GB1436589A - Process for the photopolymerisation of ethylenically unsaturate compounds - Google Patents

Process for the photopolymerisation of ethylenically unsaturate compounds

Info

Publication number
GB1436589A
GB1436589A GB5592573A GB5592573A GB1436589A GB 1436589 A GB1436589 A GB 1436589A GB 5592573 A GB5592573 A GB 5592573A GB 5592573 A GB5592573 A GB 5592573A GB 1436589 A GB1436589 A GB 1436589A
Authority
GB
United Kingdom
Prior art keywords
dec
photopolymerisation
compounds
ethylenically unsaturate
unsaturate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB5592573A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Novartis AG
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Priority to GB1841975A priority Critical patent/GB1436590A/en
Publication of GB1436589A publication Critical patent/GB1436589A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D241/00—Heterocyclic compounds containing 1,4-diazine or hydrogenated 1,4-diazine rings
    • C07D241/36—Heterocyclic compounds containing 1,4-diazine or hydrogenated 1,4-diazine rings condensed with carbocyclic rings or ring systems
    • C07D241/38—Heterocyclic compounds containing 1,4-diazine or hydrogenated 1,4-diazine rings condensed with carbocyclic rings or ring systems with only hydrogen or carbon atoms directly attached to the ring nitrogen atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D241/00—Heterocyclic compounds containing 1,4-diazine or hydrogenated 1,4-diazine rings
    • C07D241/36—Heterocyclic compounds containing 1,4-diazine or hydrogenated 1,4-diazine rings condensed with carbocyclic rings or ring systems
    • C07D241/38—Heterocyclic compounds containing 1,4-diazine or hydrogenated 1,4-diazine rings condensed with carbocyclic rings or ring systems with only hydrogen or carbon atoms directly attached to the ring nitrogen atoms
    • C07D241/40—Benzopyrazines
    • C07D241/42—Benzopyrazines with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the hetero ring
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D471/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, at least one ring being a six-membered ring with one nitrogen atom, not provided for by groups C07D451/00 - C07D463/00
    • C07D471/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, at least one ring being a six-membered ring with one nitrogen atom, not provided for by groups C07D451/00 - C07D463/00 in which the condensed system contains two hetero rings
    • C07D471/04—Ortho-condensed systems
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D491/00—Heterocyclic compounds containing in the condensed ring system both one or more rings having oxygen atoms as the only ring hetero atoms and one or more rings having nitrogen atoms as the only ring hetero atoms, not provided for by groups C07D451/00 - C07D459/00, C07D463/00, C07D477/00 or C07D489/00
    • C07D491/02—Heterocyclic compounds containing in the condensed ring system both one or more rings having oxygen atoms as the only ring hetero atoms and one or more rings having nitrogen atoms as the only ring hetero atoms, not provided for by groups C07D451/00 - C07D459/00, C07D463/00, C07D477/00 or C07D489/00 in which the condensed system contains two hetero rings
    • C07D491/04—Ortho-condensed systems
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D495/00—Heterocyclic compounds containing in the condensed system at least one hetero ring having sulfur atoms as the only ring hetero atoms
    • C07D495/02—Heterocyclic compounds containing in the condensed system at least one hetero ring having sulfur atoms as the only ring hetero atoms in which the condensed system contains two hetero rings
    • C07D495/04—Ortho-condensed systems
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Polymerisation Methods In General (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
  • Plural Heterocyclic Compounds (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)

Abstract

1436589 Photoinitiators CIBA-GEIGY AG 3 Dec 1973 [5 Dec 1972] 55925/73 Heading C3P [Also in Division G2] Photopolymerizable compositions, especially for image recording, comprise as photoinitiator a photoredox pair which are an electron donor together with a diazine compound containing the ring system in which Z is nitrogen or carbon, or a quaternized derivative; radiation of wavelength 200- 450 nm. is used for the photopolymerization. Many diazines are exemplified together with, as electron donors, sulphinic acids or esters, phosphones or arsines; water-soluble materials are preferred. Reference has been directed by the Comptroller to Specifications 1,354,541 and 1,357,367.
GB5592573A 1972-12-05 1973-12-03 Process for the photopolymerisation of ethylenically unsaturate compounds Expired GB1436589A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB1841975A GB1436590A (en) 1972-12-05 1973-12-03 Quinoxalium salts

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH1765872A CH573448A5 (en) 1972-12-05 1972-12-05

Publications (1)

Publication Number Publication Date
GB1436589A true GB1436589A (en) 1976-05-19

Family

ID=4427103

Family Applications (1)

