GB2151662B - Device for enriching a carrier gas with the vapour of a slightly volatile material for chemical vapour deposition method - Google Patents
Device for enriching a carrier gas with the vapour of a slightly volatile material for chemical vapour deposition methodInfo
- Publication number
- GB2151662B GB2151662B GB08427276A GB8427276A GB2151662B GB 2151662 B GB2151662 B GB 2151662B GB 08427276 A GB08427276 A GB 08427276A GB 8427276 A GB8427276 A GB 8427276A GB 2151662 B GB2151662 B GB 2151662B
- Authority
- GB
- United Kingdom
- Prior art keywords
- enriching
- carrier gas
- deposition method
- vapour
- volatile material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19833339625 DE3339625A1 (en) | 1983-11-02 | 1983-11-02 | DEVICE FOR ENRICHING A CARRIER GAS WITH THE VAPOR OF A LITTLE VOLATILE FABRIC |
Publications (3)
Publication Number | Publication Date |
---|---|
GB8427276D0 GB8427276D0 (en) | 1984-12-05 |
GB2151662A GB2151662A (en) | 1985-07-24 |
GB2151662B true GB2151662B (en) | 1986-07-23 |
Family
ID=6213274
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB08427276A Expired GB2151662B (en) | 1983-11-02 | 1984-10-29 | Device for enriching a carrier gas with the vapour of a slightly volatile material for chemical vapour deposition method |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPS61110766A (en) |
DE (1) | DE3339625A1 (en) |
FR (1) | FR2554131B1 (en) |
GB (1) | GB2151662B (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7678194B2 (en) | 2002-07-17 | 2010-03-16 | Applied Materials, Inc. | Method for providing gas to a processing chamber |
US7775508B2 (en) | 2006-10-31 | 2010-08-17 | Applied Materials, Inc. | Ampoule for liquid draw and vapor draw with a continuous level sensor |
US8146896B2 (en) | 2008-10-31 | 2012-04-03 | Applied Materials, Inc. | Chemical precursor ampoule for vapor deposition processes |
US8343583B2 (en) | 2008-07-10 | 2013-01-01 | Asm International N.V. | Method for vaporizing non-gaseous precursor in a fluidized bed |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3702923A1 (en) * | 1987-01-31 | 1988-08-11 | Philips Patentverwaltung | DEVICE FOR ENRICHING A CARRIER GAS WITH THE VAPOR OF A LITTLE VOLATILE FABRIC |
DE3801147A1 (en) * | 1988-01-16 | 1989-07-27 | Philips Patentverwaltung | DEVICE FOR GENERATING A GAS FLOW ENRICHED WITH THE VAPOR OF A LITTLE VOLATILE FABRIC |
JPH0269389A (en) * | 1988-08-31 | 1990-03-08 | Toyo Stauffer Chem Co | Formation of saturated vapor of solid organometallic compound in vapor growth method |
DE3931189A1 (en) * | 1989-09-19 | 1991-03-28 | Philips Patentverwaltung | Gas flow contg. vapour of low volatility powder for CVD - obtd. using device where process can be continuous and containers having little residual powder can be refilled without disturbing gas flow |
JPH0513166U (en) * | 1991-08-06 | 1993-02-23 | ダイワ精工株式会社 | Fishing reel fishing line stopper |
DE19638100C1 (en) * | 1996-09-18 | 1998-03-05 | Fraunhofer Ges Forschung | Apparatus to produce vaporous reaction product from solid particles |
US7601225B2 (en) | 2002-06-17 | 2009-10-13 | Asm International N.V. | System for controlling the sublimation of reactants |
EP1525337A2 (en) | 2002-07-30 | 2005-04-27 | ASM America, Inc. | Sublimation system employing carrier gas |
US7156380B2 (en) | 2003-09-29 | 2007-01-02 | Asm International, N.V. | Safe liquid source containers |
JP5073751B2 (en) | 2006-10-10 | 2012-11-14 | エーエスエム アメリカ インコーポレイテッド | Precursor delivery system |
US7833353B2 (en) | 2007-01-24 | 2010-11-16 | Asm Japan K.K. | Liquid material vaporization apparatus for semiconductor processing apparatus |
US8012876B2 (en) | 2008-12-02 | 2011-09-06 | Asm International N.V. | Delivery of vapor precursor from solid source |
US9117773B2 (en) | 2009-08-26 | 2015-08-25 | Asm America, Inc. | High concentration water pulses for atomic layer deposition |
US10876205B2 (en) | 2016-09-30 | 2020-12-29 | Asm Ip Holding B.V. | Reactant vaporizer and related systems and methods |
US11926894B2 (en) | 2016-09-30 | 2024-03-12 | Asm Ip Holding B.V. | Reactant vaporizer and related systems and methods |
JP7376278B2 (en) | 2018-08-16 | 2023-11-08 | エーエスエム・アイピー・ホールディング・ベー・フェー | solid raw material sublimer |
US11624113B2 (en) | 2019-09-13 | 2023-04-11 | Asm Ip Holding B.V. | Heating zone separation for reactant evaporation system |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1204588A (en) * | 1958-04-22 | 1960-01-27 | E F Drew & Co | Apparatus for carrying out continuous chemical reactions |
FR1532742A (en) * | 1967-07-19 | 1968-07-12 | Bristol Aeroplane Plastics Ltd | Method and device for mixing fluids |
FR1581523A (en) * | 1968-05-08 | 1969-09-19 | ||
US3801073A (en) * | 1972-12-27 | 1974-04-02 | Kates W Co | Fluid mixer |
US4129624A (en) * | 1977-05-13 | 1978-12-12 | The W. A. Kates Company | Fluid mixer |
JPS5635426A (en) * | 1979-08-31 | 1981-04-08 | Fujitsu Ltd | Vapor-phase epitaxial growth device |
DE3136895A1 (en) * | 1981-09-17 | 1983-03-31 | Philips Patentverwaltung Gmbh, 2000 Hamburg | Apparatus for evaporating starting materials for the reactive separation from the gas phase |
-
1983
- 1983-11-02 DE DE19833339625 patent/DE3339625A1/en active Granted
-
1984
- 1984-10-29 GB GB08427276A patent/GB2151662B/en not_active Expired
- 1984-10-30 FR FR8416553A patent/FR2554131B1/en not_active Expired
- 1984-11-01 JP JP22903684A patent/JPS61110766A/en active Granted
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7678194B2 (en) | 2002-07-17 | 2010-03-16 | Applied Materials, Inc. | Method for providing gas to a processing chamber |
US7775508B2 (en) | 2006-10-31 | 2010-08-17 | Applied Materials, Inc. | Ampoule for liquid draw and vapor draw with a continuous level sensor |
US8343583B2 (en) | 2008-07-10 | 2013-01-01 | Asm International N.V. | Method for vaporizing non-gaseous precursor in a fluidized bed |
US8146896B2 (en) | 2008-10-31 | 2012-04-03 | Applied Materials, Inc. | Chemical precursor ampoule for vapor deposition processes |
Also Published As
Publication number | Publication date |
---|---|
JPS61110766A (en) | 1986-05-29 |
GB2151662A (en) | 1985-07-24 |
GB8427276D0 (en) | 1984-12-05 |
FR2554131A1 (en) | 1985-05-03 |
DE3339625C2 (en) | 1991-01-31 |
JPH0530908B2 (en) | 1993-05-11 |
FR2554131B1 (en) | 1988-10-14 |
DE3339625A1 (en) | 1985-05-09 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 19951029 |