DE2704368C2 - - Google Patents

Info

Publication number
DE2704368C2
DE2704368C2 DE2704368A DE2704368A DE2704368C2 DE 2704368 C2 DE2704368 C2 DE 2704368C2 DE 2704368 A DE2704368 A DE 2704368A DE 2704368 A DE2704368 A DE 2704368A DE 2704368 C2 DE2704368 C2 DE 2704368C2
Authority
DE
Germany
Prior art keywords
radical
carbon atoms
atoms
group
alkyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE2704368A
Other languages
German (de)
English (en)
Other versions
DE2704368A1 (de
Inventor
Donald Paul Spencerport N.Y. Us Specht
Samir Yacoub Rochester N.Y. Us Farid
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of DE2704368A1 publication Critical patent/DE2704368A1/de
Application granted granted Critical
Publication of DE2704368C2 publication Critical patent/DE2704368C2/de
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/0085—Azides characterised by the non-macromolecular additives
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D311/00—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings
    • C07D311/02—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only hetero atom, condensed with other rings ortho- or peri-condensed with carbocyclic rings or ring systems
    • C07D311/04—Benzo[b]pyrans, not hydrogenated in the carbocyclic ring
    • C07D311/06—Benzo[b]pyrans, not hydrogenated in the carbocyclic ring with oxygen or sulfur atoms directly attached in position 2
    • C07D311/08—Benzo[b]pyrans, not hydrogenated in the carbocyclic ring with oxygen or sulfur atoms directly attached in position 2 not hydrogenated in the hetero ring
    • C07D311/16—Benzo[b]pyrans, not hydrogenated in the carbocyclic ring with oxygen or sulfur atoms directly attached in position 2 not hydrogenated in the hetero ring substituted in position 7
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/695—Compositions containing azides as the photosensitive substances
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
    • G03C5/60—Processes for obtaining vesicular images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Materials For Photolithography (AREA)
DE19772704368 1976-02-02 1977-02-02 Verwendung von in 3-stellung substituierten cumarinen zum sensibilisieren lichtempfindlicher verbindungen Granted DE2704368A1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US65448576A 1976-02-02 1976-02-02
US68866476A 1976-05-21 1976-05-21

Publications (2)

Publication Number Publication Date
DE2704368A1 DE2704368A1 (de) 1977-08-11
DE2704368C2 true DE2704368C2 (enEXAMPLES) 1988-05-11

Family

ID=27096757

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19772704368 Granted DE2704368A1 (de) 1976-02-02 1977-02-02 Verwendung von in 3-stellung substituierten cumarinen zum sensibilisieren lichtempfindlicher verbindungen

Country Status (10)

Country Link
JP (1) JPS5942684B2 (enEXAMPLES)
AU (1) AU513012B2 (enEXAMPLES)
BR (1) BR7700555A (enEXAMPLES)
DE (1) DE2704368A1 (enEXAMPLES)
ES (1) ES455588A1 (enEXAMPLES)
FI (1) FI770367A7 (enEXAMPLES)
FR (1) FR2339881A1 (enEXAMPLES)
GB (1) GB1578662A (enEXAMPLES)
IT (1) IT1076960B (enEXAMPLES)
NL (1) NL185872C (enEXAMPLES)

