DE2154120A1 - Verfahren zur Herstellung von Halbleiter-Anordnungen - Google Patents

Verfahren zur Herstellung von Halbleiter-Anordnungen

Info

Publication number
DE2154120A1
DE2154120A1 DE19712154120 DE2154120A DE2154120A1 DE 2154120 A1 DE2154120 A1 DE 2154120A1 DE 19712154120 DE19712154120 DE 19712154120 DE 2154120 A DE2154120 A DE 2154120A DE 2154120 A1 DE2154120 A1 DE 2154120A1
Authority
DE
Germany
Prior art keywords
substrate
insulation layer
diffusion
exposed
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19712154120
Other languages
German (de)
English (en)
Inventor
Ichiro; Kaji Tadao; Hayasaka Akio; Kokubunji Tokio; Uehara Keijiro Tokio; Imaizumi (Japan). M
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of DE2154120A1 publication Critical patent/DE2154120A1/de
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D10/00—Bipolar junction transistors [BJT]
    • H10D10/60—Lateral BJTs
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/033—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
    • H01L23/291—Oxides or nitrides or carbides, e.g. ceramics, glass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/043—Dual dielectric
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S148/00—Metal treatment
    • Y10S148/114—Nitrides of silicon

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Ceramic Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Bipolar Transistors (AREA)
  • Weting (AREA)
DE19712154120 1970-10-30 1971-10-29 Verfahren zur Herstellung von Halbleiter-Anordnungen Pending DE2154120A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP45095083A JPS4929785B1 (enExample) 1970-10-30 1970-10-30

Publications (1)

Publication Number Publication Date
DE2154120A1 true DE2154120A1 (de) 1972-06-29

Family

ID=14128035

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19712154120 Pending DE2154120A1 (de) 1970-10-30 1971-10-29 Verfahren zur Herstellung von Halbleiter-Anordnungen

Country Status (4)

Country Link
US (1) US3850708A (enExample)
JP (1) JPS4929785B1 (enExample)
DE (1) DE2154120A1 (enExample)
NL (1) NL7114918A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0060761A1 (fr) * 1981-03-13 1982-09-22 Societe Pour L'etude Et La Fabrication De Circuits Integres Speciaux - E.F.C.I.S. Transistor bipolaire latéral sur isolant et son procédé de fabrication

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3912558A (en) * 1974-05-03 1975-10-14 Fairchild Camera Instr Co Method of MOS circuit fabrication
US3967988A (en) * 1974-08-05 1976-07-06 Motorola, Inc. Diffusion guarded metal-oxide-silicon field effect transistors
GB2158639B (en) * 1984-05-12 1988-02-10 Ferranti Plc Fabricating semiconductor devices
US4589002A (en) * 1984-07-18 1986-05-13 Rca Corporation Diode structure

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3326729A (en) * 1963-08-20 1967-06-20 Hughes Aircraft Co Epitaxial method for the production of microcircuit components
US3342650A (en) * 1964-02-10 1967-09-19 Hitachi Ltd Method of making semiconductor devices by double masking
GB1150834A (en) * 1966-10-05 1969-05-07 Rca Corp Method of fabricating semiconductor devices
US3544399A (en) * 1966-10-26 1970-12-01 Hughes Aircraft Co Insulated gate field-effect transistor (igfet) with semiconductor gate electrode
US3537921A (en) * 1967-02-28 1970-11-03 Motorola Inc Selective hydrofluoric acid etching and subsequent processing
US3475234A (en) * 1967-03-27 1969-10-28 Bell Telephone Labor Inc Method for making mis structures
US3576478A (en) * 1969-07-22 1971-04-27 Philco Ford Corp Igfet comprising n-type silicon substrate, silicon oxide gate insulator and p-type polycrystalline silicon gate electrode

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0060761A1 (fr) * 1981-03-13 1982-09-22 Societe Pour L'etude Et La Fabrication De Circuits Integres Speciaux - E.F.C.I.S. Transistor bipolaire latéral sur isolant et son procédé de fabrication

Also Published As

Publication number Publication date
NL7114918A (enExample) 1972-05-03
JPS4929785B1 (enExample) 1974-08-07
US3850708A (en) 1974-11-26

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