DE2512933C2 - Lichtempfindliche Flachdruckplatte - Google Patents

Lichtempfindliche Flachdruckplatte

Info

Publication number
DE2512933C2
DE2512933C2 DE19752512933 DE2512933A DE2512933C2 DE 2512933 C2 DE2512933 C2 DE 2512933C2 DE 19752512933 DE19752512933 DE 19752512933 DE 2512933 A DE2512933 A DE 2512933A DE 2512933 C2 DE2512933 C2 DE 2512933C2
Authority
DE
Germany
Prior art keywords
photosensitive
plate
printing
weight
resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE19752512933
Other languages
German (de)
English (en)
Other versions
DE2512933A1 (de
Inventor
Kesanao Odawara Kanagawa Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of DE2512933A1 publication Critical patent/DE2512933A1/de
Application granted granted Critical
Publication of DE2512933C2 publication Critical patent/DE2512933C2/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
DE19752512933 1974-03-25 1975-03-24 Lichtempfindliche Flachdruckplatte Expired DE2512933C2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3326474A JPS5723253B2 (US08124317-20120228-C00018.png) 1974-03-25 1974-03-25

Publications (2)

Publication Number Publication Date
DE2512933A1 DE2512933A1 (de) 1975-10-02
DE2512933C2 true DE2512933C2 (de) 1983-11-10

Family

ID=12381649

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19752512933 Expired DE2512933C2 (de) 1974-03-25 1975-03-24 Lichtempfindliche Flachdruckplatte

Country Status (2)

Country Link
JP (1) JPS5723253B2 (US08124317-20120228-C00018.png)
DE (1) DE2512933C2 (US08124317-20120228-C00018.png)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3723411A1 (de) * 1986-07-18 1988-01-28 Tokyo Ohka Kogyo Co Ltd Hitzebestaendige, positiv-arbeitende photoresistzusammensetzung, verfahren zu ihrer herstellung und ihre verwendung
DE4013575A1 (de) * 1990-04-27 1991-10-31 Basf Ag Verfahren zur herstellung negativer reliefkopien

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5280022A (en) * 1975-12-26 1977-07-05 Fuji Photo Film Co Ltd Light solubilizable composition
DE2616992A1 (de) * 1976-04-17 1977-11-03 Agfa Gevaert Ag Lichtempfindliches material zur herstellung von druckformen und aetzresistagen
JPS54116218A (en) * 1978-03-02 1979-09-10 Oji Paper Co Photosensitive composition
JPS55527A (en) * 1978-06-16 1980-01-05 Fuji Photo Film Co Ltd Photosensitive planographic plate
JPS5557841A (en) * 1978-10-20 1980-04-30 Konishiroku Photo Ind Co Ltd Photosensitive composition
JPS55129341A (en) * 1979-03-29 1980-10-07 Daicel Chem Ind Ltd Photosensitive covering composition
JPS561045A (en) * 1979-06-16 1981-01-08 Konishiroku Photo Ind Co Ltd Photosensitive composition
JPS56140342A (en) * 1980-04-02 1981-11-02 Tokyo Ohka Kogyo Co Ltd Image forming composition and formation of resist image
DE3107109A1 (de) * 1981-02-26 1982-09-09 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch und daraus hergestelltes kopiermaterial
JPS5986046A (ja) * 1982-11-10 1984-05-18 Fuji Photo Film Co Ltd 感光性組成物
JPS5988734A (ja) * 1982-11-12 1984-05-22 Fuji Photo Film Co Ltd 感光性組成物
JPS5997146A (ja) * 1982-11-26 1984-06-04 Asahi Shinbunsha:Kk 感光性平版印刷版
JPS61193145A (ja) * 1985-02-21 1986-08-27 Japan Synthetic Rubber Co Ltd ネガ型レジスト
JPS62136636A (ja) * 1985-12-10 1987-06-19 Nec Corp ネガレジスト
JP2800217B2 (ja) * 1989-01-11 1998-09-21 ジェイエスアール株式会社 集積回路製造用感放射線性樹脂組成物
JPH02254450A (ja) * 1989-03-29 1990-10-15 Toshiba Corp レジスト
DE69029104T2 (de) 1989-07-12 1997-03-20 Fuji Photo Film Co Ltd Polysiloxane und positiv arbeitende Resistmasse
JP3063148B2 (ja) * 1989-12-27 2000-07-12 住友化学工業株式会社 ポジ型レジスト組成物
TW202504B (US08124317-20120228-C00018.png) * 1990-02-23 1993-03-21 Sumitomo Chemical Co
JPH0656488B2 (ja) * 1990-05-01 1994-07-27 日本合成ゴム株式会社 ポジ型感光性樹脂組成物
US5773194A (en) 1995-09-08 1998-06-30 Konica Corporation Light sensitive composition, presensitized lithographic printing plate and image forming method employing the printing plate
JP4527509B2 (ja) 2003-12-26 2010-08-18 岡本化学工業株式会社 平版印刷版用アルミニウム支持体および平版印刷版用原版
US20090081592A1 (en) 2007-09-26 2009-03-26 Fujifilm Corporation Fountain solution composition for lithographic printing and heat-set offset rotary printing process
EP2042339B1 (en) 2007-09-26 2013-05-22 FUJIFILM Corporation Fountain solution composition for lithographic printing and heatset offset rotary printing process
JP2009083106A (ja) 2007-09-27 2009-04-23 Fujifilm Corp 平版印刷版用版面保護剤及び平版印刷版の製版方法
JP5089422B2 (ja) 2008-02-15 2012-12-05 岡本化学工業株式会社 感光性組成物およびそれを用いた平版印刷版用原版
JP2009234247A (ja) 2008-03-07 2009-10-15 Fujifilm Corp 平版印刷用湿し水組成物及びヒートセットオフ輪印刷方法
JP5288268B2 (ja) 2009-03-25 2013-09-11 富士フイルム株式会社 平版印刷用湿し水組成物及びヒートセットオフ輪印刷方法
JP5281130B2 (ja) 2011-07-05 2013-09-04 富士フイルム株式会社 平版印刷用湿し水組成物