Families Citing this family (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6026122B2 (ja) * 1977-01-20 1985-06-21 富士写真フイルム株式会社 光重合性組成物
JPS5815503A (ja) * 1981-07-20 1983-01-28 Fuji Photo Film Co Ltd 光重合性組成物
JPS6088005A (ja) * 1983-10-21 1985-05-17 Agency Of Ind Science & Technol 光硬化樹脂組成物
JPH0676444B2 (ja) * 1986-05-08 1994-09-28 ユニチカ株式会社 光重合性組成物
DE3864530D1 (de) * 1987-02-02 1991-10-10 Ciba Geigy Ag Photoinitiatorengemische enthaltend ein titanocen und ein 3-ketocoumarin.
JP2640470B2 (ja) * 1987-08-19 1997-08-13 旭化成工業株式会社 新しい感光性組成物
DE3832032A1 (de) * 1988-09-21 1990-03-22 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
JPH02144539A (ja) * 1988-11-28 1990-06-04 Sumitomo Bakelite Co Ltd 感光性樹脂組成物
JPH02281895A (ja) * 1989-04-24 1990-11-19 Nissin Electric Co Ltd ビル管理システム
DE59007720D1 (de) * 1989-10-27 1994-12-22 Ciba Geigy Ag Verfahren zur Abstimmung der Strahlungsempfindlichkeit von photopolymerisierbaren Zusammensetzungen.
JP3141517B2 (ja) 1992-05-14 2001-03-05 ブラザー工業株式会社 光硬化型組成物
US5738974A (en) 1994-09-05 1998-04-14 Mitsubishi Chemical Corporation Photopolymerizable composition and photosensitive lithographic printing plate
EP0780731B1 (en) 1995-12-22 2002-04-17 Mitsubishi Chemical Corporation Photopolymerizable composition for a color filter, color filter and liquid crystal display device
DE19620747A1 (de) * 1996-05-23 1997-11-27 Hoechst Ag Verfahren zur Herstellung von 3-(7-Diethylamino-2-oxo-2H-chromen-3-yl)-3- oxopropionsäure-(1-methoxy-2-propylester)
EP0889361B1 (de) * 1997-06-30 2002-01-23 Siemens Aktiengesellschaft Initiatoren für die kationische Polymerisation
US7830472B2 (en) 2004-04-26 2010-11-09 Mitsubishi Chemical Corporation Blue color composition for color filter, color filter, and color image display device
JP2006065074A (ja) 2004-08-27 2006-03-09 Fuji Photo Film Co Ltd 感光性平版印刷版
JP5089866B2 (ja) 2004-09-10 2012-12-05 富士フイルム株式会社 平版印刷方法
EP2107089A1 (en) 2005-06-13 2009-10-07 Toshiba TEC Kabushiki Kaisha Inkjet ink, inkjet recording method, method of evaluating inkjet ink, and method of manufacturing inkjet ink
JP4701042B2 (ja) 2005-08-22 2011-06-15 富士フイルム株式会社 感光性平版印刷版
WO2007057346A2 (en) * 2005-11-18 2007-05-24 Agfa Graphics Nv Method of making a lithographic printing plate
ATE426191T1 (de) * 2005-11-18 2009-04-15 Agfa Graphics Nv Verfahren zur herstellung einer lithographischen druckplatte
ES2322908T3 (es) * 2005-11-18 2009-07-01 Agfa Graphics N.V. Metodo de fabricacion de una plancha de impresion litografica.
WO2007057347A1 (en) * 2005-11-18 2007-05-24 Agfa Graphics Nv Method of making a lithographic printing plate
TW200807104A (en) 2006-04-19 2008-02-01 Mitsubishi Chem Corp Color image display device
JP4890408B2 (ja) 2007-09-28 2012-03-07 富士フイルム株式会社 重合性組成物及びそれを用いた平版印刷版原版、アルカリ可溶性ポリウレタン樹脂、並びに、ジオール化合物の製造方法
CN101939857B (zh) 2008-02-07 2013-05-15 三菱化学株式会社 半导体发光装置、背光源、彩色图像显示装置以及这些中使用的荧光体
JP5264427B2 (ja) 2008-03-25 2013-08-14 富士フイルム株式会社 平版印刷版の作製方法
JP5248203B2 (ja) 2008-05-29 2013-07-31 富士フイルム株式会社 平版印刷版現像用処理液及び平版印刷版の作製方法
JP5228631B2 (ja) 2008-05-29 2013-07-03 富士フイルム株式会社 平版印刷版現像用処理液及び平版印刷版の作製方法
JP2010156945A (ja) 2008-08-22 2010-07-15 Fujifilm Corp 平版印刷版の作製方法
JP5405141B2 (ja) 2008-08-22 2014-02-05 富士フイルム株式会社 平版印刷版の作製方法
JP5171483B2 (ja) 2008-08-29 2013-03-27 富士フイルム株式会社 平版印刷版の作製方法
CN103782241B (zh) 2011-09-15 2017-04-26 富士胶片株式会社 制版处理废液的再循环方法
EP2762977B1 (en) 2011-11-04 2017-09-27 FUJIFILM Corporation Method for recycling plate-making processing waste solution
ITVA20120041A1 (it) 2012-10-22 2014-04-23 Lamberti Spa 3-chetocumarine per fotopolimerizzazioni tramite led
EP3147335A1 (en) 2015-09-23 2017-03-29 BYK-Chemie GmbH Colorant compositions containing wettting and/or dispersing agents with low amine number
KR102407377B1 (ko) 2017-11-15 2022-06-13 비와이케이-케미 게엠베하 블록 공중합체
WO2019096893A1 (en) 2017-11-15 2019-05-23 Byk-Chemie Gmbh Block co-polymer
CN118271269A (zh) * 2022-12-30 2024-07-02 常州强力先端电子材料有限公司 香豆素类增感剂、其制备方法、包含其的感光性树脂组合物和应用

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2732301A (en) * 1952-10-15 1956-01-24 Chxcxch
US3615452A (en) * 1968-09-09 1971-10-26 Gaf Corp Dye-sensitized photopolymerization process
DE1949010C3 (de) * 1969-09-27 1979-11-29 Bayer Ag, 5090 Leverkusen Verwendung von halogenmethylierten Benzophenonen als Photopolymerisationsinitiatoren
GB1310936A (en) * 1970-03-17 1973-03-21 Minnesota Mining & Mfg Light-sensitive imaging sheet and method of using

Also Published As

Publication number Publication date
AU2187177A (en) 1978-08-10
FI770367A7 (enEXAMPLES) 1977-08-03
AU513012B2 (en) 1980-11-06
BR7700555A (pt) 1977-10-04
JPS5942684B2 (ja) 1984-10-17
DE2704368A1 (de) 1977-08-11
NL7701089A (nl) 1977-08-04
IT1076960B (it) 1985-04-27
GB1578662A (en) 1980-11-05
ES455588A1 (es) 1978-07-16
NL185872B (nl) 1990-03-01
NL185872C (nl) 1990-08-01
JPS52112681A (en) 1977-09-21
FR2339881A1 (fr) 1977-08-26
FR2339881B1 (enEXAMPLES) 1979-03-02

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Legal Events

Date Code Title Description
8128 New person/name/address of the agent

Representative=s name: BRANDES, J., DIPL.-CHEM. DR.RER.NAT., PAT.-ANW., 8

D2 Grant after examination
8364 No opposition during term of opposition