DE2163178A1 - Verfahren zur Erhöhung der Empfindlichkeit sauerstoffempfindlicher Photolackschichten - Google Patents
Verfahren zur Erhöhung der Empfindlichkeit sauerstoffempfindlicher PhotolackschichtenInfo
- Publication number
- DE2163178A1 DE2163178A1 DE19712163178 DE2163178A DE2163178A1 DE 2163178 A1 DE2163178 A1 DE 2163178A1 DE 19712163178 DE19712163178 DE 19712163178 DE 2163178 A DE2163178 A DE 2163178A DE 2163178 A1 DE2163178 A1 DE 2163178A1
- Authority
- DE
- Germany
- Prior art keywords
- oxygen
- layer
- photoresist
- photoresist layer
- sensitivity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229920002120 photoresistant polymer Polymers 0.000 title claims description 32
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 title claims description 21
- 239000001301 oxygen Substances 0.000 title claims description 21
- 229910052760 oxygen Inorganic materials 0.000 title claims description 21
- 238000000034 method Methods 0.000 title claims description 19
- 230000035945 sensitivity Effects 0.000 title claims description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 31
- 229910052757 nitrogen Inorganic materials 0.000 claims description 15
- 108010010803 Gelatin Proteins 0.000 claims description 9
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 9
- 229920000159 gelatin Polymers 0.000 claims description 9
- 239000008273 gelatin Substances 0.000 claims description 9
- 235000019322 gelatine Nutrition 0.000 claims description 9
- 235000011852 gelatine desserts Nutrition 0.000 claims description 9
- 230000005855 radiation Effects 0.000 claims description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 8
- 239000012153 distilled water Substances 0.000 claims description 6
- 239000011347 resin Substances 0.000 claims description 6
- 229920005989 resin Polymers 0.000 claims description 6
- 239000000080 wetting agent Substances 0.000 claims description 4
- ZPWSKXDJLWXYSL-UHFFFAOYSA-L zinc;4-diazo-n,n-dimethylcyclohexa-1,5-dien-1-amine;dichloride Chemical compound [Cl-].[Cl-].[Zn+2].CN(C)C1=CCC(=[N+]=[N-])C=C1 ZPWSKXDJLWXYSL-UHFFFAOYSA-L 0.000 claims description 4
- 239000011261 inert gas Substances 0.000 claims description 3
- 239000000463 material Substances 0.000 claims description 3
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 2
- 239000012954 diazonium Substances 0.000 claims 1
- 150000001989 diazonium salts Chemical class 0.000 claims 1
- 239000010410 layer Substances 0.000 description 31
- 230000001681 protective effect Effects 0.000 description 8
- 150000008049 diazo compounds Chemical class 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000001035 drying Methods 0.000 description 4
- 239000011241 protective layer Substances 0.000 description 4
- 238000010926 purge Methods 0.000 description 4
- 238000000576 coating method Methods 0.000 description 3
- 238000002508 contact lithography Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 2
- WQYVRQLZKVEZGA-UHFFFAOYSA-N hypochlorite Chemical compound Cl[O-] WQYVRQLZKVEZGA-UHFFFAOYSA-N 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000007844 bleaching agent Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- UPBDXRPQPOWRKR-UHFFFAOYSA-N furan-2,5-dione;methoxyethene Chemical compound COC=C.O=C1OC(=O)C=C1 UPBDXRPQPOWRKR-UHFFFAOYSA-N 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- XJRBAMWJDBPFIM-UHFFFAOYSA-N methyl vinyl ether Chemical compound COC=C XJRBAMWJDBPFIM-UHFFFAOYSA-N 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 238000006552 photochemical reaction Methods 0.000 description 1
- 239000003223 protective agent Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
Landscapes
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10043770A | 1970-12-21 | 1970-12-21 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE2163178A1 true DE2163178A1 (de) | 1972-07-13 |
Family
ID=22279771
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19712163178 Pending DE2163178A1 (de) | 1970-12-21 | 1971-12-20 | Verfahren zur Erhöhung der Empfindlichkeit sauerstoffempfindlicher Photolackschichten |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US3669667A (enExample) |
| DE (1) | DE2163178A1 (enExample) |
| FR (1) | FR2119316A5 (enExample) |
| GB (1) | GB1354756A (enExample) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4784936A (en) * | 1985-10-24 | 1988-11-15 | General Electric Company | Process of forming a resist structure on substrate having topographical features using positive photoresist layer and poly(vinyl pyrrolidone) overlayer |
| US6541183B2 (en) * | 2001-06-04 | 2003-04-01 | Gary Ganghui Teng | Negative lithographic printing plates having a semisolid radiation-sensitive layer |
| US8708703B2 (en) * | 2005-08-15 | 2014-04-29 | Matthew Earl Fluster | Method and apparatus for teaching mathematics |
-
1970
- 1970-12-21 US US100437A patent/US3669667A/en not_active Expired - Lifetime
-
1971
- 1971-09-02 GB GB4086971A patent/GB1354756A/en not_active Expired
- 1971-10-12 FR FR7137580A patent/FR2119316A5/fr not_active Expired
- 1971-12-20 DE DE19712163178 patent/DE2163178A1/de active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| US3669667A (en) | 1972-06-13 |
| GB1354756A (en) | 1974-06-05 |
| FR2119316A5 (enExample) | 1972-08-04 |
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