Application Number Title Priority Date Filing Date
GB5592573A Expired GB1436589A (en) 1972-12-05 1973-12-03 Process for the photopolymerisation of ethylenically unsaturate compounds

Country Status (8)

Country Link
JP (2) JPS5928205B2 (en)
BE (1) BE808179A (en)
CA (1) CA980350A (en)
CH (1) CH573448A5 (en)
DE (1) DE2360350A1 (en)
FR (2) FR2217355B1 (en)
GB (1) GB1436589A (en)
NL (1) NL7315878A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001097754A2 (en) * 2000-06-17 2001-12-27 Henkel Kommanditgesellschaft Auf Aktien Agent for dyeing fibres containing keratin, containing at least one quinoxaline derivative

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH621545A5 (en) * 1976-05-24 1981-02-13 Ciba Geigy Ag
JPS6026122B2 (en) * 1977-01-20 1985-06-21 富士写真フイルム株式会社 Photopolymerizable composition
JP4291638B2 (en) 2003-07-29 2009-07-08 富士フイルム株式会社 Alkali-soluble polymer and planographic printing plate precursor using the same
JP5089866B2 (en) 2004-09-10 2012-12-05 富士フイルム株式会社 Planographic printing method
JP4538350B2 (en) 2005-03-18 2010-09-08 富士フイルム株式会社 Photosensitive composition, image recording material, and image recording method
JP4777226B2 (en) 2006-12-07 2011-09-21 富士フイルム株式会社 Image recording materials and novel compounds
JP4860525B2 (en) 2007-03-27 2012-01-25 富士フイルム株式会社 Curable composition and planographic printing plate precursor
TW200925214A (en) 2007-09-06 2009-06-16 Fujifilm Corp Processed pigment, pigment-dispersed composition, colored photosensitive composition, color filter, liquid crystal display element, and solid image pickup element
JP2009091555A (en) 2007-09-18 2009-04-30 Fujifilm Corp Curable composition, image forming material and planographic printing plate precursor
US9442372B2 (en) 2007-09-26 2016-09-13 Fujifilm Corporation Pigment dispersion composition, photocurable composition and color filter
ATE475906T1 (en) 2007-09-28 2010-08-15 Fujifilm Corp NEGATIVE LIGHT SENSITIVE MATERIAL AND NEGATIVE PLANOGRAPHIC PRINTING PLATE PRECURSOR
JP4890408B2 (en) 2007-09-28 2012-03-07 富士フイルム株式会社 Polymerizable composition, lithographic printing plate precursor using the same, alkali-soluble polyurethane resin, and method for producing diol compound
KR101654666B1 (en) 2008-03-17 2016-09-06 후지필름 가부시키가이샤 Pigment-dispersed composition, colored photosensitive composition, photocurable composition, color filter, liquid crystal display element, and solid image pickup element
US7923197B2 (en) 2008-03-25 2011-04-12 Fujifilm Corporation Lithographic printing plate precursor
JP5554106B2 (en) 2009-03-31 2014-07-23 富士フイルム株式会社 Colored curable composition, method for producing color filter, color filter, solid-state imaging device, and liquid crystal display device

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1085868A (en) * 1952-05-30 1955-02-08 Ciba Geigy Process for the preparation of novel quinoxaline compounds
US3573922A (en) * 1965-04-23 1971-04-06 Hughes Aircraft Co Photopolymerizable composition and process
DE2039861C3 (en) * 1970-08-11 1973-12-13 Kalle Ag, 6202 Wiesbaden-Biebrich Photopolymerizable copying compound

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001097754A2 (en) * 2000-06-17 2001-12-27 Henkel Kommanditgesellschaft Auf Aktien Agent for dyeing fibres containing keratin, containing at least one quinoxaline derivative
WO2001097754A3 (en) * 2000-06-17 2002-05-23 Henkel Kgaa Agent for dyeing fibres containing keratin, containing at least one quinoxaline derivative

Also Published As

Publication number Publication date
NL7315878A (en) 1974-06-07
BE808179A (en) 1974-06-04
CH573448A5 (en) 1976-03-15
JPS5924147B2 (en) 1984-06-07
CA980350A (en) 1975-12-23
FR2221453A1 (en) 1974-10-11
FR2221453B1 (en) 1978-09-08
DE2360350A1 (en) 1974-06-06
FR2217355A1 (en) 1974-09-06
JPS4986383A (en) 1974-08-19
JPS4987780A (en) 1974-08-22
FR2217355B1 (en) 1977-06-10
JPS5928205B2 (en) 1984-07-11

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee