DE3223698A1 - Bad fuer die galvanische abscheidung einer nickelhaltigen schicht fuer einen mehrschichtigen ueberzug und verfahren zur galvanischen abscheidung eines dreischichtigen nickelueberzugs unter verwendung dieses bades - Google Patents
Bad fuer die galvanische abscheidung einer nickelhaltigen schicht fuer einen mehrschichtigen ueberzug und verfahren zur galvanischen abscheidung eines dreischichtigen nickelueberzugs unter verwendung dieses badesInfo
- Publication number
- DE3223698A1 DE3223698A1 DE19823223698 DE3223698A DE3223698A1 DE 3223698 A1 DE3223698 A1 DE 3223698A1 DE 19823223698 DE19823223698 DE 19823223698 DE 3223698 A DE3223698 A DE 3223698A DE 3223698 A1 DE3223698 A1 DE 3223698A1
- Authority
- DE
- Germany
- Prior art keywords
- nickel
- layer
- bath
- sulfur content
- bath according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title claims description 194
- 229910052759 nickel Inorganic materials 0.000 title claims description 88
- 238000000576 coating method Methods 0.000 title claims description 31
- 239000011248 coating agent Substances 0.000 title claims description 25
- 238000000034 method Methods 0.000 title claims description 19
- 230000008021 deposition Effects 0.000 title claims description 15
- 229910052717 sulfur Inorganic materials 0.000 claims description 58
- 239000011593 sulfur Substances 0.000 claims description 58
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 57
- -1 thiazole compound Chemical class 0.000 claims description 18
- 238000000151 deposition Methods 0.000 claims description 15
- 239000000758 substrate Substances 0.000 claims description 14
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 claims description 9
- 150000001875 compounds Chemical class 0.000 claims description 9
- 239000000853 adhesive Substances 0.000 claims description 8
- 230000001070 adhesive effect Effects 0.000 claims description 8
- 238000004070 electrodeposition Methods 0.000 claims description 7
- RAIPHJJURHTUIC-UHFFFAOYSA-N 1,3-thiazol-2-amine Chemical compound NC1=NC=CS1 RAIPHJJURHTUIC-UHFFFAOYSA-N 0.000 claims description 6
- 229910052739 hydrogen Inorganic materials 0.000 claims description 4
- NUSVDASTCPBUIP-UHFFFAOYSA-N (5-bromo-1,3-thiazol-2-yl)azanium;bromide Chemical compound [Br-].BrC1=C[NH2+]C(=N)S1 NUSVDASTCPBUIP-UHFFFAOYSA-N 0.000 claims description 3
- MIHADVKEHAFNPG-UHFFFAOYSA-N 2-Amino-5-nitrothiazole Chemical compound NC1=NC=C([N+]([O-])=O)S1 MIHADVKEHAFNPG-UHFFFAOYSA-N 0.000 claims description 3
- 229940018167 2-amino-5-nitrothiazole Drugs 0.000 claims description 3
- XMXLBDNVSIHRRA-UHFFFAOYSA-N 4,5-dimethyl-1,3-thiazol-2-amine Chemical compound CC=1N=C(N)SC=1C XMXLBDNVSIHRRA-UHFFFAOYSA-N 0.000 claims description 3
- 229910052736 halogen Inorganic materials 0.000 claims description 3
- 150000002367 halogens Chemical class 0.000 claims description 3
- 150000003839 salts Chemical class 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims description 3
- OUQMXTJYCAJLGO-UHFFFAOYSA-N 4-methyl-1,3-thiazol-2-amine Chemical compound CC1=CSC(N)=N1 OUQMXTJYCAJLGO-UHFFFAOYSA-N 0.000 claims description 2
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 claims description 2
- 239000003929 acidic solution Substances 0.000 claims description 2
- 229910001453 nickel ion Inorganic materials 0.000 claims description 2
- 239000003795 chemical substances by application Substances 0.000 claims 2
- 101100286286 Dictyostelium discoideum ipi gene Proteins 0.000 claims 1
- 230000001464 adherent effect Effects 0.000 claims 1
- 239000012085 test solution Substances 0.000 description 45
- 239000003792 electrolyte Substances 0.000 description 17
