DE3226717A1 - System und verfahren zum sputtern mit einer hohen rate - Google Patents

System und verfahren zum sputtern mit einer hohen rate

Info

Publication number
DE3226717A1
DE3226717A1 DE19823226717 DE3226717A DE3226717A1 DE 3226717 A1 DE3226717 A1 DE 3226717A1 DE 19823226717 DE19823226717 DE 19823226717 DE 3226717 A DE3226717 A DE 3226717A DE 3226717 A1 DE3226717 A1 DE 3226717A1
Authority
DE
Germany
Prior art keywords
cathode
active plasma
movable
anode
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
DE19823226717
Other languages
German (de)
English (en)
Other versions
DE3226717C2 (enrdf_load_stackoverflow
Inventor
James D. 94063 Redwood City Ca. Crank
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ampex Corp
Original Assignee
Ampex Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ampex Corp filed Critical Ampex Corp
Publication of DE3226717A1 publication Critical patent/DE3226717A1/de
Application granted granted Critical
Publication of DE3226717C2 publication Critical patent/DE3226717C2/de
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/3417—Arrangements

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
DE19823226717 1981-07-16 1982-07-16 System und verfahren zum sputtern mit einer hohen rate Granted DE3226717A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US28376481A 1981-07-16 1981-07-16

Publications (2)

Publication Number Publication Date
DE3226717A1 true DE3226717A1 (de) 1983-02-03
DE3226717C2 DE3226717C2 (enrdf_load_stackoverflow) 1988-10-06

Family

ID=23087455

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19823226717 Granted DE3226717A1 (de) 1981-07-16 1982-07-16 System und verfahren zum sputtern mit einer hohen rate

Country Status (11)

Country Link
JP (1) JPS5825476A (enrdf_load_stackoverflow)
KR (1) KR890001032B1 (enrdf_load_stackoverflow)
BR (1) BR8204080A (enrdf_load_stackoverflow)
DE (1) DE3226717A1 (enrdf_load_stackoverflow)
FR (1) FR2509755B1 (enrdf_load_stackoverflow)
GB (1) GB2101638B (enrdf_load_stackoverflow)
IE (1) IE53214B1 (enrdf_load_stackoverflow)
IT (1) IT1148359B (enrdf_load_stackoverflow)
MX (1) MX152639A (enrdf_load_stackoverflow)
NL (1) NL8202878A (enrdf_load_stackoverflow)
PT (1) PT75222B (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102020100061A1 (de) 2020-01-03 2021-07-08 Schott Ag Kühlvorrichtung und Kühlverfahren für Sputtertargets
WO2023274558A1 (de) 2021-07-02 2023-01-05 Schott Ag Kühlvorrichtung und kühlverfahren für sputtertargets

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2125441A (en) * 1982-07-13 1984-03-07 Christopher Elphick Tunnel magnetron for cathode sputtering
US4444643A (en) * 1982-09-03 1984-04-24 Gartek Systems, Inc. Planar magnetron sputtering device
JPS60149681U (ja) * 1984-03-15 1985-10-04 ダイコク電機株式会社 パチンコホ−ル用貸出機
JPH0772349B2 (ja) * 1987-05-12 1995-08-02 住友電気工業株式会社 大面積化合物薄膜の作製方法および装置
US4885070A (en) * 1988-02-12 1989-12-05 Leybold Aktiengesellschaft Method and apparatus for the application of materials
CH687111A5 (de) * 1992-05-26 1996-09-13 Balzers Hochvakuum Verfahren zum Erzeugen einer Niederspannungsentladung, Vakuumbehandlungsanlage hierfuer sowie Anwendung des Verfahrens.
JP2001343309A (ja) * 2000-06-01 2001-12-14 Kawasaki Steel Corp 金属分析試料の予備処理方法および装置
TWI266962B (en) 2002-09-19 2006-11-21 Asml Netherlands Bv Radiation source, lithographic apparatus, and device manufacturing method
DE102004027897A1 (de) * 2004-06-09 2006-01-05 Leybold Optics Gmbh Vorrichtung und Verfahren zur Zerstäubung mit einem bewegbaren planaren Target
KR100844375B1 (ko) * 2007-01-16 2008-07-07 (주)아이씨디 알에프 차폐 구조를 갖는 플라즈마 처리 장치
CN107636195A (zh) * 2015-06-05 2018-01-26 应用材料公司 溅射沉积源、溅射装置及其操作方法
CN112626458A (zh) * 2020-12-08 2021-04-09 深圳市华星光电半导体显示技术有限公司 磁控溅射装置

