JPH0530908B2 - - Google Patents

Info

Publication number
JPH0530908B2
JPH0530908B2 JP22903684A JP22903684A JPH0530908B2 JP H0530908 B2 JPH0530908 B2 JP H0530908B2 JP 22903684 A JP22903684 A JP 22903684A JP 22903684 A JP22903684 A JP 22903684A JP H0530908 B2 JPH0530908 B2 JP H0530908B2
Authority
JP
Japan
Prior art keywords
carrier gas
container
wall
gas
materials
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP22903684A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61110766A (ja
Inventor
Harutoneru Heorugu
Herotsushe Herumuto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Koninklijke Philips Electronics NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninklijke Philips Electronics NV filed Critical Koninklijke Philips Electronics NV
Publication of JPS61110766A publication Critical patent/JPS61110766A/ja
Publication of JPH0530908B2 publication Critical patent/JPH0530908B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
JP22903684A 1983-11-02 1984-11-01 キヤリヤ−ガス富化用装置 Granted JPS61110766A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19833339625 DE3339625A1 (de) 1983-11-02 1983-11-02 Vorrichtung zum anreichern eines traegergases mit dem dampf eines wenig fluechtigen stoffes
DE3339625.6 1983-11-02

Publications (2)

Publication Number Publication Date
JPS61110766A JPS61110766A (ja) 1986-05-29
JPH0530908B2 true JPH0530908B2 (enExample) 1993-05-11

Family

ID=6213274

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22903684A Granted JPS61110766A (ja) 1983-11-02 1984-11-01 キヤリヤ−ガス富化用装置

Country Status (4)

Country Link
JP (1) JPS61110766A (enExample)
DE (1) DE3339625A1 (enExample)
FR (1) FR2554131B1 (enExample)
GB (1) GB2151662B (enExample)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3702923A1 (de) * 1987-01-31 1988-08-11 Philips Patentverwaltung Vorrichtung zum anreichern eines traegergases mit dem dampf eines wenig fluechtigen stoffes
DE3801147A1 (de) * 1988-01-16 1989-07-27 Philips Patentverwaltung Vorrichtung zum erzeugen eines mit dem dampf eines wenig fluechtigen stoffes angereicherten gasstroms
JPH0269389A (ja) * 1988-08-31 1990-03-08 Toyo Stauffer Chem Co 有機金属気相成長法における固体有機金属化合物の飽和蒸気生成方法
DE3931189A1 (de) * 1989-09-19 1991-03-28 Philips Patentverwaltung Vorrichtung und verfahren zum erzeugen eines mit dem dampf eines wenig fluechtigen stoffes angereicherten gasstroms
JPH0513166U (ja) * 1991-08-06 1993-02-23 ダイワ精工株式会社 魚釣用リ−ルの釣糸止め装置
DE19638100C1 (de) * 1996-09-18 1998-03-05 Fraunhofer Ges Forschung Vorrichtung zum Erzeugen eines dampfförmigen Reaktionsproduktes aus Feststoffteilen
US7601225B2 (en) 2002-06-17 2009-10-13 Asm International N.V. System for controlling the sublimation of reactants
US7186385B2 (en) 2002-07-17 2007-03-06 Applied Materials, Inc. Apparatus for providing gas to a processing chamber
JP4585852B2 (ja) 2002-07-30 2010-11-24 エーエスエム アメリカ インコーポレイテッド 基板処理システム、基板処理方法及び昇華装置
US7156380B2 (en) 2003-09-29 2007-01-02 Asm International, N.V. Safe liquid source containers
KR101480971B1 (ko) 2006-10-10 2015-01-09 에이에스엠 아메리카, 인코포레이티드 전구체 전달 시스템
US7775508B2 (en) 2006-10-31 2010-08-17 Applied Materials, Inc. Ampoule for liquid draw and vapor draw with a continuous level sensor
US7833353B2 (en) 2007-01-24 2010-11-16 Asm Japan K.K. Liquid material vaporization apparatus for semiconductor processing apparatus
US8343583B2 (en) 2008-07-10 2013-01-01 Asm International N.V. Method for vaporizing non-gaseous precursor in a fluidized bed
US8146896B2 (en) 2008-10-31 2012-04-03 Applied Materials, Inc. Chemical precursor ampoule for vapor deposition processes
US8012876B2 (en) 2008-12-02 2011-09-06 Asm International N.V. Delivery of vapor precursor from solid source
US9117773B2 (en) 2009-08-26 2015-08-25 Asm America, Inc. High concentration water pulses for atomic layer deposition
US11926894B2 (en) 2016-09-30 2024-03-12 Asm Ip Holding B.V. Reactant vaporizer and related systems and methods
US10876205B2 (en) 2016-09-30 2020-12-29 Asm Ip Holding B.V. Reactant vaporizer and related systems and methods
US11634812B2 (en) 2018-08-16 2023-04-25 Asm Ip Holding B.V. Solid source sublimator
US11624113B2 (en) 2019-09-13 2023-04-11 Asm Ip Holding B.V. Heating zone separation for reactant evaporation system
US12054825B2 (en) 2021-06-22 2024-08-06 Applied Materials, Inc. Bottom fed sublimation bed for high saturation efficiency in semiconductor applications

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1204588A (fr) * 1958-04-22 1960-01-27 E F Drew & Co Appareil permettant de réaliser des réactions chimiques continues
FR1532742A (fr) * 1967-07-19 1968-07-12 Bristol Aeroplane Plastics Ltd Procédé et dispositif pour mélanger les fluides
FR1581523A (enExample) * 1968-05-08 1969-09-19
US3801073A (en) * 1972-12-27 1974-04-02 Kates W Co Fluid mixer
US4129624A (en) * 1977-05-13 1978-12-12 The W. A. Kates Company Fluid mixer
JPS5635426A (en) * 1979-08-31 1981-04-08 Fujitsu Ltd Vapor-phase epitaxial growth device
DE3136895A1 (de) * 1981-09-17 1983-03-31 Philips Patentverwaltung Gmbh, 2000 Hamburg "vorrichtung zum verdampfen von ausgangsstoffen fuer die reaktive abscheidung aus der gasphase"

Also Published As

Publication number Publication date
GB2151662B (en) 1986-07-23
DE3339625C2 (enExample) 1991-01-31
FR2554131A1 (fr) 1985-05-03
GB2151662A (en) 1985-07-24
DE3339625A1 (de) 1985-05-09
FR2554131B1 (fr) 1988-10-14
JPS61110766A (ja) 1986-05-29
GB8427276D0 (en) 1984-12-05

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