- 239000000654 additive Substances 0.000 description 16
- 230000000996 additive effect Effects 0.000 description 15
- 239000000243 solution Substances 0.000 description 11
- 229910001369 Brass Inorganic materials 0.000 description 9
- 239000010951 brass Substances 0.000 description 9
- 238000005260 corrosion Methods 0.000 description 9
- 230000007797 corrosion Effects 0.000 description 9
- 239000011888 foil Substances 0.000 description 8
- 238000007747 plating Methods 0.000 description 7
- 150000003464 sulfur compounds Chemical class 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- 230000008901 benefit Effects 0.000 description 6
- 238000009713 electroplating Methods 0.000 description 6
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 5
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 4
- 239000004327 boric acid Substances 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 229920003023 plastic Polymers 0.000 description 4
- 239000004033 plastic Substances 0.000 description 4
- 239000000080 wetting agent Substances 0.000 description 4
- 229910000831 Steel Inorganic materials 0.000 description 3
- 239000010953 base metal Substances 0.000 description 3
- 239000000872 buffer Substances 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 239000010941 cobalt Substances 0.000 description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 3
- 239000010959 steel Substances 0.000 description 3
- WGJCBBASTRWVJL-UHFFFAOYSA-N 1,3-thiazolidine-2-thione Chemical compound SC1=NCCS1 WGJCBBASTRWVJL-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- LAIZPRYFQUWUBN-UHFFFAOYSA-L nickel chloride hexahydrate Chemical compound O.O.O.O.O.O.[Cl-].[Cl-].[Ni+2] LAIZPRYFQUWUBN-UHFFFAOYSA-L 0.000 description 2
- RRIWRJBSCGCBID-UHFFFAOYSA-L nickel sulfate hexahydrate Chemical compound O.O.O.O.O.O.[Ni+2].[O-]S([O-])(=O)=O RRIWRJBSCGCBID-UHFFFAOYSA-L 0.000 description 2
- 229940116202 nickel sulfate hexahydrate Drugs 0.000 description 2
- 150000002825 nitriles Chemical class 0.000 description 2
- 150000003557 thiazoles Chemical class 0.000 description 2
- GWIKYPMLNBTJHR-UHFFFAOYSA-M thiosulfonate group Chemical group S(=S)(=O)[O-] GWIKYPMLNBTJHR-UHFFFAOYSA-M 0.000 description 2
- SOSQXPIKTBUEKF-UHFFFAOYSA-N 1,4-dihexoxy-1,4-dioxobutane-2-sulfonic acid Chemical compound CCCCCCOC(=O)CC(S(O)(=O)=O)C(=O)OCCCCCC SOSQXPIKTBUEKF-UHFFFAOYSA-N 0.000 description 1
- JHUFGBSGINLPOW-UHFFFAOYSA-N 3-chloro-4-(trifluoromethoxy)benzoyl cyanide Chemical compound FC(F)(F)OC1=CC=C(C(=O)C#N)C=C1Cl JHUFGBSGINLPOW-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- KHBQMWCZKVMBLN-UHFFFAOYSA-N Benzenesulfonamide Chemical compound NS(=O)(=O)C1=CC=CC=C1 KHBQMWCZKVMBLN-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 229910001313 Cobalt-iron alloy Inorganic materials 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- XOCUXOWLYLLJLV-UHFFFAOYSA-N [O].[S] Chemical class [O].[S] XOCUXOWLYLLJLV-UHFFFAOYSA-N 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- XECAHXYUAAWDEL-UHFFFAOYSA-N acrylonitrile butadiene styrene Chemical compound C=CC=C.C=CC#N.C=CC1=CC=CC=C1 XECAHXYUAAWDEL-UHFFFAOYSA-N 0.000 description 1
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 1
- 239000004676 acrylonitrile butadiene styrene Substances 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229950003476 aminothiazole Drugs 0.000 description 1
- JEHKKBHWRAXMCH-UHFFFAOYSA-M benzenesulfinate Chemical compound [O-]S(=O)C1=CC=CC=C1 JEHKKBHWRAXMCH-UHFFFAOYSA-M 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
