JPS57120668A - Method and apparatus for forming thin polymer film - Google Patents
Method and apparatus for forming thin polymer filmInfo
- Publication number
- JPS57120668A JPS57120668A JP526281A JP526281A JPS57120668A JP S57120668 A JPS57120668 A JP S57120668A JP 526281 A JP526281 A JP 526281A JP 526281 A JP526281 A JP 526281A JP S57120668 A JPS57120668 A JP S57120668A
- Authority
- JP
- Japan
- Prior art keywords
- electret
- thin film
- cooling
- polymer
- polymer film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
Abstract
PURPOSE:To enable the use of a polymer with a low heat diffusion rate and to enhance the endurance of a thin film applied produce by enabling the cooling of a target when a thin film is formed on the surface of an object by sputtering. CONSTITUTION:The titled apparatus is composed of a mechanism transferring an object 3 on which a thin polymer film is formed in a vacuum vessel 1, a flexible electret, a mechanism cooling the electret, and a mechanism 9 generating magnetism. Said electret is used as a target 4, and the adhesion to a cooling jacket 6 is increased by static electricity or the like to efficiently cool a polymer molding. Thus, a thin film applied product with superior endurance is obtd. efficiently.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP526281A JPS57120668A (en) | 1981-01-16 | 1981-01-16 | Method and apparatus for forming thin polymer film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP526281A JPS57120668A (en) | 1981-01-16 | 1981-01-16 | Method and apparatus for forming thin polymer film |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57120668A true JPS57120668A (en) | 1982-07-27 |
JPH0224906B2 JPH0224906B2 (en) | 1990-05-31 |
Family
ID=11606309
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP526281A Granted JPS57120668A (en) | 1981-01-16 | 1981-01-16 | Method and apparatus for forming thin polymer film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57120668A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5825476A (en) * | 1981-07-16 | 1983-02-15 | アムペツクス・コ−ポレ−シヨン | High speed sputtering device and method |
-
1981
- 1981-01-16 JP JP526281A patent/JPS57120668A/en active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5825476A (en) * | 1981-07-16 | 1983-02-15 | アムペツクス・コ−ポレ−シヨン | High speed sputtering device and method |
JPH0236675B2 (en) * | 1981-07-16 | 1990-08-20 | Ampex |
Also Published As
Publication number | Publication date |
---|---|
JPH0224906B2 (en) | 1990-05-31 |
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