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2106543A1 (de) * 1970-02-12 1971-08-26 Baxter Ltd Alexander Verfahren und Vorrichtung zur Vakuum Bedampfung
DE2301593B2 (de) * 1972-11-23 1978-08-24 Balzers Hochvakuum Gmbh, 6200 Wiesbaden Wechselvorrichtung für Targets für Kathodenzerstäubung
DE2902848A1 (de) * 1978-04-13 1979-10-18 Litton Systems Inc Verfahren zur herstellung von optischen mehrfachschichten
FR2435887A7 (fr) * 1978-07-26 1980-04-04 Basf Ag Circuit pour la compensation des champs d'ecriture dans les dispositifs de memorisation de donnees, en particulier dans les memoires a disques magnetiques
DE2903291A1 (de) * 1979-01-29 1980-08-07 Siemens Ag Verfahren zur herstellung von abwechselnd uebereinanderliegenden metall- und glimmpolymerisationsschichten
DE2856930A1 (de) * 1977-06-23 1981-02-12 H Hessner A device for absorbing urine with incontinent persons

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE705794C (de) * 1937-04-29 1941-05-09 Bernhard Berghaus Verfahren und Vorrichtung zur Kathodenzerstaeubung
US3625848A (en) * 1968-12-26 1971-12-07 Alvin A Snaper Arc deposition process and apparatus
US3590777A (en) * 1969-03-13 1971-07-06 United Aircarft Corp Ingot feed drive
DE2528108B2 (de) * 1975-06-24 1977-11-03 Siemens AG, 1000 Berlin und 8000 München Verfahren zum aufbringen von elektrisch leitenden schichten auf eine unterlage
DE2707144A1 (de) * 1976-02-19 1977-08-25 Sloan Technology Corp Kathodenzerstaeubungsvorrichtung
JPS57120668A (en) * 1981-01-16 1982-07-27 Matsushita Electric Ind Co Ltd Method and apparatus for forming thin polymer film

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2106543A1 (de) * 1970-02-12 1971-08-26 Baxter Ltd Alexander Verfahren und Vorrichtung zur Vakuum Bedampfung
DE2301593B2 (de) * 1972-11-23 1978-08-24 Balzers Hochvakuum Gmbh, 6200 Wiesbaden Wechselvorrichtung für Targets für Kathodenzerstäubung
DE2856930A1 (de) * 1977-06-23 1981-02-12 H Hessner A device for absorbing urine with incontinent persons
DE2902848A1 (de) * 1978-04-13 1979-10-18 Litton Systems Inc Verfahren zur herstellung von optischen mehrfachschichten
FR2435887A7 (fr) * 1978-07-26 1980-04-04 Basf Ag Circuit pour la compensation des champs d'ecriture dans les dispositifs de memorisation de donnees, en particulier dans les memoires a disques magnetiques
DE2903291A1 (de) * 1979-01-29 1980-08-07 Siemens Ag Verfahren zur herstellung von abwechselnd uebereinanderliegenden metall- und glimmpolymerisationsschichten

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102020100061A1 (de) 2020-01-03 2021-07-08 Schott Ag Kühlvorrichtung und Kühlverfahren für Sputtertargets
WO2023274558A1 (de) 2021-07-02 2023-01-05 Schott Ag Kühlvorrichtung und kühlverfahren für sputtertargets

Also Published As

Publication number Publication date
PT75222B (en) 1984-11-19
PT75222A (en) 1982-08-01
GB2101638A (en) 1983-01-19
IE821649L (en) 1983-01-16
GB2101638B (en) 1985-07-24
JPH0236675B2 (enrdf_load_stackoverflow) 1990-08-20
BR8204080A (pt) 1983-07-05
JPS5825476A (ja) 1983-02-15
KR840000665A (ko) 1984-02-25
MX152639A (es) 1985-10-02
IT8248820A0 (it) 1982-07-15
IE53214B1 (en) 1988-08-31
FR2509755A1 (fr) 1983-01-21
DE3226717C2 (enrdf_load_stackoverflow) 1988-10-06
FR2509755B1 (fr) 1985-11-08
KR890001032B1 (ko) 1989-04-20
NL8202878A (nl) 1983-02-16
IT1148359B (it) 1986-12-03

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Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
D2 Grant after examination
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee