JPS61110766A - キヤリヤ−ガス富化用装置 - Google Patents
キヤリヤ−ガス富化用装置Info
- Publication number
- JPS61110766A JPS61110766A JP22903684A JP22903684A JPS61110766A JP S61110766 A JPS61110766 A JP S61110766A JP 22903684 A JP22903684 A JP 22903684A JP 22903684 A JP22903684 A JP 22903684A JP S61110766 A JPS61110766 A JP S61110766A
- Authority
- JP
- Japan
- Prior art keywords
- carrier gas
- container
- wall
- groove
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000012159 carrier gas Substances 0.000 title claims description 23
- 239000000463 material Substances 0.000 claims description 17
- 229910052751 metal Inorganic materials 0.000 claims description 17
- 239000002184 metal Substances 0.000 claims description 17
- 239000007789 gas Substances 0.000 claims description 11
- 239000000203 mixture Substances 0.000 claims description 7
- 239000002245 particle Substances 0.000 claims description 3
- 239000007787 solid Substances 0.000 claims description 2
- 239000000843 powder Substances 0.000 description 9
- 239000007858 starting material Substances 0.000 description 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 5
- 229910000831 Steel Inorganic materials 0.000 description 5
- 229910052802 copper Inorganic materials 0.000 description 5
- 239000010949 copper Substances 0.000 description 5
- 230000008020 evaporation Effects 0.000 description 5
- 238000001704 evaporation Methods 0.000 description 5
- 239000010959 steel Substances 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 229910052776 Thorium Inorganic materials 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- ZSLUVFAKFWKJRC-IGMARMGPSA-N 232Th Chemical compound [232Th] ZSLUVFAKFWKJRC-IGMARMGPSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- FJSDGIUVZFHMSH-MTOQALJVSA-N (z)-4-hydroxypent-3-en-2-one;thorium Chemical compound [Th].C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O.C\C(O)=C\C(C)=O FJSDGIUVZFHMSH-MTOQALJVSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000012459 cleaning agent Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910052756 noble gas Inorganic materials 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 150000002909 rare earth metal compounds Chemical class 0.000 description 1
- 150000002910 rare earth metals Chemical class 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 150000003586 thorium compounds Chemical class 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19833339625 DE3339625A1 (de) | 1983-11-02 | 1983-11-02 | Vorrichtung zum anreichern eines traegergases mit dem dampf eines wenig fluechtigen stoffes |
| DE3339625.6 | 1983-11-02 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61110766A true JPS61110766A (ja) | 1986-05-29 |
| JPH0530908B2 JPH0530908B2 (enExample) | 1993-05-11 |
Family
ID=6213274
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22903684A Granted JPS61110766A (ja) | 1983-11-02 | 1984-11-01 | キヤリヤ−ガス富化用装置 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JPS61110766A (enExample) |
| DE (1) | DE3339625A1 (enExample) |
| FR (1) | FR2554131B1 (enExample) |
| GB (1) | GB2151662B (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0513166U (ja) * | 1991-08-06 | 1993-02-23 | ダイワ精工株式会社 | 魚釣用リ−ルの釣糸止め装置 |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3702923A1 (de) * | 1987-01-31 | 1988-08-11 | Philips Patentverwaltung | Vorrichtung zum anreichern eines traegergases mit dem dampf eines wenig fluechtigen stoffes |
| DE3801147A1 (de) * | 1988-01-16 | 1989-07-27 | Philips Patentverwaltung | Vorrichtung zum erzeugen eines mit dem dampf eines wenig fluechtigen stoffes angereicherten gasstroms |
| JPH0269389A (ja) * | 1988-08-31 | 1990-03-08 | Toyo Stauffer Chem Co | 有機金属気相成長法における固体有機金属化合物の飽和蒸気生成方法 |
| DE3931189A1 (de) * | 1989-09-19 | 1991-03-28 | Philips Patentverwaltung | Vorrichtung und verfahren zum erzeugen eines mit dem dampf eines wenig fluechtigen stoffes angereicherten gasstroms |
| DE19638100C1 (de) * | 1996-09-18 | 1998-03-05 | Fraunhofer Ges Forschung | Vorrichtung zum Erzeugen eines dampfförmigen Reaktionsproduktes aus Feststoffteilen |
| US7601225B2 (en) | 2002-06-17 | 2009-10-13 | Asm International N.V. | System for controlling the sublimation of reactants |
| US7186385B2 (en) | 2002-07-17 | 2007-03-06 | Applied Materials, Inc. | Apparatus for providing gas to a processing chamber |
| JP4585852B2 (ja) | 2002-07-30 | 2010-11-24 | エーエスエム アメリカ インコーポレイテッド | 基板処理システム、基板処理方法及び昇華装置 |
| US7156380B2 (en) | 2003-09-29 | 2007-01-02 | Asm International, N.V. | Safe liquid source containers |
| KR101480971B1 (ko) | 2006-10-10 | 2015-01-09 | 에이에스엠 아메리카, 인코포레이티드 | 전구체 전달 시스템 |
