FR2554131B1 - Procede pour enrichir un gaz vehicule de la vapeur d'une substance peu volatile - Google Patents
Procede pour enrichir un gaz vehicule de la vapeur d'une substance peu volatileInfo
- Publication number
- FR2554131B1 FR2554131B1 FR8416553A FR8416553A FR2554131B1 FR 2554131 B1 FR2554131 B1 FR 2554131B1 FR 8416553 A FR8416553 A FR 8416553A FR 8416553 A FR8416553 A FR 8416553A FR 2554131 B1 FR2554131 B1 FR 2554131B1
- Authority
- FR
- France
- Prior art keywords
- enriching
- vapor
- volatile substance
- low volatile
- vehicle gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19833339625 DE3339625A1 (de) | 1983-11-02 | 1983-11-02 | Vorrichtung zum anreichern eines traegergases mit dem dampf eines wenig fluechtigen stoffes |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2554131A1 FR2554131A1 (fr) | 1985-05-03 |
FR2554131B1 true FR2554131B1 (fr) | 1988-10-14 |
Family
ID=6213274
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR8416553A Expired FR2554131B1 (fr) | 1983-11-02 | 1984-10-30 | Procede pour enrichir un gaz vehicule de la vapeur d'une substance peu volatile |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPS61110766A (fr) |
DE (1) | DE3339625A1 (fr) |
FR (1) | FR2554131B1 (fr) |
GB (1) | GB2151662B (fr) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3702923A1 (de) * | 1987-01-31 | 1988-08-11 | Philips Patentverwaltung | Vorrichtung zum anreichern eines traegergases mit dem dampf eines wenig fluechtigen stoffes |
DE3801147A1 (de) * | 1988-01-16 | 1989-07-27 | Philips Patentverwaltung | Vorrichtung zum erzeugen eines mit dem dampf eines wenig fluechtigen stoffes angereicherten gasstroms |
JPH0269389A (ja) * | 1988-08-31 | 1990-03-08 | Toyo Stauffer Chem Co | 有機金属気相成長法における固体有機金属化合物の飽和蒸気生成方法 |
DE3931189A1 (de) * | 1989-09-19 | 1991-03-28 | Philips Patentverwaltung | Vorrichtung und verfahren zum erzeugen eines mit dem dampf eines wenig fluechtigen stoffes angereicherten gasstroms |
JPH0513166U (ja) * | 1991-08-06 | 1993-02-23 | ダイワ精工株式会社 | 魚釣用リ−ルの釣糸止め装置 |
DE19638100C1 (de) * | 1996-09-18 | 1998-03-05 | Fraunhofer Ges Forschung | Vorrichtung zum Erzeugen eines dampfförmigen Reaktionsproduktes aus Feststoffteilen |
US7601225B2 (en) | 2002-06-17 | 2009-10-13 | Asm International N.V. | System for controlling the sublimation of reactants |
US7186385B2 (en) | 2002-07-17 | 2007-03-06 | Applied Materials, Inc. | Apparatus for providing gas to a processing chamber |
JP4585852B2 (ja) | 2002-07-30 | 2010-11-24 | エーエスエム アメリカ インコーポレイテッド | 基板処理システム、基板処理方法及び昇華装置 |
US7156380B2 (en) | 2003-09-29 | 2007-01-02 | Asm International, N.V. | Safe liquid source containers |
US8137462B2 (en) | 2006-10-10 | 2012-03-20 | Asm America, Inc. | Precursor delivery system |
US7775508B2 (en) | 2006-10-31 | 2010-08-17 | Applied Materials, Inc. | Ampoule for liquid draw and vapor draw with a continuous level sensor |
US7833353B2 (en) | 2007-01-24 | 2010-11-16 | Asm Japan K.K. | Liquid material vaporization apparatus for semiconductor processing apparatus |
US8343583B2 (en) | 2008-07-10 | 2013-01-01 | Asm International N.V. | Method for vaporizing non-gaseous precursor in a fluidized bed |
US8146896B2 (en) | 2008-10-31 | 2012-04-03 | Applied Materials, Inc. | Chemical precursor ampoule for vapor deposition processes |
US8012876B2 (en) | 2008-12-02 | 2011-09-06 | Asm International N.V. | Delivery of vapor precursor from solid source |
US9117773B2 (en) | 2009-08-26 | 2015-08-25 | Asm America, Inc. | High concentration water pulses for atomic layer deposition |
US11926894B2 (en) | 2016-09-30 | 2024-03-12 | Asm Ip Holding B.V. | Reactant vaporizer and related systems and methods |
US10876205B2 (en) | 2016-09-30 | 2020-12-29 | Asm Ip Holding B.V. | Reactant vaporizer and related systems and methods |
KR20200020608A (ko) | 2018-08-16 | 2020-02-26 | 에이에스엠 아이피 홀딩 비.브이. | 고체 소스 승화기 |
US11624113B2 (en) | 2019-09-13 | 2023-04-11 | Asm Ip Holding B.V. | Heating zone separation for reactant evaporation system |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1204588A (fr) * | 1958-04-22 | 1960-01-27 | E F Drew & Co | Appareil permettant de réaliser des réactions chimiques continues |
FR1532742A (fr) * | 1967-07-19 | 1968-07-12 | Bristol Aeroplane Plastics Ltd | Procédé et dispositif pour mélanger les fluides |
FR1581523A (fr) * | 1968-05-08 | 1969-09-19 | ||
US3801073A (en) * | 1972-12-27 | 1974-04-02 | Kates W Co | Fluid mixer |
US4129624A (en) * | 1977-05-13 | 1978-12-12 | The W. A. Kates Company | Fluid mixer |
JPS5635426A (en) * | 1979-08-31 | 1981-04-08 | Fujitsu Ltd | Vapor-phase epitaxial growth device |
DE3136895A1 (de) * | 1981-09-17 | 1983-03-31 | Philips Patentverwaltung Gmbh, 2000 Hamburg | "vorrichtung zum verdampfen von ausgangsstoffen fuer die reaktive abscheidung aus der gasphase" |
-
1983
- 1983-11-02 DE DE19833339625 patent/DE3339625A1/de active Granted
-
1984
- 1984-10-29 GB GB08427276A patent/GB2151662B/en not_active Expired
- 1984-10-30 FR FR8416553A patent/FR2554131B1/fr not_active Expired
- 1984-11-01 JP JP22903684A patent/JPS61110766A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
GB8427276D0 (en) | 1984-12-05 |
JPS61110766A (ja) | 1986-05-29 |
GB2151662A (en) | 1985-07-24 |
DE3339625C2 (fr) | 1991-01-31 |
DE3339625A1 (de) | 1985-05-09 |
FR2554131A1 (fr) | 1985-05-03 |
JPH0530908B2 (fr) | 1993-05-11 |
GB2151662B (en) | 1986-07-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |