DE3339625A1 - Vorrichtung zum anreichern eines traegergases mit dem dampf eines wenig fluechtigen stoffes - Google Patents
Vorrichtung zum anreichern eines traegergases mit dem dampf eines wenig fluechtigen stoffesInfo
- Publication number
- DE3339625A1 DE3339625A1 DE19833339625 DE3339625A DE3339625A1 DE 3339625 A1 DE3339625 A1 DE 3339625A1 DE 19833339625 DE19833339625 DE 19833339625 DE 3339625 A DE3339625 A DE 3339625A DE 3339625 A1 DE3339625 A1 DE 3339625A1
- Authority
- DE
- Germany
- Prior art keywords
- carrier gas
- groove
- vessel
- gas
- substance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004744 fabric Substances 0.000 title 1
- 239000012159 carrier gas Substances 0.000 claims description 20
- 229910052751 metal Inorganic materials 0.000 claims description 17
- 239000002184 metal Substances 0.000 claims description 17
- 239000000126 substance Substances 0.000 claims description 17
- 239000007789 gas Substances 0.000 claims description 10
- 239000000203 mixture Substances 0.000 claims description 10
- 239000002245 particle Substances 0.000 claims description 3
- 239000007787 solid Substances 0.000 claims description 2
- 239000000843 powder Substances 0.000 description 7
- 239000007858 starting material Substances 0.000 description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 6
- 229910052802 copper Inorganic materials 0.000 description 6
- 239000010949 copper Substances 0.000 description 6
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 230000008020 evaporation Effects 0.000 description 4
- 238000001704 evaporation Methods 0.000 description 4
- 238000011049 filling Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- ZSLUVFAKFWKJRC-IGMARMGPSA-N 232Th Chemical compound [232Th] ZSLUVFAKFWKJRC-IGMARMGPSA-N 0.000 description 3
- 229910052776 Thorium Inorganic materials 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 150000002902 organometallic compounds Chemical class 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- FJSDGIUVZFHMSH-MTOQALJVSA-N (z)-4-hydroxypent-3-en-2-one;thorium Chemical compound [Th].C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O FJSDGIUVZFHMSH-MTOQALJVSA-N 0.000 description 1
- 101150006573 PAN1 gene Proteins 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- 230000003670 easy-to-clean Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 229910052756 noble gas Inorganic materials 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 150000002909 rare earth metal compounds Chemical class 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 238000010025 steaming Methods 0.000 description 1
- 150000003586 thorium compounds Chemical class 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 210000002268 wool Anatomy 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19833339625 DE3339625A1 (de) | 1983-11-02 | 1983-11-02 | Vorrichtung zum anreichern eines traegergases mit dem dampf eines wenig fluechtigen stoffes |
| GB08427276A GB2151662B (en) | 1983-11-02 | 1984-10-29 | Device for enriching a carrier gas with the vapour of a slightly volatile material for chemical vapour deposition method |
| FR8416553A FR2554131B1 (fr) | 1983-11-02 | 1984-10-30 | Procede pour enrichir un gaz vehicule de la vapeur d'une substance peu volatile |
| JP22903684A JPS61110766A (ja) | 1983-11-02 | 1984-11-01 | キヤリヤ−ガス富化用装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19833339625 DE3339625A1 (de) | 1983-11-02 | 1983-11-02 | Vorrichtung zum anreichern eines traegergases mit dem dampf eines wenig fluechtigen stoffes |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE3339625A1 true DE3339625A1 (de) | 1985-05-09 |
| DE3339625C2 DE3339625C2 (enExample) | 1991-01-31 |
Family
ID=6213274
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19833339625 Granted DE3339625A1 (de) | 1983-11-02 | 1983-11-02 | Vorrichtung zum anreichern eines traegergases mit dem dampf eines wenig fluechtigen stoffes |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPS61110766A (enExample) |
| DE (1) | DE3339625A1 (enExample) |
| FR (1) | FR2554131B1 (enExample) |
| GB (1) | GB2151662B (enExample) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0277680A1 (de) * | 1987-01-31 | 1988-08-10 | Philips Patentverwaltung GmbH | Vorrichtung zum Anreichern eines Trägergases mit dem Dampf eines wenig flüchtigen Stoffes |
| DE3927869A1 (de) * | 1988-08-31 | 1990-03-08 | Toyo Stauffer Chem Co | Verfahren zur herstellung von gesaettigtem dampf fester metallorganischer verbindungen fuer metallorganisch-chemische bedampfungsverfahren |
| DE3931189A1 (de) * | 1989-09-19 | 1991-03-28 | Philips Patentverwaltung | Vorrichtung und verfahren zum erzeugen eines mit dem dampf eines wenig fluechtigen stoffes angereicherten gasstroms |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3801147A1 (de) * | 1988-01-16 | 1989-07-27 | Philips Patentverwaltung | Vorrichtung zum erzeugen eines mit dem dampf eines wenig fluechtigen stoffes angereicherten gasstroms |
| JPH0513166U (ja) * | 1991-08-06 | 1993-02-23 | ダイワ精工株式会社 | 魚釣用リ−ルの釣糸止め装置 |
| DE19638100C1 (de) * | 1996-09-18 | 1998-03-05 | Fraunhofer Ges Forschung | Vorrichtung zum Erzeugen eines dampfförmigen Reaktionsproduktes aus Feststoffteilen |
| US7601225B2 (en) | 2002-06-17 | 2009-10-13 | Asm International N.V. | System for controlling the sublimation of reactants |
| US7186385B2 (en) | 2002-07-17 | 2007-03-06 | Applied Materials, Inc. | Apparatus for providing gas to a processing chamber |
| JP4585852B2 (ja) | 2002-07-30 | 2010-11-24 | エーエスエム アメリカ インコーポレイテッド | 基板処理システム、基板処理方法及び昇華装置 |
| US7156380B2 (en) | 2003-09-29 | 2007-01-02 | Asm International, N.V. | Safe liquid source containers |
| KR101480971B1 (ko) | 2006-10-10 | 2015-01-09 | 에이에스엠 아메리카, 인코포레이티드 | 전구체 전달 시스템 |
| US7775508B2 (en) | 2006-10-31 | 2010-08-17 | Applied Materials, Inc. | Ampoule for liquid draw and vapor draw with a continuous level sensor |
| US7833353B2 (en) | 2007-01-24 | 2010-11-16 | Asm Japan K.K. | Liquid material vaporization apparatus for semiconductor processing apparatus |
| US8343583B2 (en) | 2008-07-10 | 2013-01-01 | Asm International N.V. | Method for vaporizing non-gaseous precursor in a fluidized bed |
| US8146896B2 (en) | 2008-10-31 | 2012-04-03 | Applied Materials, Inc. | Chemical precursor ampoule for vapor deposition processes |
| US8012876B2 (en) | 2008-12-02 | 2011-09-06 | Asm International N.V. | Delivery of vapor precursor from solid source |
| US9117773B2 (en) | 2009-08-26 | 2015-08-25 | Asm America, Inc. | High concentration water pulses for atomic layer deposition |
| US11926894B2 (en) | 2016-09-30 | 2024-03-12 | Asm Ip Holding B.V. | Reactant vaporizer and related systems and methods |
| US10876205B2 (en) | 2016-09-30 | 2020-12-29 | Asm Ip Holding B.V. | Reactant vaporizer and related systems and methods |
| US11634812B2 (en) | 2018-08-16 | 2023-04-25 | Asm Ip Holding B.V. | Solid source sublimator |
| US11624113B2 (en) | 2019-09-13 | 2023-04-11 | Asm Ip Holding B.V. | Heating zone separation for reactant evaporation system |
| US12054825B2 (en) | 2021-06-22 | 2024-08-06 | Applied Materials, Inc. | Bottom fed sublimation bed for high saturation efficiency in semiconductor applications |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3136895A1 (de) * | 1981-09-17 | 1983-03-31 | Philips Patentverwaltung Gmbh, 2000 Hamburg | "vorrichtung zum verdampfen von ausgangsstoffen fuer die reaktive abscheidung aus der gasphase" |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1204588A (fr) * | 1958-04-22 | 1960-01-27 | E F Drew & Co | Appareil permettant de réaliser des réactions chimiques continues |
| FR1532742A (fr) * | 1967-07-19 | 1968-07-12 | Bristol Aeroplane Plastics Ltd | Procédé et dispositif pour mélanger les fluides |
| FR1581523A (enExample) * | 1968-05-08 | 1969-09-19 | ||
| US3801073A (en) * | 1972-12-27 | 1974-04-02 | Kates W Co | Fluid mixer |
| US4129624A (en) * | 1977-05-13 | 1978-12-12 | The W. A. Kates Company | Fluid mixer |
| JPS5635426A (en) * | 1979-08-31 | 1981-04-08 | Fujitsu Ltd | Vapor-phase epitaxial growth device |
-
1983
- 1983-11-02 DE DE19833339625 patent/DE3339625A1/de active Granted
-
1984
- 1984-10-29 GB GB08427276A patent/GB2151662B/en not_active Expired
- 1984-10-30 FR FR8416553A patent/FR2554131B1/fr not_active Expired
- 1984-11-01 JP JP22903684A patent/JPS61110766A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3136895A1 (de) * | 1981-09-17 | 1983-03-31 | Philips Patentverwaltung Gmbh, 2000 Hamburg | "vorrichtung zum verdampfen von ausgangsstoffen fuer die reaktive abscheidung aus der gasphase" |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0277680A1 (de) * | 1987-01-31 | 1988-08-10 | Philips Patentverwaltung GmbH | Vorrichtung zum Anreichern eines Trägergases mit dem Dampf eines wenig flüchtigen Stoffes |
| US4883362A (en) * | 1987-01-31 | 1989-11-28 | U.S. Philips Corp. | Device for enriching a carrier gas with the vapor of a sparingly volatile substance |
| DE3927869A1 (de) * | 1988-08-31 | 1990-03-08 | Toyo Stauffer Chem Co | Verfahren zur herstellung von gesaettigtem dampf fester metallorganischer verbindungen fuer metallorganisch-chemische bedampfungsverfahren |
| DE3931189A1 (de) * | 1989-09-19 | 1991-03-28 | Philips Patentverwaltung | Vorrichtung und verfahren zum erzeugen eines mit dem dampf eines wenig fluechtigen stoffes angereicherten gasstroms |
Also Published As
| Publication number | Publication date |
|---|---|
| GB2151662B (en) | 1986-07-23 |
| DE3339625C2 (enExample) | 1991-01-31 |
| JPH0530908B2 (enExample) | 1993-05-11 |
| FR2554131A1 (fr) | 1985-05-03 |
| GB2151662A (en) | 1985-07-24 |
| FR2554131B1 (fr) | 1988-10-14 |
| JPS61110766A (ja) | 1986-05-29 |
| GB8427276D0 (en) | 1984-12-05 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8110 | Request for examination paragraph 44 | ||
| D2 | Grant after examination | ||
| 8364 | No opposition during term of opposition | ||
| 8339 | Ceased/non-payment of the annual fee |