- 229940092714 benzenesulfonic acid Drugs 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- SNRUBQQJIBEYMU-UHFFFAOYSA-N dodecane Chemical group CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- GPUMPJNVOBTUFM-UHFFFAOYSA-N naphthalene-1,2,3-trisulfonic acid Chemical compound C1=CC=C2C(S(O)(=O)=O)=C(S(O)(=O)=O)C(S(=O)(=O)O)=CC2=C1 GPUMPJNVOBTUFM-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 description 1
- MNCGMVDMOKPCSQ-UHFFFAOYSA-M sodium;2-phenylethenesulfonate Chemical compound [Na+].[O-]S(=O)(=O)C=CC1=CC=CC=C1 MNCGMVDMOKPCSQ-UHFFFAOYSA-M 0.000 description 1
- IIACRCGMVDHOTQ-UHFFFAOYSA-M sulfamate Chemical compound NS([O-])(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-M 0.000 description 1
- WWNBZGLDODTKEM-UHFFFAOYSA-N sulfanylidenenickel Chemical compound [Ni]=S WWNBZGLDODTKEM-UHFFFAOYSA-N 0.000 description 1
- 150000003463 sulfur Chemical class 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
- C25D3/14—Electroplating: Baths therefor from solutions of nickel or cobalt from baths containing acetylenic or heterocyclic compounds
- C25D3/18—Heterocyclic compounds
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
- C25D5/14—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium two or more layers being of nickel or chromium, e.g. duplex or triplex layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/623—Porosity of the layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/625—Discontinuous layers, e.g. microcracked layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
- Laminated Bodies (AREA)
- Chemically Coating (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/280,643 US4384929A (en) | 1981-07-06 | 1981-07-06 | Process for electro-depositing composite nickel layers |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE3223698A1 true DE3223698A1 (de) | 1983-01-27 |
Family
ID=23073986
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19823223698 Withdrawn DE3223698A1 (de) | 1981-07-06 | 1982-06-25 | Bad fuer die galvanische abscheidung einer nickelhaltigen schicht fuer einen mehrschichtigen ueberzug und verfahren zur galvanischen abscheidung eines dreischichtigen nickelueberzugs unter verwendung dieses bades |
Country Status (18)
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4549942A (en) * | 1981-07-06 | 1985-10-29 | Omi International Corporation | Process for electrodepositing composite nickel layers |
| JPS60155823A (ja) * | 1984-01-24 | 1985-08-15 | Matsushita Electric Ind Co Ltd | 酸欠安全装置 |
| US5058799A (en) * | 1986-07-24 | 1991-10-22 | Zsamboky Kalman F | Metallized ceramic substrate and method therefor |
| US5348639A (en) * | 1991-08-06 | 1994-09-20 | Hitachi Magnetics Corporation | Surface treatment for iron-based permanent magnet including rare-earth element |
| US5286366A (en) * | 1991-11-05 | 1994-02-15 | Hitachi Magnetic Corp. | Surface treatment for iron-based permanent magnet including rare-earth element |
| US6045682A (en) * | 1998-03-24 | 2000-04-04 | Enthone-Omi, Inc. | Ductility agents for nickel-tungsten alloys |
| US6344128B1 (en) * | 2000-05-18 | 2002-02-05 | Emil Toledo | Aqueous electroplating bath |
| US20040035911A1 (en) * | 2001-11-21 | 2004-02-26 | Dockus Kostas F. | Fluxless brazing |
| US7451906B2 (en) * | 2001-11-21 | 2008-11-18 | Dana Canada Corporation | Products for use in low temperature fluxless brazing |
| US20060102696A1 (en) | 2001-11-21 | 2006-05-18 | Graham Michael E | Layered products for fluxless brazing of substrates |
| US8449948B2 (en) * | 2009-09-10 | 2013-05-28 | Western Digital (Fremont), Llc | Method and system for corrosion protection of layers in a structure of a magnetic recording transducer |
| JP6220359B2 (ja) * | 2015-03-26 | 2017-10-25 | Ｊｘ金属株式会社 | フィルム外装電池用タブリード材料及びその製造方法 |
