GB2151662B - Device for enriching a carrier gas with the vapour of a slightly volatile material for chemical vapour deposition method - Google Patents

Device for enriching a carrier gas with the vapour of a slightly volatile material for chemical vapour deposition method

Info

Publication number
GB2151662B
GB2151662B GB08427276A GB8427276A GB2151662B GB 2151662 B GB2151662 B GB 2151662B GB 08427276 A GB08427276 A GB 08427276A GB 8427276 A GB8427276 A GB 8427276A GB 2151662 B GB2151662 B GB 2151662B
Authority
GB
United Kingdom
Prior art keywords
enriching
carrier gas
deposition method
vapour
volatile material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB08427276A
Other versions
GB2151662A (en
GB8427276D0 (en
Inventor
Georg Gartner
Helmut Grosche
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Publication of GB8427276D0 publication Critical patent/GB8427276D0/en
Publication of GB2151662A publication Critical patent/GB2151662A/en
Application granted granted Critical
Publication of GB2151662B publication Critical patent/GB2151662B/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
GB08427276A 1983-11-02 1984-10-29 Device for enriching a carrier gas with the vapour of a slightly volatile material for chemical vapour deposition method Expired GB2151662B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19833339625 DE3339625A1 (en) 1983-11-02 1983-11-02 DEVICE FOR ENRICHING A CARRIER GAS WITH THE VAPOR OF A LITTLE VOLATILE FABRIC

Publications (3)

Publication Number Publication Date
GB8427276D0 GB8427276D0 (en) 1984-12-05
GB2151662A GB2151662A (en) 1985-07-24
GB2151662B true GB2151662B (en) 1986-07-23

Family

ID=6213274

Family Applications (1)

Application Number Title Priority Date Filing Date
GB08427276A Expired GB2151662B (en) 1983-11-02 1984-10-29 Device for enriching a carrier gas with the vapour of a slightly volatile material for chemical vapour deposition method

Country Status (4)

Country Link
JP (1) JPS61110766A (en)
DE (1) DE3339625A1 (en)
FR (1) FR2554131B1 (en)
GB (1) GB2151662B (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7678194B2 (en) 2002-07-17 2010-03-16 Applied Materials, Inc. Method for providing gas to a processing chamber
US7775508B2 (en) 2006-10-31 2010-08-17 Applied Materials, Inc. Ampoule for liquid draw and vapor draw with a continuous level sensor
US8146896B2 (en) 2008-10-31 2012-04-03 Applied Materials, Inc. Chemical precursor ampoule for vapor deposition processes
US8343583B2 (en) 2008-07-10 2013-01-01 Asm International N.V. Method for vaporizing non-gaseous precursor in a fluidized bed

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3702923A1 (en) * 1987-01-31 1988-08-11 Philips Patentverwaltung DEVICE FOR ENRICHING A CARRIER GAS WITH THE VAPOR OF A LITTLE VOLATILE FABRIC
DE3801147A1 (en) * 1988-01-16 1989-07-27 Philips Patentverwaltung DEVICE FOR GENERATING A GAS FLOW ENRICHED WITH THE VAPOR OF A LITTLE VOLATILE FABRIC
JPH0269389A (en) * 1988-08-31 1990-03-08 Toyo Stauffer Chem Co Formation of saturated vapor of solid organometallic compound in vapor growth method
DE3931189A1 (en) * 1989-09-19 1991-03-28 Philips Patentverwaltung Gas flow contg. vapour of low volatility powder for CVD - obtd. using device where process can be continuous and containers having little residual powder can be refilled without disturbing gas flow
JPH0513166U (en) * 1991-08-06 1993-02-23 ダイワ精工株式会社 Fishing reel fishing line stopper
DE19638100C1 (en) * 1996-09-18 1998-03-05 Fraunhofer Ges Forschung Apparatus to produce vaporous reaction product from solid particles
US7601225B2 (en) 2002-06-17 2009-10-13 Asm International N.V. System for controlling the sublimation of reactants
EP1525337A2 (en) 2002-07-30 2005-04-27 ASM America, Inc. Sublimation system employing carrier gas
US7156380B2 (en) 2003-09-29 2007-01-02 Asm International, N.V. Safe liquid source containers
JP5073751B2 (en) 2006-10-10 2012-11-14 エーエスエム アメリカ インコーポレイテッド Precursor delivery system
US7833353B2 (en) 2007-01-24 2010-11-16 Asm Japan K.K. Liquid material vaporization apparatus for semiconductor processing apparatus
US8012876B2 (en) 2008-12-02 2011-09-06 Asm International N.V. Delivery of vapor precursor from solid source
US9117773B2 (en) 2009-08-26 2015-08-25 Asm America, Inc. High concentration water pulses for atomic layer deposition
US10876205B2 (en) 2016-09-30 2020-12-29 Asm Ip Holding B.V. Reactant vaporizer and related systems and methods
US11926894B2 (en) 2016-09-30 2024-03-12 Asm Ip Holding B.V. Reactant vaporizer and related systems and methods
JP7376278B2 (en) 2018-08-16 2023-11-08 エーエスエム・アイピー・ホールディング・ベー・フェー solid raw material sublimer
US11624113B2 (en) 2019-09-13 2023-04-11 Asm Ip Holding B.V. Heating zone separation for reactant evaporation system

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1204588A (en) * 1958-04-22 1960-01-27 E F Drew & Co Apparatus for carrying out continuous chemical reactions
FR1532742A (en) * 1967-07-19 1968-07-12 Bristol Aeroplane Plastics Ltd Method and device for mixing fluids
FR1581523A (en) * 1968-05-08 1969-09-19
US3801073A (en) * 1972-12-27 1974-04-02 Kates W Co Fluid mixer
US4129624A (en) * 1977-05-13 1978-12-12 The W. A. Kates Company Fluid mixer
JPS5635426A (en) * 1979-08-31 1981-04-08 Fujitsu Ltd Vapor-phase epitaxial growth device
DE3136895A1 (en) * 1981-09-17 1983-03-31 Philips Patentverwaltung Gmbh, 2000 Hamburg Apparatus for evaporating starting materials for the reactive separation from the gas phase

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7678194B2 (en) 2002-07-17 2010-03-16 Applied Materials, Inc. Method for providing gas to a processing chamber
US7775508B2 (en) 2006-10-31 2010-08-17 Applied Materials, Inc. Ampoule for liquid draw and vapor draw with a continuous level sensor
US8343583B2 (en) 2008-07-10 2013-01-01 Asm International N.V. Method for vaporizing non-gaseous precursor in a fluidized bed
US8146896B2 (en) 2008-10-31 2012-04-03 Applied Materials, Inc. Chemical precursor ampoule for vapor deposition processes

Also Published As

Publication number Publication date
JPS61110766A (en) 1986-05-29
GB2151662A (en) 1985-07-24
GB8427276D0 (en) 1984-12-05
FR2554131A1 (en) 1985-05-03
DE3339625C2 (en) 1991-01-31
JPH0530908B2 (en) 1993-05-11
FR2554131B1 (en) 1988-10-14
DE3339625A1 (en) 1985-05-09

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19951029