| US7775508B2 (en) | 2006-10-31 | 2010-08-17 | Applied Materials, Inc. | Ampoule for liquid draw and vapor draw with a continuous level sensor |
| US7833353B2 (en) | 2007-01-24 | 2010-11-16 | Asm Japan K.K. | Liquid material vaporization apparatus for semiconductor processing apparatus |
| US8343583B2 (en) | 2008-07-10 | 2013-01-01 | Asm International N.V. | Method for vaporizing non-gaseous precursor in a fluidized bed |
| US8146896B2 (en) | 2008-10-31 | 2012-04-03 | Applied Materials, Inc. | Chemical precursor ampoule for vapor deposition processes |
| US8012876B2 (en) | 2008-12-02 | 2011-09-06 | Asm International N.V. | Delivery of vapor precursor from solid source |
| US9117773B2 (en) | 2009-08-26 | 2015-08-25 | Asm America, Inc. | High concentration water pulses for atomic layer deposition |
| US11926894B2 (en) | 2016-09-30 | 2024-03-12 | Asm Ip Holding B.V. | Reactant vaporizer and related systems and methods |
| US10876205B2 (en) | 2016-09-30 | 2020-12-29 | Asm Ip Holding B.V. | Reactant vaporizer and related systems and methods |
| US11634812B2 (en) | 2018-08-16 | 2023-04-25 | Asm Ip Holding B.V. | Solid source sublimator |
| US11624113B2 (en) | 2019-09-13 | 2023-04-11 | Asm Ip Holding B.V. | Heating zone separation for reactant evaporation system |
| US12054825B2 (en) | 2021-06-22 | 2024-08-06 | Applied Materials, Inc. | Bottom fed sublimation bed for high saturation efficiency in semiconductor applications |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1204588A (fr) * | 1958-04-22 | 1960-01-27 | E F Drew & Co | Appareil permettant de réaliser des réactions chimiques continues |
| FR1532742A (fr) * | 1967-07-19 | 1968-07-12 | Bristol Aeroplane Plastics Ltd | Procédé et dispositif pour mélanger les fluides |
| FR1581523A (enExample) * | 1968-05-08 | 1969-09-19 | ||
| US3801073A (en) * | 1972-12-27 | 1974-04-02 | Kates W Co | Fluid mixer |
| US4129624A (en) * | 1977-05-13 | 1978-12-12 | The W. A. Kates Company | Fluid mixer |
| JPS5635426A (en) * | 1979-08-31 | 1981-04-08 | Fujitsu Ltd | Vapor-phase epitaxial growth device |
| DE3136895A1 (de) * | 1981-09-17 | 1983-03-31 | Philips Patentverwaltung Gmbh, 2000 Hamburg | "vorrichtung zum verdampfen von ausgangsstoffen fuer die reaktive abscheidung aus der gasphase" |
-
1983
- 1983-11-02 DE DE19833339625 patent/DE3339625A1/de active Granted
-
1984
- 1984-10-29 GB GB08427276A patent/GB2151662B/en not_active Expired
- 1984-10-30 FR FR8416553A patent/FR2554131B1/fr not_active Expired
- 1984-11-01 JP JP22903684A patent/JPS61110766A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0513166U (ja) * | 1991-08-06 | 1993-02-23 | ダイワ精工株式会社 | 魚釣用リ−ルの釣糸止め装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| GB2151662B (en) | 1986-07-23 |
| DE3339625C2 (enExample) | 1991-01-31 |
| JPH0530908B2 (enExample) | 1993-05-11 |
| FR2554131A1 (fr) | 1985-05-03 |
| GB2151662A (en) | 1985-07-24 |
| DE3339625A1 (de) | 1985-05-09 |
| FR2554131B1 (fr) | 1988-10-14 |
| GB8427276D0 (en) | 1984-12-05 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS61110766A (ja) | キヤリヤ−ガス富化用装置 | |
| JP3909792B2 (ja) | 化学気相成長法における原料供給装置及び原料供給方法 | |
| US5462013A (en) | CVD apparatus and method for forming uniform coatings | |
| US5261963A (en) | CVD apparatus comprising exhaust gas condensation means | |
| US6506352B1 (en) | Method for removing substances from gases | |
| JP4809313B2 (ja) | 入口プレナムを含む容器および容器から分配する方法 | |
| KR101941526B1 (ko) | 필터를 갖는 용기 | |
| US7901788B2 (en) | CVD condeposition of A1 and one or more reactive (gettering) elements to form protective aluminide coating | |
| JP2001323374A (ja) | 気相反応物を反応室内へ供給するための方法および装置 | |
| JP2020114941A (ja) | 固体前駆体の低温焼結 | |
| EP1990089A2 (en) | A method and equipment of producing graphite and metallic catalyst composite for diamond synthesis | |
| JPH01266801A (ja) | 低揮発性物質の蒸気で富化されたガス流の発生装置 | |
| US4883362A (en) | Device for enriching a carrier gas with the vapor of a sparingly volatile substance | |
| US20050000425A1 (en) | Simple chemical vapor deposition system and methods for depositing multiple-metal aluminide coatings | |
| CN114959643B (zh) | 固体汽化器 | |
| JP2005146418A (ja) | 原子層堆積方法及び装置 | |
| WO1992008821A1 (de) | Vorrichtung zum gasdiffusionsbeschichten von hohlen werkstücken | |
| JPS6056530B2 (ja) | 粘稠物質含有廃ギスの処理方法 | |
| US4187200A (en) | Method of making a supported porous metal catalyst | |
| JPS6070176A (ja) | 固体ソ−ス蒸発ボンベ | |
| GB2106938A (en) | Tantalum coated alumina articles | |
| EP0521078A4 (enExample) | ||
| US4725456A (en) | Method for preparing mixture to be used for production of composite material | |
| JPH0772352B2 (ja) | 化学蒸着装置及び化学蒸着方法 | |
| JP2023506373A (ja) | ２次元コーティングを堆積するための方法及びｃｖｄリアクタ |