DE2360350A1 - Verfahren zur photopolymerisation aethylenisch ungesaettigter verbindungen - Google Patents

Verfahren zur photopolymerisation aethylenisch ungesaettigter verbindungen

Info

Publication number
DE2360350A1
DE2360350A1 DE19732360350 DE2360350A DE2360350A1 DE 2360350 A1 DE2360350 A1 DE 2360350A1 DE 19732360350 DE19732360350 DE 19732360350 DE 2360350 A DE2360350 A DE 2360350A DE 2360350 A1 DE2360350 A1 DE 2360350A1
Authority
DE
Germany
Prior art keywords
group
formula
ring
groups
compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
DE19732360350
Other languages
German (de)
English (en)
Inventor
Niklaus Dr Baumann
Hans-Peter Schlunke
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Novartis AG
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Publication of DE2360350A1 publication Critical patent/DE2360350A1/de
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D241/00—Heterocyclic compounds containing 1,4-diazine or hydrogenated 1,4-diazine rings
    • C07D241/36—Heterocyclic compounds containing 1,4-diazine or hydrogenated 1,4-diazine rings condensed with carbocyclic rings or ring systems
    • C07D241/38—Heterocyclic compounds containing 1,4-diazine or hydrogenated 1,4-diazine rings condensed with carbocyclic rings or ring systems with only hydrogen or carbon atoms directly attached to the ring nitrogen atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D241/00—Heterocyclic compounds containing 1,4-diazine or hydrogenated 1,4-diazine rings
    • C07D241/36—Heterocyclic compounds containing 1,4-diazine or hydrogenated 1,4-diazine rings condensed with carbocyclic rings or ring systems
    • C07D241/38—Heterocyclic compounds containing 1,4-diazine or hydrogenated 1,4-diazine rings condensed with carbocyclic rings or ring systems with only hydrogen or carbon atoms directly attached to the ring nitrogen atoms
    • C07D241/40—Benzopyrazines
    • C07D241/42—Benzopyrazines with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the hetero ring
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D471/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, at least one ring being a six-membered ring with one nitrogen atom, not provided for by groups C07D451/00 - C07D463/00
    • C07D471/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, at least one ring being a six-membered ring with one nitrogen atom, not provided for by groups C07D451/00 - C07D463/00 in which the condensed system contains two hetero rings
    • C07D471/04—Ortho-condensed systems
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D491/00—Heterocyclic compounds containing in the condensed ring system both one or more rings having oxygen atoms as the only ring hetero atoms and one or more rings having nitrogen atoms as the only ring hetero atoms, not provided for by groups C07D451/00 - C07D459/00, C07D463/00, C07D477/00 or C07D489/00
    • C07D491/02—Heterocyclic compounds containing in the condensed ring system both one or more rings having oxygen atoms as the only ring hetero atoms and one or more rings having nitrogen atoms as the only ring hetero atoms, not provided for by groups C07D451/00 - C07D459/00, C07D463/00, C07D477/00 or C07D489/00 in which the condensed system contains two hetero rings
    • C07D491/04—Ortho-condensed systems
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D495/00—Heterocyclic compounds containing in the condensed system at least one hetero ring having sulfur atoms as the only ring hetero atoms
    • C07D495/02—Heterocyclic compounds containing in the condensed system at least one hetero ring having sulfur atoms as the only ring hetero atoms in which the condensed system contains two hetero rings
    • C07D495/04—Ortho-condensed systems
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Polymerisation Methods In General (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
DE19732360350 1972-12-05 1973-12-04 Verfahren zur photopolymerisation aethylenisch ungesaettigter verbindungen Ceased DE2360350A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH1765872A CH573448A5 (US07935154-20110503-C00018.png) 1972-12-05 1972-12-05

Publications (1)

Publication Number Publication Date
DE2360350A1 true DE2360350A1 (de) 1974-06-06

Family

ID=4427103

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19732360350 Ceased DE2360350A1 (de) 1972-12-05 1973-12-04 Verfahren zur photopolymerisation aethylenisch ungesaettigter verbindungen

Country Status (8)

Country Link
JP (2) JPS5928205B2 (US07935154-20110503-C00018.png)
BE (1) BE808179A (US07935154-20110503-C00018.png)
CA (1) CA980350A (US07935154-20110503-C00018.png)
CH (1) CH573448A5 (US07935154-20110503-C00018.png)
DE (1) DE2360350A1 (US07935154-20110503-C00018.png)
FR (2) FR2217355B1 (US07935154-20110503-C00018.png)
GB (1) GB1436589A (US07935154-20110503-C00018.png)
NL (1) NL7315878A (US07935154-20110503-C00018.png)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH621545A5 (US07935154-20110503-C00018.png) * 1976-05-24 1981-02-13 Ciba Geigy Ag
JPS6026122B2 (ja) * 1977-01-20 1985-06-21 富士写真フイルム株式会社 光重合性組成物
DE10029929A1 (de) * 2000-06-17 2001-12-20 Henkel Kgaa Mittel zum Färben von keratinhaltigen Faser
JP4291638B2 (ja) 2003-07-29 2009-07-08 富士フイルム株式会社 アルカリ可溶性ポリマー及びそれを用いた平版印刷版原版
JP5089866B2 (ja) 2004-09-10 2012-12-05 富士フイルム株式会社 平版印刷方法
JP4538350B2 (ja) 2005-03-18 2010-09-08 富士フイルム株式会社 感光性組成物および画像記録材料並びに画像記録方法
JP4777226B2 (ja) 2006-12-07 2011-09-21 富士フイルム株式会社 画像記録材料、及び新規化合物
JP4860525B2 (ja) 2007-03-27 2012-01-25 富士フイルム株式会社 硬化性組成物及び平版印刷版原版
TW200925214A (en) 2007-09-06 2009-06-16 Fujifilm Corp Processed pigment, pigment-dispersed composition, colored photosensitive composition, color filter, liquid crystal display element, and solid image pickup element
JP2009091555A (ja) 2007-09-18 2009-04-30 Fujifilm Corp 硬化性組成物、画像形成材料及び平版印刷版原版
US9442372B2 (en) 2007-09-26 2016-09-13 Fujifilm Corporation Pigment dispersion composition, photocurable composition and color filter
ATE475906T1 (de) 2007-09-28 2010-08-15 Fujifilm Corp Negatives lichtempfindliches material und negativer planographischer druckplattenvorläufer
JP4890408B2 (ja) 2007-09-28 2012-03-07 富士フイルム株式会社 重合性組成物及びそれを用いた平版印刷版原版、アルカリ可溶性ポリウレタン樹脂、並びに、ジオール化合物の製造方法
KR101654666B1 (ko) 2008-03-17 2016-09-06 후지필름 가부시키가이샤 안료 분산 조성물, 착색 감광성 조성물, 광경화성 조성물, 컬러필터, 액정표시소자, 및 고체촬상소자
US7923197B2 (en) 2008-03-25 2011-04-12 Fujifilm Corporation Lithographic printing plate precursor
JP5554106B2 (ja) 2009-03-31 2014-07-23 富士フイルム株式会社 着色硬化性組成物、カラーフィルタの製造方法、カラーフィルタ、固体撮像素子、および液晶表示装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1085868A (fr) * 1952-05-30 1955-02-08 Ciba Geigy Procédé de préparation de nouveaux composés de la quinoxaline
US3573922A (en) * 1965-04-23 1971-04-06 Hughes Aircraft Co Photopolymerizable composition and process
DE2039861A1 (de) * 1970-08-11 1972-02-17 Kalle Ag Photopolymerisierbare Kopiermasse

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1085868A (fr) * 1952-05-30 1955-02-08 Ciba Geigy Procédé de préparation de nouveaux composés de la quinoxaline
US3573922A (en) * 1965-04-23 1971-04-06 Hughes Aircraft Co Photopolymerizable composition and process
DE2039861A1 (de) * 1970-08-11 1972-02-17 Kalle Ag Photopolymerisierbare Kopiermasse

Also Published As

Publication number Publication date
NL7315878A (US07935154-20110503-C00018.png) 1974-06-07
BE808179A (fr) 1974-06-04
CH573448A5 (US07935154-20110503-C00018.png) 1976-03-15
JPS5924147B2 (ja) 1984-06-07
CA980350A (en) 1975-12-23
GB1436589A (en) 1976-05-19
FR2221453A1 (US07935154-20110503-C00018.png) 1974-10-11
FR2221453B1 (US07935154-20110503-C00018.png) 1978-09-08
FR2217355A1 (US07935154-20110503-C00018.png) 1974-09-06
JPS4986383A (US07935154-20110503-C00018.png) 1974-08-19
JPS4987780A (US07935154-20110503-C00018.png) 1974-08-22
FR2217355B1 (US07935154-20110503-C00018.png) 1977-06-10
JPS5928205B2 (ja) 1984-07-11

Similar Documents

Publication Publication Date Title
DE2360350A1 (de) Verfahren zur photopolymerisation aethylenisch ungesaettigter verbindungen
DE2661043C2 (US07935154-20110503-C00018.png)
DE2704368C2 (US07935154-20110503-C00018.png)
DE2717778C3 (de) Lichtempfindliches Gemisch
DE2150691C2 (de) Lichtempfindliches Gemisch und Verwendung eines lichtempfindlichen Gemisches zur Herstellung einer Flachdruckplatte
DE1768083A1 (de) AEthylenisch ungesaettigte Derivate von Benzophenon und vernetzbare Polymere daraus
DE1795089B2 (de) Photopolymerisierbares Material
DE2445782B2 (de) Photographisches Aufzeichnungsmaterial mit Bildempfangs- oder Lichthofschutzschicht
DE1745226B2 (de) Verfahren zur Herstellung von vernetzbaren, fotopolymerisierbaren Mischpolymeren und ihre Verwendung
DE2020939C3 (de) Photographisches Aufzeichnungsmaterial
DE2228258C3 (de) Strahlungsempfindliches photographisches Aufzeichnungsmaterial
DE2403100A1 (de) Aufzeichnungsverfahren mit photolytischer und/oder thermolytischer erzeugung von aminoverbindungen
DE1129510B (de) Thermographisches Kopiermaterial
DE1643765A1 (de) Strahlungsempfindliches Material
DE1547744A1 (de) Photographisches Material
DE1299219B (de) Verfahren zur Herstellung von Reliefbildern durch Photoelektro-polymerisation
DE2230936B2 (US07935154-20110503-C00018.png)
DE1770629A1 (de) Fotoelektrisches Polymerisationsverfahren
DE2245433B2 (de) Lichtempfindliches Gemisch
DE2802666A1 (de) Photoempfindliche aufzeichnungsmaterialien und verfahren zu deren verwendung
DE2525674A1 (de) Verfahren zur herstellung von stabilen polymer-bildern durch photopolymerisation in einer matrix
DE1940690A1 (de) Verfahren zur Herstellung von bildmaessigen Aufzeichnungen
DE2251828C2 (de) Lichtempfindliche polymere Ester und ihre Verwendung
DE1720216A1 (de) Photopolymerisations-Verfahren
DE1959052A1 (de) Photopolymerisationsverfahren

Legal Events

Date Code Title Description
8128 New person/name/address of the agent

Representative=s name: SCHWABE, H., DIPL.-ING. SANDMAIR, K., DIPL.-CHEM.

8131 Rejection