DE3428408C2 - - Google Patents

Info

Publication number
DE3428408C2
DE3428408C2 DE3428408A DE3428408A DE3428408C2 DE 3428408 C2 DE3428408 C2 DE 3428408C2 DE 3428408 A DE3428408 A DE 3428408A DE 3428408 A DE3428408 A DE 3428408A DE 3428408 C2 DE3428408 C2 DE 3428408C2
Authority
DE
Germany
Prior art keywords
projection
imagesetter
mask
detection device
vibrations
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE3428408A
Other languages
German (de)
English (en)
Other versions
DE3428408A1 (de
Inventor
Kazuo Kawasaki Kanagawa Jp Takahashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of DE3428408A1 publication Critical patent/DE3428408A1/de
Application granted granted Critical
Publication of DE3428408C2 publication Critical patent/DE3428408C2/de
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation

Landscapes

  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE19843428408 1983-08-02 1984-08-01 Aufzeichnungsgeraet Granted DE3428408A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58140567A JPS6032050A (ja) 1983-08-02 1983-08-02 露光装置

Publications (2)

Publication Number Publication Date
DE3428408A1 DE3428408A1 (de) 1985-02-21
DE3428408C2 true DE3428408C2 (enExample) 1992-07-09

Family

ID=15271681

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19843428408 Granted DE3428408A1 (de) 1983-08-02 1984-08-01 Aufzeichnungsgeraet

Country Status (4)

Country Link
US (1) US4595282A (enExample)
JP (1) JPS6032050A (enExample)
DE (1) DE3428408A1 (enExample)
GB (1) GB2146133B (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19945690C1 (de) * 1999-09-23 2001-03-22 Mosel Vitelic Inc Ausrichtungssystem einer Wafer-Kaskade
DE102008026077A1 (de) * 2008-05-30 2009-12-10 Integrated Dynamics Engineering Gmbh Lithographiesystem und Verfahren zur Regelung eines Lithographiesystems

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61183928A (ja) * 1985-02-12 1986-08-16 Nippon Kogaku Kk <Nikon> 投影光学装置
US4724466A (en) * 1986-01-17 1988-02-09 Matsushita Electric Industrial Co., Ltd. Exposure apparatus
US4805000A (en) * 1986-01-17 1989-02-14 Matsushita Electric Industrial Co., Ltd. Exposure apparatus
JPH01284793A (ja) * 1988-05-11 1989-11-16 Canon Inc 基板支持装置
JP2627543B2 (ja) * 1988-09-05 1997-07-09 キヤノン株式会社 Ｓｏｒ露光システム
JP2631395B2 (ja) * 1988-09-09 1997-07-16 キヤノン株式会社 露光装置の制御方法
US5187519A (en) * 1990-10-05 1993-02-16 Canon Kabushiki Kaisha Exposure apparatus having mount means to suppress vibrations
NL9100407A (nl) * 1991-03-07 1992-10-01 Philips Nv Optisch lithografische inrichting met een krachtgecompenseerd machinegestel.
JPH05136023A (ja) * 1991-11-14 1993-06-01 Nikon Corp 投影露光装置
US5333035A (en) * 1992-05-15 1994-07-26 Nikon Corporation Exposing method
TW316874B (enExample) * 1995-05-30 1997-10-01 Philips Electronics Nv
JP3412981B2 (ja) * 1995-08-29 2003-06-03 キヤノン株式会社 投影露光装置および投影露光方法
US5760878A (en) * 1995-08-30 1998-06-02 Canon Kabushiki Kaisha Exposure apparatus and alignment discrimination method
KR100210569B1 (ko) * 1995-09-29 1999-07-15 미따라이 하지메 노광방법 및 노광장치, 그리고 이를 이용한 디바이스제조방법
JP3512945B2 (ja) * 1996-04-26 2004-03-31 株式会社東芝 パターン形成方法及びパターン形成装置
US5814733A (en) * 1996-09-12 1998-09-29 Motorola, Inc. Method of characterizing dynamics of a workpiece handling system
JP4194160B2 (ja) * 1998-02-19 2008-12-10 キヤノン株式会社 投影露光装置
WO2008110212A1 (en) * 2007-03-15 2008-09-18 Carl Zeiss Smt Ag Optical imaging arrangement
JP6000695B2 (ja) * 2011-07-08 2016-10-05 株式会社ニューフレアテクノロジー 荷電粒子ビーム描画装置及び荷電粒子ビーム描画方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2135425B1 (enExample) * 1971-05-04 1973-08-10 Thomson Csf
FR2371716A1 (fr) * 1976-11-19 1978-06-16 Thomson Csf Appareil photorepeteur de masques
JPS5885338U (ja) * 1981-12-07 1983-06-09 株式会社日立製作所 自動焦点装置
US4473292A (en) * 1982-02-09 1984-09-25 Censor Patent-Und Versuchsanstalt Dampening system

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19945690C1 (de) * 1999-09-23 2001-03-22 Mosel Vitelic Inc Ausrichtungssystem einer Wafer-Kaskade
DE102008026077A1 (de) * 2008-05-30 2009-12-10 Integrated Dynamics Engineering Gmbh Lithographiesystem und Verfahren zur Regelung eines Lithographiesystems
DE102008026077B4 (de) * 2008-05-30 2017-11-09 Integrated Dynamics Engineering Gmbh Lithographiesystem

Also Published As

Publication number Publication date
JPS6032050A (ja) 1985-02-19
JPH0362011B2 (enExample) 1991-09-24
GB8418929D0 (en) 1984-08-30
GB2146133A (en) 1985-04-11
DE3428408A1 (de) 1985-02-21
GB2146133B (en) 1986-12-03
US4595282A (en) 1986-06-17

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Legal Events

Date Code Title Description
8110 Request for examination paragraph 44
D2 Grant after examination
8364 No opposition during term of opposition