PT75222B - High rate sputtering system and method - Google Patents
High rate sputtering system and methodInfo
- Publication number
- PT75222B PT75222B PT75222A PT7522282A PT75222B PT 75222 B PT75222 B PT 75222B PT 75222 A PT75222 A PT 75222A PT 7522282 A PT7522282 A PT 7522282A PT 75222 B PT75222 B PT 75222B
- Authority
- PT
- Portugal
- Prior art keywords
- high rate
- sputtering system
- rate sputtering
- sputtering
- rate
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3414—Targets
- H01J37/3417—Arrangements
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US28376481A | 1981-07-16 | 1981-07-16 |
Publications (2)
Publication Number | Publication Date |
---|---|
PT75222A PT75222A (en) | 1982-08-01 |
PT75222B true PT75222B (en) | 1984-11-19 |
Family
ID=23087455
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PT75222A PT75222B (en) | 1981-07-16 | 1982-07-09 | High rate sputtering system and method |
Country Status (11)
Country | Link |
---|---|
JP (1) | JPS5825476A (pt) |
KR (1) | KR890001032B1 (pt) |
BR (1) | BR8204080A (pt) |
DE (1) | DE3226717A1 (pt) |
FR (1) | FR2509755B1 (pt) |
GB (1) | GB2101638B (pt) |
IE (1) | IE53214B1 (pt) |
IT (1) | IT1148359B (pt) |
MX (1) | MX152639A (pt) |
NL (1) | NL8202878A (pt) |
PT (1) | PT75222B (pt) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2125441A (en) * | 1982-07-13 | 1984-03-07 | Christopher Elphick | Tunnel magnetron for cathode sputtering |
US4444643A (en) * | 1982-09-03 | 1984-04-24 | Gartek Systems, Inc. | Planar magnetron sputtering device |
JPS60149681U (ja) * | 1984-03-15 | 1985-10-04 | ダイコク電機株式会社 | パチンコホ−ル用貸出機 |
JPH0772349B2 (ja) * | 1987-05-12 | 1995-08-02 | 住友電気工業株式会社 | 大面積化合物薄膜の作製方法および装置 |
US4885070A (en) * | 1988-02-12 | 1989-12-05 | Leybold Aktiengesellschaft | Method and apparatus for the application of materials |
CH687111A5 (de) * | 1992-05-26 | 1996-09-13 | Balzers Hochvakuum | Verfahren zum Erzeugen einer Niederspannungsentladung, Vakuumbehandlungsanlage hierfuer sowie Anwendung des Verfahrens. |
JP2001343309A (ja) * | 2000-06-01 | 2001-12-14 | Kawasaki Steel Corp | 金属分析試料の予備処理方法および装置 |
US7528395B2 (en) | 2002-09-19 | 2009-05-05 | Asml Netherlands B.V. | Radiation source, lithographic apparatus and device manufacturing method |
DE102004027897A1 (de) * | 2004-06-09 | 2006-01-05 | Leybold Optics Gmbh | Vorrichtung und Verfahren zur Zerstäubung mit einem bewegbaren planaren Target |
KR100844375B1 (ko) * | 2007-01-16 | 2008-07-07 | (주)아이씨디 | 알에프 차폐 구조를 갖는 플라즈마 처리 장치 |
CN107636195A (zh) * | 2015-06-05 | 2018-01-26 | 应用材料公司 | 溅射沉积源、溅射装置及其操作方法 |
DE102020100061A1 (de) | 2020-01-03 | 2021-07-08 | Schott Ag | Kühlvorrichtung und Kühlverfahren für Sputtertargets |
CN112626458A (zh) * | 2020-12-08 | 2021-04-09 | 深圳市华星光电半导体显示技术有限公司 | 磁控溅射装置 |
WO2023274558A1 (de) | 2021-07-02 | 2023-01-05 | Schott Ag | Kühlvorrichtung und kühlverfahren für sputtertargets |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE705794C (de) * | 1937-04-29 | 1941-05-09 | Bernhard Berghaus | Verfahren und Vorrichtung zur Kathodenzerstaeubung |
US3625848A (en) * | 1968-12-26 | 1971-12-07 | Alvin A Snaper | Arc deposition process and apparatus |
US3590777A (en) * | 1969-03-13 | 1971-07-06 | United Aircarft Corp | Ingot feed drive |
GB1354702A (en) * | 1970-02-12 | 1974-06-05 | Baxter Ltd Alexander | Methods of and means for vacuum deposition |
DE2301593C3 (de) * | 1972-11-23 | 1979-05-03 | Balzers Hochvakuum Gmbh, 6200 Wiesbaden | Wechselvorrichtung für Targets für Kathodenzerstäubung |
DE2528108B2 (de) * | 1975-06-24 | 1977-11-03 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zum aufbringen von elektrisch leitenden schichten auf eine unterlage |
DE2707144A1 (de) * | 1976-02-19 | 1977-08-25 | Sloan Technology Corp | Kathodenzerstaeubungsvorrichtung |
DE2856930A1 (de) * | 1977-06-23 | 1981-02-12 | H Hessner | A device for absorbing urine with incontinent persons |
US4142958A (en) * | 1978-04-13 | 1979-03-06 | Litton Systems, Inc. | Method for fabricating multi-layer optical films |
DE2832719A1 (de) * | 1978-07-26 | 1980-02-07 | Basf Ag | Anordnung zur kompensation von ungleichen schreibfeldern in magnetischen datenspeichereinrichtungen, insbesondere in magnetplattenspeichern |
DE2903291A1 (de) * | 1979-01-29 | 1980-08-07 | Siemens Ag | Verfahren zur herstellung von abwechselnd uebereinanderliegenden metall- und glimmpolymerisationsschichten |
JPS57120668A (en) * | 1981-01-16 | 1982-07-27 | Matsushita Electric Ind Co Ltd | Method and apparatus for forming thin polymer film |
-
1982
- 1982-07-02 GB GB08219206A patent/GB2101638B/en not_active Expired
- 1982-07-08 IE IE1649/82A patent/IE53214B1/en unknown
- 1982-07-09 PT PT75222A patent/PT75222B/pt unknown
- 1982-07-14 BR BR8204080A patent/BR8204080A/pt unknown
- 1982-07-14 KR KR8203138A patent/KR890001032B1/ko active
- 1982-07-15 MX MX193615A patent/MX152639A/es unknown
- 1982-07-15 FR FR8212350A patent/FR2509755B1/fr not_active Expired
- 1982-07-15 NL NL8202878A patent/NL8202878A/nl not_active Application Discontinuation
- 1982-07-15 IT IT48820/82A patent/IT1148359B/it active
- 1982-07-16 DE DE19823226717 patent/DE3226717A1/de active Granted
- 1982-07-16 JP JP57123106A patent/JPS5825476A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
PT75222A (en) | 1982-08-01 |
NL8202878A (nl) | 1983-02-16 |
DE3226717C2 (pt) | 1988-10-06 |
FR2509755A1 (fr) | 1983-01-21 |
IT1148359B (it) | 1986-12-03 |
BR8204080A (pt) | 1983-07-05 |
FR2509755B1 (fr) | 1985-11-08 |
KR840000665A (ko) | 1984-02-25 |
JPH0236675B2 (pt) | 1990-08-20 |
MX152639A (es) | 1985-10-02 |
KR890001032B1 (ko) | 1989-04-20 |
JPS5825476A (ja) | 1983-02-15 |
IE821649L (en) | 1983-01-16 |
GB2101638B (en) | 1985-07-24 |
IT8248820A0 (it) | 1982-07-15 |
GB2101638A (en) | 1983-01-19 |
IE53214B1 (en) | 1988-08-31 |
DE3226717A1 (de) | 1983-02-03 |
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