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1113759A (en) * 1965-12-17 1968-05-15 Fuji Photo Film Co Ltd Lithographic printing plates
JPS505083B1 (US08124317-20120228-C00018.png) * 1970-09-16 1975-02-28
US3666473A (en) * 1970-10-06 1972-05-30 Ibm Positive photoresists for projection exposure
JPS5423571B2 (US08124317-20120228-C00018.png) * 1971-12-13 1979-08-15

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3723411A1 (de) * 1986-07-18 1988-01-28 Tokyo Ohka Kogyo Co Ltd Hitzebestaendige, positiv-arbeitende photoresistzusammensetzung, verfahren zu ihrer herstellung und ihre verwendung
DE4013575A1 (de) * 1990-04-27 1991-10-31 Basf Ag Verfahren zur herstellung negativer reliefkopien

Also Published As

Publication number Publication date
JPS50125806A (US08124317-20120228-C00018.png) 1975-10-03
JPS5723253B2 (US08124317-20120228-C00018.png) 1982-05-18
DE2512933A1 (de) 1975-10-02

Similar Documents

Publication Publication Date Title
DE2512933C2 (de) Lichtempfindliche Flachdruckplatte
DE2744097C2 (de) Verfahren zur Entwicklung einer bildweise belichteten lichtempfindlichen lithographischen Druckplatte sowie Verwendung einer Entwicklerlösung zum Entwickeln einer Druckplatte
US4123279A (en) Light-sensitive o-quinonediazide containing planographic printing plate
DE2657922C2 (de) Lichtempfindliches Gemisch
DE2147947C2 (de) Lichtempfindliches Gemisch
DE2322230C2 (de) Lichtempfindliches Gemisch und dessen Verwendung
DE2725762C2 (de) Verfahren zur Herstellung einer lithographischen Druckform
EP0155620B1 (de) Einbrenngummierung für Offsetdruckplatten und Verfahren zur Herstellung einer Offsetdruckform
DE2925360C2 (de) Oberflächenschutzmittel für lithographische Druckplatten
EP0222297B1 (de) Einbrenngummierung für Offsetdruckplatten
DE3009873A1 (de) Photoempfindliche masse
DE1447963A1 (de) Verfahren zur Herstellung einer Druckplatte aus vorsenslbilisiertem Druckplattenmaterial
DE3705342A1 (de) Lichtempfindliche zusammensetzung
DE2912060A1 (de) Traeger zur herstellung einer lithographischen platte
DE1447916B2 (de) Verfahren zur herstellung einer feuchtigkeitsfesten, lichtempfindlichen flachdruckplatte
DE2903270A1 (de) Lichtempfindliches gemisch
DE2507548C2 (de) Vorsensibilisierte lithographische Druckplatte und deren Verwendung zur Erzeugung von Bildern
DE2925362C2 (de) Schutzmittel vom Emulsionstyp für die Oberfläche von lithographischen Druckplatten
DE2925363A1 (de) Schutzmittel fuer die oberflaeche lithographischer druckplatten
DE3201151A1 (de) Positive lichtempfindliche masse und diese enthaltendes positives lichtempfindliches aufzeichnungsmaterial
DE2533156A1 (de) Verfahren zur herstellung von lichtempfindlichen druckplatten
EP0200913B1 (de) Entwicklergemisch, dessen Verwendung und ein Verfahren zur Herstellung von Flachdruckplatten mit diesem Entwickler
DE2305231C3 (de) Verfahren zur Herstellung einer vorsensibilisierten lithographischen Druckplatte
DE1572068B2 (de) Lichtempfindliche Schicht zur Herstellung von Druckformen
DE1931026A1 (de) Lichtempfindliche harzartige Zusammensetzungen

Legal Events

Date Code Title Description
OD Request for examination
8128 New person/name/address of the agent

Representative=s name: KOHLER, M., DIPL.-CHEM. DR.RER.NAT., PAT.-ANW., 80

D2 Grant after examination
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Free format text: SOLF, A., DR.-ING., 8000 MUENCHEN ZAPF, C., DIPL.-ING., PAT.-ANW., 5600 WUPPERTAL