DE3105295C2 - - Google Patents
Info
- Publication number
- DE3105295C2 DE3105295C2 DE3105295A DE3105295A DE3105295C2 DE 3105295 C2 DE3105295 C2 DE 3105295C2 DE 3105295 A DE3105295 A DE 3105295A DE 3105295 A DE3105295 A DE 3105295A DE 3105295 C2 DE3105295 C2 DE 3105295C2
- Authority
- DE
- Germany
- Prior art keywords
- doped
- fluorine
- sio2
- silicon dioxide
- titanium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 174
- 239000000377 silicon dioxide Substances 0.000 claims description 82
- 235000012239 silicon dioxide Nutrition 0.000 claims description 80
- 239000010936 titanium Substances 0.000 claims description 39
- 239000007789 gas Substances 0.000 claims description 31
- 238000000034 method Methods 0.000 claims description 30
- 150000003609 titanium compounds Chemical class 0.000 claims description 28
- 229910052731 fluorine Inorganic materials 0.000 claims description 23
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 22
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 22
- 239000011737 fluorine Substances 0.000 claims description 22
- 239000011521 glass Substances 0.000 claims description 19
- 239000001257 hydrogen Substances 0.000 claims description 19
- 229910052739 hydrogen Inorganic materials 0.000 claims description 19
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 18
- 239000000203 mixture Substances 0.000 claims description 15
- 238000004519 manufacturing process Methods 0.000 claims description 13
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 claims description 12
- 150000001875 compounds Chemical class 0.000 claims description 11
- 239000000835 fiber Substances 0.000 claims description 11
- 238000000576 coating method Methods 0.000 claims description 8
- 239000013307 optical fiber Substances 0.000 claims description 8
- 239000011248 coating agent Substances 0.000 claims description 7
- 150000002222 fluorine compounds Chemical class 0.000 claims description 6
- 230000015572 biosynthetic process Effects 0.000 claims description 5
- 230000008021 deposition Effects 0.000 claims description 5
- SFZCNBIFKDRMGX-UHFFFAOYSA-N sulfur hexafluoride Chemical compound FS(F)(F)(F)(F)F SFZCNBIFKDRMGX-UHFFFAOYSA-N 0.000 claims description 5
- 230000001939 inductive effect Effects 0.000 claims description 3
- GVGCUCJTUSOZKP-UHFFFAOYSA-N nitrogen trifluoride Chemical compound FN(F)F GVGCUCJTUSOZKP-UHFFFAOYSA-N 0.000 claims description 3
- 238000006243 chemical reaction Methods 0.000 claims description 2
- 239000002019 doping agent Substances 0.000 claims description 2
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 claims description 2
- 229910052681 coesite Inorganic materials 0.000 claims 2
- 229910052906 cristobalite Inorganic materials 0.000 claims 2
- 229910052682 stishovite Inorganic materials 0.000 claims 2
- 229910052905 tridymite Inorganic materials 0.000 claims 2
- QUVMSYUGOKEMPX-UHFFFAOYSA-N 2-methylpropan-1-olate;titanium(4+) Chemical compound [Ti+4].CC(C)C[O-].CC(C)C[O-].CC(C)C[O-].CC(C)C[O-] QUVMSYUGOKEMPX-UHFFFAOYSA-N 0.000 claims 1
- 229910003910 SiCl4 Inorganic materials 0.000 claims 1
- 229910003822 SiHCl3 Inorganic materials 0.000 claims 1
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 claims 1
- 229910052719 titanium Inorganic materials 0.000 description 24
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 22
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 22
- 239000001301 oxygen Substances 0.000 description 22
- 229910052760 oxygen Inorganic materials 0.000 description 22
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 16
- 239000005049 silicon tetrachloride Substances 0.000 description 16
- 229910052710 silicon Inorganic materials 0.000 description 10
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 9
- 150000002500 ions Chemical class 0.000 description 9
- 239000010703 silicon Substances 0.000 description 9
- 150000003377 silicon compounds Chemical class 0.000 description 9
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 8
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 7
- 230000005540 biological transmission Effects 0.000 description 6
- 239000010410 layer Substances 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 238000010521 absorption reaction Methods 0.000 description 5
- 238000000151 deposition Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 5
- 230000003647 oxidation Effects 0.000 description 5
- 238000007254 oxidation reaction Methods 0.000 description 5
- 229910001868 water Inorganic materials 0.000 description 5
- 229910052786 argon Inorganic materials 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 239000010453 quartz Substances 0.000 description 4
- 239000011265 semifinished product Substances 0.000 description 4
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical compound O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 3
- 229910018503 SF6 Inorganic materials 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 230000007812 deficiency Effects 0.000 description 3
- PXBRQCKWGAHEHS-UHFFFAOYSA-N dichlorodifluoromethane Chemical compound FC(F)(Cl)Cl PXBRQCKWGAHEHS-UHFFFAOYSA-N 0.000 description 3
- 235000019404 dichlorodifluoromethane Nutrition 0.000 description 3
- 238000006073 displacement reaction Methods 0.000 description 3
- 230000001965 increasing effect Effects 0.000 description 3
- 230000006698 induction Effects 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- -1 SiCl4 Chemical class 0.000 description 2
- 239000003570 air Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- QKCGXXHCELUCKW-UHFFFAOYSA-N n-[4-[4-(dinaphthalen-2-ylamino)phenyl]phenyl]-n-naphthalen-2-ylnaphthalen-2-amine Chemical compound C1=CC=CC2=CC(N(C=3C=CC(=CC=3)C=3C=CC(=CC=3)N(C=3C=C4C=CC=CC4=CC=3)C=3C=C4C=CC=CC4=CC=3)C3=CC4=CC=CC=C4C=C3)=CC=C21 QKCGXXHCELUCKW-UHFFFAOYSA-N 0.000 description 2
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229960000909 sulfur hexafluoride Drugs 0.000 description 2
- 238000005979 thermal decomposition reaction Methods 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 2
- 239000005052 trichlorosilane Substances 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004338 Dichlorodifluoromethane Substances 0.000 description 1
- 229910004014 SiF4 Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910009973 Ti2O3 Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000007717 exclusion Effects 0.000 description 1
- ONSKGPPTXAPQON-UHFFFAOYSA-N fluoromethane dihydrochloride Chemical compound Cl.Cl.FC ONSKGPPTXAPQON-UHFFFAOYSA-N 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 210000000056 organ Anatomy 0.000 description 1
- 150000004812 organic fluorine compounds Chemical class 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000006223 plastic coating Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000012815 thermoplastic material Substances 0.000 description 1
- GQUJEMVIKWQAEH-UHFFFAOYSA-N titanium(III) oxide Chemical compound O=[Ti]O[Ti]=O GQUJEMVIKWQAEH-UHFFFAOYSA-N 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/01413—Reactant delivery systems
- C03B37/0142—Reactant deposition burners
- C03B37/01426—Plasma deposition burners or torches
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/01413—Reactant delivery systems
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
- C03B37/01807—Reactant delivery systems, e.g. reactant deposition burners
- C03B37/01815—Reactant deposition burners or deposition heating means
- C03B37/01823—Plasma deposition burners or heating means
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
- C03B2201/12—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with fluorine
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/40—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
- C03B2201/42—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn doped with titanium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/80—Feeding the burner or the burner-heated deposition site
- C03B2207/85—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid
- C03B2207/86—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid by bubbling a gas through the liquid
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/80—Feeding the burner or the burner-heated deposition site
- C03B2207/85—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid
- C03B2207/87—Controlling the temperature
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S65/00—Glass manufacturing
- Y10S65/15—Nonoxygen containing chalogenides
- Y10S65/16—Optical filament or fiber treatment with fluorine or incorporating fluorine in final product
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- Glass Compositions (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
- Glass Melting And Manufacturing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR8003369A FR2476058A1 (fr) | 1980-02-15 | 1980-02-15 | Semi-produit pour la production de fibres optiques, procede de preparation du semi-produit et fibres optiques obtenues a partir du semi-produit |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE3105295A1 DE3105295A1 (de) | 1981-12-10 |
| DE3105295C2 true DE3105295C2 ( ) | 1991-01-17 |
Family
ID=9238625
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19813105295 Granted DE3105295A1 (de) | 1980-02-15 | 1981-02-13 | Halbfabrikat fuer die herstellung von optischen fasern, verfahren zur herstellung des halbfabrikats und die aus dem halbfabrikat hergestellten optischen fasern |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US4367013A ( ) |
| JP (1) | JPS56129626A ( ) |
| DE (1) | DE3105295A1 ( ) |
| FR (1) | FR2476058A1 ( ) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10054270B4 (de) * | 2000-11-02 | 2006-02-16 | Schott Ag | Verfahren zur Herstellung von Photomaskensubstraten |
Families Citing this family (40)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2071644B (en) * | 1980-02-22 | 1984-03-14 | Sumitomo Electric Industries | Radiation resistant optical fibres and a process for the production thereof |
| JPS6038343B2 (ja) * | 1981-03-06 | 1985-08-31 | 信越化学工業株式会社 | 石英ガラスの製造方法 |
| DE3206143A1 (de) * | 1982-02-20 | 1983-09-01 | Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt | Verfahren und anordnung zur herstellung einer vorform, aus der optische fasern ziehbar sind |
| US4714488A (en) * | 1982-09-29 | 1987-12-22 | Corning Glass Works | Apparatus for producing an optical fiber preform |
| JPS59125703A (ja) * | 1983-01-06 | 1984-07-20 | Sumitomo Electric Ind Ltd | 光伝送用ガラスフアイバ |
| JPS59202401A (ja) * | 1983-05-02 | 1984-11-16 | Sumitomo Electric Ind Ltd | 光フアイバおよびその製造方法 |
| JPS60200836A (ja) * | 1984-03-27 | 1985-10-11 | Sumitomo Electric Ind Ltd | 光フアイバ−用プリフオ−ムの製造方法 |
| US4822136A (en) * | 1984-06-15 | 1989-04-18 | Polaroid Corporation | Single mode optical fiber |
| JPS6126532A (ja) * | 1984-07-13 | 1986-02-05 | Sumitomo Electric Ind Ltd | 光フアイバ−用母材の製造方法 |
| GB2164934B (en) * | 1984-09-29 | 1988-10-05 | Stc Plc | Optical fibres |
| FR2574950B1 (fr) * | 1984-12-18 | 1987-09-25 | Corning Glass Works | Composants optiques integres en verre et leur fabrication |
| DE3500672A1 (de) * | 1985-01-11 | 1986-07-17 | Philips Patentverwaltung | Lichtleitfaser mit fluordotierung und verfahren zu deren herstellung |
| US5028246A (en) * | 1986-02-03 | 1991-07-02 | Ensign-Bickford Optical Technologies, Inc. | Methods of making optical waveguides |
| US4689212A (en) * | 1986-05-14 | 1987-08-25 | Polaroid Corporation | Method for forming doped optical preforms |
| GB8713081D0 (en) * | 1987-06-04 | 1987-07-08 | Pirelli General Plc | Optical fibre attenuators |
| DE3731604A1 (de) * | 1987-09-19 | 1989-03-30 | Philips Patentverwaltung | Verfahren zur herstellung einer monomode-lichtleitfaser |
| WO1990008030A1 (en) * | 1989-01-12 | 1990-07-26 | Codenoll Technology Corporation | Injection molded star-couplers and methods of making same |
| US5019301A (en) * | 1989-01-12 | 1991-05-28 | Codenoll Technology Corporation | Method of injection molding star-couplers |
| US5035480A (en) * | 1989-09-06 | 1991-07-30 | Codenoll Technology Corporation | Star-couplers with biconical mixing elements and methods for making the same |
| US5211730A (en) * | 1989-12-15 | 1993-05-18 | Sumitomo Electric Industries, Ltd. | Method for heating glass body |
| DE4026337A1 (de) * | 1990-08-21 | 1992-02-27 | Hench Automatik App Masch | Vorrichtung zum abkuehlen und granulieren von schmelzfluessigen straengen |
| US5318611A (en) * | 1992-03-13 | 1994-06-07 | Ensign-Bickford Optical Technologies, Inc. | Methods of making optical waveguides and waveguides made thereby |
| US5755850A (en) * | 1992-09-24 | 1998-05-26 | Iowa State University Research Foundation | Method of making a surgical laser fiber from a monolithic silica titania glass rod |
| FR2713621B1 (fr) * | 1993-12-14 | 1996-01-05 | Alcatel Fibres Optiques | Procédé de recharge par plasma d'une préforme pour fibre optique et fibre optique issue de la préforme rechargée selon ce procédé. |
| US5572618A (en) * | 1994-07-13 | 1996-11-05 | Lucent Technologies Inc. | Optical attenuator |
| US5868734A (en) * | 1995-11-29 | 1999-02-09 | Iowa State University Research Foundation, Inc. | Methods of using silica-titania clad fibers |
| FR2755124B1 (fr) * | 1996-10-24 | 1998-11-27 | Alsthom Cge Alcatel | Procede de fabrication d'une preforme de fibre optique |
| JP2000264671A (ja) * | 1999-03-12 | 2000-09-26 | Shin Etsu Chem Co Ltd | 合成石英ガラス部材 |
| US6598425B1 (en) * | 2000-03-08 | 2003-07-29 | Corning Incorporated | Method for collecting soot |
| US6374642B1 (en) * | 2000-03-15 | 2002-04-23 | Corning Incorporated | Method and apparatus for combustion-enhanced vaporization |
| WO2002055445A2 (en) * | 2001-01-12 | 2002-07-18 | Corning Incorporated | Optical fiber and preform, method of manufacturing same, and optical component made therefrom |
| US6698247B2 (en) * | 2001-05-04 | 2004-03-02 | Corning Incorporated | Method and feedstock for making silica by flame combustion |
| US20030000260A1 (en) * | 2001-06-25 | 2003-01-02 | Roba Giacomo Stefano | Device for manufacturing a preform for optical fibres through chemical deposition |
| US20030027055A1 (en) * | 2001-08-01 | 2003-02-06 | Ball Laura J. | Method and feedstock for making photomask material |
| US20030027054A1 (en) * | 2001-08-01 | 2003-02-06 | Ball Laura J. | Method for making photomask material by plasma induction |
| EP1471038A3 (de) * | 2003-04-26 | 2005-11-23 | Schott Ag | Verfahren zur Herstellung von Glaskörpern aus dotiertem Quarzglas |
| EP2241538B1 (en) * | 2004-07-01 | 2013-05-29 | Asahi Glass Company, Limited | Silica glass containing TiO2 and process for its production |
| WO2007001387A2 (en) * | 2004-10-01 | 2007-01-04 | Ceranova Corporation | Polycrystalline alumina articles and methods of manufacture |
| KR101740067B1 (ko) * | 2009-01-13 | 2017-05-25 | 아사히 가라스 가부시키가이샤 | ＴｉＯ₂를 함유하는 실리카 유리를 포함하는 광학 부재 |
| DE102013108885B3 (de) * | 2013-08-16 | 2014-08-07 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren zur Herstellung von Titan-dotiertem Kieselglas für den Einsatz in der EUV-Lithographie und danach hergestellter Rohling |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1391177A (en) * | 1971-08-09 | 1975-04-16 | Thermal Syndicate Ltd | Vitreous siliceous material |
| US3782914A (en) * | 1972-03-30 | 1974-01-01 | Corning Glass Works | Heat treating optical waveguides for oh ion removal |
| US3868170A (en) * | 1972-03-30 | 1975-02-25 | Corning Glass Works | Method of removing entrapped gas and/or residual water from glass |
| DE2420476A1 (de) * | 1974-04-27 | 1975-11-06 | Licentia Gmbh | Verfahren zur herstellung von lichtleitfasern |
| US4002512A (en) * | 1974-09-16 | 1977-01-11 | Western Electric Company, Inc. | Method of forming silicon dioxide |
| US4135901A (en) * | 1974-12-18 | 1979-01-23 | Sumitomo Electric Industries, Ltd. | Method of manufacturing glass for optical waveguide |
| US4162908A (en) * | 1975-08-16 | 1979-07-31 | Heraeus Quarzschmelze Gmbh | Method of producing synthetic quartz glass, apparatus for the practice of the method, and use of the synthetic quartz glass |
| DE2536456C2 (de) * | 1975-08-16 | 1981-02-05 | Heraeus Quarzschmelze Gmbh, 6450 Hanau | Halbzeug für die Herstellung von Lichtleitfasern und Verfahren zur Herstellung des Halbzeugs |
| CH620181A5 (en) * | 1975-08-16 | 1980-11-14 | Heraeus Schott Quarzschmelze | Process for the preparation of synthetic quartz glass, apparatus to carry out the process, and the use of the synthetic quartz glass |
| CA1029993A (en) * | 1975-09-11 | 1978-04-25 | Frederick D. King | Optical fibre transmission line |
-
1980
- 1980-02-15 FR FR8003369A patent/FR2476058A1/fr active Granted
-
1981
- 1981-02-11 US US06/233,512 patent/US4367013A/en not_active Expired - Lifetime
- 1981-02-13 DE DE19813105295 patent/DE3105295A1/de active Granted
- 1981-02-14 JP JP1960181A patent/JPS56129626A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10054270B4 (de) * | 2000-11-02 | 2006-02-16 | Schott Ag | Verfahren zur Herstellung von Photomaskensubstraten |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS56129626A (en) | 1981-10-09 |
| JPH0127005B2 ( ) | 1989-05-26 |
| FR2476058A1 (fr) | 1981-08-21 |
| DE3105295A1 (de) | 1981-12-10 |
| US4367013A (en) | 1983-01-04 |
| FR2476058B1 ( ) | 1984-10-19 |
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