CA1195947A - Process for electrodepositing composite nickel layers - Google Patents

Process for electrodepositing composite nickel layers

Info

Publication number
CA1195947A
CA1195947A CA000405089A CA405089A CA1195947A CA 1195947 A CA1195947 A CA 1195947A CA 000405089 A CA000405089 A CA 000405089A CA 405089 A CA405089 A CA 405089A CA 1195947 A CA1195947 A CA 1195947A
Authority
CA
Canada
Prior art keywords
nickel
layer
sulfur content
thiazole compound
thiazole
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA000405089A
Other languages
English (en)
French (fr)
Inventor
Robert A. Tremmel
Doina Magda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OMI International Corp
Original Assignee
OMI International Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by OMI International Corp filed Critical OMI International Corp
Application granted granted Critical
Publication of CA1195947A publication Critical patent/CA1195947A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
    • C25D3/14—Electroplating: Baths therefor from solutions of nickel or cobalt from baths containing acetylenic or heterocyclic compounds
    • C25D3/18—Heterocyclic compounds
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10—Electroplating with more than one layer of the same or of different metals
    • C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
    • C25D5/14—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium two or more layers being of nickel or chromium, e.g. duplex or triplex layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/623—Porosity of the layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/625—Discontinuous layers, e.g. microcracked layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Laminated Bodies (AREA)
  • Chemically Coating (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
CA000405089A 1981-07-06 1982-06-14 Process for electrodepositing composite nickel layers Expired CA1195947A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US280,643 1981-07-06
US06/280,643 US4384929A (en) 1981-07-06 1981-07-06 Process for electro-depositing composite nickel layers

Publications (1)

Publication Number Publication Date
CA1195947A true CA1195947A (en) 1985-10-29

Family

ID=23073986

Family Applications (1)

Application Number Title Priority Date Filing Date
CA000405089A Expired CA1195947A (en) 1981-07-06 1982-06-14 Process for electrodepositing composite nickel layers

Country Status (18)

Country Link
US (1) US4384929A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JPS5816086A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
AR (1) AR231152A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
AU (1) AU541941B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
BE (1) BE893774A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
BR (1) BR8203902A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
CA (1) CA1195947A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE3223698A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
ES (1) ES513731A0 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
FR (1) FR2508936A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
GB (1) GB2101162A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
IT (1) IT1208431B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
MX (1) MX157957A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
NL (1) NL8202563A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
NO (1) NO822328L (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
PT (1) PT75096B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
SE (1) SE8203614L (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
ZA (1) ZA824289B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4549942A (en) * 1981-07-06 1985-10-29 Omi International Corporation Process for electrodepositing composite nickel layers
JPS60155823A (ja) * 1984-01-24 1985-08-15 Matsushita Electric Ind Co Ltd 酸欠安全装置
US5058799A (en) * 1986-07-24 1991-10-22 Zsamboky Kalman F Metallized ceramic substrate and method therefor
US5348639A (en) * 1991-08-06 1994-09-20 Hitachi Magnetics Corporation Surface treatment for iron-based permanent magnet including rare-earth element
US5286366A (en) * 1991-11-05 1994-02-15 Hitachi Magnetic Corp. Surface treatment for iron-based permanent magnet including rare-earth element
US6045682A (en) * 1998-03-24 2000-04-04 Enthone-Omi, Inc. Ductility agents for nickel-tungsten alloys
US6344128B1 (en) * 2000-05-18 2002-02-05 Emil Toledo Aqueous electroplating bath
US20040035911A1 (en) * 2001-11-21 2004-02-26 Dockus Kostas F. Fluxless brazing
US7451906B2 (en) * 2001-11-21 2008-11-18 Dana Canada Corporation Products for use in low temperature fluxless brazing
US20060102696A1 (en) 2001-11-21 2006-05-18 Graham Michael E Layered products for fluxless brazing of substrates
US8449948B2 (en) * 2009-09-10 2013-05-28 Western Digital (Fremont), Llc Method and system for corrosion protection of layers in a structure of a magnetic recording transducer
JP6220359B2 (ja) * 2015-03-26 2017-10-25 Ｊｘ金属株式会社 フィルム外装電池用タブリード材料及びその製造方法
EP3147388A1 (en) * 2015-09-25 2017-03-29 Enthone, Incorporated Flexible color adjustment for dark cr(iii)-platings
US12410534B2 (en) 2022-09-26 2025-09-09 Dupont Electronic Materials International, Llc Nickel electroplating compositions for rough nickel
US20240124999A1 (en) * 2022-09-26 2024-04-18 Rohm And Haas Electronic Materials Llc Nickel electroplating compositions for rough nickel

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US309733A (en) * 1884-12-23 Heney l
GB890528A (en) * 1959-09-28 1962-03-07 Canning & Co Ltd W Nickel plating salt solutions
US3090733A (en) * 1961-04-17 1963-05-21 Udylite Res Corp Composite nickel electroplate
FR1447970A (fr) * 1964-10-12 1966-08-05 Renault Dépôts de chrome décoratif résistant à la corrosion
US3795591A (en) * 1972-07-03 1974-03-05 Oxy Metal Finishing Corp Electrodeposition of bright nickel iron deposits employing a compound containing a sulfide and a sulfonate
US3857765A (en) * 1973-09-20 1974-12-31 Metalux Corp Purification of nickel and cobalt electroplating solutions
AU8469875A (en) * 1975-03-07 1977-03-17 Oxy Metal Industries Corp Thioether sulphonates
SU551415A1 (ru) * 1975-04-28 1977-03-25 Водный электролит блест щего никелировани

Also Published As

Publication number Publication date
NL8202563A (nl) 1983-02-01
AR231152A1 (es) 1984-09-28
PT75096A (en) 1982-07-01
ES8307929A1 (es) 1983-08-01
BE893774A (fr) 1983-01-06
ES513731A0 (es) 1983-08-01
US4384929A (en) 1983-05-24
IT8248739A0 (it) 1982-07-02
IT1208431B (it) 1989-06-12
PT75096B (en) 1984-10-09
DE3223698A1 (de) 1983-01-27
NO822328L (no) 1983-01-07
JPS5816086A (ja) 1983-01-29
AU8480382A (en) 1983-01-13
JPH0237434B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1990-08-24
SE8203614L (sv) 1983-01-07
FR2508936A1 (fr) 1983-01-07
GB2101162A (en) 1983-01-12
BR8203902A (pt) 1983-06-28
ZA824289B (en) 1983-05-25
MX157957A (es) 1988-12-28
AU541941B2 (en) 1985-01-31

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Legal Events

Date Code Title Description
MKEX Expiry