FR2119316A5 - - Google Patents

Info

Publication number
FR2119316A5
FR2119316A5 FR7137580A FR7137580A FR2119316A5 FR 2119316 A5 FR2119316 A5 FR 2119316A5 FR 7137580 A FR7137580 A FR 7137580A FR 7137580 A FR7137580 A FR 7137580A FR 2119316 A5 FR2119316 A5 FR 2119316A5
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7137580A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of FR2119316A5 publication Critical patent/FR2119316A5/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
FR7137580A 1970-12-21 1971-10-12 Expired FR2119316A5 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10043770A 1970-12-21 1970-12-21

Publications (1)

Publication Number Publication Date
FR2119316A5 true FR2119316A5 (fr) 1972-08-04

Family

ID=22279771

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7137580A Expired FR2119316A5 (fr) 1970-12-21 1971-10-12

Country Status (4)

Country Link
US (1) US3669667A (fr)
DE (1) DE2163178A1 (fr)
FR (1) FR2119316A5 (fr)
GB (1) GB1354756A (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4784936A (en) * 1985-10-24 1988-11-15 General Electric Company Process of forming a resist structure on substrate having topographical features using positive photoresist layer and poly(vinyl pyrrolidone) overlayer
US6541183B2 (en) * 2001-06-04 2003-04-01 Gary Ganghui Teng Negative lithographic printing plates having a semisolid radiation-sensitive layer
US8708703B2 (en) * 2005-08-15 2014-04-29 Matthew Earl Fluster Method and apparatus for teaching mathematics

Also Published As

Publication number Publication date
DE2163178A1 (de) 1972-07-13
GB1354756A (en) 1974-06-05
US3669667A (en) 1972-06-13

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Legal Events

Date Code Title Description
ST Notification of lapse