DE2526507A1 - Verfahren zur herstellung einer halbleiterschicht - Google Patents

Verfahren zur herstellung einer halbleiterschicht

Info

Publication number
DE2526507A1
DE2526507A1 DE19752526507 DE2526507A DE2526507A1 DE 2526507 A1 DE2526507 A1 DE 2526507A1 DE 19752526507 DE19752526507 DE 19752526507 DE 2526507 A DE2526507 A DE 2526507A DE 2526507 A1 DE2526507 A1 DE 2526507A1
Authority
DE
Germany
Prior art keywords
insulating substrate
layer
semiconductor wafer
silicon
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19752526507
Other languages
German (de)
English (en)
Inventor
Richard N Thomas
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Westinghouse Electric Corp
Original Assignee
Westinghouse Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Westinghouse Electric Corp filed Critical Westinghouse Electric Corp
Publication of DE2526507A1 publication Critical patent/DE2526507A1/de
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/01—Manufacture or treatment
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B33/00—After-treatment of single crystals or homogeneous polycrystalline material with defined structure
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/051—Etching
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/085—Isolated-integrated
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/135—Removal of substrate
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/15—Silicon on sapphire SOS
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
    • Y10T428/2495—Thickness [relative or absolute]
    • Y10T428/24959—Thickness [relative or absolute] of adhesive layers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Recrystallisation Techniques (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Weting (AREA)
DE19752526507 1974-06-24 1975-06-13 Verfahren zur herstellung einer halbleiterschicht Pending DE2526507A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US482193A US3902979A (en) 1974-06-24 1974-06-24 Insulator substrate with a thin mono-crystalline semiconductive layer and method of fabrication

Publications (1)

Publication Number Publication Date
DE2526507A1 true DE2526507A1 (de) 1976-01-15

Family

ID=23915091

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19752526507 Pending DE2526507A1 (de) 1974-06-24 1975-06-13 Verfahren zur herstellung einer halbleiterschicht

Country Status (5)

Country Link
US (1) US3902979A (https=)
JP (1) JPS5118475A (https=)
DE (1) DE2526507A1 (https=)
FR (1) FR2276690A1 (https=)
GB (1) GB1482616A (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0164646A3 (en) * 1984-06-15 1987-08-05 International Business Machines Corporation Buried field shield for an integrated circuit

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4180439A (en) * 1976-03-15 1979-12-25 International Business Machines Corporation Anodic etching method for the detection of electrically active defects in silicon
FR2344847A1 (fr) * 1976-03-15 1977-10-14 Ibm Procede de detection de defauts electriquement actifs dans un substrat de silicium de type n
US4118857A (en) * 1977-01-12 1978-10-10 The United States Of America As Represented By The Secretary Of The Army Flipped method for characterization of epitaxial layers
EP0191503A3 (en) * 1980-04-10 1986-09-10 Massachusetts Institute Of Technology Method of producing sheets of crystalline material
JPS5830145A (ja) * 1981-08-17 1983-02-22 Sony Corp 半導体装置の製造方法
JPS6011504A (ja) * 1983-06-30 1985-01-21 Nippon Paint Co Ltd 水分散型樹脂組成物
JPH0616537B2 (ja) * 1983-10-31 1994-03-02 株式会社東芝 半導体基体の製造方法
US4554059A (en) * 1983-11-04 1985-11-19 Harris Corporation Electrochemical dielectric isolation technique
FR2559960B1 (fr) * 1984-02-20 1987-03-06 Solems Sa Procede de formation de circuits electriques en couche mince et produits obtenus
JPH0770473B2 (ja) * 1985-02-08 1995-07-31 株式会社東芝 半導体基板の製造方法
US4601779A (en) * 1985-06-24 1986-07-22 International Business Machines Corporation Method of producing a thin silicon-on-insulator layer
US4952446A (en) * 1986-02-10 1990-08-28 Cornell Research Foundation, Inc. Ultra-thin semiconductor membranes
JPH07120757B2 (ja) * 1986-05-07 1995-12-20 セイコーエプソン株式会社 Ｓｏｉ基板及びその製造方法
HU199020B (en) * 1987-05-04 1989-12-28 Magyar Tudomanyos Akademia Method and apparatus for measuring the layer thickness of semiconductor layer structures
CA2061796C (en) * 1991-03-28 2002-12-24 Kalluri R. Sarma High mobility integrated drivers for active matrix displays
JPH0770694B2 (ja) * 1993-01-18 1995-07-31 株式会社東芝 半導体基体
US5512375A (en) * 1993-10-14 1996-04-30 Intevac, Inc. Pseudomorphic substrates
US5395481A (en) * 1993-10-18 1995-03-07 Regents Of The University Of California Method for forming silicon on a glass substrate
GB0612093D0 (en) * 2006-06-19 2006-07-26 Univ Belfast IC Substrate and Method of Manufacture of IC Substrate
US9287353B2 (en) * 2010-11-30 2016-03-15 Kyocera Corporation Composite substrate and method of manufacturing the same
AU2011337629A1 (en) * 2010-11-30 2013-05-02 Kyocera Corporation Composite substrate and production method

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3096262A (en) * 1958-10-23 1963-07-02 Shockley William Method of making thin slices of semiconductive material
GB1138401A (en) * 1965-05-06 1969-01-01 Mallory & Co Inc P R Bonding
NL153947B (nl) * 1967-02-25 1977-07-15 Philips Nv Werkwijze voor het vervaardigen van halfgeleiderinrichtingen, waarbij een selectief elektrolytisch etsproces wordt toegepast en halfgeleiderinrichting verkregen met toepassing van de werkwijze.
NL6910274A (https=) * 1969-07-04 1971-01-06
US3655540A (en) * 1970-06-22 1972-04-11 Bell Telephone Labor Inc Method of making semiconductor device components

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0164646A3 (en) * 1984-06-15 1987-08-05 International Business Machines Corporation Buried field shield for an integrated circuit

Also Published As

Publication number Publication date
US3902979A (en) 1975-09-02
FR2276690A1 (fr) 1976-01-23
JPS5118475A (https=) 1976-02-14
GB1482616A (en) 1977-08-10

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