酯光引发剂
CN106164206B (zh) 2014-03-27 2019-12-10 3M创新有限公司 填充的包含聚二有机硅氧烷的组合物及其使用方法
WO2016030790A1 (en) 2014-08-29 2016-03-03 Basf Se Oxime sulfonate derivatives
ES2798135T5 (es) 2014-09-04 2023-11-16 Igm Group B V Fotoiniciadores policíclicos
JP6671381B2 (ja) 2015-02-02 2020-03-25 ビーエーエスエフ ソシエタス・ヨーロピアBasf Se 潜在酸およびそれらの使用
WO2018041935A1 (en) 2016-09-02 2018-03-08 Igm Group B.V. Polycyclic glyoxylates as photoinitiators
KR20190091439A (ko) 2016-12-13 2019-08-06 니치유 가부시키가이샤 퍼옥시신나메이트 유도체, 그 화합물을 함유하는 중합성 조성물
WO2018221177A1 (ja) 2017-06-01 2018-12-06 日油株式会社 トリアジンペルオキシド誘導体、該化合物を含有する重合性組成物
JP6923130B2 (ja) * 2017-08-31 2021-08-18 学校法人東京理科大学 ペルオキシエステル基を有するベンゾフェノン誘導体、該化合物を含有する重合性組成物およびその硬化物、当該硬化物の製造方法
CN119874207A (zh) 2018-02-23 2025-04-25 巴斯夫欧洲公司 有机改性的金属氧化物或准金属氧化物聚合物膜
EP3847179A1 (en) 2018-09-07 2021-07-14 IGM Resins Italia S.r.l. Multifunctional bisacylphosphine oxide photoinitiators
KR102710878B1 (ko) 2018-09-26 2024-09-26 니치유 가부시키가이샤 티오크산톤 골격을 갖는 디알킬퍼옥사이드, 그 화합물을 함유하는 중합성 조성물
JP7472429B2 (ja) 2018-12-28 2024-04-23 アイジーエム レシンス イタリア ソチエタ レスポンサビリタ リミタータ 光開始剤
US20220121113A1 (en) 2019-01-23 2022-04-21 Basf Se Oxime ester photoinitiators having a special aroyl chromophore
GB2582002B (en) * 2019-03-07 2022-12-28 Henkel Ag & Co Kgaa One-part anaerobically curable compositions
WO2021070152A1 (en) 2019-10-11 2021-04-15 Igm Resins Italia S.R.L. Coumarin glyoxylates for led photocuring
WO2021175855A1 (en) 2020-03-04 2021-09-10 Basf Se Oxime ester photoinitiators
IT202000023815A1 (it) 2020-10-09 2022-04-09 Igm Resins Italia Srl Ketoquinolones as photonitiators
IT202100014885A1 (it) 2021-06-08 2022-12-08 Igm Resins Italia Srl Fotoiniziatori a base di silicio bifunzionali
IT202100025868A1 (it) 2021-10-08 2023-04-08 Igm Resins Italia Srl Nuovi fotoiniziatori
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IT202300004737A1 (it) 2023-03-14 2024-09-14 Igm Resins Italia Srl Uso di fotoiniziatori specifici in un processo di fotopolimerizzazione utilizzando lunghezze d’onda combinate di luce a led
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WO2025140854A2 (en) 2023-12-28 2025-07-03 Igm Resins Italia S.R.L. NOVEL SOLID FORM OF BIS(2,4,6-TRIMETHYLBENZOYL)-n-OCTYL-PHOSPHINE OXIDE
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Also Published As

Publication number Publication date
JPH0360322B2 (cg-RX-API-DMAC7.html) 1991-09-13
EP0126541B1 (en) 1987-01-21
JPS59197401A (ja) 1984-11-09
EP0126541A1 (en) 1984-11-28
US4777191A (en) 1988-10-11
US4970244A (en) 1990-11-13

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