| EP3147388A1 (en) * | 2015-09-25 | 2017-03-29 | Enthone, Incorporated | Flexible color adjustment for dark cr(iii)-platings |
| US12410534B2 (en) | 2022-09-26 | 2025-09-09 | Dupont Electronic Materials International, Llc | Nickel electroplating compositions for rough nickel |
| US20240124999A1 (en) * | 2022-09-26 | 2024-04-18 | Rohm And Haas Electronic Materials Llc | Nickel electroplating compositions for rough nickel |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2541553A1 (de) * | 1975-03-07 | 1976-09-23 | Oxy Metal Industries Corp | Thioaethersulfonate |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US309733A (en) * | 1884-12-23 | Heney l | ||
| GB890528A (en) * | 1959-09-28 | 1962-03-07 | Canning & Co Ltd W | Nickel plating salt solutions |
| US3090733A (en) * | 1961-04-17 | 1963-05-21 | Udylite Res Corp | Composite nickel electroplate |
| FR1447970A (fr) * | 1964-10-12 | 1966-08-05 | Renault | Dépôts de chrome décoratif résistant à la corrosion |
| US3795591A (en) * | 1972-07-03 | 1974-03-05 | Oxy Metal Finishing Corp | Electrodeposition of bright nickel iron deposits employing a compound containing a sulfide and a sulfonate |
| US3857765A (en) * | 1973-09-20 | 1974-12-31 | Metalux Corp | Purification of nickel and cobalt electroplating solutions |
| SU551415A1 (ru) * | 1975-04-28 | 1977-03-25 | Водный электролит блест щего никелировани |
-
1981
- 1981-07-06 US US06/280,643 patent/US4384929A/en not_active Expired - Lifetime
-
1982
- 1982-06-10 SE SE8203614A patent/SE8203614L/ not_active Application Discontinuation
- 1982-06-11 AU AU84803/82A patent/AU541941B2/en not_active Expired - Fee Related
- 1982-06-14 CA CA000405089A patent/CA1195947A/en not_active Expired
- 1982-06-17 ZA ZA824289A patent/ZA824289B/xx unknown
- 1982-06-22 PT PT75096A patent/PT75096B/pt unknown
- 1982-06-24 NL NL8202563A patent/NL8202563A/nl not_active Application Discontinuation
- 1982-06-25 DE DE19823223698 patent/DE3223698A1/de not_active Withdrawn
- 1982-06-29 AR AR289816A patent/AR231152A1/es active
- 1982-07-02 NO NO822328A patent/NO822328L/no unknown
- 1982-07-02 FR FR8211662A patent/FR2508936A1/fr not_active Withdrawn
- 1982-07-02 IT IT8248739A patent/IT1208431B/it active
- 1982-07-05 MX MX193444A patent/MX157957A/es unknown
- 1982-07-05 GB GB08219383A patent/GB2101162A/en not_active Withdrawn
- 1982-07-05 BR BR8203902A patent/BR8203902A/pt unknown
- 1982-07-05 ES ES513731A patent/ES513731A0/es active Granted
- 1982-07-06 JP JP57117631A patent/JPS5816086A/ja active Granted
- 1982-07-06 BE BE0/208541A patent/BE893774A/fr unknown
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2541553A1 (de) * | 1975-03-07 | 1976-09-23 | Oxy Metal Industries Corp | Thioaethersulfonate |
Also Published As
| Publication number | Publication date |
|---|---|
| NL8202563A (nl) | 1983-02-01 |
| AR231152A1 (es) | 1984-09-28 |
| PT75096A (en) | 1982-07-01 |
| ES8307929A1 (es) | 1983-08-01 |
| BE893774A (fr) | 1983-01-06 |
| ES513731A0 (es) | 1983-08-01 |
| US4384929A (en) | 1983-05-24 |
| IT8248739A0 (it) | 1982-07-02 |
| IT1208431B (it) | 1989-06-12 |
| PT75096B (en) | 1984-10-09 |
| NO822328L (no) | 1983-01-07 |
| JPS5816086A (ja) | 1983-01-29 |
| AU8480382A (en) | 1983-01-13 |
| CA1195947A (en) | 1985-10-29 |
| JPH0237434B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1990-08-24 |
| SE8203614L (sv) | 1983-01-07 |
| FR2508936A1 (fr) | 1983-01-07 |
| GB2101162A (en) | 1983-01-12 |
| BR8203902A (pt) | 1983-06-28 |
| ZA824289B (en) | 1983-05-25 |
| MX157957A (es) | 1988-12-28 |
| AU541941B2 (en) | 1985-01-31 |
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