DE2514840C3 - Verfahren und Vorrichtung zur photomechanischen Herstellung einer Siebdruckform - Google Patents
Verfahren und Vorrichtung zur photomechanischen Herstellung einer SiebdruckformInfo
- Publication number
- DE2514840C3 DE2514840C3 DE2514840A DE2514840A DE2514840C3 DE 2514840 C3 DE2514840 C3 DE 2514840C3 DE 2514840 A DE2514840 A DE 2514840A DE 2514840 A DE2514840 A DE 2514840A DE 2514840 C3 DE2514840 C3 DE 2514840C3
- Authority
- DE
- Germany
- Prior art keywords
- printing form
- template
- sleeve
- chamber
- sockets
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/24—Curved surfaces
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR7411960A FR2266903A1 (en) | 1974-04-04 | 1974-04-04 | Photochemical production of screen printing matrices - with negative-positive reproduction printing system with tubular negative and photo sensitised layers on matrix |
| FR7508019A FR2304105A2 (fr) | 1975-03-14 | 1975-03-14 | Procede et machine pour la realisation d'un ecran serigraphique par la methode photochimique |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| DE2514840A1 DE2514840A1 (de) | 1975-10-16 |
| DE2514840B2 DE2514840B2 (de) | 1979-04-26 |
| DE2514840C3 true DE2514840C3 (de) | 1980-01-03 |
Family
ID=26218265
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE2514840A Expired DE2514840C3 (de) | 1974-04-04 | 1975-04-04 | Verfahren und Vorrichtung zur photomechanischen Herstellung einer Siebdruckform |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US4037957A (OSRAM) |
| JP (1) | JPS5116106A (OSRAM) |
| DE (1) | DE2514840C3 (OSRAM) |
| NL (1) | NL166800C (OSRAM) |
| SE (1) | SE423799B (OSRAM) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2964409D1 (en) * | 1978-07-10 | 1983-02-03 | Akzo Nv | Process and apparatus for the manufacture of a relief printing form |
| US4334770A (en) * | 1978-12-22 | 1982-06-15 | Logetronics, Inc. | Method and apparatus for manipulating and transporting image media |
| US4262594A (en) * | 1978-12-22 | 1981-04-21 | Logescan Systems, Inc. | Method and apparatus for manipulating and transporting image media |
| AT382558B (de) * | 1985-02-12 | 1987-03-10 | Kufstein Schablonentech Gmbh | Verfahren und vorrichtung zur herstellung einer siebdruckschablone |
| NL8801218A (nl) * | 1988-04-16 | 1989-11-16 | Stork X Cel Bv | Werkwijze en inrichting voor het voor drukken gereedmaken van een rotatiezeefdrukschabloon. |
| CN1201532A (zh) * | 1995-09-29 | 1998-12-09 | 纽罗姆技术股份有限公司 | 数字光学媒体录制和复制系统 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS449363Y1 (OSRAM) * | 1968-08-05 | 1969-04-16 | ||
| DE6753683U (de) * | 1968-09-28 | 1969-06-19 | Kodak Ag | Vorrichtung zum photographischen duplizieren von mikroplanfilmen. |
| US3574460A (en) * | 1968-11-14 | 1971-04-13 | Alvin A Snaper | High-pressure gate for photographic contact printing |
| US3694080A (en) * | 1970-03-09 | 1972-09-26 | Massachusetts Inst Technology | Method of and apparatus for photoprinting conductor patterns on the curved surfaces of transducers |
| US3622241A (en) * | 1970-05-21 | 1971-11-23 | John L Dexter | Rotary photosensitive material printer |
| JPS5224418Y2 (OSRAM) * | 1971-05-29 | 1977-06-03 | ||
| JPS5129443B2 (OSRAM) * | 1972-07-20 | 1976-08-25 |
-
1975
- 1975-03-25 US US05/561,889 patent/US4037957A/en not_active Expired - Lifetime
- 1975-04-03 SE SE7503842A patent/SE423799B/xx unknown
- 1975-04-03 JP JP50039862A patent/JPS5116106A/ja active Granted
- 1975-04-04 DE DE2514840A patent/DE2514840C3/de not_active Expired
- 1975-04-04 NL NL7504012.A patent/NL166800C/xx not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| DE2514840B2 (de) | 1979-04-26 |
| SE423799B (sv) | 1982-06-07 |
| SE7503842L (sv) | 1975-10-06 |
| JPS5116106A (en) | 1976-02-09 |
| NL166800B (nl) | 1981-04-15 |
| NL7504012A (nl) | 1975-10-07 |
| NL166800C (nl) | 1981-09-15 |
| DE2514840A1 (de) | 1975-10-16 |
| JPS57491B2 (OSRAM) | 1982-01-06 |
| US4037957A (en) | 1977-07-26 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C3 | Grant after two publication steps (3rd publication) | ||
| 8328 | Change in the person/name/address of the agent |
Free format text: LIEDL, G., DIPL.-PHYS. NOETH, H., DIPL.-PHYS., PAT.-ANW., 8000 MUENCHEN |
|
| 8328 | Change in the person/name/address of the agent |
Free format text: LIEDL, G., DIPL.-PHYS., PAT.-ANW., 8000 MUENCHEN |
|
| 8339 | Ceased/non-payment of the annual fee |